JPS60101541A - Electrophotographic sensitive body - Google Patents
Electrophotographic sensitive bodyInfo
- Publication number
- JPS60101541A JPS60101541A JP20911583A JP20911583A JPS60101541A JP S60101541 A JPS60101541 A JP S60101541A JP 20911583 A JP20911583 A JP 20911583A JP 20911583 A JP20911583 A JP 20911583A JP S60101541 A JPS60101541 A JP S60101541A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- crystalline
- crystallization
- crystallization prevention
- selenium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
Abstract
Description
【発明の詳細な説明】
〔イ6明の技術力!11j〕
この発明Qよ、長波長に感度を有する電子写真感光体に
関する。[Detailed description of the invention] [Technical power of I6 Ming! 11j] This invention Q relates to an electrophotographic photoreceptor sensitive to long wavelengths.
従来、電子写真11&光体に適用する光導電体としては
、アモルファスセレンや、アモルファスセレン−テルル
合金A、(、+(が用いられている。Conventionally, amorphous selenium and amorphous selenium-tellurium alloys A, (, +() have been used as photoconductors for use in electrophotography 11 & light bodies.
ところが、つ′七〕1ファスセレンは、第1図において
曲線aで示すように、短波長にしか感度がなく、iiJ
祝光露光露光用ては使用しにくい欠点があり、−:lた
、アモルファスセレン−テルル合金ハ、第1図において
曲BA IJに示す如く、長波長に感度し、1、あるが
、結晶化の進行等の経時変化があり、不安定で耐久性が
ない欠点がある。However, as shown by curve a in Figure 1, 1-phase selenium is sensitive only to short wavelengths, and
The amorphous selenium-tellurium alloy has the disadvantage of being difficult to use for light exposure, as shown in curve BA IJ in Figure 1, and is sensitive to long wavelengths. It has the drawback of being unstable and lacking durability as it undergoes changes over time such as the progression of oxidation.
寸だ、長波長に感度のある光導電体としては、/lかに
、結晶セレン(その特性は第1図の曲線すと同じ)があ
るが、結晶セレンは均一な光導電層として使用した場合
iJ1、抵抗が低すぎて、電荷の保持ができず、丑だ、
これをアモルファスセレンと混在させると、結晶セレ/
が核となり、層全体が結晶化してし捷うので、現実には
、真空蒸着等でこのようなアモルファスセレンと結晶セ
レンを混在させた光導電層を形成することは困難である
。As a photoconductor sensitive to long wavelengths, there is crystalline selenium (its characteristics are the same as the curve in Figure 1), but crystalline selenium was used as a uniform photoconductive layer. In case iJ1, the resistance is too low and the charge cannot be held, so it is useless.
When this is mixed with amorphous selenium, crystalline selenium/
serves as a nucleus, and the entire layer crystallizes and shatters. Therefore, in reality, it is difficult to form a photoconductive layer containing a mixture of amorphous selenium and crystalline selenium by vacuum evaporation or the like.
そのため、結晶セレンは長波長に感度があるにも拘らず
、結果的には余り利用されていない。Therefore, although crystalline selenium is sensitive to long wavelengths, it is not used much as a result.
本発明は、長波長に感度があり、安定した長寿命の電子
写真感光体を提供することを目的とするものである。An object of the present invention is to provide an electrophotographic photoreceptor that is sensitive to long wavelengths and has a stable and long life.
本発明は、アモルファスセレン層に、砒素金含有したア
モルファスセレンからなる結晶化防止層を介して、結晶
セ・・層を彫版して、光導電層を構成し、長波長帯域に
感度をもたせ、アモルファスセレン層の結晶化の進行を
阻止して、安定した特性で長寿命化するものである。The present invention constructs a photoconductive layer by engraving a crystalline selenium layer on an amorphous selenium layer through an anti-crystallization layer made of amorphous selenium containing arsenic gold, and provides sensitivity in a long wavelength band. This prevents the progress of crystallization of the amorphous selenium layer, resulting in stable characteristics and longer life.
以下本発明の実施例について説明する。 Examples of the present invention will be described below.
第2図は、本発明の一実施例の概略断面図である。図に
おいて、1は導電層で、Az、All、Ag5Ni、O
u、ステンレス、その他の金属、及びIn2031Sn
02や、それらの混合物などで形成される。FIG. 2 is a schematic cross-sectional view of one embodiment of the present invention. In the figure, 1 is a conductive layer consisting of Az, All, Ag5Ni, O
u, stainless steel, other metals, and In2031Sn
02 or a mixture thereof.
