JPS5954600A - 感光性樹脂印刷版用複合支持体 - Google Patents

感光性樹脂印刷版用複合支持体

Info

Publication number
JPS5954600A
JPS5954600A JP16410582A JP16410582A JPS5954600A JP S5954600 A JPS5954600 A JP S5954600A JP 16410582 A JP16410582 A JP 16410582A JP 16410582 A JP16410582 A JP 16410582A JP S5954600 A JPS5954600 A JP S5954600A
Authority
JP
Japan
Prior art keywords
photosensitive resin
adhesive layer
support
adhesive
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16410582A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0342197B2 (enrdf_load_stackoverflow
Inventor
Matsuo Yoshida
吉田　松夫
Tadashi Kawamoto
忠志 川本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Asahi Kasei Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd, Asahi Kasei Kogyo KK filed Critical Asahi Chemical Industry Co Ltd
Priority to JP16410582A priority Critical patent/JPS5954600A/ja
Publication of JPS5954600A publication Critical patent/JPS5954600A/ja
Publication of JPH0342197B2 publication Critical patent/JPH0342197B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Plates And Materials Therefor (AREA)
JP16410582A 1982-09-22 1982-09-22 感光性樹脂印刷版用複合支持体 Granted JPS5954600A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16410582A JPS5954600A (ja) 1982-09-22 1982-09-22 感光性樹脂印刷版用複合支持体

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16410582A JPS5954600A (ja) 1982-09-22 1982-09-22 感光性樹脂印刷版用複合支持体

Publications (2)

Publication Number Publication Date
JPS5954600A true JPS5954600A (ja) 1984-03-29
JPH0342197B2 JPH0342197B2 (enrdf_load_stackoverflow) 1991-06-26

Family

ID=15786849

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16410582A Granted JPS5954600A (ja) 1982-09-22 1982-09-22 感光性樹脂印刷版用複合支持体

Country Status (1)

Country Link
JP (1) JPS5954600A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1628158A4 (en) * 2003-05-23 2007-10-24 Asahi Kasei Chemicals Corp LIGHT-SENSITIVE STRUCTURE FOR FLEXOGRAPHIC PRINTING
JP2011197425A (ja) * 2010-03-19 2011-10-06 Tokyo Ohka Kogyo Co Ltd 表面改質材料、レジストパターン形成方法及びパターン形成方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1628158A4 (en) * 2003-05-23 2007-10-24 Asahi Kasei Chemicals Corp LIGHT-SENSITIVE STRUCTURE FOR FLEXOGRAPHIC PRINTING
US7544463B2 (en) 2003-05-23 2009-06-09 Asahi Kasei Chemicals Corporation Photosensitive structure for flexographic printing
JP2011197425A (ja) * 2010-03-19 2011-10-06 Tokyo Ohka Kogyo Co Ltd 表面改質材料、レジストパターン形成方法及びパターン形成方法

Also Published As

Publication number Publication date
JPH0342197B2 (enrdf_load_stackoverflow) 1991-06-26

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