JPS5978943A - Manufacture of glass containing fluorine - Google Patents

Manufacture of glass containing fluorine

Info

Publication number
JPS5978943A
JPS5978943A JP18579482A JP18579482A JPS5978943A JP S5978943 A JPS5978943 A JP S5978943A JP 18579482 A JP18579482 A JP 18579482A JP 18579482 A JP18579482 A JP 18579482A JP S5978943 A JPS5978943 A JP S5978943A
Authority
JP
Japan
Prior art keywords
gas
glass
flame
fluorine
contg
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18579482A
Other languages
Japanese (ja)
Other versions
JPS6144823B2 (en
Inventor
Gotaro Tanaka
豪太郎 田中
Kunio Fujiwara
藤原 国生
Nobuo Inagaki
稲垣 伸夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Sumitomo Electric Industries Ltd
Original Assignee
Nippon Telegraph and Telephone Corp
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp, Sumitomo Electric Industries Ltd filed Critical Nippon Telegraph and Telephone Corp
Priority to JP18579482A priority Critical patent/JPS5978943A/en
Publication of JPS5978943A publication Critical patent/JPS5978943A/en
Publication of JPS6144823B2 publication Critical patent/JPS6144823B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/014Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413Reactant delivery systems
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00Glass deposition burners
    • C03B2207/36Fuel or oxidant details, e.g. flow rate, flow rate ratio, fuel additives
    • C03B2207/38Fuel combinations or non-standard fuels, e.g. H2+CH4, ethane

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Light Guides In General And Applications Therefor (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Glass Compositions (AREA)

Abstract

PURPOSE:To obtain high-purity glass contg. fluorine at a low cost by using SiCl4 and a gas contg. fluorine as starting materials for synthesizing glass and by bringing them into reaction in a flame using a specified gas to form fine paticles. CONSTITUTION:Starting materials for synthesizing glass are introduced into a flame and allowed to react in the flame to form fine particles, and the particles are deposited on a starting member to synthesize glass. In this method, a halogen compound such as SiCl4 and a gas contg. fluorine such as gaseous flon are used as the starting materials, and gaseous hydrocarbon contg. hydrogen in <=1.0 ratio of H/C in the molecule or a gas contg. no hydrogen such as CO, C2N2 NOx or CS2 is used as a gas for forming the flame. Gaseous acetylene easy to handle is preferably used as the gas for forming the flame because it gives a high temp. and has low toxicity.

Description

【発明の詳細な説明】 発明の技術分野 本発明は光ファイバのクラツド材、赤外線透過用光ファ
イバなどの”I+殊な目的に用いるコア材、その他弗素
を含有させたことによる低屈折率・低分散ガラスとして
用いる不純物の極めて少ない″弗素含有ガラスの製造方
法に関するものである。
Detailed Description of the Invention Technical Field of the Invention The present invention relates to optical fiber cladding materials, core materials used for special purposes such as infrared transmitting optical fibers, and other materials with low refractive index and low refractive index due to the inclusion of fluorine. The present invention relates to a method for producing a fluorine-containing glass that is used as a dispersion glass and has extremely low impurities.

技術の背景 従来、気相反応じよるガラスの合成法としては、酸水素
炎を用いた火炎加水分解により802などを合成する方
法が知られている。この方法は、火炎を用いるためエネ
ルギの集中度がよく熱効率カーよく、また加水分解は反
応速度が早いため合成速度を上げることができるなどの
特徴を有している。
BACKGROUND OF THE TECHNOLOGY Conventionally, as a method for synthesizing glass based on gas phase response, a method for synthesizing 802 and the like by flame hydrolysis using an oxyhydrogen flame is known. This method uses a flame, so it has good energy concentration and thermal efficiency, and the hydrolysis has a fast reaction rate, so it can increase the synthesis rate.

然し、フロンガスなどを原料ガス墨;添加して、弗素を
ガラス(たとえばSin、 )中(二添加しようとして
も殆んどドープできない。これは次の(1)乃至(5)
などに示す反応が主に生じるが、H2Oが多量に存在す
ると、(5)に示す反応により、弗素の含有に必要なS
iF、の平衡濃度が極めて低いものとなるためと考えら
れる。
However, even if you try to add fluorine gas to the raw material gas and add fluorine into the glass (for example, Sin), you will hardly be able to dope it.This is due to the following (1) to (5).
The reaction shown in (5) mainly occurs, but if a large amount of H2O is present, the reaction shown in (5) causes the S
This is thought to be because the equilibrium concentration of iF becomes extremely low.