2は前記導電層1上に形成されるバリア層で、パラキシ
リレンやAz 、、OJなどで構成されるが、これは必
須のものではなく、電荷の保持性を強めたい萌など、必
要に応じ形成されるものである。3は15〜50μの厚
さに形成されたアモルファスセレン層て、電荷輸送層と
して機能するものである。Reference numeral 2 denotes a barrier layer formed on the conductive layer 1, which is made of paraxylylene, Az, OJ, etc., but this is not essential and can be formed as necessary, such as when you want to strengthen charge retention. It is something that will be done. Reference numeral 3 denotes an amorphous selenium layer formed to a thickness of 15 to 50 μm, which functions as a charge transport layer.
4は、該アモルファスセレン層3上に形成された結晶化
防止層で、05〜2μの厚さを有し、0.2〜50%の
砒素を含イJするアモルファスセレンで形成さ711.
ている。砒素の3有率が02〜50%に設定されている
のは次の理由による。すなわち、0.2%以−1だと、
該アモルファスセレン層の結晶化防止作用が弱く、50
%以にだと、応答が悪くなるので好まし7くないからで
ある。4 is a crystallization prevention layer formed on the amorphous selenium layer 3, which has a thickness of 0.5 to 2 μm and is made of amorphous selenium containing 0.2 to 50% arsenic.
ing. The reason why the arsenic content is set at 02 to 50% is as follows. In other words, if it is 0.2% or more -1,
The crystallization prevention effect of the amorphous selenium layer is weak, and 50
% or more is not preferable because the response becomes poor.
51J、’前記結晶化防由層4上に形成された結晶セレ
ン層で、01〜3ztの厚さを有し、電荷発生層として
機能するものである。6は該結晶セレン層5上に設けた
、5〜50μの厚さの透明絶縁層で、フッ素、アクリル
、ウレタン、ポリエステル、アルキッド、エポキシ樹脂
、あるいはポリエチレンテレフタレート等のフィルムを
接着剤でl1lIIり伺けたり、あるいは、バラキンリ
レンの気相蒸メ°11などにより形成されるものである
。51J, 'A crystalline selenium layer formed on the crystallization prevention layer 4, having a thickness of 01 to 3zt, and functioning as a charge generation layer. 6 is a transparent insulating layer with a thickness of 5 to 50 μm provided on the crystalline selenium layer 5, and a film of fluorine, acrylic, urethane, polyester, alkyd, epoxy resin, or polyethylene terephthalate is bonded with an adhesive. It is formed by vapor-phase vaporization of baraquinrylene or the like.
次に、かかる構成の電子写真感光体の製作例を示す。ま
ず、導′亀性基板としてアルミニウノ・基板を用意し、
該基板上に、基板温度をC50Cに保持して、10 L
orrの真空条件下で、ボート加熱による真空蒸着によ
って、50μ厚さのアモルファスセレン層を形成する。Next, an example of manufacturing an electrophotographic photoreceptor having such a configuration will be shown. First, prepare an aluminum Uno substrate as a conductive substrate,
On the substrate, 10 L was added while maintaining the substrate temperature at C50C.
A 50μ thick amorphous selenium layer is formed by vacuum evaporation using boat heating under vacuum conditions of 50 μm.
次いで、このアモルファスセレン層上に砒素を0.4%
含有するアモルファスセレン層を1μの厚さで形成し、
引続いて、真空ペルジャー外で、予め100Cで約2時
間熱処理し、六方晶系とした結晶セレンを、1μの厚さ
に真空蒸着して、光導電層を構成した。この光導電層の
表面を、ペルジャー内に配設されている400Wのハロ
ゲンランプで、数分間露光して熱処理した後、真空ペル
ジャーから取り出し、30μ厚の透IJJポリエステル
膜を取付けて絶縁層とし、本発明に係る電子写真感光体
をイJ) lこ。。Next, 0.4% arsenic was added on this amorphous selenium layer.
Forming an amorphous selenium layer containing 1 μm in thickness,
Subsequently, crystalline selenium, which had been heat-treated at 100 C for about 2 hours to form hexagonal crystals, was vacuum-deposited to a thickness of 1 μm outside a vacuum Pelger to form a photoconductive layer. The surface of this photoconductive layer was exposed and heat-treated for several minutes using a 400W halogen lamp installed in the Pelger, and then removed from the vacuum Pelger and a 30 μ thick transparent IJJ polyester film was attached as an insulating layer. The electrophotographic photoreceptor according to the present invention is described below. .
