JPS5940644A - 軟ｘ線転写用マスク及びその製造法 - Google Patents

軟ｘ線転写用マスク及びその製造法

Info

Publication number
JPS5940644A
JPS5940644A JP57151133A JP15113382A JPS5940644A JP S5940644 A JPS5940644 A JP S5940644A JP 57151133 A JP57151133 A JP 57151133A JP 15113382 A JP15113382 A JP 15113382A JP S5940644 A JPS5940644 A JP S5940644A
Authority
JP
Japan
Prior art keywords
film
soft
polyimide
ray
silicon dioxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57151133A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0340935B2 (enrdf_load_stackoverflow
Inventor
Yukio Iimura
飯村　幸夫
Tomihiro Nakada
中田　富紘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP57151133A priority Critical patent/JPS5940644A/ja
Publication of JPS5940644A publication Critical patent/JPS5940644A/ja
Publication of JPH0340935B2 publication Critical patent/JPH0340935B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP57151133A 1982-08-31 1982-08-31 軟ｘ線転写用マスク及びその製造法 Granted JPS5940644A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57151133A JPS5940644A (ja) 1982-08-31 1982-08-31 軟ｘ線転写用マスク及びその製造法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57151133A JPS5940644A (ja) 1982-08-31 1982-08-31 軟ｘ線転写用マスク及びその製造法

Publications (2)

Publication Number Publication Date
JPS5940644A true JPS5940644A (ja) 1984-03-06
JPH0340935B2 JPH0340935B2 (enrdf_load_stackoverflow) 1991-06-20

Family

ID=15512085

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57151133A Granted JPS5940644A (ja) 1982-08-31 1982-08-31 軟ｘ線転写用マスク及びその製造法

Country Status (1)

Country Link
JP (1) JPS5940644A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63283023A (ja) * 1987-05-14 1988-11-18 Oki Electric Ind Co Ltd Ｘ線露光マスク用メンブレンの製造方法
US5178976A (en) * 1990-09-10 1993-01-12 General Electric Company Technique for preparing a photo-mask for imaging three-dimensional objects

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63283023A (ja) * 1987-05-14 1988-11-18 Oki Electric Ind Co Ltd Ｘ線露光マスク用メンブレンの製造方法
US5178976A (en) * 1990-09-10 1993-01-12 General Electric Company Technique for preparing a photo-mask for imaging three-dimensional objects

Also Published As

Publication number Publication date
JPH0340935B2 (enrdf_load_stackoverflow) 1991-06-20

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