(1)StC14+2H20−4SiO2+4HCl(
2)  CC12Ft + 02  − CO,十C1
,+2 (F)(3) 5iC1a +4 CF)  
→StF+ + 2C’t(415tOt +4 (F
)  →3iF、 +02(5)  SiF、+2H2
0−5in2+ 411F従来技術と問題点 従来のガラス合成法の−っである酸水素炎を用いた火炎
加水分解により5i02などを合成する方法では、前に
述べたようにガラスに弗素を含有させることは殆んどで
きなかった。また水の関与しない反応をより多くさせる
ことにより弗素収率を上げることを目的として、電磁気
的エネルギ(二より炎を形成するプラズマ炎を用いる方
法があるが、このプラズマ炎を用いる方法は設備が極め
て大形になり、したがって設備価格が高く、またトーチ
の劣化などが生じ易く安定運転が難かしいなどの点で高
度の技術を必要とするという問題があった。
(1) StC14+2H20-4SiO2+4HCl(
2) CC12Ft + 02 - CO, 10C1
, +2 (F) (3) 5iC1a +4 CF)
→StF+ + 2C't(415tOt +4 (F
) →3iF, +02(5) SiF, +2H2
0-5in2+ 411F Conventional technology and problems In the conventional glass synthesis method, which synthesizes 5i02 etc. by flame hydrolysis using an oxyhydrogen flame, as mentioned earlier, it is difficult to incorporate fluorine into the glass. I could hardly do it. In addition, there is a method that uses electromagnetic energy (a plasma flame that forms a flame from two sources) in order to increase the fluorine yield by increasing the number of reactions that do not involve water, but this method requires equipment. This poses a problem in that it is extremely large in size, resulting in high equipment costs, and requires advanced technology because the torch is likely to deteriorate and stable operation is difficult.

発明の目的 本発明は従来の問題点を解決するもので、ガラス合成用
原料Cニハロゲン化物及び弗素含有気体を用い、火炎形
成用ガスに分子構成元素比でll10が1.0以下の炭
水素ガスまたは水素元素を含まないガスを用いて火炎反
応を行うことを特徴とし、その目的は低価格で高純度の
弗素含有ガラスを製造する方法を提供するものである。
Purpose of the Invention The present invention solves the problems of the conventional art, and uses a dihalide C as a raw material for glass synthesis and a fluorine-containing gas, and uses a hydrocarbon gas with a molecular element ratio of 110 of 1.0 or less as a flame-forming gas. Alternatively, the method is characterized in that a flame reaction is carried out using a gas that does not contain hydrogen element, and its purpose is to provide a method for producing high-purity fluorine-containing glass at low cost.

発明の実施例 本発明は、ガラス合成用原料として5iC14などのへ
ログン化合物及びフロンガスなどの弗素含有気体を用い
、火炎形成用ガスとして、該ガスの分子を構成する元素
比でII/Cが1.0以下の水素含有度の炭化水素ガス
またはCo 、 C2N、 、 NOx、 C8,など
水素を含有しないガスを用いて火炎反応を行うことを特
徴とする。さらに前記火炎形成用ガスとしては、高温が
得られ、かつ毒性が低いため取扱い易いC,II2ガス
を用いるのが好都合である。ガラス中の弗素濃度をさら
に上げたい場合には、CO。
Embodiments of the Invention The present invention uses a helogne compound such as 5iC14 and a fluorine-containing gas such as chlorofluorocarbon gas as raw materials for glass synthesis, and as a flame forming gas, an element ratio of II/C of the molecules of the gas is 1. It is characterized by carrying out a flame reaction using a hydrocarbon gas with a hydrogen content of 0.0 or less or a gas containing no hydrogen such as Co, CN, NOx, C8, etc. Further, as the flame-forming gas, it is convenient to use C, II2 gas, which can provide high temperature and is easy to handle because of its low toxicity. If you want to further increase the fluorine concentration in the glass, use CO.

02N2. NOx 、 C82などの水素を全く含ま
ないガスがよい。また反応速度を上げたいなどのために
より高温が必要なときにはC2N、がよい。弗素含有気
体としては、フロンガスたとえばCCI、F、などが安
価で入手し易く、また取扱い易いので好適である。
02N2. Gases that do not contain hydrogen at all, such as NOx and C82, are preferable. Furthermore, when a higher temperature is required to increase the reaction rate, CN is preferable. As the fluorine-containing gas, fluorocarbon gases such as CCI, F, etc. are suitable because they are inexpensive, easily available, and easy to handle.