この」、うにして製作された電子写真感光体に、−次イ
IY電とじ−こ+7J(Vの直流コロナを印加しながら
、同時に赤領域の発光スペクトルも含む螢光う77’
−(:’ 、光1牙を露j’(: L、次いで一6Kv
の逆極性直v1シ帯電を行4い、最後に全面露光を加え
たところ、暗部rli位−500V、明Fit(r、4
位+5o■で、高コントラスI−屯位550■の静電潜
像を得た。While applying a direct current corona of +7J (V) to the electrophotographic photoreceptor produced in this manner, the electrophotographic photoreceptor produced in this manner simultaneously emits a fluorescent light containing an emission spectrum in the red region.
-(:', light 1 fang j'(: L, then 16Kv
When the reverse polarity DC charging was performed and finally the entire surface was exposed, the dark area rli level was -500V, and the light Fit (r, 4
A high-contrast electrostatic latent image of 550 square meters was obtained at a position of +5°.
−二tだ、この電子写真感光体を繰り返し使用したとこ
ろ、経時的な変化がなく、10万枚程度の寿命を示した
。When this electrophotographic photoreceptor was used repeatedly, there was no change over time, and it had a lifespan of about 100,000 sheets.
以上のように、本発明の砒素を含有するアモルファスセ
レンからなる結晶化防止層4は、結晶セレノ層5が核と
なり、下層のアモルファスセレン層:tの結晶化が′1
ln1」するのを防止する機能を、十分果しているもの
であり、更にこの砒素−セレン層・1t」、耐熱性を備
えているので、結晶セレン層5の形成時における耐熱材
としても、大きな役割を果しているものである。As described above, in the crystallization prevention layer 4 made of amorphous selenium containing arsenic of the present invention, the crystalline selenium layer 5 serves as a nucleus, and the crystallization of the lower amorphous selenium layer t is '1'.
In addition, since this arsenic-selenium layer 1t has heat resistance, it plays an important role as a heat-resistant material when forming the crystalline selenium layer 5. It is something that fulfills the following.
この結晶化防止層4における砒素の含有率は、上記理由
によシ、0.2〜50%が適当であるが、その含有率が
犬になると、易動度が若干低下してくる(7)f、ハD
ゲン(Qz、■、13r 、 ト’ )を0〜2゜pp
Hlドープし、これを補償してやることもできる。For the reasons stated above, the arsenic content in this crystallization prevention layer 4 is suitably 0.2 to 50%, but if the content is too high, the mobility will decrease slightly (7 ) f, c D
Gen (Qz, ■, 13r, t') from 0 to 2゜pp
It is also possible to compensate for this by doping with Hl.
上記製作例においては、結晶セレン層を、熱処理して六
方晶系とした結晶セレンを蒸着し、・・ロゲンランプで
更に熱処理して形成したものを示したが、その他の結晶
セレン層の形成法としてdl、(1)、セレン蒸着材料
自体を60〜100Cで予め熱処理し、六方晶系とした
ものをそのま1結晶セレン層として用いる方法、(2)
、アモルファスセレンを蒸着し、その後、ハロゲンラン
プによる熱処理、熱ローラーとの接触、電子線によるス
キャン、レーザー光線によるスキャン等の手段で、結晶
セレンに変化させる方法、あるいは、(3)、(1)と
(2)の方法を組合わせて結晶セレン層を形成する方法
(上記製作例はこの方法によるものである)がある。In the above production example, the crystalline selenium layer was formed by heat-treating hexagonal crystalline selenium by vapor deposition, and then further heat-treating it with a rogen lamp. However, other methods of forming the crystalline selenium layer are possible. dl, (1), A method in which the selenium vapor deposition material itself is heat-treated in advance at 60 to 100 C to form a hexagonal crystal system, and the material is used as a single crystal selenium layer, (2)
, a method of depositing amorphous selenium and then changing it to crystalline selenium by means such as heat treatment with a halogen lamp, contact with a heated roller, scanning with an electron beam, scanning with a laser beam, or (3), (1). There is a method (the above production example is based on this method) of forming a crystalline selenium layer by combining the method (2).
