JPS5963706A - Magnetic thin film body - Google Patents
Magnetic thin film bodyInfo
- Publication number
- JPS5963706A JPS5963706A JP57174912A JP17491282A JPS5963706A JP S5963706 A JPS5963706 A JP S5963706A JP 57174912 A JP57174912 A JP 57174912A JP 17491282 A JP17491282 A JP 17491282A JP S5963706 A JPS5963706 A JP S5963706A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- anisotropy
- magnetic
- unevenness
- magnetic field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/32—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film
- H01F41/34—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film in patterns, e.g. by lithography
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
- Hall/Mr Elements (AREA)
- Measuring Magnetic Variables (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、磁気異方性の制御された強磁性簿膜体に関す
るものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a ferromagnetic film with controlled magnetic anisotropy.
従来例の構成とその問題点
最近、信号磁界の周波数にかかわらず大きな出力が得ら
れる仁とから、強磁性薄膜の磁気抵抗効果を利用した各
種磁気センサや磁訟ヘッドが実用化されている。この磁
気抵抗効果は、強磁性薄膜の比抵抗をρ、磁化方向と電
流のなす角をθとすると、
ρ＝ρ。十△ρＭＡＩ（２）θ
という関係式で表わされる。磁化の方向は、−軸異方性
を有する薄膜の場合、異方性磁界の大きさ程度の外部磁
界で回転する。異方性磁界は、たとえば磁場中蒸着した
パーマロイ膜の場合数エルステッドであるから、外部信
号がそれより大きい場合、外部磁界との関係において抵
抗が飽和してしまうので、用途に応じているいろな大き
さの異方性磁界をもった強磁性薄膜を用いることが望ま
しい。しかし、磁場中蒸着では異方性磁界の大きさの制
御は困難であり、斜め蒸着の入射角で制御する方法では
その再現性に問題がある。また、基板に凹凸を形成し、
その上に強磁性膜を形成する方法では、数μｍピンチの
凹凸である程度以上の異方性磁界をつけるためには膜厚
と同程度以上の溝深さを要する。Conventional configurations and their problems Recently, various magnetic sensors and magnetic heads that utilize the magnetoresistive effect of ferromagnetic thin films have been put into practical use because of their ability to obtain large outputs regardless of the frequency of the signal magnetic field. This magnetoresistive effect is expressed as ρ=ρ, where ρ is the specific resistance of the ferromagnetic thin film, and θ is the angle between the magnetization direction and the current. It is expressed by the relational expression 10ΔρMAI(2)θ. In the case of a thin film having -axis anisotropy, the direction of magnetization is rotated by an external magnetic field of approximately the magnitude of the anisotropic magnetic field. For example, in the case of a permalloy film deposited in a magnetic field, the anisotropic magnetic field is several Oersteds, so if the external signal is larger than this, the resistance will be saturated in relation to the external magnetic field, so it is necessary to apply various methods depending on the application. It is desirable to use a ferromagnetic thin film with an anisotropic magnetic field of a certain magnitude. However, in the case of deposition in a magnetic field, it is difficult to control the magnitude of the anisotropic magnetic field, and the method of controlling the angle of incidence of oblique deposition has a problem in its reproducibility. In addition, by forming irregularities on the substrate,
In the method of forming a ferromagnetic film on top of the ferromagnetic film, in order to generate a certain level of anisotropic magnetic field with unevenness of a few micrometers, the groove depth must be equal to or greater than the film thickness.
発明の目的
本発明は、このような問題を解決し、磁気異方性が安定
していて、その大きさを希望する値とすることのできる
磁性薄膜体を提供することを目的とする。OBJECTS OF THE INVENTION It is an object of the present invention to solve these problems and provide a magnetic thin film whose magnetic anisotropy is stable and whose size can be set to a desired value.
発明の構成
本発明は、磁性薄膜体の一方の面に、所定の方向に配列
された縞状の凹凸を形成するととによって、十述の目的
を実現したものである。）実施例の説明
以下、本発明の実施例について、図面を用いて説明する
。Structure of the Invention The present invention achieves the above-mentioned objects by forming striped concavities and convexities arranged in a predetermined direction on one surface of a magnetic thin film body. ) Description of Embodiments Embodiments of the present invention will be described below with reference to the drawings.
