JPS59226194A - Production of material for electronic parts - Google Patents

Production of material for electronic parts

Info

Publication number
JPS59226194A
JPS59226194A JP10141383A JP10141383A JPS59226194A JP S59226194 A JPS59226194 A JP S59226194A JP 10141383 A JP10141383 A JP 10141383A JP 10141383 A JP10141383 A JP 10141383A JP S59226194 A JPS59226194 A JP S59226194A
Authority
JP
Japan
Prior art keywords
tin
plating
jacket
reflow
plating layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10141383A
Other languages
Japanese (ja)
Inventor
Tetsuya Nishi
西 徹也
Satoru Takano
悟 高野
Shingo Ishiguro
石黒 信吾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP10141383A priority Critical patent/JPS59226194A/en
Publication of JPS59226194A publication Critical patent/JPS59226194A/en
Pending legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)
  • Manufacturing Of Electrical Connectors (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)

Abstract

PURPOSE:To produce a material for electronic parts which is free from ruggedness and uneven brightness by heating directly a metallic blank wire rod on which a tin or tin-lead alloy plating layer is formed while passing said wire rod in a gaseous cooling atmosphere to melt the plating layer then cooling quickly the same imediately thereafter. CONSTITUTION:A metallic wire or rod 1 on which tin or tin-lead alloy plating is formed by electroplating is passed continuously into a reflow jacket 3 maintained in a gaseous cooling atmosphere 2 kept at <=0 deg.C. At the same time the material is directly heated by subjecting the same to resistance heating by direct conduction of electricity or high frequency heating, etc. to melt the plating layer on the surface. The material is passed in a cooling medium 4 underneath the jacket 3 immediately after melting and is thus quickly cooled.

Description

【発明の詳細な説明】 この発明は小型抵抗器やコンデンサなどのリード線ある
いはコネクタ用、ネットワーク抵抗リードフレー、!−
用材刺として用いられる電子部品用材料の製造法に関し
、詳しくのべると、金属線または条(テープ)に錫また
は錫−鉛合金めっき層を施した素材を0℃以下の冷却気
体雰囲気中に走行せしめると同時に該素材を直接加熱し
て表面のめっき轡を溶融したのち、直ちに急冷すること
を特徴とする電子部品用材料のmM 6法に関するもの
である。
[Detailed Description of the Invention] This invention is for lead wires or connectors of small resistors, capacitors, etc., network resistance lead wires,! −
Regarding the manufacturing method for electronic component materials used as material thorns, in detail, a metal wire or strip (tape) coated with a tin or tin-lead alloy plating layer is made to run in a cooled gas atmosphere at a temperature below 0°C. At the same time, the present invention relates to the mm6 method for materials for electronic components, which is characterized in that the material is directly heated to melt the plating on the surface and then immediately rapidly cooled.

電子部品用材料、特にリード線として用いられる金属線
または条(テープ)のSnあるいはSn  Pb合金め
っき線は通常2μ以上のめっき厚が必要とされている。
BACKGROUND ART Electronic component materials, particularly metal wires or strips (tape) of Sn or Sn Pb alloy plated wires used as lead wires, usually require a plating thickness of 2 μm or more.

まだコネクタ等の電子部品用8nあるいは8n Pb合
金テープにおいては、ライヌカ−発生の防止などを目的
としてリフロー処理が実施されている。
8n or 8n Pb alloy tapes for electronic parts such as connectors are still subjected to reflow treatment for the purpose of preventing line cracking.

通常このリフロー処理は抵抗加熱等の方法で大気あるい
はジャケット内空気中で溶融させることによって行って
いる。しかしながら1.5〜2μ以上のめっき厚を有す
るテープ(条)にこの方法を実施すると、めっき表面の
流動性によシめっき響が流れるため、長手方向の凸凹や
光沢むらを生じて好ましくなく、従って1.5〜2μ以
上のめつ′き厚の金属テープにおいては、リフロー処理
は不可能とされていた。
Usually, this reflow treatment is carried out by melting the material in the atmosphere or in the air inside the jacket using a method such as resistance heating. However, if this method is applied to a tape (strip) with a plating thickness of 1.5 to 2 μm or more, the plating sound will flow due to the fluidity of the plating surface, resulting in unevenness in the longitudinal direction and uneven gloss, which is undesirable. Therefore, it has been considered impossible to perform reflow treatment on metal tapes with a plating thickness of 1.5 to 2 microns or more.

まためっきした金属線においても、上記のようなりフロ
ー処理を行うと、同じように外観光沢むらや提手方向の
凸凹を生ずるのでリフロー処理は一般に行われていない
Furthermore, when a plated metal wire is subjected to flow treatment as described above, it similarly causes uneven gloss in appearance and unevenness in the direction of the handle, so reflow treatment is generally not performed.

