JPS596056B2 - 酸化鉄光学マスクの製造方法 - Google Patents
酸化鉄光学マスクの製造方法Info
- Publication number
- JPS596056B2 JPS596056B2 JP53006631A JP663178A JPS596056B2 JP S596056 B2 JPS596056 B2 JP S596056B2 JP 53006631 A JP53006631 A JP 53006631A JP 663178 A JP663178 A JP 663178A JP S596056 B2 JPS596056 B2 JP S596056B2
- Authority
- JP
- Japan
- Prior art keywords
- iron oxide
- iron
- manufacturing
- optical mask
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 title claims description 47
- 238000004519 manufacturing process Methods 0.000 title claims description 24
- 230000003287 optical effect Effects 0.000 title claims description 14
- 239000000758 substrate Substances 0.000 claims description 21
- 150000002505 iron Chemical class 0.000 claims description 13
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 12
- 239000002904 solvent Substances 0.000 claims description 11
- 238000005507 spraying Methods 0.000 claims description 9
- 229910052742 iron Inorganic materials 0.000 claims description 8
- -1 ethylene glycol ethers Chemical class 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 claims description 5
- 239000003960 organic solvent Substances 0.000 claims description 5
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 4
- 229910021645 metal ion Inorganic materials 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 150000003839 salts Chemical class 0.000 claims description 3
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 claims 1
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- 239000011521 glass Substances 0.000 description 12
- 239000000243 solution Substances 0.000 description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 238000005530 etching Methods 0.000 description 6
- 239000000443 aerosol Substances 0.000 description 5
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 5
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 4
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000012266 salt solution Substances 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 229910003145 α-Fe2O3 Inorganic materials 0.000 description 3
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 2
- JZQOJFLIJNRDHK-CMDGGOBGSA-N alpha-irone Chemical compound CC1CC=C(C)C(\C=C\C(C)=O)C1(C)C JZQOJFLIJNRDHK-CMDGGOBGSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 229910000859 α-Fe Inorganic materials 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- 229940093475 2-ethoxyethanol Drugs 0.000 description 1
- 229910016874 Fe(NO3) Inorganic materials 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- AZFUOHYXCLYSQJ-UHFFFAOYSA-N [V+5].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O Chemical compound [V+5].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O AZFUOHYXCLYSQJ-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 150000001728 carbonyl compounds Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 1
- 150000003840 hydrochlorides Chemical class 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 159000000014 iron salts Chemical class 0.000 description 1
- MVFCKEFYUDZOCX-UHFFFAOYSA-N iron(2+);dinitrate Chemical compound [Fe+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MVFCKEFYUDZOCX-UHFFFAOYSA-N 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/80—Etching
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Surface Treatment Of Glass (AREA)
- ing And Chemical Polishing (AREA)
- Laminated Bodies (AREA)
- Glass Compositions (AREA)
- Soft Magnetic Materials (AREA)
- Compounds Of Iron (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL000007700808 | 1977-01-27 | ||
