JPS594022A - Spin air bearing - Google Patents

Spin air bearing

Info

Publication number
JPS594022A
JPS594022A JP11312882A JP11312882A JPS594022A JP S594022 A JPS594022 A JP S594022A JP 11312882 A JP11312882 A JP 11312882A JP 11312882 A JP11312882 A JP 11312882A JP S594022 A JPS594022 A JP S594022A
Authority
JP
Japan
Prior art keywords
air
mask
spin
jet
bearing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11312882A
Other languages
Japanese (ja)
Inventor
Setsuo Nagashima
長島　節夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP11312882A priority Critical patent/JPS594022A/en
Publication of JPS594022A publication Critical patent/JPS594022A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To execute a spin process of a photo-mask, etc. under a non-contact state by forming an air jet to the circumference of a rotary bearing and ejecting an air jet in the tangential direction of a circle in the rotary bearing used for rotary treatment for the photo-mask, a wafer, etc. CONSTITUTION:The spin air bearing 11 is prepared by a block made of Teflon or vinyl chloride of acid resistance and alkali resistance, and an air intake 14 is formed to the lower section of the block. A horizontal path 15 and a plurality of inclined paths 15a directed in the oblique upward direction from the path 15 are formed to the intake 14, and the air jets 12 or 13 are formed at the noses of the paths. According to such constitution, the mask being forwarded to the bearing 11 is received by air from the jet 13 first, and the mask and a circle drawn by the jet 12 are made concentrical. The jet stream from the jet 13 is stopped, air from the jet 12 is blown off, and the mask is given with revolution while being floated up.

Description

【発明の詳細な説明】 （１）発明の技術分野 本発明は、フォトマスク、ウユハ等のスピンプ１−１セ
ス（回転処理）に用いるスピン（回転）エアヘアリング
に関する。DETAILED DESCRIPTION OF THE INVENTION (1) Technical Field of the Invention The present invention relates to a spin (rotation) air hair ring used for spin processing (rotation processing) of photomasks, uyuha, etc.

（２）技術の背景 ソメトマスク、ウェハ等（マスク等）の処理におい゛（
マスク等を回転さ一υて処理をなすこと（スピンプロセ
ス）が行われ、その例は、ホトレジスト剤のスピンコー
ド　（回・ト１１塗４Ｊ）、現像等であ（１） る。現像の例を第１図を参照して説明すると、円形のフ
ォトマスクｌはステージ２上に載置され、ステージ２は
矢印の示す方向に回転可能である。(2) Background of the technology In the processing of somet masks, wafers, etc. (masks, etc.)
A process (spin process) is performed by rotating a mask or the like, and examples thereof include spin code of photoresist agent (11 coats 4J), development, etc. (1). An example of development will be described with reference to FIG. 1. A circular photomask 1 is placed on a stage 2, and the stage 2 is rotatable in the direction indicated by the arrow.

操作において、前の工程からマスクｌが運ばれてきステ
ージ２−ににおかれると、スピンカップ３が上から図示
の位置に下りζくる。そこでステージ２が回転を始め、
ノズル４から現像液が噴出し、次いで他のノズル５から
洗浄水が噴出する構成となっている。In operation, when the mask l is carried from the previous step and placed on the stage 2-, the spin cup 3 is lowered from above to the position shown. Then stage 2 starts rotating,
The configuration is such that the developer is ejected from the nozzle 4, and then the cleaning water is ejected from the other nozzle 5.

フォトマスク１の搬送をそれの裏面を保鏝する目的で無
接触状態でなすべく、エアヘアリングを用いる搬送が行
われるようになっ°（いる。エアヘアリング搬送におい
ては、）、ｒ　）マスクに下刃からフォトマスクの進行
方向に斜めに空気を吹き付り、フォトマスクを浮いた状
態で前進させるものである。現在、スピンプロセスをな
すとごろまではエアヘアリングを用いてフォトマスクを
搬送し、次いで自動アームを用い゛ζフォトマスクをス
テージ上におき、スピンプじＪセスか終った後に再びア
ームを用いてマスクをステージから次の工程（２） −１移すことか行われている。In order to transport the photomask 1 in a non-contact manner for the purpose of protecting the back surface of the photomask 1, transport using an air hair ring has started to be carried out. The lower blade blows air obliquely in the direction of travel of the photomask, causing the photomask to move forward in a floating state. Currently, the photomask is transported using an air hair ring until the spin process is completed, then an automatic arm is used to place the photomask on the stage, and the arm is used again after the spin process is completed. The mask is transferred from the stage to the next step (2)-1.

