JPH0115136B2 - - Google Patents

Info

Publication number
JPH0115136B2
JPH0115136B2 JP57168187A JP16818782A JPH0115136B2 JP H0115136 B2 JPH0115136 B2 JP H0115136B2 JP 57168187 A JP57168187 A JP 57168187A JP 16818782 A JP16818782 A JP 16818782A JP H0115136 B2 JPH0115136 B2 JP H0115136B2
Authority
JP
Japan
Prior art keywords
absorber
mask
film
pattern
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57168187A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5957433A (ja
Inventor
Hideo Yoshihara
Akira Ozawa
Misao Sekimoto
Toshiro Ono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP57168187A priority Critical patent/JPS5957433A/ja
Publication of JPS5957433A publication Critical patent/JPS5957433A/ja
Publication of JPH0115136B2 publication Critical patent/JPH0115136B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP57168187A 1982-09-27 1982-09-27 Ｘ線マスクの製造方法 Granted JPS5957433A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57168187A JPS5957433A (ja) 1982-09-27 1982-09-27 Ｘ線マスクの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57168187A JPS5957433A (ja) 1982-09-27 1982-09-27 Ｘ線マスクの製造方法

Publications (2)

Publication Number Publication Date
JPS5957433A JPS5957433A (ja) 1984-04-03
JPH0115136B2 true JPH0115136B2 (enExample) 1989-03-15

Family

ID=15863391

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57168187A Granted JPS5957433A (ja) 1982-09-27 1982-09-27 Ｘ線マスクの製造方法

Country Status (1)

Country Link
JP (1) JPS5957433A (enExample)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5279069U (enExample) * 1975-12-09 1977-06-13
JPS52139375A (en) * 1976-05-18 1977-11-21 Toshiba Corp Mask for x-ray exposure
JPS594356B2 (ja) * 1976-10-12 1984-01-28 三菱電機株式会社 エレベ−タの乗場表示装置
JPS5616137A (en) * 1979-07-17 1981-02-16 Mitsubishi Electric Corp Transfer mask for x-ray exposure

Also Published As

Publication number Publication date
JPS5957433A (ja) 1984-04-03

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