NL7700808A NL7700808A (nl) | 1977-01-27 | 1977-01-27 | Werkwijze voor de vervaardiging van ijzer- oxidefotomaskers en ijzeroxidemaskers verkre- gen volgens deze werkwijze. |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5394185A JPS5394185A (en) | 1978-08-17 |
JPS596056B2 true JPS596056B2 (ja) | 1984-02-08 |
Family
ID=19827853
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP53006631A Expired JPS596056B2 (ja) | 1977-01-27 | 1978-01-24 | 酸化鉄光学マスクの製造方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US4199621A (en, 2012) |
JP (1) | JPS596056B2 (en, 2012) |
CA (1) | CA1110507A (en, 2012) |
DE (1) | DE2802814C2 (en, 2012) |
FR (1) | FR2378872A1 (en, 2012) |
GB (1) | GB1592017A (en, 2012) |
NL (1) | NL7700808A (en, 2012) |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1268753A (en) * | 1968-05-20 | 1972-03-29 | United Glass Ltd | Containers resistant to ultra-violet light |
GB1307216A (en) * | 1969-04-23 | 1973-02-14 | Pilkington Brothers Ltd | Treating glass |
US3824100A (en) * | 1970-06-29 | 1974-07-16 | Corning Glass Works | Transparent iron oxide microcircuit mask |
FR2110622A5 (en, 2012) * | 1970-10-23 | 1972-06-02 | Commissariat Energie Atomique | |
IT996924B (it) * | 1972-12-21 | 1975-12-10 | Glaverbel | Procedimento per formare uno strato di ossido metallico |
-
1977
- 1977-01-27 NL NL7700808A patent/NL7700808A/xx not_active Application Discontinuation
-
1978
- 1978-01-18 CA CA295,241A patent/CA1110507A/en not_active Expired
- 1978-01-23 DE DE2802814A patent/DE2802814C2/de not_active Expired
- 1978-01-24 GB GB2802/78A patent/GB1592017A/en not_active Expired
- 1978-01-24 JP JP53006631A patent/JPS596056B2/ja not_active Expired
- 1978-01-24 FR FR7801889A patent/FR2378872A1/fr active Granted
- 1978-01-25 US US05/872,171 patent/US4199621A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE2802814A1 (de) | 1978-08-03 |
GB1592017A (en) | 1981-07-01 |
FR2378872A1 (fr) | 1978-08-25 |
DE2802814C2 (de) | 1984-10-25 |
FR2378872B1 (en, 2012) | 1983-11-18 |
JPS5394185A (en) | 1978-08-17 |
US4199621A (en) | 1980-04-22 |
NL7700808A (nl) | 1978-07-31 |
CA1110507A (en) | 1981-10-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4172159A (en) | Process for coating a glass sheet with a semi-reflective film of tin oxide | |
US4874462A (en) | Method of forming patterned film on substrate surface by using metal alkoxide sol | |
JPS6210943B2 (en, 2012) | ||
DD273623A5 (de) | Verfahren und Vorrichtung zur Ablagerung einer Metalloxydbeschichtung auf Floatglas | |
US5051278A (en) | Method of forming metal fluoride films by the decomposition of metallo-organic compounds in the presence of a fluorinating agent | |
US5006418A (en) | Decorative mirror | |
US2570245A (en) | Method of spraying transparent coatings | |
CA1143258A (en) | Method of forming a magneto-optical polycrystalline cobalt ferrite layer on a substrate | |
JPS596056B2 (ja) | 酸化鉄光学マスクの製造方法 | |
US4788079A (en) | Method of making haze-free tin oxide coatings | |
JP5568482B2 (ja) | ガラスドロー中の導電フィルム形成 | |
EP0697013B1 (en) | Coating solution suitable for the manufacture of a magnesium-oxide layer and a method of manufacturing such a layer | |
JPS61502121A (ja) | 虹彩抑制方法 | |
AU719340B2 (en) | Process for forming silica film and composition therefor | |
KR100357946B1 (ko) | 투명 도전막의 제조방법 | |
JPH0662317B2 (ja) | 透明導電性ガラスの製造方法 | |
JPH10265960A (ja) | 亜酸化銅膜の製造方法 | |
JPS6169961A (ja) | 霧化薄膜作製装置用ノズル | |
Gao et al. | Growth and characterization of zirconium oxide films | |
JPH0416012B2 (en, 2012) | ||
JP2002249878A (ja) | 酸化物薄膜の製造方法 | |
WO2017013399A1 (en) | Metal oxide deposition | |
SU1346600A1 (ru) | Способ изготовлени тонкопленочных проводниковых элементов на кварцевой подложке | |
JPH01294306A (ja) | 導電材およびその製造方法 | |
JP5118621B2 (ja) | 無機膜形成方法 |