JPS5958847A - Substrate for electric insulation and manufacture thereof - Google Patents

Substrate for electric insulation and manufacture thereof

Info

Publication number
JPS5958847A
JPS5958847A JP57168258A JP16825882A JPS5958847A JP S5958847 A JPS5958847 A JP S5958847A JP 57168258 A JP57168258 A JP 57168258A JP 16825882 A JP16825882 A JP 16825882A JP S5958847 A JPS5958847 A JP S5958847A
Authority
JP
Japan
Prior art keywords
aluminum nitride
thermal conductivity
polymerization agent
less
expansion coefficient
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57168258A
Other languages
Japanese (ja)
Other versions
JPH0355924B2 (en
Inventor
Hiroaki Yanagida
柳田 博明
Heiji Tabuchi
田渕 平次
Kenichi Sakamoto
憲一 坂本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Nippon Light Metal Co Ltd
Original Assignee
Central Glass Co Ltd
Nippon Light Metal Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central Glass Co Ltd, Nippon Light Metal Co Ltd filed Critical Central Glass Co Ltd
Priority to JP57168258A priority Critical patent/JPS5958847A/en
Publication of JPS5958847A publication Critical patent/JPS5958847A/en
Publication of JPH0355924B2 publication Critical patent/JPH0355924B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/12Mountings, e.g. non-detachable insulating substrates
    • H01L23/14Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
    • H01L23/15Ceramic or glass substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Ceramic Products (AREA)
  • Inorganic Insulating Materials (AREA)

Abstract

PURPOSE:To obtain the insulating substrate without requiring a high-temperature high-pressure press and sintering by adding and mixing a fixed quantity of an organic polymerization agent to aluminum nitride powder. CONSTITUTION:A material, thermal conductivity thereof is lower than aluminum nitride and a thermal expansion coefficient and electric resistivity thereof are larger than that, such as unsaturated polyester is selected as the organic polymerization agent, and a proper quantity of benzoyl peroxide, etc. are added to the material as a high-temperature curing agent. The polymerization agent is kneaded with aluminum nitride by approximately 2-7% wt., and hot-pressed at a comparatively low temperature of 100-400 deg.C and completed. Curing capability degrades when the polymerization agent is 2% wt. or less, and thermal conductivity and the thermal expansion coefficient degrade when it is 7% wt. or more. According to the constitution, the substrate of not less than 10<9>OMEGAcm resistivity, not less than 0.05cal/cm sec deg.C thermal conductivity and a not more than 6X10<-6>/ deg.C expansion coefficient is obtained easily.

Description

【発明の詳細な説明】 有する窒化アルミニウムを主体とした電気絶縁用基板お
よびその製造法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electrically insulating substrate mainly made of aluminum nitride and a method for manufacturing the same.

近年における半導体工業の発展に伴って、集積回路等に
使用される絶縁基板は、半導体チップ等の高密度化が進
み、熱放散性のより優れた材料が要求されている。即ち
かかる絶縁基板には、当面電気絶縁性および熱伝導率が
太きく、シかも熱膨張係数がシリコンのそれと同等で、
かつ機械的強度の大きいことが必要である。
2. Description of the Related Art With the development of the semiconductor industry in recent years, insulating substrates used for integrated circuits and the like are becoming more densely packed with semiconductor chips, and materials with better heat dissipation properties are required. In other words, such an insulating substrate has high electrical insulation and thermal conductivity, and a coefficient of thermal expansion equivalent to that of silicon.
It is also necessary to have high mechanical strength.

然して斯かる要求を満だ14のとして窒化アルミニウム
材料が注目され、即ちその熱伝導率は室温において0.
 is〜0. 16 c&L/cI!L。
However, aluminum nitride material has attracted attention as a material that satisfies these requirements14, namely, its thermal conductivity is 0.1 at room temperature.
is~0. 16 c&L/cI! L.

see ℃であり、これはアルミナの約2倍に相当し、
更に他のセラミックスに比較して高温性がすぐれしかも
熱膨張係数はアルミナの約8X10  /℃ に比べ6
X10  /’C  以下と低く、耐熱衝撃性も良好で
あり、加えて窒化アルミニウムの電気比抵抗は10 Ω
α以上であって、電気絶縁性、誘電性は高周波領域にお
いて特に優れており、誘電正接は著しく小さいものであ
る。
see °C, which is approximately twice that of alumina,
Furthermore, it has superior high temperature resistance compared to other ceramics, and its coefficient of thermal expansion is 6 compared to alumina's approximately 8X10/℃.
It has a low X10/'C or less, good thermal shock resistance, and the electrical resistivity of aluminum nitride is 10 Ω.
α or more, the electrical insulation and dielectric properties are particularly excellent in the high frequency range, and the dielectric loss tangent is extremely small.

