JPS5927587A - 磁気抵抗素子用磁性薄膜の製造方法 - Google Patents
磁気抵抗素子用磁性薄膜の製造方法Info
- Publication number
- JPS5927587A JPS5927587A JP57135650A JP13565082A JPS5927587A JP S5927587 A JPS5927587 A JP S5927587A JP 57135650 A JP57135650 A JP 57135650A JP 13565082 A JP13565082 A JP 13565082A JP S5927587 A JPS5927587 A JP S5927587A
- Authority
- JP
- Japan
- Prior art keywords
- film
- thin film
- effect
- vacuum
- annealing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/01—Manufacture or treatment
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Hall/Mr Elements (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57135650A JPS5927587A (ja) | 1982-08-05 | 1982-08-05 | 磁気抵抗素子用磁性薄膜の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57135650A JPS5927587A (ja) | 1982-08-05 | 1982-08-05 | 磁気抵抗素子用磁性薄膜の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5927587A true JPS5927587A (ja) | 1984-02-14 |
JPS6412112B2 JPS6412112B2 (enrdf_load_stackoverflow) | 1989-02-28 |
Family
ID=15156748
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57135650A Granted JPS5927587A (ja) | 1982-08-05 | 1982-08-05 | 磁気抵抗素子用磁性薄膜の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5927587A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61144893A (ja) * | 1984-12-18 | 1986-07-02 | Aichi Tokei Denki Co Ltd | 磁気抵抗素子 |
JPH0223680A (ja) * | 1988-07-12 | 1990-01-25 | Nec Corp | 磁気抵抗効果薄膜およびその製造方法 |
DE19941046C1 (de) * | 1999-08-28 | 2001-01-11 | Bosch Gmbh Robert | Magnetisch sensitive Schichtanordnung mit GMR-Effekt und Verfahren zu deren Herstellung |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58135688A (ja) * | 1982-02-08 | 1983-08-12 | Nippon Denso Co Ltd | 磁気抵抗素子の製造方法 |
-
1982
- 1982-08-05 JP JP57135650A patent/JPS5927587A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58135688A (ja) * | 1982-02-08 | 1983-08-12 | Nippon Denso Co Ltd | 磁気抵抗素子の製造方法 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61144893A (ja) * | 1984-12-18 | 1986-07-02 | Aichi Tokei Denki Co Ltd | 磁気抵抗素子 |
JPH0223680A (ja) * | 1988-07-12 | 1990-01-25 | Nec Corp | 磁気抵抗効果薄膜およびその製造方法 |
DE19941046C1 (de) * | 1999-08-28 | 2001-01-11 | Bosch Gmbh Robert | Magnetisch sensitive Schichtanordnung mit GMR-Effekt und Verfahren zu deren Herstellung |
Also Published As
Publication number | Publication date |
---|---|
JPS6412112B2 (enrdf_load_stackoverflow) | 1989-02-28 |
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