JPS59228751A - Semiconductor integrated circuit - Google Patents
Semiconductor integrated circuitInfo
- Publication number
- JPS59228751A JPS59228751A JP10326283A JP10326283A JPS59228751A JP S59228751 A JPS59228751 A JP S59228751A JP 10326283 A JP10326283 A JP 10326283A JP 10326283 A JP10326283 A JP 10326283A JP S59228751 A JPS59228751 A JP S59228751A
- Authority
- JP
- Japan
- Prior art keywords
- input
- layer
- integrated circuit
- circuit
- protection circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
- H01L27/0288—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using passive elements as protective elements, e.g. resistors, capacitors, inductors, spark-gaps
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、外部入力ハンドから入る静也気全カントする
入力保護回路′+CMする千8メ体集債回路に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an input protection circuit which silently and totally cants input from an external input hand.
従来の入力保護回路゛r用いた半導体集積回路を第1図
、第2図を用いて説明する。A semiconductor integrated circuit using a conventional input protection circuit will be explained with reference to FIGS. 1 and 2.
一般に、半導体集積回路は、外部人カバンドア1−ら入
る大きな静磁気VC、Cり破壊されるように第1図の如
く実際に外部からの信号を処理する集積回路領域2と入
力Vin が入る外部人力バンドとのfMJ K入力
保護回路工が設けられている。第1図の 。In general, a semiconductor integrated circuit is divided into an integrated circuit area 2 that actually processes signals from the outside, and an external area where an input Vin enters, as shown in FIG. A fMJK input protection circuit with a human power band is provided. In Figure 1.
実施例の場合、入力保護回路を介することに文って、信
号処理集積回路領域2のゲート電圧VGに大きな砲圧が
印加されてないようになっている。In the case of the embodiment, a large gun pressure is not applied to the gate voltage VG of the signal processing integrated circuit region 2 because it is passed through the input protection circuit.
例えば、従来用いられている入力保護回路は、第2図の
ようなものでめる。拡散抵抗6及びZを直列に結び、フ
ラングダイオード8を設けである。For example, a conventionally used input protection circuit is shown in FIG. The diffused resistor 6 and Z are connected in series, and a flang diode 8 is provided.
拡散抵抗6及び7は基板との間に実効的なりランプダイ
オード6′及び7′を形成する。このような第2図に示
しだ入力保護回路は、原理的にダイオードの整流作用と
逆方向ブレイクダウン車圧を利用しているために、信号
処理集積回路領域2の入力端子がりる程度静電耐圧に幻
して強い場合は有効でめった。例えば、MO8型集槓回
路のゲート入力保護回路の場合、ケート敗化模厚が50
0A以上と厚く、W¥耐圧がSOV以上と大1きな場合
は有効であった。しかし、最近、集積回路の高集積化に
ともない、ゲートi化膜の薄膜化、接合耐圧の低取圧化
が進みつつある。The diffused resistors 6 and 7 effectively form lamp diodes 6' and 7' with the substrate. The input protection circuit shown in FIG. 2 uses the rectification effect of the diode and the reverse breakdown vehicle pressure in principle, so the input terminal of the signal processing integrated circuit area 2 is exposed to static electricity. It is rarely effective if it is strong enough to withstand pressure. For example, in the case of the gate input protection circuit of an MO8 type concentrator circuit, the gate failure simulation thickness is 50.
It was effective when it was thick, at 0A or more, and the W\ breakdown voltage was large, at SOV or more. However, recently, with the increase in the degree of integration of integrated circuits, the gate i-oxide film is becoming thinner and the junction breakdown voltage is becoming lower.
即ち、信号処理集積回路の静屯耐圧の低峨圧化が進んで
いるために、従来の入力保護回路では光分に信号処理集
積回路を保護できず、靜諷耐圧による集積回路の破壊が
時々生ずるようKなってきている。In other words, as the static withstand voltage of signal processing integrated circuits is becoming lower, conventional input protection circuits are unable to protect signal processing integrated circuits from light, and integrated circuits are sometimes destroyed due to the static withstand voltage. K is becoming more and more likely to occur.