この中、(2)の電子線スキャンによる具体例を示すと
次のとおりである。すなわち、蒸着により表面に結晶化
防止層を介してアモルファスセレン層を形成した光導出
、体イL・、真空度10 torr のチャンバーに入
れ、この)lI′□5カ電体と、10μφ の電子ビー
ノ、(ヒーム電圧数白〜数1(vl ビーム電流0.0
1〜lμA)とを相対的に71′6動させて、表面のア
モルファス士し7層を電子ビームでスキャンし結晶化さ
せ、結晶セレン層を得ることができる。Among these, a specific example of (2) using electron beam scanning is as follows. That is, a light-emitting body with an amorphous selenium layer formed on its surface via a crystallization prevention layer by vapor deposition is placed in a chamber with a degree of vacuum of 10 torr, and this) lI'□5 conductor and electrons of 10 μφ Beano, (Heam voltage number white ~ Number 1 (vl Beam current 0.0
A crystalline selenium layer can be obtained by scanning and crystallizing the seven amorphous layers on the surface with an electron beam by relatively moving the amorphous selenium layer by 71'6.
寸だ、上記のように構成した電子写真感光体への作像プ
ロセスとしては、直流コロナ帯電同時光像露)°L1逆
極性直i’l:i’、 17電、全面露光の各工程から
なる方式を示し7kが、作像プロセスとしては、この他
に、(11、電流コロナ帯電、逆極性直流又は交流コロ
ナ帯電同時光1象露光、全面露光、(2)、直流コ「J
す帯電同時光13コ露光、逆極性直流帯電、全面i′行
光、の各工程からなる電子写真法を適用することができ
、同等の効果が得られる。The process of forming an image on the electrophotographic photoreceptor configured as described above includes the steps of direct current corona charging, simultaneous light image exposure), L1 reverse polarity direct i'l:i', 17 electrons, and full-surface exposure. 7k shows a method of
The same effect can be obtained by applying an electrophotographic method consisting of the following steps: charging, simultaneous exposure to 13 light beams, reverse polarity direct current charging, and full-surface i'-row light exposure.
本発明は、電子写真感光体の光導電層を、アモルファス
セレン層ト(1,lL素ヲ含有スるアモルファスセレン
からなる結晶化防止層と、結晶セレン層とを順次積層し
たもので形成し、最上層を結晶セレン層としたので、長
波長にも感度があり、露光用光州として長波長成分をも
つランプや、レーザーを用いることができる。In the present invention, a photoconductive layer of an electrophotographic photoreceptor is formed by sequentially laminating an amorphous selenium layer (an anti-crystallization layer made of amorphous selenium containing 1,1 L element) and a crystalline selenium layer, Since the uppermost layer is a crystalline selenium layer, it is sensitive to long wavelengths, and a lamp or laser having a long wavelength component can be used as the light beam for exposure.
寸だ、光導電層の表面層は結晶セレン層で形成され、結
晶化されており、しかも、結晶化防止層に」:り下層の
アモルファスセレン層が結晶化するという変化も阻止し
ているので、安定した長)、r命の電子写真感光体が得
られる。In fact, the surface layer of the photoconductive layer is formed of a crystalline selenium layer and is crystallized, and it also acts as a crystallization prevention layer: it also prevents the underlying amorphous selenium layer from crystallizing. , stable length), an electrophotographic photoreceptor with long life can be obtained.
第1図は、アモルファスセレン及びアモルファスセレン
−テルル合金の光波長に対する感!特性を示す図、第2
図は、本発明に係る電子:lJ:真感)10体の一実施
例の概略断面図である。
図において、■は導電層、2はバリア層、:31:J−
電荷輸送層、4は結晶化防止層、5に″lL1.萌発生
層、6は絶縁層を示す。
特許出願人 オリンパス光学工業株式会社簡1 図
□5反長
筒2図Figure 1 shows the sensitivity of amorphous selenium and amorphous selenium-tellurium alloy to light wavelengths! Diagram showing characteristics, 2nd
The figure is a schematic cross-sectional view of an embodiment of 10 electronic (lJ: shinkan) bodies according to the present invention. In the figure, ■ is a conductive layer, 2 is a barrier layer, :31:J-
A charge transport layer, 4 an anti-crystallization layer, 5 a crystallization prevention layer, 5 an insulating layer, and 6 an insulating layer.Patent applicant: Olympus Optical Co., Ltd.