（３）従来技術と問題点 −１−記従来技術のスピンプロセスにおいて、マスクは
ステージ上に直に置かれるので、マスク裏面への１１１
供は十分な対策がとられ′Ｃいるにもがかわらず免れえ
ない。マスクはそれを通し−で光を照Ｍ・１シマスク」
二のパターンを相手カマスフまたはウェハ土に投影する
のであるから、裏面の損傷は避りなりればならない。そ
のためには、マスクが無接触状態でスピンして所定の処
理がなされることか望ましい。(3) Prior art and problems -1- In the spin process of the prior art, the mask is placed directly on the stage, so the 111
Although sufficient measures have been taken, children are still not spared. The mask shines light through it.
Since the second pattern is projected onto the opposing surface or wafer soil, damage to the back surface must be avoided. For this purpose, it is desirable that the mask be spun in a non-contact state to perform a predetermined process.

（４）発明の目的 本発明は上記従来の問題点に漏め、フメトマスク〜′・
のスビンプ１」セスを無接触状態で行ないうる装置を提
供することを目的とする。(4) Purpose of the Invention The present invention addresses the above-mentioned conventional problems and provides a fumetomask ~'.
An object of the present invention is to provide a device capable of carrying out a swiping process in a non-contact manner.

（５）発明の構成 そしてこの１」的は本発明によると、物体例えば円形マ
スク等の接線方向に流体を吹き付ける噴射孔を具備した
スピンエアヘアリングを１に供するコトニヨって達成さ
れ、またこのスピンエアヘア（３） リングには円形物体１般送川の空気噴流を作る空気噴出
口を設けることもできる。(5) Structure of the Invention According to the present invention, the object 1 is achieved by providing a spin air hair ring equipped with an injection hole that sprays fluid in the tangential direction of an object such as a circular mask. Spin Air Hair (3) The ring can also be provided with an air jet to create an air jet of the circular object.

（６）発明の実施例 以下、本発明の実施例を図面によって詳述する。(6) Examples of the invention Embodiments of the present invention will be described in detail below with reference to the drawings.

第２図と第３図に本発明にかかるスピンエアベアリング
が平面図と断面図で示され、第２図以下において既に図
示した部分と同し部分は同一符号を以て示す。スピンエ
アヘアリング１１は制酸性、耐アルカリ性のテフロンま
たは塩化ビニール製のブロックからなり、その）部には
空気取入れ口１４が形成され、空気取入れ口１４ば水平
通路１５に通じ、水平通路１５から所定の数の傾斜通路
１５ａが延び、表面において空気噴射口１２または１３
とを形成する。2 and 3 show a spin air bearing according to the present invention in a plan view and a sectional view, and in FIG. 2 and subsequent figures, the same parts as those already illustrated are designated by the same reference numerals. The spin air hair ring 11 is made of a block made of antacid and alkali-resistant Teflon or vinyl chloride, and an air intake port 14 is formed in the ( ) part of the spin air hair ring 11 . A predetermined number of inclined passages 15a extend, and air injection ports 12 or 13 are formed on the surface.
and form.

空気噴射口１２とそれに通し２る伸斜通１洛１５ａは、
スピンプロセスされるべきマスク１　（同図に点線で示
す）がスピンエアべ１リング」−に正しく位置ぎめされ
′Ｃいるとき、マスク１の接線力）ｉ、ｉＪ　１．こ空
気が噴流する如く形成し、空気噴射口１３とそれに通じ
る傾斜通路１５ａは、第２図に見て左から送られ（４） −（きたマスク１を受け、スピン処理が終った後にマス
ク１を図に見てイｉ方向に送り出す如く空気を噴出する
。かかる空気の噴出力向は図に矢印で示す。傾斜通路の
伸きと内径、噴出し１１２．１３の径等は、マスクの大
きさ、重ｔ、ｔ、回転速度等を計算して適宜選定する。The air injection port 12 and the expansion passage 15a passing through it are as follows:
When the mask 1 to be spin-processed (indicated by the dotted line in the figure) is correctly positioned in the spin air ring, the tangential forces of the mask 1) i, iJ 1. The air jet port 13 and the inclined passage 15a leading thereto are formed so that the air flows out from the left side as seen in FIG. The air is ejected so as to be sent in the i direction as shown in the figure.The direction of the ejected air is shown by the arrow in the figure.The length and inner diameter of the inclined passage, the diameter of the ejection 112, 13, etc. are determined depending on the size of the mask. The length, weight t, t, rotation speed, etc. are calculated and selected as appropriate.