本発明者らは上記の点に鑑みて、めっき処理した金属線
あるいは条(テープ)に対して長手方向の凸凹や光沢む
らの生じないリフロー処理について検討した結果、この
発明に至ったものである。
In view of the above-mentioned points, the present inventors investigated a reflow treatment for plated metal wires or strips (tape) that does not cause unevenness in the longitudinal direction or uneven gloss, and as a result, they arrived at this invention. .

即ち、この発明の方法は図面で示すように、電気めっき
によってめっき層を被偵した金属線または条紫材1を連
続的に0°C以下の冷却気体界囲気2としたりフロージ
ャケット3内を通過させ、この通過時に該めっき@を被
覆しfc素材に直接通電による抵抗加熱、あるいは高周
波加熱等によって素材を直接加熱して該素材表面のめつ
き廟を溶融させ、その後直ちにリフロージャケット下部
の冷却媒体4中を通過させて急冷させるというリフロー
処理を行うことによって、長手方向の凸凹や光沢むらの
ない電子部品用材料を得ることを目的とするものである
That is, as shown in the drawings, the method of the present invention is such that a metal wire or striped material 1 coated with a plating layer by electroplating is continuously exposed to a cooling gas atmosphere 2 of 0°C or less or inside a flow jacket 3. During this passage, the plating is coated and the material is directly heated by resistance heating by direct current to the FC material, or high frequency heating, etc. to melt the plating on the surface of the material, and then the lower part of the reflow jacket is immediately cooled. By performing a reflow process in which the material is passed through a medium 4 and rapidly cooled, the purpose is to obtain a material for electronic components that is free from unevenness in the longitudinal direction and uneven gloss.

しかして、この発明の方法で電子部品用材料を得るに使
用する素材としては、OuあるいはOu合などを電気め
っきにてめっき厚0.5〜13μ、好ましくは1.5〜
18μに被覆したものをリフロー処理するものである。
Therefore, as the material used to obtain the material for electronic parts by the method of this invention, Ou or Ou alloy is electroplated to a thickness of 0.5 to 13μ, preferably 1.5 to 13μ.
The 18μ coating is subjected to reflow treatment.

そして、上記素材に対するSn、Sn  Pb合金の電
気めっき被覆においては、そのめっきり構造を2層めっ
きとし、内側の層をより融点の低いSn  Pb合金層
、外側の層をより融点の高い8nあるいはSn  Pb
合金とするのが好ましい。
In the electroplating coating of Sn and SnPb alloy on the above materials, the clear structure is two-layer plating, the inner layer is a SnPb alloy layer with a lower melting point, and the outer layer is an 8n or Sn layer with a higher melting point. Pb
Preferably, it is an alloy.

次に8nあるいはsn  Pb合金のめっき轡を有する
素材に対するリフロー処理は、図示のように冷却気体を
送って、該気体の0℃以下の雰囲気としたりフロージャ
ケット内に上記素材を通過させる際に抵抗加熱、高周波
加熱などの素材への直接加熱によって、該素材表面のめ
っき層を溶融させたのち、直ちにリフロージャケット下
部の冷却媒体中を通過させて、この溶融めっき製を急冷
させることによって行なわれるが、この際、抵抗加熱、
高周波加熱等による素材の直接加熱が重要であって、ジ
ャケット内の気体の雰囲気加熱では目的を達しない。
Next, in the reflow process for materials with 8n or sn Pb alloy plating, a cooling gas is sent as shown in the figure to create an atmosphere of the gas below 0°C, or when the material is passed through a flow jacket, resistance is increased. This is done by melting the plating layer on the surface of the material by direct heating, high-frequency heating, etc., and then immediately passing it through a cooling medium at the bottom of the reflow jacket to rapidly cool the hot-dip plating. , At this time, resistance heating,
Direct heating of the material by high frequency heating or the like is important, and atmospheric heating of the gas inside the jacket does not achieve the purpose.

しかして、リフロージャケット内に送入する冷却気体と
しては0℃以下の空気、水素、フォーミングガス、アル
ゴンなどが適当である。
Therefore, as the cooling gas to be introduced into the reflow jacket, air at a temperature of 0° C. or lower, hydrogen, forming gas, argon, etc. are suitable.

また、ジャケット下部に設ける冷却媒体としては、主と
して水あるいはポリエチレングリコ−ノン等の界面活性
剤を含有する水が用いられる。
Further, as the cooling medium provided in the lower part of the jacket, mainly water or water containing a surfactant such as polyethylene glyconone is used.

