JPS5981370A - Adhesive for electric circuit laminate - Google Patents

Adhesive for electric circuit laminate

Info

Publication number
JPS5981370A
JPS5981370A JP19137182A JP19137182A JPS5981370A JP S5981370 A JPS5981370 A JP S5981370A JP 19137182 A JP19137182 A JP 19137182A JP 19137182 A JP19137182 A JP 19137182A JP S5981370 A JPS5981370 A JP S5981370A
Authority
JP
Japan
Prior art keywords
adhesive
laminate
epoxy resin
silicone
circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19137182A
Other languages
Japanese (ja)
Inventor
Hiroshi Yanagida
柳田 浩
Shunichi Nakayama
俊一 中山
Masami Takagi
高木 正巳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP19137182A priority Critical patent/JPS5981370A/en
Publication of JPS5981370A publication Critical patent/JPS5981370A/en
Pending legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PURPOSE:To provide the titled adhesive which gives sufficient adhesion between a laminate and a circuit metal in the additive method, by using a silicone-modified epoxy resin and NBR as main components and adding an arom. polyamine as a hardener and a curing accelerator thereto. CONSTITUTION:NBR is blended with a silicone-modified epoxy resin, both ingredients being used as main components for adhesive, and an arom. polyamine as a hardener, a curing accelerator and optionally an inorg. filler and a solvent are added thereto to prepare the titled adhesive. The silicone-modified epoxy resin is one obtd. by adding polysiloxane as side chain to the main chain of a bisphenol A type epoxy resin, and those having an epoxy equivalent of 500- 2,500 and a silicone component content of 5-20% are preferred. Examples of the curing accelerators are boron trifluoride/amine complexes.

Description

【発明の詳細な説明】 本発明は、電気回路積層板における金属層で形成した電
気回路と積層板上の閣の接着に用いる接着剤に閃するも
のである。
DETAILED DESCRIPTION OF THE INVENTION The present invention is directed to an adhesive used for bonding an electric circuit formed of a metal layer in an electric circuit laminate to a panel on the laminate.

電気回路f*層板としては紙基桐フェノール樹脂積ノー
板、紙基材エボ+シ樹脂槓層板、カラス布基材エホ士シ
樹脂積層板など絶縁基板に銅箔を加圧接着した銅張り積
層板(CCL)が一般的であり、銅箔を回路パターンを
残してエツチンジ除去することによlaF気回路が形成
される。そして従来が用いられ、従来のかかる接着剤で
は熱時の銅箔のヒール特性が十分とはいえないものであ
った。
Electrical circuit f* laminates include paper-based paulownia phenolic resin laminated boards, paper-based evo+shi resin laminated boards, and glass cloth-based ehoshi resin laminates, etc.Copper with copper foil bonded under pressure to insulating substrates Clad laminates (CCL) are common, and the laF air circuit is formed by etching away the copper foil leaving the circuit pattern behind. Conventional adhesives have been used, and the heel properties of the copper foil when heated are not sufficient.