本発明によると石英ガラスに弗素をドープしたガラスで
、弗素濃度として約’I、wt%程度(Sio2との比
屈折率差で0.6%程度)のものが比較的簡単に得るこ
とができる。火炎形成用ガスとしで、分子度のガラスを
得ることは容易でなかった。
According to the present invention, it is possible to relatively easily obtain a fluorine concentration of about 'I, wt% (about 0.6% relative refractive index difference with Sio2) using fluorine-doped quartz glass. . It has not been easy to obtain molecular glass as a flame-forming gas.

以下本発明の実施例を示す。Examples of the present invention will be shown below.

実施例1; ガラス合成用原料として5iC14,CC12F2 を
用い火炎形成用ガスとしてC,H2ガスを用い、次表に
示す条件にてこれらのガスを同心円状4重管バーナに導
入し、火炎を形成すると同時に、ガラス微粒子を発生さ
せ、回転し左右に移動する石英棒上に、上記ガラス微粒
子を堆積させた。
Example 1: Using 5iC14 and CC12F2 as raw materials for glass synthesis and C and H2 gases as flame forming gases, these gases were introduced into a concentric quadruple tube burner under the conditions shown in the table below to form a flame. At the same time, glass particles were generated and deposited on a quartz rod that rotated and moved from side to side.

この堆積体を約1300℃の炉内に挿入し、溶融透明化
した。得られた透明ガラスの屈折率値を測定した所、S
t Oxに比べ約0.4%低いガラスが得られた。
This deposited body was inserted into a furnace at about 1300° C. to be melted and made transparent. When the refractive index value of the obtained transparent glass was measured, S
A glass with about 0.4% lower tOx was obtained.

実施例2: 火炎形成用ガスとしてB2を用い、その他の条件として
は実施例1とほぼ同様の条件にてガラスを合成したとこ
ろ、その屈折率値は、5in2に比へ、0.1〜0.2
%低いガラスであった。
Example 2: Glass was synthesized using B2 as the flame-forming gas and under almost the same conditions as Example 1, and the refractive index value was 0.1 to 0 relative to 5in2. .2
% lower glass.

実施例6: 火炎形成用ガスとして02N2を用いその他の条件とし
ては、実施例1とほぼ同様な条件にて火炎を形成し、ガ
ラス微粒子を発生させ、回転し、左右に移動する石英棒
上に上記ガラス微粒子を堆積させ、この時移動させる速
度を調節して、上記火炎の加熱を利用し堆積部の温度を
高く保持することにより溶融状態にてガラス層を形成し
た。得られたガラスの屈折率値として、5in2に比べ
約0.5%低いものが得られた。
Example 6: Using 02N2 as the flame-forming gas, a flame was formed under almost the same conditions as in Example 1, glass particles were generated, and a flame was placed on a quartz rod that rotated and moved from side to side. The fine glass particles were deposited, and the speed at which they were moved was adjusted to maintain the temperature of the deposited portion high using the heating of the flame, thereby forming a glass layer in a molten state. The refractive index value of the obtained glass was about 0.5% lower than that of 5in2.

発明の効果 以上述べたように、本発明の水の関与しない反応をJ:
り多くさせることにより弗素収率を上げることを特徴と
する弗素含有ガラスの製法により、比較的単純な原料系
をもつ設備で製造工程を構成でき、また長時間の安定な
合成が可能であり、経済性に富んだ高純度の弗素含有ガ
ラスの合成ができ、光ファイバのクラッド材、赤外線透
過用光ソアイパなどの特殊な目的に用いるコア材その他
弗素を含有させたことによる低屈折率・低分散ガラス等
に用いる高純度弗素含有ガラスの製造に適用して効果が
大である。
Effects of the Invention As mentioned above, the reaction not involving water of the present invention can be carried out by J:
The manufacturing method for fluorine-containing glass, which is characterized by increasing the fluorine yield by increasing the amount of fluorine, allows the manufacturing process to be configured using equipment with a relatively simple raw material system, and allows for stable synthesis over a long period of time. It is possible to synthesize high-purity fluorine-containing glass that is highly economical, and has a low refractive index and low dispersion due to the inclusion of fluorine in core materials used for special purposes such as cladding materials for optical fibers and optical fibers for infrared transmission. It is highly effective when applied to the production of high-purity fluorine-containing glass used in glass and the like.

