JPS5957433A - Ｘ線マスクの製造方法 - Google Patents

Ｘ線マスクの製造方法

Info

Publication number
JPS5957433A
JPS5957433A JP57168187A JP16818782A JPS5957433A JP S5957433 A JPS5957433 A JP S5957433A JP 57168187 A JP57168187 A JP 57168187A JP 16818782 A JP16818782 A JP 16818782A JP S5957433 A JPS5957433 A JP S5957433A
Authority
JP
Japan
Prior art keywords
film
mask
pattern
absorber
ray mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57168187A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0115136B2 (enExample
Inventor
Hideo Yoshihara
秀雄 吉原
Akira Ozawa
小澤　章
Misao Sekimoto
関本　美佐雄
Toshiro Ono
俊郎 小野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP57168187A priority Critical patent/JPS5957433A/ja
Publication of JPS5957433A publication Critical patent/JPS5957433A/ja
Publication of JPH0115136B2 publication Critical patent/JPH0115136B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP57168187A 1982-09-27 1982-09-27 Ｘ線マスクの製造方法 Granted JPS5957433A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57168187A JPS5957433A (ja) 1982-09-27 1982-09-27 Ｘ線マスクの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57168187A JPS5957433A (ja) 1982-09-27 1982-09-27 Ｘ線マスクの製造方法

Publications (2)

Publication Number Publication Date
JPS5957433A true JPS5957433A (ja) 1984-04-03
JPH0115136B2 JPH0115136B2 (enExample) 1989-03-15

Family

ID=15863391

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57168187A Granted JPS5957433A (ja) 1982-09-27 1982-09-27 Ｘ線マスクの製造方法

Country Status (1)

Country Link
JP (1) JPS5957433A (enExample)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5279069U (enExample) * 1975-12-09 1977-06-13
JPS52139375A (en) * 1976-05-18 1977-11-21 Toshiba Corp Mask for x-ray exposure
JPS5347663A (en) * 1976-10-12 1978-04-28 Mitsubishi Electric Corp Hall indicator system for elevator
JPS5616137A (en) * 1979-07-17 1981-02-16 Mitsubishi Electric Corp Transfer mask for x-ray exposure

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5279069U (enExample) * 1975-12-09 1977-06-13
JPS52139375A (en) * 1976-05-18 1977-11-21 Toshiba Corp Mask for x-ray exposure
JPS5347663A (en) * 1976-10-12 1978-04-28 Mitsubishi Electric Corp Hall indicator system for elevator
JPS5616137A (en) * 1979-07-17 1981-02-16 Mitsubishi Electric Corp Transfer mask for x-ray exposure

Also Published As

Publication number Publication date
JPH0115136B2 (enExample) 1989-03-15

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