本発明は、上記のような従来の集積回路の欠点を克服す
るためにな式れたものであり、新規な入力保護(ロ)路
を用いることにより静屯側圧尺対して強い半導体集積回
路を与えるものである。The present invention was developed to overcome the drawbacks of conventional integrated circuits as described above, and by using a novel input protection circuit, it is possible to create a semiconductor integrated circuit that is resistant to static pressure. It is something to give.
本発明の半導体集積回路を第6,7粘4.第5図を用い
て説明する。The semiconductor integrated circuit of the present invention is applied to the sixth and seventh adhesives 4. This will be explained using FIG.
第5図は、本発明の半導体集積回路に用いられる人力保
護回路部分の半導体領域の断面図である。FIG. 5 is a sectional view of the semiconductor region of the human power protection circuit used in the semiconductor integrated circuit of the present invention.
外部信号は、へカッ・ンドから入力保護回路の入力端子
16拡散狽域11fr:介して出力端子14へ伝わり、
信号処理集積回路部分へ伝わる。第6図に示した人力保
護回路について説明する。例とじて14型の半導体基板
の場合につい1説明する。N型半導体基板10の甲にP
型の拡散)曽11を設け、P型拡散層11の中にN型拡
散層口を設ける。人力保護回路の入力・出力端子はN型
拡散層120両側に各々オーム接触できるようなP型拡
散増15.14により設けられている。N型拡散層12
の電位は、一般的には半導体基板10と同電位になって
いる。拡散層15は半導体基板10の電極である。The external signal is transmitted from the input protection circuit to the output terminal 14 via the input terminal 16 diffusion region 11fr:
It is transmitted to the signal processing integrated circuit section. The human power protection circuit shown in FIG. 6 will be explained. As an example, a case of a 14-inch semiconductor substrate will be explained. P on the back of the N-type semiconductor substrate 10
(type diffusion) 11 is provided, and an N-type diffusion layer opening is provided in the P-type diffusion layer 11. The input/output terminals of the human power protection circuit are provided by P-type diffusion layers 15 and 14 that can make ohmic contact with both sides of the N-type diffusion layer 120, respectively. N-type diffusion layer 12
The potential is generally the same as that of the semiconductor substrate 10. Diffusion layer 15 is an electrode of semiconductor substrate 10 .
本発明の人力保護回路の原理を説明する。The principle of the human power protection circuit of the present invention will be explained.
まず、入力電圧ViN が小さな値の場合、信号は拡
散層11を介して出力端子14に伝わる。入力重圧Vi
N が大きくなると、P型拡散層11に半導体基板1
0内かN型半鳩体基板口との間に大きな逆バイアスか加
わり空乏層が第6図破線のように広がる。その結果、入
力端子16と出力端子140間の拡散層11のインピー
ダンスは大きくなり出力端子14に伝わる電圧は飽和し
てしまう。First, when the input voltage ViN is a small value, the signal is transmitted to the output terminal 14 via the diffusion layer 11. Input pressure Vi
When N becomes large, the semiconductor substrate 1 is placed in the P-type diffusion layer 11.
A large reverse bias is applied between the 0 and the N-type semicircular substrate opening, and the depletion layer expands as shown by the broken line in FIG. As a result, the impedance of the diffusion layer 11 between the input terminal 16 and the output terminal 140 increases, and the voltage transmitted to the output terminal 14 becomes saturated.
第4図は、第6図の人力保護回路の入力電圧に対する出
力磁圧を描い/Cグラフである。紀4図に示した如く、
入力重圧ViN がvotて1つても、入力保護回路
の出力磁圧VOutはVmay以上にならない。即ち、
入力1呆護回路の最犬山力嘔圧Vmayを、その後に接
続する信号処理集積回路の静電耐圧工υ小ざな蝕に制御
ずhは、入力保護回路の静菟耐圧まで破渥しない集積回
路か得られる。入力保護回路の最大出力屯圧Vmayは
、次のバラメーメによって制御できる。FIG. 4 is a /C graph depicting the output magnetic pressure with respect to the input voltage of the human power protection circuit shown in FIG. As shown in Figure 4,
Even if the input pressure ViN is 1, the output magnetic pressure VOut of the input protection circuit will not exceed Vmay. That is,
The maximum inuyama force vomiting pressure Vmay of the input 1 protection circuit is controlled by the electrostatic withstand voltage υ of the signal processing integrated circuit connected after it. or can be obtained. The maximum output pressure Vmay of the input protection circuit can be controlled by the following parameters.
