JPS59207651A - Manufacture of filmy circuit substrate - Google Patents
Manufacture of filmy circuit substrateInfo
- Publication number
- JPS59207651A JPS59207651A JP58082075A JP8207583A JPS59207651A JP S59207651 A JPS59207651 A JP S59207651A JP 58082075 A JP58082075 A JP 58082075A JP 8207583 A JP8207583 A JP 8207583A JP S59207651 A JPS59207651 A JP S59207651A
- Authority
- JP
- Japan
- Prior art keywords
- thick film
- thick
- resistor
- filmy
- conductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Parts Printed On Printed Circuit Boards (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
Abstract
Description
【発明の詳細な説明】
不発明は膜回路基板の製造方法で、特に厚膜回路基板の
製造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a film circuit board, and particularly to a method for manufacturing a thick film circuit board.
従来の厚膜回路基板の製造方法は1例えば絶縁性基板上
に厚膜導体ペーストおよび厚膜抵抗体ペースト等を印刷
する工程と、印刷された各々のペーストを焼成する工程
とを組合せていた。A conventional method for manufacturing a thick film circuit board combines the steps of printing thick film conductor paste, thick film resistor paste, etc. on an insulating substrate, and firing each of the printed pastes.
しかしながら、この製造方法により形成された厚膜Iu
路は、絶縁性基板上に各々のペース)=1−印刷用スク
リーンを用いて印刷する時、スクリーンがメツシュ状で
25〜50μの厚さがあるため印刷された各々のペース
トの印刷精度は悪く、その上印刷されたペーストラ焼成
する時にいわゆる「にじみ現象」によりペーストが更に
拡がるため、焼成後の厚膜回路の寸法精度は50〜10
0μとなる。However, the thick Iu film formed by this manufacturing method
When printing on an insulating substrate using a printing screen, the printing accuracy of each paste is poor because the screen is mesh-like and has a thickness of 25 to 50μ. Moreover, when the printed paste is fired, the paste spreads further due to the so-called "bleeding phenomenon", so the dimensional accuracy of the thick film circuit after firing is 50 to 10
It becomes 0μ.
従って、この方法では厚膜回路として50μ以下の微細
パターンを製造することができなかった。この欠点を除
去する方法としては、前述の製造工程にホトレジストヲ
用いたホトエツチング工程を加えることが考えられるが
、レジスト材料やエツチング液の制限や複雑なホトエツ
チング工程の付加によりコスト高を招くことになりかね
ない。Therefore, with this method, it was not possible to produce a fine pattern of 50 μm or less as a thick film circuit. One possible way to eliminate this drawback is to add a photoetching process using photoresist to the above-mentioned manufacturing process, but this increases costs due to restrictions on resist materials and etching solutions, and the addition of a complicated photoetching process. It's possible.
不発明の目的は精度の艮い膜回路を簡単に製造する方法
を提供することにある。It is an object of the invention to provide a simple method for manufacturing precision membrane circuits.
即ち1本発明の膜回路基板の製造方法は、絶縁性基板上
に膜回路全製造する工程において、膜回路を製造する工
程内に膜導体または膜抵抗体の所望の部分全レーザー光
線の照射により整形または形成する工程を含むことを特
徴とする特次に不発明の詳細を一実施例を挙げて具体的
に説明する。Specifically, the method for manufacturing a film circuit board of the present invention includes shaping the entire desired portion of a film conductor or film resistor by irradiating it with a laser beam during the process of manufacturing the film circuit on an insulating substrate. The details of the special non-invention characterized in that it includes a step of forming the invention will be specifically explained by giving an example.
第1図(a)、 (bl乃至第3図(a)、 (b)は
本発明による厚膜回路基板の完成までの各工程図を示し
、(a)は表面図、(b)は断面図を夫々示す。Figures 1(a) and 3(b) to 3(a) and (b) show each process diagram until the completion of the thick film circuit board according to the present invention, (a) is a surface view, and (b) is a cross-sectional view. Figures are shown respectively.