例えば１ｌｌｌ當の円形マスクの場合そのｉイは１５０
　ｍｍ、またスピンプロセスのときのマスクの回転は１
００〜２００ｒρｍである。For example, in the case of a 1lll circular mask, its i is 150.
mm, and the rotation of the mask during the spin process is 1
00 to 200 rpm.

マスク１がスピンエアベアリングのところに送られてく
ると、先ず空気噴射し］１３がら空気を噴流してマスク
Ｉを受りる。マスク１と噴出口１２のｐ！ｉｉ　＜円と
が同心となるようマスクＩが位１１コぎめされると、噴
出口１３からの空気噴出を止め、噴出口１２からの空気
の噴出を開始する。噴出ロエ２がらの空気はマスクの接
線力向に噴出するがら、マスク１は持ら上げられた状態
でスピン（回転）Ｊる。When the mask 1 is sent to the spin air bearing, air is first jetted out from the spin air bearing 13, and the mask I is received. Mask 1 and spout 12 p! ii <When the mask I is rotated so that it is concentric with the circle, the air jetting from the jetting port 13 is stopped and the jetting of air from the jetting port 12 is started. While the air from the blowout air 2 blows out in the direction of the tangential force of the mask, the mask 1 spins (rotates) in a lifted state.

スピンブト１セスが終ると、噴出＋１１２からの空気の
噴出を止め、噴出口１３がら空気を噴出してマスクｌを
図に見て右方向に送り出矛。かがる空気噴出の開始と停
［には、空気取入れＬ月４に連結されたハ（５） ルブ（図示−Ｕず）を、上記のプロセスのプＩ」グラム
が入力されたマイクロコンピュータ（図示せず）により
開閉するごとにより実施されうる。When the spin button 1 process is completed, stop blowing out the air from the blowout +112, blow out the air from the blowout nozzle 13, and send the mask l to the right as seen in the diagram. In order to start and stop the air injection, the air intake L (not shown) is connected to the microcomputer (5) connected to the air intake L (not shown) and programmed with the program for the above process. (not shown).

第４図（ａｌに本発明のスピンエアヘアリングを用いる
マスク処理装置の配置が断面図で示され、同図において
１６は送りエアヘアリングを示し、それはマスク１を図
に見て左から右に送る。送りエアへアリング１６はスピ
ンエアヘアリング１１に類似するが、第２図に示される
噴出口１２は設けられず、噴出口１３と同じ噴出口１３
’のみが設けられている。FIG. 4 (al) shows a cross-sectional view of the arrangement of the mask processing apparatus using the spin air hair ring of the present invention. The feed air hair ring 16 is similar to the spin air hair ring 11, but is not provided with the spout 12 shown in FIG.
' is provided.

マスク１が送られて第４図に示す位置にくると、スピン
カップ３が上刃から降下してき−（図示の位置で停止し
、前記した現像、水洗処理が施され、このプロセスが終
るとスピンカップ３は上方に動き、しかる後マスク１１
は右隣の送りエアベアリング１６上へと送られる。第４
図（ｔｅｌは同図６１１のエアヘアリングの平面図で、
図の矢印は空気の噴流方向を示す。When the mask 1 is fed and reaches the position shown in Fig. 4, the spin cup 3 descends from the upper blade and stops at the position shown, and the above-mentioned development and washing processes are performed. Cup 3 moves upwards and then mask 11
is sent onto the feed air bearing 16 on the right. Fourth
The figure (tel is a plan view of the air hair ring in figure 611,
The arrows in the figure indicate the direction of the air jet.

従来の技術によると、エアヘアリングを用いる無接触状
態での搬送は、スピンカップのところく６） で１１月４ｊｉされ、そこで搬送アームが用いられる。According to the prior art, the contactless conveyance using air hair rings is carried out at the spin cup 6), where a conveyor arm is used.

このアームは真空吸着によりマスクを保持し空気圧で動
作する構成をとるが、アームを余りにも急速に動かすと
、真空で吸省保持し７゛（いるマスクが脱落するおそれ
があるから、アームを使ったマスクの移動は緩やかなも
のでなむ」ればならず、時間がかかりすぎる問題があっ
た。本発明のスピンエアーベアリングを用いる第４図に
示すシステムにおいては、無接触搬送の中ｗｉなしにス
ピンプロセスを実施しつる利点が生しるものである。This arm holds the mask using vacuum suction and operates using air pressure. However, if you move the arm too quickly, the vacuum will absorb and hold the mask and the mask may fall off. There was a problem in that the movement of the mask had to be done slowly, which took too much time.In the system shown in Fig. 4, which uses the spin air bearing of the present invention, it is possible to transfer the mask without contact during contactless transfer. This is an advantage of performing a spin process.

