JPS5996520A - 薄膜磁気ヘツドの製造方法 - Google Patents
薄膜磁気ヘツドの製造方法Info
- Publication number
- JPS5996520A JPS5996520A JP20455182A JP20455182A JPS5996520A JP S5996520 A JPS5996520 A JP S5996520A JP 20455182 A JP20455182 A JP 20455182A JP 20455182 A JP20455182 A JP 20455182A JP S5996520 A JPS5996520 A JP S5996520A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- amorphous
- film
- layer
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 19
- 239000010409 thin film Substances 0.000 title claims description 17
- 238000000034 method Methods 0.000 claims abstract description 37
- 239000000758 substrate Substances 0.000 claims abstract description 19
- 238000010884 ion-beam technique Methods 0.000 claims abstract description 10
- 238000003801 milling Methods 0.000 claims abstract description 10
- 239000010408 film Substances 0.000 claims description 26
- 238000000151 deposition Methods 0.000 claims description 9
- 238000007740 vapor deposition Methods 0.000 claims description 9
- 230000008021 deposition Effects 0.000 claims description 8
- 238000004544 sputter deposition Methods 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 6
- 229920002120 photoresistant polymer Polymers 0.000 claims description 5
- 239000004020 conductor Substances 0.000 claims description 3
- 238000000059 patterning Methods 0.000 claims description 3
- 238000004804 winding Methods 0.000 claims description 3
- 238000002425 crystallisation Methods 0.000 abstract description 8
- 230000008025 crystallization Effects 0.000 abstract description 8
- 230000003647 oxidation Effects 0.000 abstract description 8
- 238000007254 oxidation reaction Methods 0.000 abstract description 8
- 230000008020 evaporation Effects 0.000 abstract description 7
- 238000001704 evaporation Methods 0.000 abstract description 7
- 239000000463 material Substances 0.000 abstract description 5
- 230000006866 deterioration Effects 0.000 abstract description 4
- 230000001133 acceleration Effects 0.000 abstract description 2
- 230000015572 biosynthetic process Effects 0.000 abstract description 2
- 239000000696 magnetic material Substances 0.000 description 9
- 230000000694 effects Effects 0.000 description 5
- 238000005530 etching Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000002411 adverse Effects 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000035699 permeability Effects 0.000 description 3
- 230000005389 magnetism Effects 0.000 description 2
- 230000005415 magnetization Effects 0.000 description 2
- 241000218657 Picea Species 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 238000005280 amorphization Methods 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Magnetic Heads (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20455182A JPS5996520A (ja) | 1982-11-24 | 1982-11-24 | 薄膜磁気ヘツドの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20455182A JPS5996520A (ja) | 1982-11-24 | 1982-11-24 | 薄膜磁気ヘツドの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5996520A true JPS5996520A (ja) | 1984-06-04 |
| JPH0481243B2 JPH0481243B2 (enrdf_load_stackoverflow) | 1992-12-22 |
Family
ID=16492367
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20455182A Granted JPS5996520A (ja) | 1982-11-24 | 1982-11-24 | 薄膜磁気ヘツドの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5996520A (enrdf_load_stackoverflow) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54116663A (en) * | 1978-03-03 | 1979-09-11 | Matsushita Electric Ind Co Ltd | Magnetic device |
| JPS5542375A (en) * | 1978-09-20 | 1980-03-25 | Sharp Corp | Manufacture of magnetic head |
-
1982
- 1982-11-24 JP JP20455182A patent/JPS5996520A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54116663A (en) * | 1978-03-03 | 1979-09-11 | Matsushita Electric Ind Co Ltd | Magnetic device |
| JPS5542375A (en) * | 1978-09-20 | 1980-03-25 | Sharp Corp | Manufacture of magnetic head |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0481243B2 (enrdf_load_stackoverflow) | 1992-12-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS5996520A (ja) | 薄膜磁気ヘツドの製造方法 | |
| JP2002118027A (ja) | 磁性膜形成装置および磁性膜形成方法 | |
| US5411813A (en) | Ferhgasi soft magnetic materials for inductive magnetic heads | |
| JPH04142719A (ja) | 磁性体薄膜の製造方法 | |
| JPS59185024A (ja) | 磁気記録媒体 | |
| JPH01230275A (ja) | 超電導薄膜の形成法 | |
| JP2890771B2 (ja) | 超伝導薄膜素子の製造方法 | |
| JP2611976B2 (ja) | 光磁気記録膜の製造方法 | |
| JP3038084B2 (ja) | 軟磁性薄膜の形成方法 | |
| JPH0571164B2 (enrdf_load_stackoverflow) | ||
| JPH0261819A (ja) | 垂直磁気記録媒体 | |
| JPH0571163B2 (enrdf_load_stackoverflow) | ||
| JPS6013067B2 (ja) | 真空蒸着装置 | |
| JPH0389506A (ja) | 強磁性金属薄膜の製造方法 | |
| JPH0744107B2 (ja) | 軟磁性薄膜 | |
| Lo et al. | Near-zero magnetostriction NiFe films deposited by ion beam sputtering | |
| JPS63452A (ja) | 磁性薄膜の製造方法 | |
| JPH01189013A (ja) | 薄膜磁気ヘッド | |
| JPS61265715A (ja) | 磁気ヘツドコア用部材 | |
| Hill | Nucleation and charge on glass substrates | |
| JPH05291038A (ja) | 添加物としてＩｒを有するＦｅＧａＳｉ系磁性材料 | |
| JPS60138735A (ja) | 磁気記録媒体の熱処理方法 | |
| JPS5922235A (ja) | 垂直磁気記録用媒体の製造装置 | |
| JPH05171368A (ja) | 磁性合金 | |
| JP2000248355A (ja) | ＩｎＳｂ膜の形成方法 |