またCCLでは不凍部分の銅箔金エヅチシク除去して回
路を形成するために省負殊土の問題があり、さらに工程
の簡素化、回路パターンの筒賃度化の見地より近時アデ
ィティプエ法が盛んに研死され、実用に至っている。ア
ディティづ工法は公知のように、積層板上ンこ無電解銅
メッキのみで電路を形成する(フルアディティブ法)か
、もしくは積層板上に無電解銅メツ+で薄い碑亀層を形
成しi回路以外の部分全核った状頼で導°亀層に通電す
ることにより一気メツ+で電路を形成し、電路以外の導
電層をソフトエツチンクで除去する(七ニアデイテイプ
法)ものである。しかし々からアヂイテイプエ法では積
層板にメツ士で回路を形1祝するために回路と積層板と
の間の密着性に問題があり、そこで従来は接着剤として
エボ+シ樹脂にNBRにトリルづム)fr:混合したも
のを用い、この接着剤を積層板に塗イDしてBステージ
に甘で硬化させ、次でこの接滋剤の表面をクロム#を含
んだ液でエツチンジ処理することによって接m All
中のブタシコニン成分を溶出δせてhツ着剤の表面を粗
面化し、粗面に対するメツ士金属のアンカー効果を利用
して回路と積層板との間のヒール特′[生倉向」−せし
めるようにしていた。しかしこの場@はり0ム酸を官有
するエツチンタ処理廃液が排出されることになるため作
業環境面や公害面で大きな問題が生じることになる。こ
こで接着剤の表面の粗面化ばω1磨紙による研磨など物
理的研磨で行なうことも可能ではあるが、エツチングに
よる粗面化処理でニ奥が広い微小穴による凹凸で粗面全
形成して太きなアシカー効果が得られるのに対して物理
的研磨でけこのような粗面にはならず大きなアンカタに
よる粗面化が多用されているものである。そして、この
ようなアヂイテイづ工法でi、+: y固化処理を施し
ても回路はメツ士で積層板に形成しであるため、回路と
積層板とのヒール強度はCCLには及はないものである
In addition, in CCL, the copper foil and gold edges of the anti-freezing parts are removed to form circuits, so there is the problem of saving energy and soil.Additionally, from the viewpoint of simplifying the process and increasing the thickness of the circuit pattern, the aditipu method has recently been adopted. It has been extensively refined and is now in practical use. As is well known, the additive construction method involves forming electrical circuits using only electroless copper plating on the laminate (full additive method), or forming a thin layer of electroless copper plating on the laminate. In this method, an electric path is formed in one go by applying current to the conductive layer in all parts other than the circuit, and the conductive layer other than the electric path is removed by soft etching (seven-day tape method). However, in the adipure method, there was a problem with the adhesion between the circuit and the laminate because the circuit was formed on the laminate with a metal glue. M) fr: Use the mixture, apply this adhesive to the laminate, harden it at B stage, and then etch the surface of this adhesive with a liquid containing chromium #. Tangent by All
The surface of the adhesive is roughened by dissolving the butashikonin component in it, and the anchoring effect of Metsushi metal on the rough surface is used to create a heel characteristic between the circuit and the laminate [Ikura Mukai] I was trying to force him to do it. However, in this case, the waste liquid from the etching treatment containing muric acid will be discharged, which will cause major problems in terms of the working environment and pollution. Although it is possible to roughen the surface of the adhesive by physical polishing such as polishing with ω1 polishing paper, it is possible to roughen the surface by etching, which completely forms a rough surface with unevenness created by deep micro-holes. In contrast, physical polishing does not produce such a rough surface, and surface roughening using large anchors is often used. Even if the i, +: y solidification process is performed using this adhesion construction method, the circuit is formed on the laminate using metallurgy, so the heel strength between the circuit and the laminate is not as strong as CCL. It is.

本発明は上記の点に鑑みてなされたものであって、積層
板と回路金属との接着性に優れ、和・にアデイテイづ工
法においては物理的研磨の粗面で積J−板と回路金属と
の接着性を十分に得ることができる電気回路積層板用接
着剤を提供することを目的とするものである。
The present invention has been made in view of the above points, and has excellent adhesion between the laminate and the circuit metal. The object of the present invention is to provide an adhesive for electrical circuit laminates that can provide sufficient adhesion to the electrical circuit laminate.

しかして本発明は、シリコン変性エボ+ジオ封月旨とN
 B Rとを主剤とし、硬化剤として芳香族ポリアミン
、及び硬化促進剤が配合されて収ることを特徴とする電
気回路積層板用接着剤により上記目的を達成したもので
あシ、以下本発明の詳細な説明する。
However, the present invention combines the silicone modified Evo + Geo seal and N
The above object has been achieved by an adhesive for electrical circuit laminates, which is characterized in that it contains B as a main ingredient, an aromatic polyamine as a curing agent, and a curing accelerator. Detailed explanation of.

本発明においては先ず、シリコン変性エポ士シ樹脂を接
着成分として用いることに特徴を有する。シリコン変性
エポ士シ樹脂は次の構造式で示すようにヒスフェノール
A型のエボ士シ樹月旨の主鎖にボッ50すサンを側鎖と
して付加せしめたものであり、エポ+シ当量が500 
/−2500、シリコン成分を5〜20%含有せしめた
ものが好址しい「 R−0−3i−OR ン ここで上記構造式中n=1w4、m=3〜8(特に4−
〇)のものが好ましく、Rは芳香族又は脂肪1族の炭化
水素で、Rとしては脂肪族のものが好ましく特にエチル
基であることが好捷しい。
The present invention is first characterized in that a silicone-modified epoxy resin is used as an adhesive component. As shown in the following structural formula, silicone-modified epoxy resin is a hisphenol A-type epoxy resin with a side chain added to the main chain of the epoxy resin, and the epoxy equivalent is 500
/-2500, preferably containing 5 to 20% silicon component.
○) is preferable, R is an aromatic or aliphatic group 1 hydrocarbon, and R is preferably an aliphatic group, particularly preferably an ethyl group.