第１図は本発明の一実施例を示す。FIG. 1 shows an embodiment of the invention.
第１図（Ａ）に示すように、基板２（たとえばガラス）
上に真空蒸着やスパッタ、メッキなど（以下総称して単
に蒸着と称す）によって強磁性祠刺たとえばパーマロイ
からなる強磁性簿膜１を形成し、その上に縞状のフォト
レジストパターン３を、フォ１−リングラフィ技術によ
り形成する。各部の寸ある。次に、第１図（Ｂ）に示す
ようにスパッタエツチング、イオンミリング、ケミカル
コニノチングなどの方法で強磁性薄膜１をエツチングし
、たとえば深さ２００Ａの溝を形成する。このようにし
て形成された表面凹凸により、強磁性薄膜１には矢印Ａ
方向に磁気異方性を生じた。その異方性磁界は約２５エ
ルヌテソドであった。As shown in FIG. 1(A), a substrate 2 (for example, glass)
A ferromagnetic film 1 made of permalloy, for example, is formed thereon by vacuum evaporation, sputtering, plating, etc. (hereinafter collectively referred to as evaporation), and a striped photoresist pattern 3 is formed on it. 1- formed by phosphorography technology. There are dimensions for each part. Next, as shown in FIG. 1(B), the ferromagnetic thin film 1 is etched by a method such as sputter etching, ion milling, or chemical silicon notching to form a groove having a depth of, for example, 200 Å. Due to the surface irregularities formed in this way, the ferromagnetic thin film 1 is
Magnetic anisotropy occurred in the direction. The anisotropy field was approximately 25 ernes tesods.
第２図は本発明の他の実施例を示す。第２図（Ａｌに示
すように、基板２上にパーマロイを１０ＯＡの厚さに蒸
着して、強磁性薄膜１′を形成し、その上にフォ１−レ
シヌトを塗付してｒｉ ４μｍ、ピンチ８μｍｎの縞状
パターン３を形成する。この上にさらにパーマロイを４
０ＯＡの厚さに蒸着し、レジストを溶解して第２図（Ｂ
ｌに示すような表面に凹凸のある強磁性薄膜１を得る。FIG. 2 shows another embodiment of the invention. As shown in FIG. 2 (Al), permalloy is deposited on a substrate 2 to a thickness of 10 OA to form a ferromagnetic thin film 1', and a ferromagnetic thin film 1' is coated thereon with an ri of 4 μm and a pinch. Form a striped pattern 3 of 8 μm.Furthermore, 4 pieces of permalloy are formed on this.
The resist was deposited to a thickness of 0 OA, and the resist was dissolved to form a pattern as shown in Figure 2 (B).
A ferromagnetic thin film 1 having an uneven surface as shown in FIG. 1 is obtained.
この薄膜１は矢印の方向に磁化容易軸を有する磁気異方
性を生じ、異方性磁界は約１ｏｏエルステツドであった
。This thin film 1 exhibited magnetic anisotropy with an axis of easy magnetization in the direction of the arrow, and the anisotropic magnetic field was approximately 10 oersted.
発明の効果
以上実施例に示したように、本発明によれば、強磁性薄
膜の表面に凹凸を形成しているので、その形成方向、深
さを選ぶことにより、任意の方向に、任意の大きさの磁
気異方性を形成できる。また、この異方性は形状異方性
であるので、高温にさらしだ後でも消えることがない。Effects of the Invention As shown in the examples, according to the present invention, unevenness is formed on the surface of the ferromagnetic thin film. It is possible to form magnetic anisotropy in magnitude. Furthermore, since this anisotropy is shape anisotropy, it does not disappear even after exposure to high temperatures.