（７）発明の効果 以」二、詳細に説明したように、本発明のスピンエアヘ
アリングを用いると、マスク等の無接触状態でのスピン
プロセスが可能となり、しかも、それはエアヘアリング
を用いる１般送システムと中断なく連結されうるので、
半導体装置の製造歩留りと製品の信頼性向上に効果大で
ある。なお以上の説明においてはマスクを例にとったが
、本発明の適用範囲はその場合に限られるものでなく、
円板状のその他の物体の回転の場合にも及ぶもので（７
） ある。(7) Effects of the Invention As explained in detail in Section 2, by using the spin air hair ring of the present invention, it is possible to perform a spin process without contacting a mask, etc. 1 can be connected without interruption to the general delivery system,
This is highly effective in improving semiconductor device manufacturing yield and product reliability. Although the above explanation uses a mask as an example, the scope of application of the present invention is not limited to that case.
This also applies to the rotation of other disc-shaped objects (7
) be.

【図面の簡単な説明】[Brief explanation of the drawing]

第１図はスピンプロセスに用いる装置の断面図、第２図
と第３図はそれぞれ本発明のスピンエアベアリングの平
面図と…ｎｆＤ図、第４図（ａｌは本発明のスピンエア
ヘアリングを用いるシステムの断面図、同図（ｂｌは同
図（ａｌのエアヘアリングの平面図である。 ■−マスク、２−ステージ、３−スピンカップ、４　＋
　５−ノズル、１１−スピンエアヘアリング、１２．１
３．１３　’−空気噴出口、１４−空気取入れ口、１５
−水平空気通路、１５ａ−７ｑ斜空気１１１１１８、Ｉ
６−エアベアリング（８） 第１図 ２１２ 第３図 １２）３ ／／′ 第４図 （ａ） （ｂ）Figure 1 is a cross-sectional view of the device used in the spin process, Figures 2 and 3 are a plan view of the spin air bearing of the present invention,...nfD diagram, and Figure 4 (al represents the spin air hair ring of the present invention). Cross-sectional view of the system used, same figure (bl is a plan view of the air hair ring in the same figure (al). ■-Mask, 2-stage, 3-spin cup, 4+
5-Nozzle, 11-Spin air hair ring, 12.1
3.13'-air outlet, 14-air intake, 15
- horizontal air passage, 15a-7q oblique air 111118, I
6-Air bearing (8) Fig. 1 212 Fig. 3 12) 3 //' Fig. 4 (a) (b)

Claims (1)

【特許請求の範囲】[Claims] 空気の噴出１」が少なくとも１つの円周に沿っ−Ｃ配置
され、かかる噴出１０から噴出される空気の噴流は、前
記円の接線方向に噴出されて前記円と同心に噴出Ｉ」の
上方に配置されノこ物体を持ち上げられた状態で回転す
ることを特徴とするスピンエアへ゛ｊ′リング。Air jets 1'' are arranged along at least one circumference -C, and the jets of air emitted from such jets 10 are ejected tangentially to said circle and concentrically above said circle. A spin air ``j'' ring characterized in that it rotates while the saw object is placed in a lifted state.
JP11312882A 1982-06-30 1982-06-30 Spin air bearing Pending JPS594022A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11312882A JPS594022A (en) 1982-06-30 1982-06-30 Spin air bearing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11312882A JPS594022A (en) 1982-06-30 1982-06-30 Spin air bearing

Publications (1)

Publication Number Publication Date
JPS594022A true JPS594022A (en) 1984-01-10

Family

ID=14604244

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11312882A Pending JPS594022A (en) 1982-06-30 1982-06-30 Spin air bearing

Country Status (1)

Country Link
JP (1) JPS594022A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5518360A (en) * 1990-11-16 1996-05-21 Kabushiki-Kaisha Watanabe Shoko Wafer carrying device and wafer carrying method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5518360A (en) * 1990-11-16 1996-05-21 Kabushiki-Kaisha Watanabe Shoko Wafer carrying device and wafer carrying method
US5921744A (en) * 1990-11-16 1999-07-13 Kabushiki-Kaisha Watanabe Shoko Wafer carrying device and wafer carrying method

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