JPS619389B2 - - Google Patents
Info
- Publication number
- JPS619389B2 JPS619389B2 JP15269982A JP15269982A JPS619389B2 JP S619389 B2 JPS619389 B2 JP S619389B2 JP 15269982 A JP15269982 A JP 15269982A JP 15269982 A JP15269982 A JP 15269982A JP S619389 B2 JPS619389 B2 JP S619389B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15269982A JPS5943861A (ja) | 1982-09-03 | 1982-09-03 | ル−バ−式化学的蒸着装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15269982A JPS5943861A (ja) | 1982-09-03 | 1982-09-03 | ル−バ−式化学的蒸着装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5943861A JPS5943861A (ja) | 1984-03-12 |
| JPS619389B2 true JPS619389B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1986-03-22 |
Family
ID=15546206
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15269982A Granted JPS5943861A (ja) | 1982-09-03 | 1982-09-03 | ル−バ−式化学的蒸着装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5943861A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5160544A (en) * | 1990-03-20 | 1992-11-03 | Diamonex Incorporated | Hot filament chemical vapor deposition reactor |
| WO1991014798A1 (en) * | 1990-03-20 | 1991-10-03 | Diamonex, Incorporated | An improved hot filament chemical vapor deposition reactor |
| US5188672A (en) * | 1990-06-28 | 1993-02-23 | Applied Materials, Inc. | Reduction of particulate contaminants in chemical-vapor-deposition apparatus |
| US5204144A (en) * | 1991-05-10 | 1993-04-20 | Celestech, Inc. | Method for plasma deposition on apertured substrates |
| WO1992020464A1 (en) * | 1991-05-10 | 1992-11-26 | Celestech, Inc. | Method and apparatus for plasma deposition |
| US5551983A (en) * | 1994-11-01 | 1996-09-03 | Celestech, Inc. | Method and apparatus for depositing a substance with temperature control |
| US5679404A (en) * | 1995-06-07 | 1997-10-21 | Saint-Gobain/Norton Industrial Ceramics Corporation | Method for depositing a substance with temperature control |
| US6173672B1 (en) | 1997-06-06 | 2001-01-16 | Celestech, Inc. | Diamond film deposition on substrate arrays |
| US6406760B1 (en) | 1996-06-10 | 2002-06-18 | Celestech, Inc. | Diamond film deposition on substrate arrays |
| JP2002168530A (ja) * | 2000-11-30 | 2002-06-14 | Daiwa House Ind Co Ltd | 太陽熱温水器付き屋根パネル及び太陽熱温水器の施工方法 |
| DE102008044024A1 (de) * | 2008-11-24 | 2010-05-27 | Robert Bosch Gmbh | Beschichtungsverfahren sowie Beschichtungsvorrichtung |
| KR20160105431A (ko) * | 2013-12-27 | 2016-09-06 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 3차원 배열의 균일한 형상을 갖는 물체의 균일한 화학 증착 코팅 |
| JP7230494B2 (ja) * | 2018-12-21 | 2023-03-01 | 富士フイルムビジネスイノベーション株式会社 | 膜形成装置、および膜形成方法 |
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1982
- 1982-09-03 JP JP15269982A patent/JPS5943861A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5943861A (ja) | 1984-03-12 |