」二記シリコシ変性エホ+シ樹脂にNBRを配合して両
者を接着剤の主剤とするものであるが、これにさらに硬
化剤、硬化促進剤、必要に応じて無機光てん剤、溶剤を
配合して接着剤を′?A製するものである。硬化剤とし
ては芳香族ポリアミンを用いるものであり、かかる芳香
族ポリアミンとしてけm−フェニレンジアミン、シア三
ノジフェニルエーテル、シア三ノジフェニルスルホン・
ベンジジン、m−アミンペンジルアミンなどを挙けるこ
とができる。また硬化促進剤としては三フッ化ホウ素ア
ミンコンプレックスを用いるものであり、かかる三フッ
化ホウ素アミン]ンラレックスとしては、三フッ化ホウ
素−アニリン、三フッ化ホウ素−ノヌラトルイジン、三
フッ化ホウ素−ベンジルアミン、三フッ化ホウ素−1〜
リエタノールア三ン、三フッ化ホウ累−ヒベリジンなど
を挙けることができる。さらに無機光てん剤としてはC
aC0,、、A403、Zr(Sins)3.5iO3
L、カオリン等、酸化物、ケイ酸塩、炭酸塩、窒化物、
炭化物など種々のものを用いることができ、その粒径に
−J: 0.1−10μのものが好ましい。溶剤として
は1−ルエン、イソプDヒルアルコール、アゼトン、M
 E K s シクロへ十サツシなどを一種もしくは二
槙以上混合して用いることができる。
``NBR is blended with the silicone-modified Eho + Si resin described in Section 2, and both are used as the main ingredients of the adhesive, and in addition, a curing agent, a curing accelerator, an inorganic photonic agent, and a solvent are further blended as necessary. And the glue? It is manufactured by A. Aromatic polyamines are used as curing agents, and such aromatic polyamines include m-phenylenediamine, cyanodiphenyl ether, cyanodiphenyl sulfone, etc.
Examples include benzidine and m-aminepenzylamine. Further, a boron trifluoride amine complex is used as a curing accelerator, and examples of the boron trifluoride amine complex include boron trifluoride-aniline, boron trifluoride-nonuratoidine, and boron trifluoride-nonuratoidine. Benzylamine, boron trifluoride-1~
Examples include reethanolamine, boron trifluoride-hyberidine, and the like. Furthermore, as an inorganic photoresist, C
aC0,,,A403,Zr(Sins)3.5iO3
L, kaolin, etc., oxides, silicates, carbonates, nitrides,
Various materials such as carbides can be used, and those having a particle size of -J: 0.1-10μ are preferable. Solvents include 1-luene, isop-D alcohol, azetone, M
E K s Cyclohe Jusatsushi etc. can be used alone or in combination of two or more.

配合割合は、シリコン変性エボ士シ樹脂100重景部に
対してNBRを30〜20ON量部、無機光てん剤をθ
〜500重知1部、溶剤を400〜700重量部が好ま
しく、硬化剤及び硬化促進剤は接着剤の使用条件に応じ
て適量を配合すればよく、例えば硬化剤Vi1〜15重
薙部、硬化促進剤は0.2〜2重量部程度が適当である
The blending ratio is 30 to 20 parts of NBR to 100 parts of silicon-modified resin, and θ of the inorganic brightening agent.
It is preferable to use 1 part by weight of ~500, and 400 to 700 parts by weight of the solvent, and the curing agent and curing accelerator may be blended in appropriate amounts depending on the usage conditions of the adhesive. A suitable amount of the accelerator is about 0.2 to 2 parts by weight.