まず第1図のように絶縁性基板となるアルミナ板1上に
厚膜導体ペースト(バラシームと銀の混合ベース)lk
19r望の形状になるよう印刷し、焼成用電気炉等によ
り焼成しアルミナ板1上に所望の銀バラジュームの厚膜
導体2を形成する0次に第1図の銀バラジュームの厚膜
導体上に目合せを行ない厚膜抵抗体ペースト(酸化ルテ
ニウム)をスクリーン印刷し、厚膜導体と同様に焼成し
所望の厚膜抵抗体3を形成する。次に、レーザートリミ
ング装置の如くレーザー光を発生する装置で、第2図の
厚膜回路の厚膜導体2.厚膜抵抗体3の不必要部分をレ
ーザー光線の照射により焼き飛ばし、厚膜導体インダク
タ2′、厚膜抵抗体3を整形する。この場合厚膜抵抗体
3を整形し次に抵抗体の抵抗値をレーザートリミングす
ることも可能である。なお一般には厚膜抵抗体30両端
の厚膜導体20幅が抵抗体30幅より広いのが通常であ
る。これは厚膜24体2に目合せを行い厚膜抵抗体3(
f−スクリーン印刷する際、位置ずれが生じるため、位
置ずれによる厚膜抵抗体3の両端が厚膜導体からはみ出
さないようにするためである。とくに導体のパターンず
れよりも抵抗体のパタ−ンずれの方が回路定数に直接影
響するため抵抗体の方を精度よく作らなければならない
。しかしながらこのような厚膜導体と抵抗体のパターン
設計法では厚膜回路の高密層化、微細パターン化は内難
である。厚膜回路の高密度、微細パターンを実現するに
は、抵抗体の両端の導体の幅と合わせ、無駄な導体幅を
削除し、全体ヲ尚密度にレイアウトすることが必要であ
ることは宮う′までもない。従って、不発明の厚膜基板
の製造方法では、厚膜抵抗体の両端の厚膜導体は、あら
かじめ第1図において厚膜#:vc体に必要な設計幅に
等しい幅で印刷しておき、第2図の抵抗体のスクリーン
印刷において抵抗体の幅は、抵抗体に必要な設計幅手位
置すれ幅となるように従来とは逆に幅広く印刷、焼成し
、第3図において、レーザー光線の照射により、位置ず
れ部分を焼き飛ばし抵抗体の最終的な設計幅に整形する
ようにしている。同様に、第2図の厚膜導体2(1)右
側の部分では、レーザー光線の照射により、導体の不必
要部分を焼き飛ばして微細な導体インダクタ回路素子を
形成している。First, as shown in Fig. 1, a thick film conductor paste (mixed base of rose seam and silver) is applied on an alumina plate 1 which will become an insulating substrate.
19R Print the desired shape and sinter it in an electric furnace for firing to form the desired thick film conductor 2 of silver baladium on the alumina plate 1. After alignment, a thick film resistor paste (ruthenium oxide) is screen printed and fired in the same manner as the thick film conductor to form the desired thick film resistor 3. Next, the thick film conductor 2 of the thick film circuit shown in FIG. Unnecessary portions of the thick film resistor 3 are burned off by laser beam irradiation, and the thick film conductor inductor 2' and the thick film resistor 3 are shaped. In this case, it is also possible to shape the thick film resistor 3 and then laser trim the resistance value of the resistor. Generally, the width of the thick film conductor 20 at both ends of the thick film resistor 30 is generally wider than the width of the resistor 30. This aligns the thick film 24 body 2 and thick film resistor 3 (
This is to prevent both ends of the thick film resistor 3 from protruding from the thick film conductor due to misalignment when performing f-screen printing. In particular, resistor pattern misalignment has a more direct effect on circuit constants than conductor pattern misalignment, so the resistor must be made with greater precision. However, with such pattern design methods for thick film conductors and resistors, it is difficult to create dense layers and fine patterns for thick film circuits. In order to realize high-density, fine patterns for thick film circuits, it is necessary to match the width of the conductors at both ends of the resistor, eliminate unnecessary conductor width, and lay out the entire structure in a more dense manner. Not even '. Therefore, in the uninvented thick film substrate manufacturing method, the thick film conductors at both ends of the thick film resistor are printed in advance with a width equal to the design width required for the thick film #:vc body in FIG. In the screen printing of the resistor shown in Figure 2, the width of the resistor is printed and fired to be wide, contrary to the conventional method, so that the width of the resistor corresponds to the design width necessary for the resistor. This allows the misaligned portion to be burned off and shaped to the final design width of the resistor. Similarly, on the right side of the thick film conductor 2(1) in FIG. 2, unnecessary portions of the conductor are burned off by irradiation with a laser beam to form a fine conductive inductor circuit element.
