JPS5943861A - ル−バ−式化学的蒸着装置 - Google Patents

ル−バ−式化学的蒸着装置

Info

Publication number
JPS5943861A
JPS5943861A JP15269982A JP15269982A JPS5943861A JP S5943861 A JPS5943861 A JP S5943861A JP 15269982 A JP15269982 A JP 15269982A JP 15269982 A JP15269982 A JP 15269982A JP S5943861 A JPS5943861 A JP S5943861A
Authority
JP
Japan
Prior art keywords
gas
substrates
reaction
vapor deposition
chemical vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15269982A
Other languages
English (en)
Japanese (ja)
Other versions
JPS619389B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Chikara Hayashi
林　主税
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Nihon Shinku Gijutsu KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc, Nihon Shinku Gijutsu KK filed Critical Ulvac Inc
Priority to JP15269982A priority Critical patent/JPS5943861A/ja
Publication of JPS5943861A publication Critical patent/JPS5943861A/ja
Publication of JPS619389B2 publication Critical patent/JPS619389B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP15269982A 1982-09-03 1982-09-03 ル−バ−式化学的蒸着装置 Granted JPS5943861A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15269982A JPS5943861A (ja) 1982-09-03 1982-09-03 ル−バ−式化学的蒸着装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15269982A JPS5943861A (ja) 1982-09-03 1982-09-03 ル−バ−式化学的蒸着装置

Publications (2)

Publication Number Publication Date
JPS5943861A true JPS5943861A (ja) 1984-03-12
JPS619389B2 JPS619389B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1986-03-22

Family

ID=15546206

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15269982A Granted JPS5943861A (ja) 1982-09-03 1982-09-03 ル−バ−式化学的蒸着装置

Country Status (1)

Country Link
JP (1) JPS5943861A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1991014798A1 (en) * 1990-03-20 1991-10-03 Diamonex, Incorporated An improved hot filament chemical vapor deposition reactor
US5160544A (en) * 1990-03-20 1992-11-03 Diamonex Incorporated Hot filament chemical vapor deposition reactor
WO1992020464A1 (en) * 1991-05-10 1992-11-26 Celestech, Inc. Method and apparatus for plasma deposition
US5188672A (en) * 1990-06-28 1993-02-23 Applied Materials, Inc. Reduction of particulate contaminants in chemical-vapor-deposition apparatus
US5204144A (en) * 1991-05-10 1993-04-20 Celestech, Inc. Method for plasma deposition on apertured substrates
US5551983A (en) * 1994-11-01 1996-09-03 Celestech, Inc. Method and apparatus for depositing a substance with temperature control
US5679404A (en) * 1995-06-07 1997-10-21 Saint-Gobain/Norton Industrial Ceramics Corporation Method for depositing a substance with temperature control
US6173672B1 (en) 1997-06-06 2001-01-16 Celestech, Inc. Diamond film deposition on substrate arrays
JP2002168530A (ja) * 2000-11-30 2002-06-14 Daiwa House Ind Co Ltd 太陽熱温水器付き屋根パネル及び太陽熱温水器の施工方法
US6406760B1 (en) 1996-06-10 2002-06-18 Celestech, Inc. Diamond film deposition on substrate arrays
DE102008044024A1 (de) * 2008-11-24 2010-05-27 Robert Bosch Gmbh Beschichtungsverfahren sowie Beschichtungsvorrichtung
US20160306088A1 (en) * 2013-12-27 2016-10-20 3M Innovative Properties Company Uniform chemical vapor deposition coating on a 3-diminsional array of uniformly shaped articles
JP2020100877A (ja) * 2018-12-21 2020-07-02 富士ゼロックス株式会社 膜形成装置、および膜形成方法

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5160544A (en) * 1990-03-20 1992-11-03 Diamonex Incorporated Hot filament chemical vapor deposition reactor
WO1991014798A1 (en) * 1990-03-20 1991-10-03 Diamonex, Incorporated An improved hot filament chemical vapor deposition reactor
US5188672A (en) * 1990-06-28 1993-02-23 Applied Materials, Inc. Reduction of particulate contaminants in chemical-vapor-deposition apparatus
US5322567A (en) * 1990-06-28 1994-06-21 Applied Materials, Inc. Particulate reduction baffle with wafer catcher for chemical-vapor-deposition apparatus
US5397596A (en) * 1990-06-28 1995-03-14 Applied Materials, Inc. Method of reducing particulate contaminants in a chemical-vapor-deposition system
EP0969120B1 (en) * 1991-05-10 2003-07-30 Celestech, Inc. Method for plasma deposition
WO1992020464A1 (en) * 1991-05-10 1992-11-26 Celestech, Inc. Method and apparatus for plasma deposition
US5204144A (en) * 1991-05-10 1993-04-20 Celestech, Inc. Method for plasma deposition on apertured substrates
US5435849A (en) * 1991-05-10 1995-07-25 Celestech, Inc. Apparatus for plasma deposition
US5487787A (en) * 1991-05-10 1996-01-30 Celestech, Inc. Apparatus and method for plasma deposition
US5551983A (en) * 1994-11-01 1996-09-03 Celestech, Inc. Method and apparatus for depositing a substance with temperature control
US5683759A (en) * 1994-11-01 1997-11-04 Celestech, Inc. Method for depositing a substance with temperature control
US5679404A (en) * 1995-06-07 1997-10-21 Saint-Gobain/Norton Industrial Ceramics Corporation Method for depositing a substance with temperature control
US6099652A (en) * 1995-06-07 2000-08-08 Saint-Gobain Industrial Ceramics, Inc. Apparatus and method for depositing a substance with temperature control
US6406760B1 (en) 1996-06-10 2002-06-18 Celestech, Inc. Diamond film deposition on substrate arrays
US6173672B1 (en) 1997-06-06 2001-01-16 Celestech, Inc. Diamond film deposition on substrate arrays
JP2002168530A (ja) * 2000-11-30 2002-06-14 Daiwa House Ind Co Ltd 太陽熱温水器付き屋根パネル及び太陽熱温水器の施工方法
DE102008044024A1 (de) * 2008-11-24 2010-05-27 Robert Bosch Gmbh Beschichtungsverfahren sowie Beschichtungsvorrichtung
US20160306088A1 (en) * 2013-12-27 2016-10-20 3M Innovative Properties Company Uniform chemical vapor deposition coating on a 3-diminsional array of uniformly shaped articles
US10739503B2 (en) * 2013-12-27 2020-08-11 3M Innovative Properties Company Uniform chemical vapor deposition coating on a 3-dimensional array of uniformly shaped articles
JP2020100877A (ja) * 2018-12-21 2020-07-02 富士ゼロックス株式会社 膜形成装置、および膜形成方法

Also Published As

Publication number Publication date
JPS619389B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1986-03-22

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