上記のようにして得た本発明に係る接着剤は、CCLや
アヂイテイづ工法における積層板と金属回路との間の接
着に用いられるが、その用法の概略を説明する。先ずC
CLの場合、銅箔に接着剤を20〜30μ厚程度で塗布
し、これを150’0.2分間位でBステージ状態に予
備乾燥させる。そして紙基桐やノコラス布基材にフェノ
ール樹脂やエポ・トシわJ脂等の9ニスを含浸して乾燥
することにより得たづりづレフにこの銅箔を重ね、16
0 ’0160〜90分、120kg/7程度の条件で
熱圧成形を行なうことにより、ラリプレジの積層硬化体
である積層板に接着剤を介して銅箔が張られだCCLを
得るものである。まだアヂイテイづ工法の場合は、積層
板の表面に30μ厚程度以上の厚みで接着剤を塗布して
先ずBステージ状態にまで予備加熱し、次で接着剤の表
面を物理的に研磨する。物理的研磨は、研磨紙を手操作
したり、研磨ベルト機を用いたり、またtよりリドプラ
スト法を用いたり、粗面シートより粗面を転写する方法
を用いたりなどして行なうことができる。このように物
理的研磨で接着剤の表面を而粗さ0.2〜1.0μ(好
ましくは05〜0.75μ)程度に粗面化する。次で接
着剤の粗面に常法に従って伏字メツ士、電気メツ士の手
法を用い、回路をメツ+で形成し、このように回路形成
を行なったのちに接着剤を完全硬化させるのである。
The adhesive according to the present invention obtained as described above is used for bonding between a laminate and a metal circuit in the CCL or Ajiitei construction method, and an outline of its usage will be explained below. First, C
In the case of CL, an adhesive is applied to the copper foil to a thickness of about 20 to 30 microns, and this is pre-dried to a B-stage state for about 150'0.2 minutes. Then, this copper foil was layered on a Zurizuref obtained by impregnating a paper base paulownia or Nocorus cloth base material with 9 varnish such as phenol resin or Epo Toshiwa J resin and drying it.
By carrying out hot press molding for 90 minutes at a pressure of about 120 kg/7, a CCL is obtained in which a laminate, which is a cured laminate of Laliprej, is covered with copper foil via an adhesive. In the case of the adjoining method, adhesive is applied to the surface of the laminate to a thickness of about 30 μm or more, first preheated to a B-stage state, and then the surface of the adhesive is physically polished. Physical polishing can be carried out by manually handling abrasive paper, using an abrasive belt machine, using a lidoplast method, or by transferring a rough surface from a rough sheet. In this manner, the surface of the adhesive is roughened by physical polishing to a roughness of approximately 0.2 to 1.0 microns (preferably 05 to 0.75 microns). Next, a circuit is formed on the rough surface of the adhesive using a conventional technique such as that of a masked or electrician, and after the circuit is formed in this manner, the adhesive is completely cured.

ここで、本発明はシリ〕ン変性エボ+シ樹脂の硬化にあ
たって、硬化剤として芳香族ポリアミンを用いると共に
三フッ化ホウ素アミシコンづレックスを硬化促進剤とし
て井用した点に第2の特徴を有するものであり、かかる
硬化剤と硬化促進剤とを用いることによって接着剤によ
る積層板と金属回路とのヒール特性を向上させることが
できるものである。このことは第1図のグラフにおいて
顕著に確認される。すなわち第1図のりラフにおいてN
o、1〜No、6idシリコン変性工ボ+シ捌脂100
重量部、NBR106重量部に対して第1表の配合で硬
化剤や硬化促進剤を配合した場合のヒール強度と温度と
の関係を示すもので、この第1図のグラフより、硬化剤
芳香族ホリア三−J(レア三ノジフェニルスルホン)に
硬化促進剤三フッ化ホウ素ヒベリジンを併用した接着剤
/162、扁4、扁6においては硬化促進剤三フッ化ホ
ウ素ピペリジンを併用しない接着剤A61%/168.
765よりもヒール強度を大巾に向上させることが確認
される。
Here, the second feature of the present invention is that an aromatic polyamine is used as a curing agent and boron trifluoride Amicion Durex is used as a curing accelerator in curing the silicone-modified EVO+Si resin. By using such a curing agent and curing accelerator, it is possible to improve the heel characteristics of the adhesive between the laminate and the metal circuit. This is clearly confirmed in the graph of FIG. In other words, N in the rough seam in Figure 1
o, 1~No, 6id silicon modified resin + resin 100
This graph shows the relationship between heel strength and temperature when curing agents and curing accelerators are blended in the proportions shown in Table 1 to 106 parts by weight of NBR. Adhesive that uses Horia 3-J (rare trinodiphenyl sulfone) in combination with the curing accelerator boron trifluoride hiberidine / Adhesive A61% that does not use the curing accelerator boron trifluoride piperidine in 162, 4, and 6 /168.
It is confirmed that the heel strength is greatly improved compared to 765.

