JPS5948040U - heat treatment equipment - Google Patents

heat treatment equipment

Info

Publication number
JPS5948040U
JPS5948040U JP14461382U JP14461382U JPS5948040U JP S5948040 U JPS5948040 U JP S5948040U JP 14461382 U JP14461382 U JP 14461382U JP 14461382 U JP14461382 U JP 14461382U JP S5948040 U JPS5948040 U JP S5948040U
Authority
JP
Japan
Prior art keywords
heat treatment
treatment equipment
heating
sample
heating means
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14461382U
Other languages
Japanese (ja)
Other versions
JPH0234824Y2 (en
Inventor
魚落　泰雄
下田　春夫
Original Assignee
富士通株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 富士通株式会社 filed Critical 富士通株式会社
Priority to JP14461382U priority Critical patent/JPS5948040U/en
Publication of JPS5948040U publication Critical patent/JPS5948040U/en
Application granted granted Critical
Publication of JPH0234824Y2 publication Critical patent/JPH0234824Y2/ja
Granted legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

第１図は従来の熱処理装置を示す構成図、第２図は本考
案の一実施例である熱処理装置を示す構成図、第３図は
本考案の一実施例であるウェハ支持機構を示す平面図で
ある。 図中１１は石英反応室、１２は赤外線ランプ、１３はガ
ス導入口、１４は排気口、１５はキャップ、１６は反射
板、１７はウェハステージ、１８は半導体ウェハ、１９
は赤外線ヒータ、２０はアーム、２１は突起片を示す。Fig. 1 is a block diagram showing a conventional heat treatment apparatus, Fig. 2 is a block diagram showing a heat treatment apparatus which is an embodiment of the present invention, and Fig. 3 is a plan view showing a wafer support mechanism which is an embodiment of the present invention. It is a diagram. In the figure, 11 is a quartz reaction chamber, 12 is an infrared lamp, 13 is a gas inlet, 14 is an exhaust port, 15 is a cap, 16 is a reflector, 17 is a wafer stage, 18 is a semiconductor wafer, 19
20 is an infrared heater, 20 is an arm, and 21 is a protruding piece.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 、　　　　　　赤外線ランプを熱源とし、試料の主表面
を加熱する第１の加熱手段と該試料の周辺部を加熱する
第２の加熱手段を備えたことを特徴とする熱処理装置。A heat treatment apparatus using an infrared lamp as a heat source and comprising a first heating means for heating the main surface of a sample and a second heating means for heating a peripheral part of the sample.
JP14461382U 1982-09-24 1982-09-24 heat treatment equipment Granted JPS5948040U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14461382U JPS5948040U (en) 1982-09-24 1982-09-24 heat treatment equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14461382U JPS5948040U (en) 1982-09-24 1982-09-24 heat treatment equipment

Publications (2)

Publication Number Publication Date
JPS5948040U true JPS5948040U (en) 1984-03-30
JPH0234824Y2 JPH0234824Y2 (en) 1990-09-19

Family

ID=30322437

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14461382U Granted JPS5948040U (en) 1982-09-24 1982-09-24 heat treatment equipment

Country Status (1)

Country Link
JP (1) JPS5948040U (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5565851U (en) * 1978-10-26 1980-05-07

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5565851U (en) * 1978-10-26 1980-05-07

Also Published As

Publication number Publication date
JPH0234824Y2 (en) 1990-09-19

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