また、下地基板に凹凸をつけてその上に強磁性薄膜を形
成した場合と比較して同一膜厚、溝深さでは大きな異方
性磁界が得られる。たとえば、８３Ｎｉ−Ｆｅｙ＜−ン
１１Ｊ２μｍ、ピッチ４μｍの場合、本発明による薄膜
では異方性磁界１６０エルステ・ノドであるのに対して
、基板に凹凸をつけて、その上にＲＸ膜を形成した場合
１５エルステツドであり、約１０倍の異方性磁界が得ら
れた。Furthermore, a larger anisotropic magnetic field can be obtained with the same film thickness and groove depth than in the case where a ferromagnetic thin film is formed on a base substrate with irregularities. For example, in the case of 83Ni-Fey<-11J2μm and a pitch of 4μm, the anisotropic magnetic field is 160 Oerste nod in the thin film according to the present invention, whereas the RX film is formed on the substrate with irregularities. In this case, it was 15 oersted, and an anisotropic magnetic field of about 10 times was obtained.
まだこの強磁性薄膜を用いて磁気抵抗効果型ヘッドを作
ったところ、高調波歪成分が少ない、直線性の良好なヘ
ッドが得られた。When a magnetoresistive head was made using this ferromagnetic thin film, a head with good linearity and low harmonic distortion components was obtained.
第１図および第２図はそれぞれ本発明の実施例の磁性薄
膜体の製造工程を示す斜視図である。
１・・・・・強磁性薄膜、２・・・・・・基板。
代理人の氏名 弁理士 中 尾 敏 男 ほか１名第１
図FIGS. 1 and 2 are perspective views showing the manufacturing process of a magnetic thin film body according to an embodiment of the present invention, respectively. 1...Ferromagnetic thin film, 2...Substrate. Name of agent: Patent attorney Toshio Nakao and 1 other person No. 1
figure
Claims (1)
縞状の凹凸が形成されていることを特徴とする磁性薄膜
体。A magnetic thin film body made of a ferromagnetic material, characterized in that striped concavities and convexities arranged in a predetermined direction are formed on one surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57174912A JPS5963706A (en) | 1982-10-04 | 1982-10-04 | Magnetic thin film body |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57174912A JPS5963706A (en) | 1982-10-04 | 1982-10-04 | Magnetic thin film body |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5963706A true JPS5963706A (en) | 1984-04-11 |
Family
ID=15986867
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57174912A Pending JPS5963706A (en) | 1982-10-04 | 1982-10-04 | Magnetic thin film body |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5963706A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61112977A (en) * | 1984-11-08 | 1986-05-30 | Matsushita Electric Ind Co Ltd | Apparatus for detecting magnetic field |
| JPH08197177A (en) * | 1995-09-11 | 1996-08-06 | Kanemitsu:Kk | Formation of boss part of sheet metal blank |
| JP2014154208A (en) * | 2013-02-11 | 2014-08-25 | Hgst Netherlands B V | Current-perpendicular-to-the-plane (cpp) magnetoresistive sensor with exchange-coupled reference layer having shape anisotropy |
| JP2015014494A (en) * | 2013-07-04 | 2015-01-22 | 国立大学法人信州大学 | Optical probe current sensor using magnetic substance having shape magnetic anisotropy |
-
1982
- 1982-10-04 JP JP57174912A patent/JPS5963706A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61112977A (en) * | 1984-11-08 | 1986-05-30 | Matsushita Electric Ind Co Ltd | Apparatus for detecting magnetic field |
| JPH08197177A (en) * | 1995-09-11 | 1996-08-06 | Kanemitsu:Kk | Formation of boss part of sheet metal blank |
| JP2740946B2 (en) * | 1995-09-11 | 1998-04-15 | 株式会社カネミツ | Boss forming method for sheet metal material |
| JP2014154208A (en) * | 2013-02-11 | 2014-08-25 | Hgst Netherlands B V | Current-perpendicular-to-the-plane (cpp) magnetoresistive sensor with exchange-coupled reference layer having shape anisotropy |
| JP2015014494A (en) * | 2013-07-04 | 2015-01-22 | 国立大学法人信州大学 | Optical probe current sensor using magnetic substance having shape magnetic anisotropy |
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