1 第 1 表(重量部) 上述のように本発明に係る接着剤にあっては、シリコン
変性エポ士シ拘脂とNBRとを主剤とするものであって
さらに硬化剤として芳香族ポリアミンを用い硬化促進剤
を併用するものであり、シリコン変性エホ+シ樹脂の接
着作用によって積層板と金属回路との接着性を向上させ
ることができ、CCLKあっては金属回路のヒール特性
、特に熱時のヒール%性を向上させることができるもの
であって半田時に金属回路がa層板から剥れることを防
止でき、半田耐熱性を同上させることができるものであ
シ、またアディティブ工法にあってはシリコン変性エボ
+シ樹脂の優れた接着作用によって、物理的研磨による
接着剤表面の粗面化でも金属回路をメツ+で接着性よく
積層板KMすこさができて高いヒール特性を得ることが
でき、クロム酸液によるエツチングで粗面化処理を行な
うような必要がないものである。尚、電気的特性につい
ては、本発明の接着剤は従来の接着剤と同等ノモのを有
しているものである。
1 Table 1 (parts by weight) As mentioned above, the adhesive according to the present invention is based on silicone-modified epoxy resin and NBR, and further contains an aromatic polyamine as a curing agent. CCLK is used in combination with a curing accelerator, and can improve the adhesion between the laminate and the metal circuit due to the adhesive action of the silicone-modified epoxy resin. It should be able to improve the heel % property, prevent the metal circuit from peeling off from the A-layer board during soldering, and increase the soldering heat resistance. Due to the excellent adhesion of the silicone-modified Evo+ resin, even if the adhesive surface is roughened due to physical polishing, the metal circuit can be bonded well with Metsu+, making the laminate KM thin and providing high heel characteristics. There is no need to roughen the surface by etching with a chromic acid solution. In terms of electrical properties, the adhesive of the present invention has the same properties as conventional adhesives.

次に本発明を実施例によって説明する。Next, the present invention will be explained by examples.

エボ+シ当量が1100〜1300でシリコン含量が1
5%で、前記構造式のRがエチル基のシリコン変性エポ
士シ樹脂を100重量部、NBR(N1po11072
i日本ゼオン製)を106重量部、硬化剤としてシア三
ノジフェニルスルボンを6重量部、硬化促進剤として三
フッ化ホウ素ピペリジンを1重量部、充テン剤としテC
aCO3(#′2000 )を94M量部、安定剤とし
てアエロジルR972を4重量部、溶剤としてトルエン
を506重量部、シフDへ+リノンを40重量部、イソ
プロピルアルコ−混合することにより接着剤を調製した
Evo + Shi equivalent weight is 1100-1300 and silicon content is 1
5%, 100 parts by weight of silicone-modified epoxy resin in which R in the structural formula is an ethyl group, NBR (N1po11072
106 parts by weight of Nippon Zeon), 6 parts by weight of cyanodiphenylsulfone as a curing agent, 1 part by weight of boron trifluoride piperidine as a curing accelerator, TeC as a filler.
An adhesive was prepared by mixing 94M parts of aCO3 (#'2000), 4 parts by weight of Aerosil R972 as a stabilizer, 506 parts by weight of toluene as a solvent, 40 parts by weight of Schiff D + linone, and isopropyl alcohol. did.

この接着剤を紙工小生シアンクラッド積層板に50μ厚
の塗布厚で塗布したのち、130’0.60分の条件で
加熱して接着剤をBステージ状態Kまで一次硬化処理し
た。次でこの接着剤の表面を600φ“の研磨紙でたて
よこ30回づつ研磨し、さらに住友スリーエム製のスコ
ッチプライトUFでたてよこ50回づつ研磨することに
より、而粗さ05μに粗面処理した。
This adhesive was applied to a paper cyan clad laminate to a coating thickness of 50 μm, and then heated under conditions of 130° and 0.60 min to primary cure the adhesive to B-stage state K. Next, the surface of this adhesive was polished 30 times vertically and horizontally with 600φ" abrasive paper, and then 50 times vertically and horizontally with Scotchprite UF manufactured by Sumitomo 3M, so that the surface was roughened to a roughness of 05μ. Processed.