Cのような窒化アルミニウムはその用途に応じ、例えば
窒化アルミニウム粉末を所望の形状に成形し、型名雰囲
気中で焼結して焼結体を1.するが、窒化アルミニウム
は本来難焼結性の化合物であるため熱伝導率の高い高密
度ツタ(化アルミニウム焼結体を得るためには1500
〜2000’0 、 100気圧以上の高温、高トドに
よるホットプレス等の加圧焼結を必要とする。しかも斯
様な高温高圧焼結法においても、より高密度の一碑結体
を得るためには、酸化マンガン、酸化ストロンチウム等
の焼結促JEM剤の添加を必要としている。しかしなが
ら、かかる小加削は往々にして窒化アルミニウムの本来
有しているすぐれた熱伝導性等の諸物件を大@<4Hな
わせることがあるため好ましいものではない。
Aluminum nitride such as C is prepared depending on its use, for example, by molding aluminum nitride powder into a desired shape and sintering it in an atmosphere to form a sintered body. However, since aluminum nitride is a compound that is inherently difficult to sinter, high-density ivy with high thermal conductivity (1500
-2000'0, high temperature of 100 atmospheres or more, and pressure sintering such as hot pressing with high pressure is required. Moreover, even in such a high-temperature, high-pressure sintering method, it is necessary to add a sintering promoting JEM agent such as manganese oxide or strontium oxide in order to obtain a monolithic body with higher density. However, such small machining is not preferable because it often causes the inherent excellent thermal conductivity of aluminum nitride to become larger than 4H.

本発明はこれら従来法と異なった窒化アルミニウム主体
とする一V「規な電気絶縁用基板およびその製法の提供
しようとするものであり、高温高圧によるホットプレス
、更にはmMを必要としない絶縁基板およびその製造法
である。1(Iiかる本発明によるものは大略5μ程度
の粒子よりなる窒化アルミニウム粉末に2〜7虚量係の
有機重合剤を添加混合し、100〜400℃の比較的低
温下でホットプレスすることにより達成される。
The present invention aims to provide an electrically insulating substrate based on aluminum nitride that is different from these conventional methods, and a method for manufacturing the same. and its manufacturing method. 1 (Ii) According to the present invention, an organic polymerizing agent having an imaginary coefficient of 2 to 7 is added to and mixed with aluminum nitride powder consisting of particles of approximately 5μ, and the mixture is heated at a relatively low temperature of 100 to 400°C. This is achieved by hot pressing under the

上記のように添加される有機重合剤は一般に窒化アルミ
ニウムに比較して熱伝導率が低く、熱膨張率および電気
比抵抗が太きいもの抗の太きいものを心安とし、例えば
不飽和ポリエステル、アルキドあるいはエボキン等で、
これらに過酸化ベンゾイル(BPO)、t−ブチルペル
オキソ2−エチルヘキサノエート(TBPO)あるいは
ジクロルペルオキシド(DCP)、ラウロイルペルオキ
シド(LP)等の高温硬化剤を適量添加したものが有効
に使用烙れる。
The organic polymerization agent added as described above generally has a lower thermal conductivity than aluminum nitride, and one with a large coefficient of thermal expansion and electrical resistivity is recommended, such as unsaturated polyester, alkyd, etc. Or with Evokin etc.
Adding appropriate amounts of high-temperature curing agents such as benzoyl peroxide (BPO), t-butylperoxo-2-ethylhexanoate (TBPO), dichloroperoxide (DCP), and lauroyl peroxide (LP) to these can be effectively used. It will be done.

例えばアルキドにDCPを1重−1%添加した重合体単
体の熱伝導率は0.025catム、 sec、℃であ
り熱膨張昆は25x10 7℃、電気比抵抗は10  
Qcmである。
For example, the thermal conductivity of a single polymer made by adding 1 weight - 1% of DCP to alkyd is 0.025 catm, sec, °C, the thermal expansion is 25 x 107 °C, and the electrical resistivity is 10
Qcm.

本発明はかかる有機重合剤を窒化アルミニウムに対し、
2.0〜7.0重量係の範囲で使用するものであるが2
.0重量悌以下では熱硬化性が悪く、又7.0 重量%
以上では見掛上の気孔率が減少し編密度化にはなるが熱
伝導率および熱膨張係数が各々所定の範囲を逸脱する。
The present invention uses such an organic polymerization agent for aluminum nitride,
It is used in the range of 2.0 to 7.0 weight ratio, but 2
.. If it is less than 0% by weight, the thermosetting property is poor, and if it is less than 7.0% by weight.
In the above case, the apparent porosity decreases and the density increases, but the thermal conductivity and the coefficient of thermal expansion each deviate from the predetermined ranges.

