JPS5983336A - 荷電粒子線集束偏向装置 - Google Patents

荷電粒子線集束偏向装置

Info

Publication number
JPS5983336A
JPS5983336A JP57193077A JP19307782A JPS5983336A JP S5983336 A JPS5983336 A JP S5983336A JP 57193077 A JP57193077 A JP 57193077A JP 19307782 A JP19307782 A JP 19307782A JP S5983336 A JPS5983336 A JP S5983336A
Authority
JP
Japan
Prior art keywords
deflection
deflector
charged particle
particle beam
electromagnetic lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57193077A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0234426B2 (enrdf_load_stackoverflow
Inventor
Hidekazu Goto
英一 後藤
Takashi Soma
相馬　嵩
Masanori Idesawa
出沢　正徳
Teruo Someya
染谷　輝夫
Toshinori Goto
後藤　俊徳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Nippon Telegraph and Telephone Corp
RIKEN
Original Assignee
Jeol Ltd
Nihon Denshi KK
Nippon Telegraph and Telephone Corp
RIKEN
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, Nippon Telegraph and Telephone Corp, RIKEN filed Critical Jeol Ltd
Priority to JP57193077A priority Critical patent/JPS5983336A/ja
Publication of JPS5983336A publication Critical patent/JPS5983336A/ja
Publication of JPH0234426B2 publication Critical patent/JPH0234426B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP57193077A 1982-11-02 1982-11-02 荷電粒子線集束偏向装置 Granted JPS5983336A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57193077A JPS5983336A (ja) 1982-11-02 1982-11-02 荷電粒子線集束偏向装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57193077A JPS5983336A (ja) 1982-11-02 1982-11-02 荷電粒子線集束偏向装置

Publications (2)

Publication Number Publication Date
JPS5983336A true JPS5983336A (ja) 1984-05-14
JPH0234426B2 JPH0234426B2 (enrdf_load_stackoverflow) 1990-08-03

Family

ID=16301824

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57193077A Granted JPS5983336A (ja) 1982-11-02 1982-11-02 荷電粒子線集束偏向装置

Country Status (1)

Country Link
JP (1) JPS5983336A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6476656A (en) * 1987-09-16 1989-03-22 Toshiba Corp Charged beam depicting device
JP2007534124A (ja) * 2004-04-23 2007-11-22 ヴィステック エレクトロン ビーム ゲーエムべーハー 粒子光学照的射系用の照射コンデンサー
JP2008153131A (ja) * 2006-12-19 2008-07-03 Jeol Ltd 荷電粒子ビーム装置
US7521688B2 (en) 2006-01-11 2009-04-21 Jeol Ltd. Charged-particle beam instrument

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0642644U (ja) * 1992-11-06 1994-06-07 佐藤工業株式会社 包装用仕切りと仕切り付き包装箱

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5648052A (en) * 1979-09-17 1981-05-01 Varian Associates Method of double deflecting and scanning charged particle beam and condenser

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5648052A (en) * 1979-09-17 1981-05-01 Varian Associates Method of double deflecting and scanning charged particle beam and condenser

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6476656A (en) * 1987-09-16 1989-03-22 Toshiba Corp Charged beam depicting device
JP2007534124A (ja) * 2004-04-23 2007-11-22 ヴィステック エレクトロン ビーム ゲーエムべーハー 粒子光学照的射系用の照射コンデンサー
US7521688B2 (en) 2006-01-11 2009-04-21 Jeol Ltd. Charged-particle beam instrument
JP2008153131A (ja) * 2006-12-19 2008-07-03 Jeol Ltd 荷電粒子ビーム装置
US7820978B2 (en) 2006-12-19 2010-10-26 Jeol Ltd. Charged-particle beam system

Also Published As

Publication number Publication date
JPH0234426B2 (enrdf_load_stackoverflow) 1990-08-03

Similar Documents

Publication Publication Date Title
JP5160021B2 (ja) 粒子光学投影装置
KR100572253B1 (ko) 리소그래피장치, 디바이스 제조방법 및 그것에 의하여제조된 디바이스
US4544846A (en) Variable axis immersion lens electron beam projection system
JPH09223475A (ja) 電磁偏向器、及び該偏向器を用いた荷電粒子線転写装置
US5635719A (en) Variable curvilinear axis deflection means for particle optical lenses
US7041988B2 (en) Electron beam exposure apparatus and electron beam processing apparatus
JPS626341B2 (enrdf_load_stackoverflow)
US4544847A (en) Multi-gap magnetic imaging lens for charged particle beams
JPH06103946A (ja) 可変軸スティグマトール
US6642675B2 (en) Charged particle beam exposing apparatus
JP3210613B2 (ja) 曲線軸補正装置
US5444257A (en) Electron-beam exposure system for reduced distortion of electron beam spot
US5708274A (en) Curvilinear variable axis lens correction with crossed coils
JPH10302693A (ja) 中心に双極子を有する曲線軸移動型レンズ補正
JP4156862B2 (ja) 電子ビーム露光装置及び電子ビーム処理装置
JPS61101944A (ja) 荷電粒子ビ−ム用集束装置
JPS5983336A (ja) 荷電粒子線集束偏向装置
US5847402A (en) Charged particle beam pattern transfer apparatus and method
US4798953A (en) Electronic beam device for projecting an image of an object on a sample
US5650628A (en) Simultaneous deflections in charged-particle beams
US6066855A (en) Charged-particle-beam optical system exhibiting aberration correction
JP3772067B2 (ja) 荷電粒子ビーム照射装置
JPH01295419A (ja) 電子ビーム露光方法及びその装置
JP7480917B1 (ja) マルチ荷電粒子ビーム描画装置
Zhu et al. Comprehensive analysis of electron optical design of SCALPEL-HT/Alpha