上記のようにして得たアヂイテイづ用粗面化処理積層板
にアディティブ法で回路を形成した。す々わち、先ずシ
ラづレイ社製+セタラリップ404の270jj/’l
;水溶液(80±10 ’O)を接着剤粗面に塗布して
5〜6分間処理することにより酸処理全行ない、次でシ
ップレイ社製+セタプリッ’′j404の270jj/
1.*〆液とシップレイ社製中1フタポジット44の3
0cc/l水雛液との混合液を30±1゜°0に調製し
てこれを接着剤粗面に塗布し、5〜6分間処理すること
により触媒処理を行なった。次に水洗を行なったのちに
シップしイ社製アクしレータ■9の6倍希釈水溶液(3
0±10’O)を接着剤粗面に塗布して5〜6分間処理
することによりアクセし一夕処理を行なった。このよう
に前処理を行々つだのち、硫、酸銅2〜8g1lc銅分
として)、ホIb ?す:15 /−9g/13.ED
TA・・2Na 2og/l、安定剤少量の組成の水溶
液でなる無電II銅メツ士浴を80±1°OVC調製し
てこの無電解銅メツ士浴に積層板を5〜】O分間浸漬処
理することにより、無電解銅メツ+で接着剤粗面に薄い
銅メッキ層を形成した。次に水洗したのち薄銅メツ士層
の表面に回路となる部分を残して田村化研製のエツチン
グレジストU R−450Bを塗布硬化せしめることに
よりマスクし、硫酸銅70g/l、硫酸160&/d、
光沢剤少量の組成の水溶液で調製した電気銅メツ士浴に
積層板を浸漬して8A、/d+n2.60分、室温の条
件で電気メツ+を行なうことにより薄い銅メツ+層上に
回路パターンをメツ牛しだ。こののち上記エツチングレ
ジストを5%NaOH水溶液で除去し、さらに塩化第2
鉄溶液によるライトエツチンクで回路以外の薄い銅メッ
キ層を除去した。
A circuit was formed on the roughened adhesion-treated laminate obtained as described above by an additive method. First of all, Shirazurei + Setara Lip 404 270jj/'l
Aqueous solution (80±10'O) was applied to the rough surface of the adhesive and treated for 5 to 6 minutes to complete the acid treatment, and then 270jj/
1. *Filling liquid and Shipley's medium 1 lid posi 44-3
A mixed solution with 0 cc/l water chick liquid was prepared at 30±1°0, applied to the rough surface of the adhesive, and treated for 5 to 6 minutes to carry out catalyst treatment. Next, after washing with water, a 6-fold diluted aqueous solution (3
0±10'O) was applied to the rough surface of the adhesive and treated for 5 to 6 minutes, and then treated overnight. After carrying out the pretreatment in this way, sulfuric acid copper (2-8g1lc copper content), HoIb? Su: 15/-9g/13. ED
An electroless II copper methane bath consisting of an aqueous solution containing TA...2Na 2 og/l and a small amount of stabilizer was prepared at 80±1° OVC, and the laminate was immersed in this electroless copper methane bath for 5 to 10 minutes. By doing so, a thin copper plating layer was formed on the rough surface of the adhesive using electroless copper metal. Next, after washing with water, the parts that would become circuits were left on the surface of the thin copper methane layer and masked by coating and curing etching resist U R-450B manufactured by Tamura Kaken.
A circuit pattern is formed on the thin copper foil layer by immersing the laminate in an electrolytic copper foil bath prepared with an aqueous solution containing a small amount of brightener and performing electric foil bathing for 8 A, /d+n2.60 minutes at room temperature. Metsuushida. Thereafter, the above etching resist was removed with a 5% NaOH aqueous solution, and then dichloride dichloride was added.
The thin copper plating layer other than the circuit was removed by light etching using an iron solution.

