JPS5999343A - ガス検知素子 - Google Patents
ガス検知素子Info
- Publication number
- JPS5999343A JPS5999343A JP20968782A JP20968782A JPS5999343A JP S5999343 A JPS5999343 A JP S5999343A JP 20968782 A JP20968782 A JP 20968782A JP 20968782 A JP20968782 A JP 20968782A JP S5999343 A JPS5999343 A JP S5999343A
- Authority
- JP
- Japan
- Prior art keywords
- catalyst
- catalyst layer
- gas
- burned
- insulating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003054 catalyst Substances 0.000 claims abstract description 36
- 239000004065 semiconductor Substances 0.000 claims abstract description 10
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 8
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 8
- 239000011810 insulating material Substances 0.000 claims abstract description 6
- 229910000510 noble metal Inorganic materials 0.000 claims abstract description 5
- 238000001514 detection method Methods 0.000 claims description 8
- 229910052703 rhodium Inorganic materials 0.000 claims description 4
- 229910052741 iridium Inorganic materials 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- 230000035945 sensitivity Effects 0.000 abstract description 10
- 239000000843 powder Substances 0.000 abstract description 5
- 239000007864 aqueous solution Substances 0.000 abstract description 4
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 abstract description 4
- 239000000463 material Substances 0.000 abstract description 3
- 239000002253 acid Substances 0.000 abstract description 2
- 230000003247 decreasing effect Effects 0.000 abstract description 2
- 238000000034 method Methods 0.000 abstract description 2
- 239000000203 mixture Substances 0.000 abstract description 2
- 229910001961 silver nitrate Inorganic materials 0.000 abstract description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 2
- 229910052593 corundum Inorganic materials 0.000 abstract 2
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 2
- 230000000694 effects Effects 0.000 description 5
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910018879 Pt—Pd Inorganic materials 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/12—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid, for detecting components in the fluid
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20968782A JPS5999343A (ja) | 1982-11-30 | 1982-11-30 | ガス検知素子 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20968782A JPS5999343A (ja) | 1982-11-30 | 1982-11-30 | ガス検知素子 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5999343A true JPS5999343A (ja) | 1984-06-08 |
| JPH0444691B2 JPH0444691B2 (enrdf_load_stackoverflow) | 1992-07-22 |
Family
ID=16576957
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20968782A Granted JPS5999343A (ja) | 1982-11-30 | 1982-11-30 | ガス検知素子 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5999343A (enrdf_load_stackoverflow) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04279853A (ja) * | 1991-03-08 | 1992-10-05 | Figaro Eng Inc | ガス検出方法及びそれに用いるガスセンサ |
| JPH0540102A (ja) * | 1991-08-07 | 1993-02-19 | Osaka Gas Co Ltd | ガスセンサ |
| JPH09269306A (ja) * | 1996-04-02 | 1997-10-14 | New Cosmos Electric Corp | 熱線型半導体式ガス検知素子及びガス検知装置 |
| JPH11142356A (ja) * | 1997-11-07 | 1999-05-28 | Fis Kk | 半導体ガスセンサ |
| JP2018048912A (ja) * | 2016-09-21 | 2018-03-29 | 大阪瓦斯株式会社 | ガスセンサおよびガス検知装置 |
| JP2018054592A (ja) * | 2016-09-21 | 2018-04-05 | 大阪瓦斯株式会社 | ガスセンサおよびガス検知装置 |
| JP2018054593A (ja) * | 2016-09-21 | 2018-04-05 | 大阪瓦斯株式会社 | ガスセンサおよびガス検知装置 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7124221B1 (en) | 1999-10-19 | 2006-10-17 | Rambus Inc. | Low latency multi-level communication interface |
| US6396329B1 (en) | 1999-10-19 | 2002-05-28 | Rambus, Inc | Method and apparatus for receiving high speed signals with low latency |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54134697A (en) * | 1978-04-12 | 1979-10-19 | Toshiba Corp | Gas sensitive element |
| JPS5578236A (en) * | 1978-12-08 | 1980-06-12 | Matsushita Electric Works Ltd | Gas detection element |
| JPS5594153A (en) * | 1979-01-11 | 1980-07-17 | Fuigaro Giken Kk | Methane gas detector |
-
1982
- 1982-11-30 JP JP20968782A patent/JPS5999343A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54134697A (en) * | 1978-04-12 | 1979-10-19 | Toshiba Corp | Gas sensitive element |
| JPS5578236A (en) * | 1978-12-08 | 1980-06-12 | Matsushita Electric Works Ltd | Gas detection element |
| JPS5594153A (en) * | 1979-01-11 | 1980-07-17 | Fuigaro Giken Kk | Methane gas detector |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04279853A (ja) * | 1991-03-08 | 1992-10-05 | Figaro Eng Inc | ガス検出方法及びそれに用いるガスセンサ |
| JPH0540102A (ja) * | 1991-08-07 | 1993-02-19 | Osaka Gas Co Ltd | ガスセンサ |
| JPH09269306A (ja) * | 1996-04-02 | 1997-10-14 | New Cosmos Electric Corp | 熱線型半導体式ガス検知素子及びガス検知装置 |
| JPH11142356A (ja) * | 1997-11-07 | 1999-05-28 | Fis Kk | 半導体ガスセンサ |
| JP2018048912A (ja) * | 2016-09-21 | 2018-03-29 | 大阪瓦斯株式会社 | ガスセンサおよびガス検知装置 |
| JP2018054592A (ja) * | 2016-09-21 | 2018-04-05 | 大阪瓦斯株式会社 | ガスセンサおよびガス検知装置 |
| JP2018054593A (ja) * | 2016-09-21 | 2018-04-05 | 大阪瓦斯株式会社 | ガスセンサおよびガス検知装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0444691B2 (enrdf_load_stackoverflow) | 1992-07-22 |
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