Claims (3)
セレンからなる電荷発生層と、透明絶縁層とを順次積層
して構成したことを特徴とする′1シ子写真感光体。(1) On the conductive layer, via a barrier layer if necessary, /C
1. A photographic photoreceptor comprising a charge generating layer made of selenium and a transparent insulating layer laminated in sequence.
有するアモルファスセレンで構成されていることを特徴
とする特許請求の範囲第1項記載の電子写真感光体。(2) The electrophotographic photoreceptor according to claim 1, wherein the crystallization prevention layer is composed of amorphous selenium containing 02 to 50% arsenic.
0〜201)p Illのハロゲンを含有するアモルフ
ァスセレンで構成されていることを特徴とする特許請求
の範囲第1項記載の電子写真感光体。(3) The crystallization prevention layer contains 0.2 to 50% arsenic;
2. The electrophotographic photoreceptor according to claim 1, wherein the electrophotographic photoreceptor is made of amorphous selenium containing a halogen of 0 to 201) p Ill.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20911583A JPS60101541A (en) | 1983-11-09 | 1983-11-09 | Electrophotographic sensitive body |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20911583A JPS60101541A (en) | 1983-11-09 | 1983-11-09 | Electrophotographic sensitive body |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS60101541A true JPS60101541A (en) | 1985-06-05 |
Family
ID=16567532
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20911583A Pending JPS60101541A (en) | 1983-11-09 | 1983-11-09 | Electrophotographic sensitive body |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60101541A (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4797338A (en) * | 1986-09-16 | 1989-01-10 | Minolta Camera Kabushiki Kaisha | Photosensitive member comprising charge generating layer and charge transporting layer |
US4801515A (en) * | 1986-07-08 | 1989-01-31 | Minolta Camera Kabushiki Kaisha | Photosensitive member having an overcoat layer |
US4882256A (en) * | 1986-10-14 | 1989-11-21 | Minolta Camera Kabushiki Kaisha | Photosensitive member having an overcoat layer comprising amorphous carbon |
US4886724A (en) * | 1987-03-09 | 1989-12-12 | Minolta Camera Kabushiki Kaisha | Photosensitive member having an overcoat layer and process for manufacturing the same |
US4891291A (en) * | 1987-03-09 | 1990-01-02 | Minolta Camera Kabushiki Kaisha | Photosensitive member having an amorphous carbon overcoat layer |
US4994337A (en) * | 1987-06-17 | 1991-02-19 | Minolta Camera Kabushiki Kaisha | Photosensitive member having an overcoat layer |
US5000831A (en) * | 1987-03-09 | 1991-03-19 | Minolta Camera Kabushiki Kaisha | Method of production of amorphous hydrogenated carbon layer |
US7649177B2 (en) * | 2005-11-01 | 2010-01-19 | Fujifilm Corporation | Radiation image detector |
US8143587B2 (en) * | 2007-05-01 | 2012-03-27 | Fujifilm Corporation | Radiation image detector having a doped intermediate layer |
-
1983
- 1983-11-09 JP JP20911583A patent/JPS60101541A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4801515A (en) * | 1986-07-08 | 1989-01-31 | Minolta Camera Kabushiki Kaisha | Photosensitive member having an overcoat layer |
US4797338A (en) * | 1986-09-16 | 1989-01-10 | Minolta Camera Kabushiki Kaisha | Photosensitive member comprising charge generating layer and charge transporting layer |
US4882256A (en) * | 1986-10-14 | 1989-11-21 | Minolta Camera Kabushiki Kaisha | Photosensitive member having an overcoat layer comprising amorphous carbon |
US4886724A (en) * | 1987-03-09 | 1989-12-12 | Minolta Camera Kabushiki Kaisha | Photosensitive member having an overcoat layer and process for manufacturing the same |
US4891291A (en) * | 1987-03-09 | 1990-01-02 | Minolta Camera Kabushiki Kaisha | Photosensitive member having an amorphous carbon overcoat layer |
US5000831A (en) * | 1987-03-09 | 1991-03-19 | Minolta Camera Kabushiki Kaisha | Method of production of amorphous hydrogenated carbon layer |
US4994337A (en) * | 1987-06-17 | 1991-02-19 | Minolta Camera Kabushiki Kaisha | Photosensitive member having an overcoat layer |
US7649177B2 (en) * | 2005-11-01 | 2010-01-19 | Fujifilm Corporation | Radiation image detector |
US8143587B2 (en) * | 2007-05-01 | 2012-03-27 | Fujifilm Corporation | Radiation image detector having a doped intermediate layer |
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