さらにこの積層板を100”0X60分、160°0×
6θ分の条件で加熱して接着剤を2次硬化させることに
より、電気回路積層板を得た。
Furthermore, this laminated board was 100”0×60 minutes, 160°
An electric circuit laminate was obtained by secondarily curing the adhesive by heating under conditions of 6θ.

上記のようにして得た電気回路積層板について金属回路
と積層板との間のヒール強度及び1づんだ耐熱性(測定
は260’Oの―、んだ浴に電気回路積層板を浮かべて
金属回路が積層板から剥れるまでの時開を計測すること
により行なった)について測定したところ、常態のヒー
ル強度は450〜4.80牧/硼、150°○のヒール
強度は1.06〜+、t o ky/αであり、260
’Oけんだ耐熱性は81秒であった。
Regarding the electrical circuit laminate obtained as described above, the heel strength between the metal circuit and the laminate and the heat resistance (measured at 260'O) were measured by floating the electrical circuit laminate in a solder bath. The heel strength at normal state was 450 to 4.80 m/m, and the heel strength at 150°○ was 1.06 to +. to ky/α, which is 260
'O-ken heat resistance was 81 seconds.

そして、実施例のもののヒール強度と温度との貢52 関係をグラフで定性的に示すと添伺図のようにな△ る。ここで添伺図のグラフにおいて比較例1のもディテ
ィ″j電気回路積層板、比較例2は接着剤としてフェノ
ール樹脂とブチラール樹脂との混合接着剤を用いた従来
の紙エホ+シアンクラッド積層板によるCCLKつぃて
のヒール強度と温度上の関係を示すものである。このグ
ラフより、去施例のもののヒール強度幻比較例1のアデ
ィティプエ法のものよりも、ぞして比較例2のCCLO
ものよりも優れていることが確認される。
When the relationship between the heel strength and temperature of the example is qualitatively shown in a graph, it is as shown in the accompanying diagram. Here, in the accompanying graph, Comparative Example 1 is the electrical circuit laminate, and Comparative Example 2 is the conventional paper ejector + cyan clad laminate using a mixed adhesive of phenol resin and butyral resin as the adhesive. This graph shows the relationship between the heel strength of CCLK and temperature.From this graph, it can be seen that the heel strength of the previous example is much higher than that of the Aditipue method of comparative example 1.
Confirmed to be better than others.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図、第2図はヒール強度と温度との関係を示すグラ
フである。 代理人 弁理士  石 1)長 七 手 続 補 正 書(自発) 昭和57年12月20日 特許庁長官殿 1、事件の表示 昭和57年特許願第191871号 2、発 リ1 の名称 電気回路積層板用接着剤 3、補正をする者 事(’lとの関係      特許 出願人件  所 
 大阪府門真市太字門真1048番地名 称 (583
)松下電ニ丁二株式会社代表者小 林  郁 4 代理人 郵便番号 530 5、補正命令の日付 自  発 6、補正により増加する発明の数 削     正     1」1 願1番り 特願昭57−19137]け1、  ’13
14細嶺第5負正から第5行乃至下から第4行の[n−
1〜4、m =’ 3〜8(幅に4〜6)−j全削除し
、[n−2〜20(より好捷しくに4〜7)、m”1〜
8(J−り好寸しく−2〜4)1奮挿入し甘す。 2 同上@7負第】5行目の[20〜・3011.7ψ
程度」を削除し、r 20 /A厚杓!度以」ニー1全
挿入します。 8 同」1第12頁第14行乃至第16行の1−を・接
着斎:和面   ケ行ない−1を削除し、「に5へ6分
間浸漬処理し」を挿入しj丁。 4 同上同負第19行乃至第20行の「これを分間処理
」全削除し、「、5〜6分聞浸苗−1を挿入し−ます。 5、同上第13頁第2行乃至第3行の1′−ヲ接イ■剤
・分間処理」全削除し、UVC5〜6分間とジ渣」全挿
入し1す。
FIGS. 1 and 2 are graphs showing the relationship between heel strength and temperature. Agent Patent Attorney Ishi 1) Chief Seventh Procedural Amendment (spontaneous) December 20, 1980 Mr. Commissioner of the Japan Patent Office 1, Indication of Case 1988 Patent Application No. 191871 2, Name of Issue 1 Electrical Circuit Adhesive for laminates 3, Person making the amendment (Relationship with 'l Patent Applicant Place
1048 Bold Kadoma, Kadoma City, Osaka Prefecture Name (583)
) Matsushita Electric Nichoji Co., Ltd. Representative Iku Kobayashi 4 Agent postal code 530 5 Date of amendment order 6 Reduction in the number of inventions increased by amendment 1'1 Application number 1 Patent application 1977- 19137]ke1, '13
14 Hosoridge 5th line from negative to 4th line from the bottom
1 to 4, m = ' 3 to 8 (4 to 6 in width) - j all deleted, [n - 2 to 20 (more conveniently 4 to 7), m''1 to
8 (J-Rishunsuku-2~4) Insert once and enjoy. 2 Same as above @7 negative] 5th line [20~・3011.7ψ
Delete "degree" and r 20 / A thick ladle! Insert knee 1 completely. 8 Same page 1, page 12, lines 14 to 16, delete 1-1 and insert ``Immersed in water for 6 minutes''. 4.Delete all "process this for minutes" in lines 19 and 20 of the same as above, and insert "Soak seedlings for 5 to 6 minutes-1". 5. Lines 2 to 2 of page 13 of the same In line 3, 1'--Delete all of ``Adhesive/minute treatment'' and insert all of ``UVC for 5 to 6 minutes and residue''.