■ 拡散ノ臼11の深さ くわ 拡散層11の濃度 ■ 拡散層12の深さ ■ 拡散層12の濃度 ■ 拡散層12の形状 ■ 入力保護回路以後のインピーダンス。■ Depth of diffusion mortar 11 Hoe Concentration of diffusion layer 11 ■ Depth of diffusion layer 12 ■ Concentration of diffusion layer 12 ■ Shape of diffusion layer 12 ■ Impedance after the input protection circuit.
例えば、Vmay f小さくしようとすれば、拡散j曽
12をj朶くし、拡散層11を浅くすればよい。For example, in order to reduce Vmay f, the diffusion layer 12 can be made shallower by making the diffusion layer 11 shallower.
また、入力保護回路以後のインピーダンスを小さくすれ
ばVmayは小さくできる。V瓦ayを5Vに制御ずn
ば、100Aの薄い改化・英を用いたMO8集積回路も
保護できる。Further, Vmay can be reduced by reducing the impedance after the input protection circuit. V ay is not controlled to 5V.
For example, a 100A thin MO8 integrated circuit using modified English can be protected.
本発明の具体的な実施例を第5図に示す。、実際の信号
処理集積回路領域26と、第3図に示した入力保護回路
21と、入力保護回路21を保護する保護回路20を山
列に接続ブる。入力保護回路を保護する保護回路20は
従来使用されている第2図のような保護回路でよい、。A specific embodiment of the present invention is shown in FIG. , the actual signal processing integrated circuit area 26, the input protection circuit 21 shown in FIG. 3, and the protection circuit 20 for protecting the input protection circuit 21 are connected in a series. The protection circuit 20 for protecting the input protection circuit may be a conventional protection circuit as shown in FIG.
また、入力保設奮必要とする信号処理集積回路26の入
力端子と基板(他の電極でもよい)との間に抵抗22を
挿入することにより出力インピーダンスを下げれば、タ
1部入力端子に大きな重圧が印加されても屯流工は第5
図のように抵抗を介して流れるため、信号処理集積回路
26は大きな静電気から守られている。Furthermore, if the output impedance is lowered by inserting the resistor 22 between the input terminal of the signal processing integrated circuit 26 that requires input maintenance and the substrate (another electrode may be used), it is possible to Even when heavy pressure is applied, the tonryu works will remain in the 5th position.
Since the current flows through the resistor as shown in the figure, the signal processing integrated circuit 26 is protected from large static electricity.
本発明において、新規に提案した図6の1呆内回路の一
部は、逆導電型の構造でもN6の保護作用があることは
言う壕でもない。In the present invention, it is no secret that a part of the newly proposed circuit in the first half of FIG. 6 has a reverse conductivity type structure and has a protective effect of N6.
以上、今までの説明から明らかなように、外部信号入力
ハンドと入力保護の必要な信号処理集積回路との囲に従
来の保護回路の他に94なる拡散層で挾まれた抵抗を介
することにより、従来の珠護−回路では不可能でめった
非常に弱い集積回路(例えばゲート暖化kJ?−が20
0ス以下のMO8集積回路、PN 接合を用いた集積
回路6tC)の床穫が可能になった。従って、本発明の
保護N路全FIJいめことにより、高集積度が集積回路
が実現できAs is clear from the above explanation, in addition to the conventional protection circuit, a resistor 94 sandwiched between the diffusion layer and the external signal input hand and the signal processing integrated circuit that requires input protection is used. , very weak integrated circuits (e.g. gate warming kJ?- which is not possible with conventional protection circuits)
It has become possible to produce MO8 integrated circuits with less than 0 bus and integrated circuits (6tC) using PN junctions. Therefore, by protecting the entire FIJ of the present invention, it is possible to realize an integrated circuit with a high degree of integration.
