JPS5935456A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS5935456A
JPS5935456A JP57145668A JP14566882A JPS5935456A JP S5935456 A JPS5935456 A JP S5935456A JP 57145668 A JP57145668 A JP 57145668A JP 14566882 A JP14566882 A JP 14566882A JP S5935456 A JPS5935456 A JP S5935456A
Authority
JP
Japan
Prior art keywords
elements
vessel
terminals
input
output
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57145668A
Other languages
Japanese (ja)
Inventor
Isamu Nagameguri
長廻 勇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP57145668A priority Critical patent/JPS5935456A/en
Publication of JPS5935456A publication Critical patent/JPS5935456A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/07Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L29/00
    • H01L25/072Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L29/00 the devices being arranged next to each other
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4911Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain
    • H01L2224/49113Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain the connectors connecting different bonding areas on the semiconductor or solid-state body to a common bonding area outside the body, e.g. converging wires
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • H01L2224/49175Parallel arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Thyristors (AREA)

Abstract

PURPOSE:To eliminte instability in the case when the device is operated in parallel by making at least one terminals independent at every semiconductor element and connecting these terminals by a resistor when a plurality of the elements are encased in one vessel and electrode terminals connected to each input and output electrode are drawn outside the vessel. CONSTITUTION:A vessel 1 is constituted by a metallic base 1a and an insulator frame body 1b, two same transistor elements 4 are encased in the element encasing section of the vessel, a bonding metallic film 6a connected in common to drain electrodes as the output sides of the two elements 4 is formed to the upper surface of the frame body 1b, and a common electrode terminal 3 for external drawing is fitted to the film 6a. On the other hand, bonding films 6G made independent at every element 4 are formed on the gate electrode sides as input sides, gate electrode terminals 2 are made independent at every element 4 from the films 6G and drawn to the outside, and a resistance film 7 is connected between these terminals. Accordingly, a plurality of the elements are encased in the same vessel in order to increased as output from the device, and unstable elements in the case when the elements are operated in parallel are removed.

Description

【発明の詳細な説明】 本発明は半導体装置、特に超高周波帯に有効なトランジ
スタ装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a semiconductor device, and particularly to a transistor device that is effective in ultra-high frequency bands.

近年、半導体装置はその高出力化を図るため、複数個の
半導体素子、又は複数個のセルを有する半導体素子を同
一容器内に収容し、並列動作によシ出力電力を増してい
る。
In recent years, in order to increase the output power of semiconductor devices, a plurality of semiconductor elements or a semiconductor element having a plurality of cells are housed in the same container, and the output power is increased by parallel operation.

第1図(a)は従来の電界効果トランジスタの平面図、
同図(b)は図(&)のA−A断面図である。第1図(
a) 、 (b)において、1&はメタルペースで、容
器底面とソース電極端子を兼ねる。2はゲート引き出し
電極端子、3はドレイン引き出し電極端子を示す。4は
半導体素子、5は半導体素子と外部引き出し電極端子と
を接続するための金員細線を示す。
FIG. 1(a) is a plan view of a conventional field effect transistor.
Figure (b) is a sectional view taken along line AA in figure (&). Figure 1 (
In a) and (b), 1 & is a metal paste, which also serves as the bottom surface of the container and the source electrode terminal. 2 indicates a gate lead-out electrode terminal, and 3 indicates a drain lead-out electrode terminal. Reference numeral 4 indicates a semiconductor element, and reference numeral 5 indicates a thin metal wire for connecting the semiconductor element and an external lead-out electrode terminal.

こうした半導体装vtt−ソース電極端子11’に接地
して使用する場合、2個の半導体素子4,4への入力電
極端子2からの長い距陥、インピーダンスの不整合など
で出力電力が1個の場合の2倍は得られないばかシか、
場合によっては不安定性をおこす。
When using such a semiconductor device by grounding it to the vtt-source electrode terminal 11', the output power of one semiconductor device may be low due to a long distance from the input electrode terminal 2 to the two semiconductor devices 4, 4, impedance mismatch, etc. Are you an idiot who can't get twice as much as you would?
In some cases, this may cause instability.