なお、窒化アルミニウムと有機重合剤の温合はできるだ
け均一に行う必要があり例えば摺潰機などによる混合捏
練が好ましい。また場合によっては乗合剤をもって窒化
アルミニウムをマイクロカプセル化する手段も有効であ
る。
The aluminum nitride and the organic polymerization agent must be heated as uniformly as possible, and mixing and kneading using a grinder or the like is preferred, for example. In some cases, it is also effective to microcapsule aluminum nitride with a combination agent.

以上の如く本発明は極めて簡便な方法で窒化アルミニウ
ムを主体とする電気絶縁用基板を提供するものであり、
その工業的価値は極めて太きいと這える。
As described above, the present invention provides an electrically insulating substrate mainly made of aluminum nitride using an extremely simple method.
Its industrial value is said to be extremely large.

以−ト、本発明を災施例により更に詳述する。The present invention will now be explained in more detail by way of practical examples.

実施例 不飽和アルキド(アサヒベ/社製)100部に対し硬化
剤としてジクロルペルオキシド(DCP)0.5部を添
加混合した41機重合剤を調整した。次に粒径3〜5μ
の望化アルミニウム100重量部に対し上記有機重合剤
を1〜10重量係の範囲で変量して添加し、細潰機内で
それぞれ30分間混合したのち、温度100〜300℃
、圧力100〜400 Kg/CJ、減圧度I X 1
0−2〜l X 10−”Torr の+ia囲で熱間
加圧成型しキュアタイムを20分保持したΦ件下で大略
28IllIIIφ×1叫厚の円板状基板を製作した。
Example 41 A polymerization agent was prepared by adding and mixing 0.5 part of dichloroperoxide (DCP) as a hardening agent to 100 parts of unsaturated alkyd (manufactured by Asahibe Co., Ltd.). Next, the particle size is 3~5μ
To 100 parts by weight of aluminum, the above-mentioned organic polymerizing agent was added in varying amounts in the range of 1 to 10 parts by weight, mixed for 30 minutes in a crusher, and then heated to a temperature of 100 to 300°C.
, pressure 100-400 Kg/CJ, degree of vacuum I x 1
A disk-shaped substrate having a thickness of approximately 28IllIIIφ×1 was fabricated under the condition of hot pressure molding in a +ia range of 0-2 to 10-” Torr and a curing time of 20 minutes.

得られた基板の諸物性を次の第1表に示すが、この$1
表から明らかなように本発明の範囲内である実験番号A
4〜A6およびAI 1〜A15における熱伝導率、熱
膨張係数および電気比抵抗の諸物性が共に秀れているこ
とが判る。
The physical properties of the obtained substrate are shown in Table 1 below.
As is clear from the table, experiment number A is within the scope of the present invention.
It can be seen that physical properties such as thermal conductivity, coefficient of thermal expansion, and electrical resistivity in Examples 4 to A6 and AI 1 to A15 are all excellent.

実施例 粒径lμ以下のポリエステル樹脂(住友化学社製:商品
名工コール)1重量部にアセトン10車量部を密閉容器
内で添加し、48時間攪拌して溶液を作り、該溶液に粒
径3〜5μの窒化アルミニウム100重量部を加え、信
漬機で30分間殴拌混合したのち40〜60℃の温度で
乾燥した。ついで成形体の形状が大略28闘φ×1鴫厚
の円板状となるよう計量し、温度100〜300℃、圧
力100〜400に97cx” 、減圧度I X 10
 〜lXl0  Torrの範囲で熱間加圧成型し、キ
ュアタイム20分の条件下で基板を製作した。得られた
基板の諸物性を第2表に示す。即ちこの第2表から明ら
かなように本発明の範囲内である実験番号屋3〜&6お
よびA I 1〜A 15のものにおける熱伝導率、熱
膨張係数および電気比抵抗の諸物性が秀れていることが
判る。
Example 10 parts by weight of acetone are added to 1 part by weight of a polyester resin having a particle size of 1μ or less (manufactured by Sumitomo Chemical Co., Ltd., trade name Kokoru) in a closed container, and stirred for 48 hours to prepare a solution. 100 parts by weight of aluminum nitride having a particle diameter of 3 to 5 microns was added, mixed by stirring for 30 minutes using a pickling machine, and then dried at a temperature of 40 to 60°C. Next, the molded body was weighed so that it had a disc shape of approximately 28mm diameter x 1mm thick, and the temperature was 100 to 300°C, the pressure was 100 to 400°C, and the pressure was 97cm, and the degree of vacuum was I x 10.
The substrate was manufactured under conditions of hot pressure molding in the range of ~lXl0 Torr and a cure time of 20 minutes. Table 2 shows the physical properties of the obtained substrate. That is, as is clear from Table 2, the physical properties of the thermal conductivity, thermal expansion coefficient, and electrical resistivity of the experimental numbers 3 to 6 and AI 1 to A 15, which are within the scope of the present invention, are excellent. It can be seen that