Claims (1)

【特許請求の範囲】[Claims] (1)ガラス合成用原料を火炎に導入し、火炎中で該ガ
ラス合成用原料を反応させて微粒子を形成せしめ、該形
成された微粒子を出発材料に堆積させてガラスを合成す
る方法において、前記ガラス合成用原料は5iC14及
び弗素含有気体からなり、前記火炎形成用ガスは分子摺
成元素比でll10が1.0以下の炭化水素ガスまたは
水素元素を含まないガスからなることを特徴とする弗素
含有ガラスの製造方法。 <2) Mij記11/Cが1.0以下の炭化水素ガス
がアセチ(6)前記弗素含有気体がフロンガスからなる
ことを特徴とする特許請求の範囲第1項記載の弗素含有
ガラスの製造方法。
(1) A method for synthesizing glass by introducing a raw material for glass synthesis into a flame, reacting the raw material for glass synthesis in the flame to form fine particles, and depositing the formed fine particles on a starting material, the method comprising: The raw material for glass synthesis is composed of 5iC14 and a fluorine-containing gas, and the flame-forming gas is composed of a hydrocarbon gas having a molecular composition element ratio of 110 of 1.0 or less or a gas containing no hydrogen element. Method for manufacturing glass containing glass. <2) The method for producing a fluorine-containing glass according to claim 1, wherein the hydrocarbon gas having a Mij 11/C of 1.0 or less is acetate (6) and the fluorine-containing gas is a fluorocarbon gas. .
JP18579482A 1982-10-22 1982-10-22 Manufacture of glass containing fluorine Granted JPS5978943A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18579482A JPS5978943A (en) 1982-10-22 1982-10-22 Manufacture of glass containing fluorine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18579482A JPS5978943A (en) 1982-10-22 1982-10-22 Manufacture of glass containing fluorine

Publications (2)

Publication Number Publication Date
JPS5978943A true JPS5978943A (en) 1984-05-08
JPS6144823B2 JPS6144823B2 (en) 1986-10-04

Family

ID=16177002

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18579482A Granted JPS5978943A (en) 1982-10-22 1982-10-22 Manufacture of glass containing fluorine

Country Status (1)

Country Link
JP (1) JPS5978943A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6117432A (en) * 1984-07-02 1986-01-25 Sumitomo Electric Ind Ltd Manufacture of optical fiber preform
JPS6172643A (en) * 1984-09-19 1986-04-14 Sumitomo Electric Ind Ltd Manufacture of optical fiber preform
JPH0558661A (en) * 1991-08-27 1993-03-09 Fujikura Ltd Production of parent material for optical fiber

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6117432A (en) * 1984-07-02 1986-01-25 Sumitomo Electric Ind Ltd Manufacture of optical fiber preform
JPH0451497B2 (en) * 1984-07-02 1992-08-19 Sumitomo Electric Industries
JPS6172643A (en) * 1984-09-19 1986-04-14 Sumitomo Electric Ind Ltd Manufacture of optical fiber preform
JPH0583502B2 (en) * 1984-09-19 1993-11-26 Sumitomo Denki Kogyo Kk
JPH0558661A (en) * 1991-08-27 1993-03-09 Fujikura Ltd Production of parent material for optical fiber

Also Published As

Publication number Publication date
JPS6144823B2 (en) 1986-10-04

Similar Documents

Publication Publication Date Title
JP2744695B2 (en) Improved vitreous silica products
KR900008503B1 (en) Manufacture of preform for glass fibres
JPH05246736A (en) Method for preparing non-porous object and optical waveguide fiber of high purity fused silica glass doped with titania
JPS6038345B2 (en) Manufacturing method of glass material for optical transmission
JP3007510B2 (en) Manufacturing method of synthetic quartz glass member
EP0888398A4 (en) Germanium doped silica forming feedstock and method
US4388095A (en) Method of producing a glass layer on an interior surface of a hollow body
JPH0459254B2 (en)
JPS5978943A (en) Manufacture of glass containing fluorine
JPS59146947A (en) Manufacture of preform for light conductive body
JPH038737A (en) Production of preform for optical fiber
JPS6253452B2 (en)
JP2612871B2 (en) Method of manufacturing graded-in-desk type optical fiber preform
JP3258478B2 (en) High viscosity synthetic quartz glass tube for thermal CVD method and quartz glass preform for optical fiber using the same
JPS6090836A (en) Manufacture of synthetic quartz
JPS6143290B2 (en)
JPS62108744A (en) Transparent vitrification method of porous glass base material
JPS61261228A (en) Manufacture of fluorine-added preform for optical fiber
JPH0324415B2 (en)
JPS60264338A (en) Manufacture of optical fiber preform
JPS6086039A (en) Production of fluorine-containing silica glass
JPS59162143A (en) Production of synthetic quartz
JPS6042242A (en) Manufacture of glass for optical fiber
JPS59137333A (en) Manufacture of base material for optical fiber
JPH053416B2 (en)