本発明の説明では、厚膜導体2と厚膜抵抗体3の各々を
レーザー光線の照射により、整形、パターン設計法する
ことを述べたが、厚膜導体または抵抗体のどちらか一方
をレーザー光線の照射によシ整形したりまたは形成する
方法においても効果があることは明らかである。In the description of the present invention, it has been described that the thick film conductor 2 and the thick film resistor 3 are shaped and pattern designed by irradiating each with a laser beam, but either the thick film conductor or the resistor is irradiated with a laser beam. It is clear that a method of shaping or forming the shape is also effective.
以上説明したように1本発明の厚膜回路基板の製造方法
によれば、高密度微細な厚膜回路パターンを形成するの
に、必要に応じてレーザー光線の照射法を用いて抵抗体
や導体の位置ずれの修正。As explained above, according to the method for manufacturing a thick film circuit board of the present invention, a laser beam irradiation method is used as necessary to form a high-density, fine thick film circuit pattern. Correction of misalignment.
寸法精度の向上、インダクター、ギヤ、プキャパシター
の形成などかり能とな妙、シかも、複雑で高価なホトエ
ツチングの工程を余分に追加すると 5 −
となく、従来より行なわれている抵抗値修正のためのレ
ーザー抵抗トリミング工程のプログラムを変更するのみ
で可能とならない。従って、安価で高歩留、高位置精度
の微細な厚膜回路基板の製造方法を提供することができ
、その効果は大きい。Improving dimensional accuracy, forming inductors, gears, capacitors, etc. may be difficult, and adding an extra complicated and expensive photo-etching process will reduce the resistance value correction that has traditionally been done. This is not possible simply by changing the program for the laser resistor trimming process. Therefore, it is possible to provide a method for manufacturing a fine thick film circuit board at low cost, with high yield, and with high positional accuracy, and its effects are significant.
第1図、第2図、第3図は本発明の厚膜回路基板の製造
方法の一実施例を説明するだめの各工程図を示し、(a
)はその表面図、(b)はその断面図を各々示す。
1・・・・・・絶縁性アルミナ基板、2・・・・・・銀
バラジューム厚膜導体、2′・・・・・・厚膜導体イン
ダクタ、3・・・・・・酸化ルテニウム厚膜抵抗体、3
′・・・・・・整形された厚膜抵抗体。
6−
沁3珂(72)
り
53 しd (し)FIG. 1, FIG. 2, and FIG. 3 show process diagrams for explaining one embodiment of the method for manufacturing a thick film circuit board of the present invention.
