JPS59211566A - 無電解はんだめつき方法 - Google Patents
無電解はんだめつき方法Info
- Publication number
- JPS59211566A JPS59211566A JP8424883A JP8424883A JPS59211566A JP S59211566 A JPS59211566 A JP S59211566A JP 8424883 A JP8424883 A JP 8424883A JP 8424883 A JP8424883 A JP 8424883A JP S59211566 A JPS59211566 A JP S59211566A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- solder plating
- bath
- electroless
- solder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007747 plating Methods 0.000 title claims abstract description 86
- 229910000679 solder Inorganic materials 0.000 title claims abstract description 43
- 238000000034 method Methods 0.000 title claims description 17
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims abstract description 14
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims abstract description 7
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000003638 chemical reducing agent Substances 0.000 claims abstract 3
- 238000007772 electroless plating Methods 0.000 claims description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 239000010931 gold Substances 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 239000007788 liquid Substances 0.000 abstract description 7
- 229910052718 tin Inorganic materials 0.000 abstract description 4
- 239000004094 surface-active agent Substances 0.000 abstract description 2
- 239000000463 material Substances 0.000 abstract 2
- 229910020816 Sn Pb Inorganic materials 0.000 abstract 1
- 229910020922 Sn-Pb Inorganic materials 0.000 abstract 1
- 229910008783 Sn—Pb Inorganic materials 0.000 abstract 1
- 229910052745 lead Inorganic materials 0.000 abstract 1
- 229910001369 Brass Inorganic materials 0.000 description 11
- 239000010951 brass Substances 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 238000005476 soldering Methods 0.000 description 6
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000001556 precipitation Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 3
- 238000010790 dilution Methods 0.000 description 3
- 239000012895 dilution Substances 0.000 description 3
- 238000007598 dipping method Methods 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 2
- HWSZZLVAJGOAAY-UHFFFAOYSA-L lead(II) chloride Chemical compound Cl[Pb]Cl HWSZZLVAJGOAAY-UHFFFAOYSA-L 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000006722 reduction reaction Methods 0.000 description 2
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 2
- SCVJRXQHFJXZFZ-KVQBGUIXSA-N 2-amino-9-[(2r,4s,5r)-4-hydroxy-5-(hydroxymethyl)oxolan-2-yl]-3h-purine-6-thione Chemical compound C1=2NC(N)=NC(=S)C=2N=CN1[C@H]1C[C@H](O)[C@@H](CO)O1 SCVJRXQHFJXZFZ-KVQBGUIXSA-N 0.000 description 1
- RNMDNPCBIKJCQP-UHFFFAOYSA-N 5-nonyl-7-oxabicyclo[4.1.0]hepta-1,3,5-trien-2-ol Chemical compound C(CCCCCCCC)C1=C2C(=C(C=C1)O)O2 RNMDNPCBIKJCQP-UHFFFAOYSA-N 0.000 description 1
- 241000218645 Cedrus Species 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000002075 main ingredient Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000013081 microcrystal Substances 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/48—Coating with alloys
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8424883A JPS59211566A (ja) | 1983-05-16 | 1983-05-16 | 無電解はんだめつき方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8424883A JPS59211566A (ja) | 1983-05-16 | 1983-05-16 | 無電解はんだめつき方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59211566A true JPS59211566A (ja) | 1984-11-30 |
JPS6217029B2 JPS6217029B2 (enrdf_load_stackoverflow) | 1987-04-15 |
Family
ID=13825155
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8424883A Granted JPS59211566A (ja) | 1983-05-16 | 1983-05-16 | 無電解はんだめつき方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59211566A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1997046732A1 (fr) * | 1996-06-05 | 1997-12-11 | Sumitomo Light Metal Industries, Ltd. | Procede de fabrication de tuyau de cuivre dont l'interieur est plaque a l'etain |
WO2004031447A1 (ja) * | 2002-10-07 | 2004-04-15 | Tokyo Electron Limited | 無電解メッキ方法 |
-
1983
- 1983-05-16 JP JP8424883A patent/JPS59211566A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1997046732A1 (fr) * | 1996-06-05 | 1997-12-11 | Sumitomo Light Metal Industries, Ltd. | Procede de fabrication de tuyau de cuivre dont l'interieur est plaque a l'etain |
WO2004031447A1 (ja) * | 2002-10-07 | 2004-04-15 | Tokyo Electron Limited | 無電解メッキ方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6217029B2 (enrdf_load_stackoverflow) | 1987-04-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US8603315B2 (en) | Tin and tin alloy electroplating method with controlled internal stress and grain size of the resulting deposit | |
US20070007144A1 (en) | Tin electrodeposits having properties or characteristics that minimize tin whisker growth | |
US20090038949A1 (en) | Copper plating process | |
EP3004429B1 (en) | Electroplating baths of silver and tin alloys | |
CN111020585A (zh) | 一种硫酸过氧化氢体系的粗化微蚀液及其应用 | |
US2814589A (en) | Method of plating silicon | |
JP2006009039A (ja) | ウィスカー成長が抑制されたスズ系めっき皮膜及びその形成方法 | |
CN106637159B (zh) | 一种化学镀液、制备方法及一种非金属化学镀的方法 | |
US3622470A (en) | Continuous plating method | |
US3669852A (en) | Electroplating gold | |
JPH03236476A (ja) | アルミニウム基板上に平滑な無電解金属めっきを析出する方法 | |
JPS59211566A (ja) | 無電解はんだめつき方法 | |
US20050199507A1 (en) | Chemical structures and compositions of ECP additives to reduce pit defects | |
US20160108254A1 (en) | Zinc immersion coating solutions, double-zincate method, method of forming a metal plating film, and semiconductor device | |
CN107974698A (zh) | 镍镀敷溶液 | |
CN112176371A (zh) | 一种铍铜表面镀金的电镀工艺 | |
Blair | Silver plating | |
US2662054A (en) | Method of electrodepositing chromium directly on aluminum | |
US3037896A (en) | Masking process | |
Bullough et al. | The Quantitative Adhesion of Nickel Electrodeposits to Aluminium Alloys | |
US2966448A (en) | Methods of electroplating aluminum and alloys thereof | |
CN101501250A (zh) | 镀锡或者镀锡合金用晶须防止剂和利用其的晶须防止方法 | |
CN103238184A (zh) | 用于生产硬盘基材的方法和硬盘基材 | |
US2039328A (en) | Method for gold plating | |
JP3173074B2 (ja) | 半田皮膜の形成方法 |