なお8n*8nPb合金めっきをした素材のりフロー処
理に当っては、その前処理として例えばグツVコン酸等
の有機酸によるフラックス処理を行ってもよい。
In addition, in the case of flow treatment of the material plated with 8n*8nPb alloy, flux treatment with an organic acid such as V-conic acid may be performed as a pretreatment.

またリフロー処理後に変色防止処理としてリン酸ソーダ
水溶液に浸漬してやることも好ましい。
It is also preferable to immerse the film in a sodium phosphate aqueous solution as a discoloration prevention treatment after the reflow process.

かくして上記のようなりフロー処理を行うこの発明の電
子部品用材料の製造法は、これを連続的な工程として行
うことができ、こd製造法によれば、 (1)  詳細な理由は未だ明らかではないが、リフロ
ー処理後の素材の最表面を冷却(急冷)するため、めっ
き層の流動性が低くなシ、偏肉、長手方向の凸凹が生じ
なくなるので、リフロー処理した表面が平滑になること
、そして特に1,5〜18μという厚膜のめっき智であ
っても同じ結果が得られること。
Thus, the method for producing materials for electronic components of the present invention, which involves flow processing as described above, can be carried out as a continuous process, and according to this production method, (1) The detailed reason is still unclear. However, since the outermost surface of the material after reflow treatment is cooled (quickly cooled), the fluidity of the plating layer is low, uneven thickness, and unevenness in the longitudinal direction do not occur, resulting in a smooth surface after reflow treatment. In particular, the same results can be obtained even with a thick plating layer of 1.5 to 18 μm.

+2)  filと同様の処理を線材にも’)jfD、
すことが可能であること。
+2) Apply the same treatment to the wire as for fil')jfD,
It must be possible to do so.

(3)リフロー処理にょシ、酸化を防止する効果がある
ことから表面光沢むらなどが発生しないこと。
(3) Since reflow treatment has the effect of preventing oxidation, uneven surface gloss does not occur.

などの利点を得ることができるのである。You can get benefits such as:

このようKして得られた電子部品用材料は、これを切断
後、小型抵抗器やコンデンサなどのリード線として、あ
るいは打抜き、プレスなどにょってコネクタ用材料、ネ
ットワーク抵抗リードフレーム用材料、チップ抵抗、チ
ップコンデンサ等のキャップの材料として用いることが
できるのである。
After cutting, the electronic component materials obtained in this manner can be used as lead wires for small resistors, capacitors, etc., or as connector materials, network resistor lead frame materials, and chips by punching, pressing, etc. It can be used as a cap material for resistors, chip capacitors, etc.

以下実施例によりこの発明を説明する。The present invention will be explained below with reference to Examples.

実施例1゜ 9.2mg(l l ffffwのリン青銅テープに通
常のアルカリ電解脱脂および酸洗いを施こした後、アル
カノールスルホン酸第1錫(商品名As−8*)240
 f/1 アルカノールスルホン酸鉛(m品名As−P*)409
/II アルカノールスルホン酸(商品−f+A8−A*)15
0 f/1 添 加 剤 (商品名518Y*)       80
g/II(但し*の商品名は何れも石原産業株式会社製
である。) のめつき浴にて1 OA/cby/にて5n−to%P
b合金めっきを施こした。
Example 1 A phosphor bronze tape of 9.2 mg (l l ffffw) was subjected to normal alkaline electrolytic degreasing and pickling, and then 240 mg of tinned alkanolsulfonate (trade name As-8*) was applied.
f/1 Lead alkanol sulfonate (m product name As-P*) 409
/II Alkanolsulfonic acid (product-f+A8-A*) 15
0 f/1 additive (product name 518Y*) 80
g/II (However, all product names marked with * are manufactured by Ishihara Sangyo Co., Ltd.) 1 OA/cby/5n-to%P in plating bath
b Alloy plating was applied.

かくして得られた8n −・Pbめっきテープを1om
ン分の速度でリフロー処理を行なった。
The 8n-Pb plated tape thus obtained was
The reflow process was performed at the same speed as the reflow process.

リフロー処理は直径5cIR,長さ1mの鉄パイプを冷
却水上に立て、該鉄パイプ上の給電ロールと冷却水中の
給電ロールに約300〜600Aの電流を流して行った
The reflow treatment was performed by standing an iron pipe with a diameter of 5 cIR and a length of 1 m above cooling water, and passing a current of about 300 to 600 A through the power supply roll on the iron pipe and the power supply roll in the cooling water.