) shows its surface view, and (b) shows its cross-sectional view. 1...Insulating alumina substrate, 2...Silver baladium thick film conductor, 2'...Thick film conductor inductor, 3...Ruthenium oxide thick film resistor body, 3
′・・・・・・Shaped thick film resistor. 6- 沁3珂(72) ri53 しd (shi)
Claims (1)
材料を被着した後、レーザー光線の照射により膜回路パ
ターンを形成もしくは整形することを特徴とする膜回路
基板の製造方法。1. A method for manufacturing a film circuit board, which comprises, in the step of manufacturing a film circuit on an insulating substrate, forming or shaping a film circuit pattern by irradiating a laser beam after depositing a film circuit material.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58082075A JPS59207651A (en) | 1983-05-11 | 1983-05-11 | Manufacture of filmy circuit substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58082075A JPS59207651A (en) | 1983-05-11 | 1983-05-11 | Manufacture of filmy circuit substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59207651A true JPS59207651A (en) | 1984-11-24 |
JPH0326550B2 JPH0326550B2 (en) | 1991-04-11 |
Family
ID=13764351
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58082075A Granted JPS59207651A (en) | 1983-05-11 | 1983-05-11 | Manufacture of filmy circuit substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59207651A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5081438A (en) * | 1989-04-11 | 1992-01-14 | Sumitomo Electric Industries, Ltd. | Thermistor and its preparation |
EP0905720A1 (en) * | 1997-09-17 | 1999-03-31 | Dale Electronics, Inc. | Thick film low value high frequency inductor, and method of making the same |
KR100324209B1 (en) * | 2000-01-28 | 2002-02-16 | 오길록 | Fabrication method of silver inductors |
JP2002111222A (en) * | 2000-10-02 | 2002-04-12 | Matsushita Electric Ind Co Ltd | Multilayer substrate |
JP2007165932A (en) * | 2007-02-22 | 2007-06-28 | Matsushita Electric Ind Co Ltd | Multilayer substrate |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50139357A (en) * | 1974-04-25 | 1975-11-07 | ||
JPS5871647A (en) * | 1981-10-23 | 1983-04-28 | Omron Tateisi Electronics Co | Trimming method for reactance |
-
1983
- 1983-05-11 JP JP58082075A patent/JPS59207651A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50139357A (en) * | 1974-04-25 | 1975-11-07 | ||
JPS5871647A (en) * | 1981-10-23 | 1983-04-28 | Omron Tateisi Electronics Co | Trimming method for reactance |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5081438A (en) * | 1989-04-11 | 1992-01-14 | Sumitomo Electric Industries, Ltd. | Thermistor and its preparation |
EP0905720A1 (en) * | 1997-09-17 | 1999-03-31 | Dale Electronics, Inc. | Thick film low value high frequency inductor, and method of making the same |
US6201215B1 (en) * | 1997-09-17 | 2001-03-13 | Vishay Dale Electronics, Inc. | Method of making a thick film low value high frequency inductor |
KR100324209B1 (en) * | 2000-01-28 | 2002-02-16 | 오길록 | Fabrication method of silver inductors |
JP2002111222A (en) * | 2000-10-02 | 2002-04-12 | Matsushita Electric Ind Co Ltd | Multilayer substrate |
JP2007165932A (en) * | 2007-02-22 | 2007-06-28 | Matsushita Electric Ind Co Ltd | Multilayer substrate |
Also Published As
Publication number | Publication date |
---|---|
JPH0326550B2 (en) | 1991-04-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6130601A (en) | Thick-film resistor having concentric terminals and method therefor | |
EP0250842B1 (en) | Imaging process for forming ceramic electronic circuits | |
US6256866B1 (en) | Polymer thick-film resistor printed on planar circuit board surface | |
US6225570B1 (en) | Circuit board having electric component and its manufacturing method | |
JP2005026525A (en) | Wiring board and method of manufacturing the same | |
JPS59207651A (en) | Manufacture of filmy circuit substrate | |
KR100688404B1 (en) | Method for manufacturing ceramic green sheet and method for manufacturing electronic part using that ceramic green sheet | |
US5234745A (en) | Method of forming an insulating layer on a printed circuit board | |
JP3794064B2 (en) | Printed wiring board and manufacturing method thereof | |
JPH03268478A (en) | Electronic circuit and manufacture thereof | |
JPH09283654A (en) | Glass ceramic board and manufacture thereof | |
JPH0685462A (en) | Manufacture of ceramic multilayer board | |
JPS60194556A (en) | Resistance multilayer printed substrate | |
JPH0514542Y2 (en) | ||
JPH07335411A (en) | Chip resistor network | |
JPS5922397B2 (en) | Method for manufacturing thick film multilayer wiring board | |
JPS5819158B2 (en) | Manufacturing method for high-density multilayer wiring board | |
JPS59224194A (en) | Thin film circuit board | |
JPH11274689A (en) | Manufacture electronic component | |
JPH10335786A (en) | Manufacture of high-density printed wiring board | |
JPS5678147A (en) | Manufacture of thick film hybrid integrated circuit board | |
JPS6142990A (en) | Thick film printed board | |
JPH08316080A (en) | Production of high frequency inductor | |
JPH05267813A (en) | Thick film circuit board, manufacture of the same and thick film circuit board manufacturing board | |
JPS6353720B2 (en) |