第1図は床繊回路−と設けた集積回路図、第2図は従来
の保−(回路図、第6図は本発明の保護回路に用いる電
圧すミンタ素子の内1面1乞、第4図は第5図の磁圧リ
ミッタ糸十の重圧リミンタ特注図、第5図は本発明の集
積回路の笑施例の回路図である。
1・・・・・・保護回路、
2・・・・・・信号処理集積回路頭載、6.4・・・・
・・MOSトランジスタ、6.7・・・・・・抵抗、
6’ 7’ 8 ・・・ターイオード、10・
・・・・・基板、 11・・・・・・P−Wel
112.15・・・・・・N 拡散層41.5.14・
・・P 拡散層、16.17 ・・・空乏層、
20・・・・・・従来の保護回路、22・、・・・・M
(抗。
以 上
出願人 株式会社 第二精玉舎
代理人 弁理士 最 −ヒ 務
第1図
第2図
第・1図
第5図Fig. 1 is a diagram of an integrated circuit provided with a floor fiber circuit, Fig. 2 is a circuit diagram of a conventional protection circuit, and Fig. 6 is a diagram of a voltage summation element used in the protection circuit of the present invention. Fig. 4 is a custom-made diagram of the magnetic pressure limiter of Fig. 5, and Fig. 5 is a circuit diagram of an embodiment of the integrated circuit of the present invention. 1...Protection circuit, 2... ...Signal processing integrated circuit head, 6.4...
・・MOS transistor, 6.7・・・・Resistance,
6'7' 8... Teriode, 10.
...Substrate, 11...P-Wel
112.15...N Diffusion layer 41.5.14.
...P diffusion layer, 16.17 ... depletion layer, 20 ... conventional protection circuit, 22., ...M
(Against the above. Applicant: Daini Seidokusha Co., Ltd. Agent Patent Attorney: Figure 1, Figure 2, Figure 1, Figure 5)
Claims (1)
れる第1導電型と道導覗型の第1の拡散層と、前記拡散
層内に設けた入出力端子と、前記第1の拡散層内に設け
られ又前記入力端子と前記出力端子間に流オLる屯流を
リミットする第2の1広敷層とから構成烙れる入力保護
回路を外部信号人力バンドの次段回路に接続したことを
特徴とする半導体集積回路。a semiconductor substrate of a first conductivity type; a first diffusion layer of a first conductivity type and a conductive type provided within the semiconductor substrate; an input/output terminal provided within the diffusion layer; An input protection circuit is connected to the next stage circuit of the external signal power band, and the input protection circuit is provided within the layer and includes a second wide layer that limits the tidal current flowing between the input terminal and the output terminal. A semiconductor integrated circuit characterized by:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10326283A JPS59228751A (en) | 1983-06-09 | 1983-06-09 | Semiconductor integrated circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10326283A JPS59228751A (en) | 1983-06-09 | 1983-06-09 | Semiconductor integrated circuit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS59228751A true JPS59228751A (en) | 1984-12-22 |
Family
ID=14349519
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10326283A Pending JPS59228751A (en) | 1983-06-09 | 1983-06-09 | Semiconductor integrated circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59228751A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0448119A2 (en) * | 1990-03-22 | 1991-09-25 | Kabushiki Kaisha Toshiba | Input protection resistor used in input protection circuit |
US5925922A (en) * | 1991-09-30 | 1999-07-20 | Texas Instruments Incorporated | Depletion controlled isolation stage |
-
1983
- 1983-06-09 JP JP10326283A patent/JPS59228751A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0448119A2 (en) * | 1990-03-22 | 1991-09-25 | Kabushiki Kaisha Toshiba | Input protection resistor used in input protection circuit |
US5181092A (en) * | 1990-03-22 | 1993-01-19 | Kabushiki Kaisha Toshiba | Input protection resistor used in input protection circuit |
US5925922A (en) * | 1991-09-30 | 1999-07-20 | Texas Instruments Incorporated | Depletion controlled isolation stage |
US5977596A (en) * | 1991-09-30 | 1999-11-02 | Texas Instruments Incorporated | Depletion controlled isolation stage |
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