Claims (1)

【特許請求の範囲】 (1ン  窒化アルミニウムを主体として有機重合剤を
含み、電気比抵抗か10 Ωα以上、熱伝導率が0.0
5caL/cm、 sec℃以上で、熱膨張係数が6×
lO/℃以下であることを特徴とする電気絶縁用基板。 (2)窒化アルミニウム粉末に2〜7重量係の有機重合
剤を加え、400℃以下でホットプレスすることを特徴
とする電気絶縁用基板の製造法。
[Claims] (1) Contains an organic polymerization agent mainly composed of aluminum nitride, has an electrical resistivity of 10 Ωα or more, and a thermal conductivity of 0.0.
5caL/cm, sec℃ or more, thermal expansion coefficient is 6×
An electrically insulating substrate characterized by a temperature of 1O/°C or less. (2) A method for producing an electrically insulating substrate, which comprises adding 2 to 7 parts by weight of an organic polymerization agent to aluminum nitride powder and hot pressing at 400°C or lower.
JP57168258A 1982-09-29 1982-09-29 Substrate for electric insulation and manufacture thereof Granted JPS5958847A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57168258A JPS5958847A (en) 1982-09-29 1982-09-29 Substrate for electric insulation and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57168258A JPS5958847A (en) 1982-09-29 1982-09-29 Substrate for electric insulation and manufacture thereof

Publications (2)

Publication Number Publication Date
JPS5958847A true JPS5958847A (en) 1984-04-04
JPH0355924B2 JPH0355924B2 (en) 1991-08-26

Family

ID=15864669

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57168258A Granted JPS5958847A (en) 1982-09-29 1982-09-29 Substrate for electric insulation and manufacture thereof

Country Status (1)

Country Link
JP (1) JPS5958847A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002018298A1 (en) * 2000-09-01 2002-03-07 Atofina Ceramic preforms, and in particular made of aluminium nitride capable of being green-machined and method for obtaining same

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50161508A (en) * 1974-06-20 1975-12-27

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50161508A (en) * 1974-06-20 1975-12-27

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002018298A1 (en) * 2000-09-01 2002-03-07 Atofina Ceramic preforms, and in particular made of aluminium nitride capable of being green-machined and method for obtaining same
FR2813603A1 (en) * 2000-09-01 2002-03-08 Atofina CERAMIC PREFORMS, ESPECIALLY IN MACHINABLE WASTED RAIN AND PROCESS FOR OBTAINING THE SAME

Also Published As

Publication number Publication date
JPH0355924B2 (en) 1991-08-26

Similar Documents

Publication Publication Date Title
US4671912A (en) Method of manufacturing sintered ceramic body
JPS6143309B2 (en)
JPS5832073A (en) Sintered body
US3538205A (en) Method of providing improved lossy dielectric structure for dissipating electrical microwave energy
JPS5958847A (en) Substrate for electric insulation and manufacture thereof
CN110577745A (en) Preparation method of heat conduction material
JPS6221764A (en) Manufacture of aluminum nitride
JPS61145266A (en) Adhesive
JPH0147039B2 (en)
US3634566A (en) Method for providing improved lossy dielectric structure for dissipating electrical microwave energy
JPH02225357A (en) Complex dielectric material
JPS63162576A (en) Black aluminum nitride sintered body and manufacture
JPS63307748A (en) Resin material
JPH075378B2 (en) Black aluminum nitride sintered body and manufacturing method thereof
JPS61146764A (en) Aluminum nitride sintered body and manufacture
JPS6025390B2 (en) Manufacturing method of electrical insulation material
JPS5923049B2 (en) Insulating ceramics for high frequency circuit boards
JPS62235262A (en) Manufacture of aluminum nitride sintered body
JPS6236069A (en) Manufacture of aluminum nitride sintered body
JPS61146766A (en) Aluminum nitride sintered body and manufacture
JPH0482059B2 (en)
JPS62246867A (en) Manufacture of aluminum nitride sintered body
JPH0470776B2 (en)
JPS59156960A (en) Manufacture of alumina sintered substrate
JPH0328174A (en) Aluminum nitride sintered material