Claims (1)

【特許請求の範囲】 (1)  シリコ′J変性エボ士シ樹脂とNBRと勿主
剤とし、硬化剤として芳香族ポリアミン、及び硬化促進
剤が配合されて成ることを特徴とする電気回路811層
板用接着剤。 (2)硬化促進剤が三フッ化ホウ素ア三シコンプレック
スであることを特徴とする特、vf請求の範囲第1項記
載の゛電気回路積層板用接着剤。 (8)充てん剤が配合されて成ることを特徴とする特i
fFMg求の範囲第1項又は第2項記載の電気回路積層
板用接着剤。
[Scope of Claims] (1) An electric circuit 811-layer board characterized by comprising a Silico'J-modified epoxy resin, NBR, a base agent, an aromatic polyamine as a curing agent, and a curing accelerator. Adhesive for use. (2) The adhesive for electrical circuit laminates according to claim 1, wherein the curing accelerator is a boron trifluoride trifluoride complex. (8) Special feature i characterized by containing a filler
fFMg The adhesive for electrical circuit laminates according to item 1 or 2.
JP19137182A 1982-10-30 1982-10-30 Adhesive for electric circuit laminate Pending JPS5981370A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19137182A JPS5981370A (en) 1982-10-30 1982-10-30 Adhesive for electric circuit laminate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19137182A JPS5981370A (en) 1982-10-30 1982-10-30 Adhesive for electric circuit laminate

Publications (1)

Publication Number Publication Date
JPS5981370A true JPS5981370A (en) 1984-05-11

Family

ID=16273472

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19137182A Pending JPS5981370A (en) 1982-10-30 1982-10-30 Adhesive for electric circuit laminate

Country Status (1)

Country Link
JP (1) JPS5981370A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0135674A2 (en) * 1983-06-10 1985-04-03 Matsushita Electric Works, Ltd. Production of metal surface-laminated sheet
JPH04370996A (en) * 1991-06-19 1992-12-24 Shin Etsu Chem Co Ltd Bonding sheet
KR20030077915A (en) * 2002-03-27 2003-10-04 김상양 Epoxy Multi-function Primer Composition for concrete construction

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5014736A (en) * 1973-06-11 1975-02-17
JPS5230837A (en) * 1975-09-03 1977-03-08 Toshiba Chem Corp Thermostable compositions for use in adhesives and thermostable lamina ted boards

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5014736A (en) * 1973-06-11 1975-02-17
JPS5230837A (en) * 1975-09-03 1977-03-08 Toshiba Chem Corp Thermostable compositions for use in adhesives and thermostable lamina ted boards

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0135674A2 (en) * 1983-06-10 1985-04-03 Matsushita Electric Works, Ltd. Production of metal surface-laminated sheet
JPH04370996A (en) * 1991-06-19 1992-12-24 Shin Etsu Chem Co Ltd Bonding sheet
KR20030077915A (en) * 2002-03-27 2003-10-04 김상양 Epoxy Multi-function Primer Composition for concrete construction

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