JPS5996763A - Semiconductor integrated circuit - Google Patents
Semiconductor integrated circuitInfo
- Publication number
- JPS5996763A JPS5996763A JP57206516A JP20651682A JPS5996763A JP S5996763 A JPS5996763 A JP S5996763A JP 57206516 A JP57206516 A JP 57206516A JP 20651682 A JP20651682 A JP 20651682A JP S5996763 A JPS5996763 A JP S5996763A
- Authority
- JP
- Japan
- Prior art keywords
- channel type
- channel
- type fet
- region
- fet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims description 7
- 230000000295 complement effect Effects 0.000 claims abstract description 7
- 230000005669 field effect Effects 0.000 claims abstract description 6
- 239000000470 constituent Substances 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 4
- 230000010355 oscillation Effects 0.000 description 3
- 239000003990 capacitor Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 235000003976 Ruta Nutrition 0.000 description 1
- 240000005746 Ruta graveolens Species 0.000 description 1
- 238000010411 cooking Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 235000005806 ruta Nutrition 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/0688—Integrated circuits having a three-dimensional layout
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、複数の相補形M I S電界効果トランジス
タを同−半導体基、体上に集積化した半導体集積回路に
関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a semiconductor integrated circuit in which a plurality of complementary MIS field effect transistors are integrated on the same semiconductor substrate.
従来、例えば相補形MO8電界効呆トランジスタ(以下
CM OS −FE Tと称す)を用いた集積回路にお
いて、0MO8−FETを構成するPチャンネル型FE
TとNチャンネル型FETのしきい電圧VTHPIVT
HN (!: t OjA t 圧VDD (7) 間
ニ、l VTHPl+VTHN< VDDなる関係か成
立する様に谷定数を決定していた。Conventionally, for example, in an integrated circuit using a complementary MO8 field effect transistor (hereinafter referred to as CMOS-FET), a P-channel FE that constitutes an 0MO8-FET has been used.
T and N-channel FET threshold voltage VTHPIVT
HN (!: t OjA t Pressure VDD (7) The valley constant was determined so that the relationship VTHPl+VTHN<VDD was established.
例エバ、VDD = 10 Vノ集積回路テハ、vTH
P。Example Eva, VDD = 10 V integrated circuit technology, vTH
P.
VTHN はそれそ゛扛略々−2V 、 +2Vである
。第1図に従来の0MO8−F’ETインバータの入出
力゛電圧特性とドレイン電流を示す。入力信号の立上り
時間、立下り時間が短い場合、トレイン電流は無視でき
、泊費電流は次段のMOS−FETゲート容量の充放電
電流と考えらfる。この場合、高速動作を実現するには
、l VTI(P l + VTHNをできるだけ小さ
くして、充放電電流を大きくする必要がある。しかるに
、第2図に示す如き遅延回路では、インバータ2の入力
直圧の立上り、立下り時間が長くなり、第1図に示した
トレイン電流か無視できなくなる。高速動作を得るため
に% 1VTHP1.VTHNを小さくすれはする程
、ドレイン電流は犬となり、集積回路の消費醒流は増大
する。第3図に示す如き発振回路にも、同様の欠点があ
る。さらに、従来のC八l OS −F ETは、第1
図から明らかな様に、その−理スレンショールドにヒス
テリシス特性が無いため、過痙時にノイズが混入すると
、回路が誤動作するおそれがある。VTHN is approximately -2V and +2V, respectively. FIG. 1 shows the input/output voltage characteristics and drain current of a conventional 0MO8-F'ET inverter. When the rise time and fall time of the input signal are short, the train current can be ignored, and the charge current is considered to be the charging/discharging current of the MOS-FET gate capacitor in the next stage. In this case, in order to achieve high-speed operation, it is necessary to make l VTI (P l + VTHN as small as possible and increase the charging/discharging current. However, in the delay circuit as shown in Fig. 2, the input of inverter 2 The rise and fall times of the direct voltage become longer, and the train current shown in Figure 1 cannot be ignored.The smaller %1VTHP1.VTHN is made to obtain high-speed operation, the more the drain current becomes a dog, and the integrated circuit The oscillation circuit shown in Fig. 3 has a similar drawback.Furthermore, the conventional C
As is clear from the figure, since there is no hysteresis characteristic in the -Lislenskjöld, if noise is mixed in during hyperconvulsions, there is a risk that the circuit will malfunction.
本発明は、上述の欠点を除去して、低(円貨電流でノイ
ズに強い半導体集積回路を提供することを目的とする。SUMMARY OF THE INVENTION An object of the present invention is to eliminate the above-mentioned drawbacks and provide a semiconductor integrated circuit with low current and strong resistance to noise.
第4図に、1vTHP1+vTHN′〉VDDナル条件
ヲ満足するCMO5−FETインバータの入出力電圧特
性を示す。第4図で、領域工は′Pチャンネル型FE’
l’オン、Nチャンネル型F E Tオフ、領域■はP
チャンネル型FETオフ、領域IはPチャンネル型F
HTオフ、Nチャンネル型F’ETオンである。FIG. 4 shows the input/output voltage characteristics of a CMO5-FET inverter that satisfies the 1vTHP1+vTHN'>VDD null condition. In Figure 4, the area engineering is 'P channel type FE'
l'on, N channel type FET off, area ■ is P
Channel type FET off, region I is P channel type F
HT off, N-channel type F'ET on.