リフロー処理後のテープのめっき厚、パイプ内の雰囲気
と表面平滑性、外観との関係は第1表に示す通りであっ
た。
The relationship between the plating thickness of the tape after reflow treatment, the atmosphere inside the pipe, the surface smoothness, and the appearance is as shown in Table 1.

第  1  表 実施例2 0、52 Iffφノ鉄線を200 f/11の水酸化
ナトリウーム溶液中でアルカリ電解脱脂し、さらに硫酸
浴中で電解酸洗いを行ったのち、下記AまだはBの配合
のホウフッ化浴にて65%8n85%Pbめっきあるい
は純anめっきを行った。
Table 1 Example 2 0, 52 Iffφ iron wire was subjected to alkaline electrolytic degreasing in a 200 f/11 sodium hydroxide solution, and further electrolytically pickled in a sulfuric acid bath. 65%8N85%Pb plating or pure AN plating was performed in a borofluoride bath.

次いでこのめっき鉄線を実施例1と同様にしてリフロー
処理を行なった。
Next, this plated iron wire was subjected to a reflow treatment in the same manner as in Example 1.

このリフロー処理後のめっき鉄線のめっき厚、パイプ内
の雰囲気と表面平滑性、外観との関係は第2表に示しだ
Table 2 shows the relationship between the plating thickness of the plated iron wire after this reflow treatment, the atmosphere inside the pipe, the surface smoothness, and the appearance.

なお第2表中実施例8はに浴によるめっき後さらにB浴
によるめっき処理を行ったものである。
In addition, in Example 8 in Table 2, plating treatment was performed in B bath after plating in B bath.

【図面の簡単な説明】[Brief explanation of drawings]

図面はこの発明のりフロー処理工程の説明図である。 l・・・Snあるいはsn Pb合金めっきすを有する
素材 2・・・冷却気体雰囲気  3・・・リフロージャケッ
ト4・・・冷却媒体 特許出願人        住友電気工業株式会社代理
 人    弁理士和1)昭
The drawings are explanatory diagrams of the glue flow treatment process of the present invention. l...Material having Sn or sn Pb alloy plating 2...Cooling gas atmosphere 3...Reflow jacket 4...Cooling medium Patent applicant Sumitomo Electric Industries, Ltd. Agent Patent attorney Kazu1) Akira

Claims (3)

【特許請求の範囲】[Claims] (1)金属線または条に錫または錫−鉛合金めっき9を
施した素材を0℃以下の冷却気体算囲気と□を特徴とす
る電子部品用材料の製造法。
(1) A method for producing a material for electronic components, characterized by surrounding a material in which a metal wire or strip is coated with tin or tin-lead alloy 9 and surrounded by a cooling gas atmosphere of 0° C. or lower.
(2)錫または錫−鉛合金めっき響け0.5〜18μの
厚さに施したことを特徴とする特許請求の範囲第1項記
載の電子部品用材料の製造法。
(2) The method for producing a material for electronic components according to claim 1, wherein tin or tin-lead alloy plating is applied to a thickness of 0.5 to 18 μm.
(3)  錫または錫−鉛合金めっき轡を有する素材の
冷却気体雰囲気中における直接加熱が抵抗加熱または高
周波加熱であることを特徴とする特許請求の範囲第1項
記載の電子部品用材料の製造法。
(3) Production of a material for electronic components according to claim 1, wherein the direct heating of the material having a tin or tin-lead alloy plating in a cooling gas atmosphere is resistance heating or high frequency heating. Law.
JP10141383A 1983-06-06 1983-06-06 Production of material for electronic parts Pending JPS59226194A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10141383A JPS59226194A (en) 1983-06-06 1983-06-06 Production of material for electronic parts

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10141383A JPS59226194A (en) 1983-06-06 1983-06-06 Production of material for electronic parts

Publications (1)

Publication Number Publication Date
JPS59226194A true JPS59226194A (en) 1984-12-19

Family

ID=14300019

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10141383A Pending JPS59226194A (en) 1983-06-06 1983-06-06 Production of material for electronic parts

Country Status (1)

Country Link
JP (1) JPS59226194A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0379166U (en) * 1989-12-04 1991-08-12
JP2007311258A (en) * 2006-05-19 2007-11-29 Sumitomo Electric Ind Ltd Alloy manufacturing method and flat cable manufacturing method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0379166U (en) * 1989-12-04 1991-08-12
JP2007311258A (en) * 2006-05-19 2007-11-29 Sumitomo Electric Ind Ltd Alloy manufacturing method and flat cable manufacturing method
JP4640260B2 (en) * 2006-05-19 2011-03-02 住友電気工業株式会社 Flat cable manufacturing method

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