本発明の目的は、従来栴造のもつ不安定要素をなくした
半導体装置を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a semiconductor device that eliminates the unstable elements that conventional SEIZO has.

本発明の半導体装置は、入力電極と出力電極とをもった
複数個の半導体素子と、該半導体素子を収容する容器と
、前記半導体素子の電極を前記容器外に導出する電極端
子とを有し、前記入力または出力電極端子のうちの少く
とも一方の側の電極端子は素子毎に独立に容器外に導出
され、かつ前記電極端子間には抵抗が設けられている構
成を有する。
A semiconductor device of the present invention includes a plurality of semiconductor elements having input electrodes and output electrodes, a container that houses the semiconductor elements, and an electrode terminal that leads the electrodes of the semiconductor elements out of the container. , at least one side of the input or output electrode terminals is led out of the container independently for each element, and a resistor is provided between the electrode terminals.

つぎに本発明全実施例により説明する。Next, all embodiments of the present invention will be explained.

第2図は本発明の一実施例の平面図である。第2図にお
いて、メタルペース1&と絶縁物枠体1bとで形成され
た容器1の素子収容部には2個の同じトランジスタ素子
4,4が収納され、容器10枠体1bの上面には、出力
電極側、すなわち、ドレイン電極側のボンディング金属
膜6dが設けられ、金属膜6dには二つの素子4.4の
ドレイン電極と共通に接続され、さらに共通の電極端子
3が外部に引き出されている。一方、入力電極側、すな
わち、ゲート電極側では、素子4,4に独立に接続され
るボンディング金属膜6G、6Gがあり、金属膜6G、
6Gからゲート電極端子2.2が素子毎に独立に外部へ
引き出されている。また、金属膜6G、6Gの間は抵抗
膜7により接続されている。
FIG. 2 is a plan view of one embodiment of the present invention. In FIG. 2, two identical transistor elements 4, 4 are housed in the element accommodating portion of a container 1 formed of a metal paste 1& and an insulating frame 1b, and on the upper surface of the container 10 frame 1b, A bonding metal film 6d on the output electrode side, that is, the drain electrode side, is provided, and the metal film 6d is commonly connected to the drain electrodes of the two elements 4.4, and a common electrode terminal 3 is drawn out to the outside. There is. On the other hand, on the input electrode side, that is, on the gate electrode side, there are bonding metal films 6G, 6G independently connected to the elements 4, 4;
Gate electrode terminals 2.2 are independently drawn out from 6G for each element. Further, the metal films 6G and 6G are connected by a resistive film 7.

第3図は第2図の本発明の半導体装vを実際の回路に適
用した状態の平面図である。第3図において、8と9は
それぞれマイクロストリップライン構成の入力回路部お
よび出力回路部であり、10は第2図に示す半導体装置
である。第3図において、入力信号電力は入力回路部8
のストリップラインに入力され、Y形分岐線路七通して
2分され、2個の半導体素子に独立に入力される。
FIG. 3 is a plan view of the semiconductor device v of the present invention shown in FIG. 2 applied to an actual circuit. In FIG. 3, 8 and 9 are an input circuit section and an output circuit section, respectively, each having a microstrip line configuration, and 10 is a semiconductor device shown in FIG. 2. In FIG. 3, the input signal power is input to the input circuit section 8.
The signal is input to the strip line, divided into two by seven Y-shaped branch lines, and input independently to two semiconductor devices.

今仮に、2つの半導体素子の入力インピーダンスの違い
があると、反射係数が違って入力端で両方の線路間に電
位差を生じてくる。この電位差は容器内に接続された抵
抗の両端に加わり、抵抗に電流が流れ、両線路の電位差
を低下させる。このため、半導体素子間のアンバランス
による不安定性は解消できる。この場合、分岐線路長は
1/4波長位は必要である。また、個々の分岐線上にイ
ンピーダンス整合回路を設けることもできる。
Now, if there is a difference in the input impedance of the two semiconductor elements, the reflection coefficients will be different and a potential difference will occur between both lines at the input end. This potential difference is applied across a resistor connected inside the container, causing current to flow through the resistor and reducing the potential difference between both lines. Therefore, instability caused by imbalance between semiconductor elements can be eliminated. In this case, the branch line length needs to be about 1/4 wavelength. Moreover, an impedance matching circuit can also be provided on each branch line.

