JPS5981850A - 電子レンズ - Google Patents

電子レンズ

Info

Publication number
JPS5981850A
JPS5981850A JP57191787A JP19178782A JPS5981850A JP S5981850 A JPS5981850 A JP S5981850A JP 57191787 A JP57191787 A JP 57191787A JP 19178782 A JP19178782 A JP 19178782A JP S5981850 A JPS5981850 A JP S5981850A
Authority
JP
Japan
Prior art keywords
coil
magnetomotive force
lens
excitation
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57191787A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0234419B2 (OSRAM
Inventor
Akira Yonezawa
米沢　彬
Tetsuo Iwaki
岩城　哲郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
INTERNATL PRECISION Inc
Original Assignee
INTERNATL PRECISION Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by INTERNATL PRECISION Inc filed Critical INTERNATL PRECISION Inc
Priority to JP57191787A priority Critical patent/JPS5981850A/ja
Publication of JPS5981850A publication Critical patent/JPS5981850A/ja
Publication of JPH0234419B2 publication Critical patent/JPH0234419B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/141—Electromagnetic lenses

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
JP57191787A 1982-11-02 1982-11-02 電子レンズ Granted JPS5981850A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57191787A JPS5981850A (ja) 1982-11-02 1982-11-02 電子レンズ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57191787A JPS5981850A (ja) 1982-11-02 1982-11-02 電子レンズ

Publications (2)

Publication Number Publication Date
JPS5981850A true JPS5981850A (ja) 1984-05-11
JPH0234419B2 JPH0234419B2 (OSRAM) 1990-08-03

Family

ID=16280529

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57191787A Granted JPS5981850A (ja) 1982-11-02 1982-11-02 電子レンズ

Country Status (1)

Country Link
JP (1) JPS5981850A (OSRAM)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62100936A (ja) * 1985-10-28 1987-05-11 Shimadzu Corp 荷電粒子線を用いた分析装置の試料汚染防止方法
US4735288A (en) * 1986-01-24 1988-04-05 Ckd Kabushiki Kaisha Detachably attaching mechanism for cup of lubricator or filter used with air-actuated device
EP0596529A1 (en) * 1992-11-06 1994-05-11 Hitachi, Ltd. Electron lens
US6429607B1 (en) 2000-08-15 2002-08-06 International Business Machines Corporation Constant power dynamic focus coil
JP2005038857A (ja) * 2003-07-14 2005-02-10 Fei Co 磁界レンズ
JP2005038853A (ja) * 2003-07-14 2005-02-10 Fei Co 二重ビーム装置
JP2007335134A (ja) * 2006-06-13 2007-12-27 Hitachi High-Technologies Corp 走査電子顕微鏡
US8183547B2 (en) 2009-05-28 2012-05-22 Fei Company Dual beam system
JP2019050189A (ja) * 2017-08-08 2019-03-28 エクスロン インターナショナル ゲゼルシャフト ミット ベシュレンクテル ハフツングＹｘｌｏｎ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｇｍｂｈ Ｘ線管用の対物レンズ及び集束レンズ、ｘ線管並びにそのようなｘ線管を操作する方法
JP2020087701A (ja) * 2018-11-26 2020-06-04 日本電子株式会社 荷電粒子線装置及び荷電粒子線装置の制御方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57151160A (en) * 1981-03-16 1982-09-18 Internatl Precision Inc Electron lens

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57151160A (en) * 1981-03-16 1982-09-18 Internatl Precision Inc Electron lens

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62100936A (ja) * 1985-10-28 1987-05-11 Shimadzu Corp 荷電粒子線を用いた分析装置の試料汚染防止方法
US4735288A (en) * 1986-01-24 1988-04-05 Ckd Kabushiki Kaisha Detachably attaching mechanism for cup of lubricator or filter used with air-actuated device
EP0596529A1 (en) * 1992-11-06 1994-05-11 Hitachi, Ltd. Electron lens
US6429607B1 (en) 2000-08-15 2002-08-06 International Business Machines Corporation Constant power dynamic focus coil
US8013311B2 (en) 2003-07-14 2011-09-06 Fei Company Dual beam system
JP2005038853A (ja) * 2003-07-14 2005-02-10 Fei Co 二重ビーム装置
EP1498929A3 (en) * 2003-07-14 2009-09-02 FEI Company Magnetic lens
JP2011151042A (ja) * 2003-07-14 2011-08-04 Fei Co 磁界レンズ
JP2005038857A (ja) * 2003-07-14 2005-02-10 Fei Co 磁界レンズ
JP2007335134A (ja) * 2006-06-13 2007-12-27 Hitachi High-Technologies Corp 走査電子顕微鏡
US8183547B2 (en) 2009-05-28 2012-05-22 Fei Company Dual beam system
JP2019050189A (ja) * 2017-08-08 2019-03-28 エクスロン インターナショナル ゲゼルシャフト ミット ベシュレンクテル ハフツングＹｘｌｏｎ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｇｍｂｈ Ｘ線管用の対物レンズ及び集束レンズ、ｘ線管並びにそのようなｘ線管を操作する方法
JP2020087701A (ja) * 2018-11-26 2020-06-04 日本電子株式会社 荷電粒子線装置及び荷電粒子線装置の制御方法

Also Published As

Publication number Publication date
JPH0234419B2 (OSRAM) 1990-08-03

Similar Documents

Publication Publication Date Title
US8947917B2 (en) Thermal spin torque transfer magnetoresistive random access memory
US5440233A (en) Atomic layered materials and temperature control for giant magnetoresistive sensor
EP0045844B1 (en) Arrangement for focusing a beam of charged particles with variable focus
JPH0234419B2 (OSRAM)
US20050007095A1 (en) Open-loop electric current sensor and a power supply circuit provided with such sensors
CN1319239C (zh) 使用磁阻抗元件的过载电流保护设备
KR102351687B1 (ko) 자기저항 메모리 장치
EP3591493A1 (en) Temperature control device, temperature control method, computer program, and storage medium
JP7198605B2 (ja) Ｘ線管用の対物レンズ及び集束レンズ、ｘ線管並びにそのようなｘ線管を操作する方法
Ceriale et al. Electro-thermal bistability in (La0. 7Sr0. 3) MnO3 suspended microbridges: Thermal characterization and transient analysis
JPH07302747A (ja) 駆動装置
US3559039A (en) Regulated power supply with thermal compensation
US2319406A (en) Temperature control instrument
JP2020068293A (ja) 超電導磁石装置
JPH07302124A (ja) 駆動装置
US7019308B2 (en) Thermal compensation in magnetic field influencing of an electron beam
US2282480A (en) Measuring and control apparatus
JPS6338825B2 (OSRAM)
KR102553568B1 (ko) 탭절환 변압기 제어 장치 및 방법
Chambers Power Calorimetry of Fast-Particle Beams
Warekois X‐Ray Diffraction Film‐to‐Specimen Gauge
JP2005079092A (ja) 電子ビームの磁場作用における熱補償
JP6719717B2 (ja) メモリデバイス及び情報処理装置
Okal Modeling of the percolation phenomenon of disordered two-dimensional systems
JP2500364B2 (ja) 超電導コイルのクエンチ検出装置