入力゛ル:圧が領域■にある時、出力電圧は次段の負荷
容量に保持さ扛る。この構成では、Pチャンネル型F
E’1’とNチャン、ネル型F’ETが同時にmA状態
になることが無いので、入力電圧の立上り・立下り時間
に関係無くドレイン電流は流扛ない。Input ゛: When the pressure is in the region ゛, the output voltage is held by the load capacity of the next stage. In this configuration, P-channel type F
Since E'1' and the N-channel channel type F'ET do not enter the mA state at the same time, no drain current flows regardless of the rise and fall times of the input voltage.
さらに調理スレッショールドにヒステリシス特性がある
ため過渡時のノイズにも強い。Furthermore, since the cooking threshold has hysteresis characteristics, it is resistant to noise during transient periods.
IVTHPI + VTHN > VDD ヲti 足
f ルタ?h VTHP *VTHNを変える方法それ
自身はよく知られており、ゲート専寛体の櫨類をかえる
、イオン注入など!こよりチャンネル部の不純物濃度を
制御する、ゲート絶縁膜の厚さ、種類をかえる等の方法
が孕けられる。こnにより、第4図の穎域ト4の幅を任
意にかえることができる。IVTHPI + VTHN > VDD Woti foot f Ruta? h VTHP *The methods of changing VTHN are well known, such as changing the gate exclusive body, ion implantation, etc. This suggests methods such as controlling the impurity concentration in the channel region and changing the thickness and type of the gate insulating film. This allows the width of the glume area 4 in FIG. 4 to be changed arbitrarily.
このインバータを、第2図の2つのインバータ1.2と
コンデンサ3からなる遅延回路インバータ2や、第3図
に示すコンデンサ4,5.インバータ6、抵抗7.水晶
発振器8からなる発振回路のインバータ3に適用するこ
Lにより、低消費電流でノイズに価い回路か得らnる。This inverter can be used as a delay circuit inverter 2 consisting of two inverters 1.2 and a capacitor 3 shown in FIG. 2, or a delay circuit inverter 2 shown in FIG. Inverter 6, resistor 7. By applying this to the inverter 3 of the oscillation circuit consisting of the crystal oscillator 8, a circuit with low current consumption and low noise resistance can be obtained.
以上、本発明の具体的な実施例を、CMO:1−FET
インバータについて述べたが、この他にも種々組合せか
可能である。集積回路は、IVTHI)l+VTHN
>VDDを満足する相補形FETのみで構成しても、前
記条件を満足する相補形FETと満足しない相補形FE
Tを組合せて構成しても良い。As described above, specific embodiments of the present invention have been described with reference to CMO:1-FET.
Although the inverter has been described, various other combinations are possible. The integrated circuit is IVTHI)l+VTHN
>Even if it is composed only of complementary FETs that satisfy VDD, there will be complementary FETs that satisfy the above conditions and complementary FEs that do not.
It may be configured by combining T.
この発明によnば、回路構成や装造プロセスを複雑化す
ること無く、低消費電流でノイズに5虫い半導体集積回
路が得らnる。According to the present invention, a semiconductor integrated circuit with low current consumption and low noise can be obtained without complicating the circuit configuration or manufacturing process.
第1図は従来のCへ408−FETインバータの出力電
圧およびドレイン1lEfiと入力電圧との関係を示す
線図、第2図は遅延回路の結線図、第5図は発振回路の
結線図、第4図は本発明によるインノクータの入出力電
圧特性を示す線図である。
1.2.6・・・インバータ、3〜5・・・容量、7・
・抵抗、8・水晶発振器。
ヤ1 (2)
テ2 閃Fig. 1 is a diagram showing the relationship between the output voltage and drain 1lEfi of a conventional C408-FET inverter and the input voltage, Fig. 2 is a wiring diagram of a delay circuit, Fig. 5 is a wiring diagram of an oscillation circuit, and FIG. 4 is a diagram showing the input/output voltage characteristics of the innocoator according to the present invention. 1.2.6...Inverter, 3-5...Capacity, 7.
・Resistance, 8. Crystal oscillator. Ya1 (2) Te2 Flash
Claims (1)
なるM I S =、5界効果トランジスタよりなる相
補型M I S電界効果トランジスタを構成要素に含む
ことを特徴とする半導体集積回路。A semiconductor integrated circuit characterized in that the sum of the absolute values of respective threshold voltages is greater than the power supply voltage, and the semiconductor integrated circuit includes a complementary M I S field effect transistor made of five field effect transistors as a component.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57206516A JPS5996763A (en) | 1982-11-25 | 1982-11-25 | Semiconductor integrated circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57206516A JPS5996763A (en) | 1982-11-25 | 1982-11-25 | Semiconductor integrated circuit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5996763A true JPS5996763A (en) | 1984-06-04 |
Family
ID=16524653
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57206516A Pending JPS5996763A (en) | 1982-11-25 | 1982-11-25 | Semiconductor integrated circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5996763A (en) |
-
1982
- 1982-11-25 JP JP57206516A patent/JPS5996763A/en active Pending
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