JPS5961531U - Liquid phase epitaxial growth equipment - Google Patents
Liquid phase epitaxial growth equipmentInfo
- Publication number
- JPS5961531U JPS5961531U JP15767582U JP15767582U JPS5961531U JP S5961531 U JPS5961531 U JP S5961531U JP 15767582 U JP15767582 U JP 15767582U JP 15767582 U JP15767582 U JP 15767582U JP S5961531 U JPS5961531 U JP S5961531U
- Authority
- JP
- Japan
- Prior art keywords
- epitaxial growth
- liquid phase
- phase epitaxial
- boat
- growth equipment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第1図は従来のエピタキシャル装置め断面図、第2図は
本考案実施例の液相エピタキシャル成長装置の断面図で
ある。
1・・・ボート、2・・・半導体基板、3・・・凹部、
4・・・スライド板、5・・・融液、6・・・融液室。FIG. 1 is a sectional view of a conventional epitaxial growth apparatus, and FIG. 2 is a sectional view of a liquid phase epitaxial growth apparatus according to an embodiment of the present invention. DESCRIPTION OF SYMBOLS 1... Boat, 2... Semiconductor substrate, 3... Recessed part,
4... Slide plate, 5... Melt liquid, 6... Melt liquid chamber.
Claims (1)
に摺動可能にボー、ト上に載置され、底面をボート表面
で形成し、融液と接する主たる面が粗面となった融液室
をもったスライド板とを具備した事を特徴とする液相エ
ピタキシャル成長装置。A boat has a recess for storing a substrate, and a melt is placed on the boat so as to be able to slide relative to the boat, the bottom surface is formed by the boat surface, and the main surface in contact with the melt is a rough surface. A liquid phase epitaxial growth apparatus characterized by comprising a slide plate having a liquid chamber.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15767582U JPS5961531U (en) | 1982-10-19 | 1982-10-19 | Liquid phase epitaxial growth equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15767582U JPS5961531U (en) | 1982-10-19 | 1982-10-19 | Liquid phase epitaxial growth equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5961531U true JPS5961531U (en) | 1984-04-23 |
JPH025529Y2 JPH025529Y2 (en) | 1990-02-09 |
Family
ID=30347559
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15767582U Granted JPS5961531U (en) | 1982-10-19 | 1982-10-19 | Liquid phase epitaxial growth equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5961531U (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5623956A (en) * | 1979-08-01 | 1981-03-06 | Tokyo Electric Co Ltd | Automatic electric moxa cautery device |
JPS58138330U (en) * | 1982-03-11 | 1983-09-17 | 日本電気株式会社 | Liquid phase epitaxial growth equipment |
-
1982
- 1982-10-19 JP JP15767582U patent/JPS5961531U/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5623956A (en) * | 1979-08-01 | 1981-03-06 | Tokyo Electric Co Ltd | Automatic electric moxa cautery device |
JPS58138330U (en) * | 1982-03-11 | 1983-09-17 | 日本電気株式会社 | Liquid phase epitaxial growth equipment |
Also Published As
Publication number | Publication date |
---|---|
JPH025529Y2 (en) | 1990-02-09 |
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