本発明は、高周波高出力半導体装置に対して特に有効で
ある。上記実施例ではソース接地型、電界効果型トラン
ジスタに応用した場合について述べたが、他の接地方式
にも、バイポーラトランジスタにも応用できる。分岐数
も素子数あるいはセル数によって増加させることができ
る。抵抗値は、高周波ロスと安定性とのかね合いにより
決定されるが、入力インピーダンスのリプル成分の2倍
〜10倍が望ましい。
The present invention is particularly effective for high frequency, high power semiconductor devices. In the above embodiment, the case where the present invention is applied to a source grounded type and field effect type transistor has been described, but it can also be applied to other grounded types and bipolar transistors. The number of branches can also be increased by changing the number of elements or cells. The resistance value is determined by the trade-off between high frequency loss and stability, but is preferably 2 to 10 times the ripple component of the input impedance.

【図面の簡単な説明】[Brief explanation of drawings]

第1図(a)は従来の半導体装置の平面図、同図(b)
は図(&)のA−A断面図、第2図は本発明の一実施例
の平面図、第3図は本発明の半導体装置?実際に使用す
る場合の使用例を示す平面図である。 1・・・・・・容器、1a・・・・・・メタルベース、
1b・・・・・・枠体、2・・・・・・ゲート電極端子
、3・・・・・・ドレイン電極端子、4・・・・・・半
導体素子、5・・・・・・金属細線、6d・・・・・・
ドレイン側金属膜、6G・・・・・・ゲート側金属膜、
7・・・・・・抵抗、8・・・・・・入力回路部、9・
・・・・・出力¥3Ilii]
FIG. 1(a) is a plan view of a conventional semiconductor device, and FIG. 1(b) is a plan view of a conventional semiconductor device.
2 is a plan view of an embodiment of the present invention, and FIG. 3 is a semiconductor device of the present invention. FIG. 3 is a plan view showing an example of actual use. 1...Container, 1a...Metal base,
1b... Frame body, 2... Gate electrode terminal, 3... Drain electrode terminal, 4... Semiconductor element, 5... Metal Thin line, 6d...
Drain side metal film, 6G...Gate side metal film,
7...Resistor, 8...Input circuit section, 9.
・・・・・・Output ¥3Ilii]

Claims (1)

【特許請求の範囲】[Claims] 入力電極と出力電極とを有する複数の半導体素子と、こ
れら半導体素子を共に収容する容器と、前記入力電極お
よび出力電極にそれぞれ接続されて前記容器外に導出さ
れた複数の電極端子と全備え、これら電極端子のうちの
前記入力電極側または出力電極側の少くとも一方の電極
端子は各素子毎に独立であって、かつ、この独立電極端
子間は抵抗体により接続されていることを特徴とする半
導体装置。
Completely equipped with a plurality of semiconductor elements having input electrodes and output electrodes, a container housing these semiconductor elements together, and a plurality of electrode terminals connected to the input electrodes and output electrodes respectively and led out of the container, Among these electrode terminals, at least one electrode terminal on the input electrode side or the output electrode side is independent for each element, and the independent electrode terminals are connected by a resistor. semiconductor devices.
JP57145668A 1982-08-23 1982-08-23 Semiconductor device Pending JPS5935456A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57145668A JPS5935456A (en) 1982-08-23 1982-08-23 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57145668A JPS5935456A (en) 1982-08-23 1982-08-23 Semiconductor device

Publications (1)

Publication Number Publication Date
JPS5935456A true JPS5935456A (en) 1984-02-27

Family

ID=15390318

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57145668A Pending JPS5935456A (en) 1982-08-23 1982-08-23 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS5935456A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4639760A (en) * 1986-01-21 1987-01-27 Motorola, Inc. High power RF transistor assembly

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51111066A (en) * 1975-03-26 1976-10-01 Nec Corp High-output semiconductor device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51111066A (en) * 1975-03-26 1976-10-01 Nec Corp High-output semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4639760A (en) * 1986-01-21 1987-01-27 Motorola, Inc. High power RF transistor assembly

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