JPH10335786A - Manufacture of high-density printed wiring board - Google Patents

Manufacture of high-density printed wiring board

Info

Publication number
JPH10335786A
JPH10335786A JP13978497A JP13978497A JPH10335786A JP H10335786 A JPH10335786 A JP H10335786A JP 13978497 A JP13978497 A JP 13978497A JP 13978497 A JP13978497 A JP 13978497A JP H10335786 A JPH10335786 A JP H10335786A
Authority
JP
Japan
Prior art keywords
copper plating
substrate
printed wiring
wiring board
solder resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13978497A
Other languages
Japanese (ja)
Inventor
Shinichi Niijima
信一 新島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Electric Corp
Original Assignee
Kokusai Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kokusai Electric Corp filed Critical Kokusai Electric Corp
Priority to JP13978497A priority Critical patent/JPH10335786A/en
Publication of JPH10335786A publication Critical patent/JPH10335786A/en
Pending legal-status Critical Current

Links

Landscapes

  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PROBLEM TO BE SOLVED: To form conductor pattern which are excellent in physical characteristics are solid and are microscopic, on a substrate with good productivity in a short time, by a method wherein a photo solder resist is applied on the substrate to form wiring resist patterns on the substrate by a photolithography technique, and a copper plated film is formed on the substrate using together a chemical copper plating and an electrolytic copper plating. SOLUTION: A photo solder resist 4 is applied on both surfaces of a substrate 1. A sensitizing treatment and a developing treatment are performed on the photo solder resist 4 using a photomask, and plated resist patterns 5 for microscopic wiring are formed on the surface of the substrate 1. Moreover, after a very thin chemical copper plated layer is formed on the surface of the substrate by a chemical copper plating applied in the manufacture of a normal printed wiring board, an electrolytic copper plating is applied to the plated layer. In such a way, the photo solder resist is applied on the surface of the substrate to form the solder resist patterns 5 for wiring and component mounting on the surface of the substrate, whereby a highly reliable high-density printed wiring board can be obtained.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はプリント配線基板の
製造方法に係り、特に、基板材料の所要の配線部分にの
み選択的に銅めっきを施して導体配線パターンを形成す
るアディティブ法により、微細な高密度配線を容易に形
成することができる高密度、高信頼性、低価格のプリン
ト配線基板の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a printed wiring board, and more particularly, to a fine wiring method using an additive method in which only a required wiring portion of a substrate material is selectively plated with copper to form a conductive wiring pattern. The present invention relates to a method for manufacturing a high-density, high-reliability, low-cost printed wiring board capable of easily forming a high-density wiring.

【0002】[0002]

【従来の技術】従来、プリント配線基板の微細配線回路
(例えば、回路幅50μm以下)の形成には、一般に、
完全無電解めっき法によるアディティブ法(基板材料の
所要の配線部分にのみ、選択的な銅めっきにより導体配
線パターンを形成する方法)が適している。しかし、こ
のアディティブ法は、例えば、図3(a)〜(e)に示
すような工程で作製される。すなわち、基板11とし
て、触媒入り接着剤付きの積層板〔図3(a)〕を用
い、孔開け加工により孔13を形成した後〔図3
(b)〕、フォトレジストを塗布して、化学銅めっきを
施す領域を定める、めっきレジストパターン14を形成
し〔図3(c)〕、化学銅めっき15を施して配線パタ
ーンを形成した後〔図3(d)〕、基板表面にフォトソ
ルダレジストを塗布して、ソルダレジストパターン〔図
3(e)〕を形成する工程によってプリント配線基板が
作製されていた。このようにして作製されたプリント配
線基板は、以下に示す問題点があり、特に、信頼性が要
求される電子機器等の高密度プリント配線基板などには
適用されていなかった。 (1)銅めっきが化学(無電解)めっき法のみであるた
め、電気(電解)めっきに比べて物理特性が劣り、この
ためプリント配線基板としての信頼性が低い。 (2)化学銅めっきであるため、めっき時間が長くかか
り、プリント配線基板の作製には長時間必要とし、生産
性が低い。 (3)基板材料として触媒入りで接着剤付のものを使用
する関係上、特別な生産管理を必要とする。
2. Description of the Related Art Conventionally, for forming a fine wiring circuit (for example, a circuit width of 50 μm or less) of a printed wiring board, generally,
An additive method by a completely electroless plating method (a method of forming a conductor wiring pattern only on a required wiring portion of a substrate material by selective copper plating) is suitable. However, this additive method is produced, for example, by steps shown in FIGS. That is, a laminated plate with an adhesive containing a catalyst (FIG. 3A) was used as the substrate 11, and after the holes 13 were formed by punching [FIG.
(B)], a photoresist is applied, a plating resist pattern 14 is formed to define a region to be subjected to chemical copper plating [FIG. 3 (c)], and a chemical copper plating 15 is applied to form a wiring pattern [ In FIG. 3D, a printed wiring board has been manufactured by a process of applying a photo solder resist on the substrate surface to form a solder resist pattern [FIG. 3E]. The printed wiring board manufactured in this manner has the following problems, and has not been particularly applied to a high-density printed wiring board of an electronic device or the like that requires reliability. (1) Since copper plating is only a chemical (electroless) plating method, physical properties are inferior to electric (electrolytic) plating, and thus the reliability as a printed wiring board is low. (2) Since it is a chemical copper plating, a long plating time is required, a long time is required for manufacturing a printed wiring board, and productivity is low. (3) Special production control is required because a substrate containing a catalyst and an adhesive is used as the substrate material.

【0003】[0003]

【発明が解決しようとする課題】本発明の目的は、従来
の基板材料の所要の配線部分にのみ、選択的に化学(無
電解)銅めっきを施し、導体配線パターンを形成するア
ディティブ法によりプリント配線基板を製造する方法の
問題点を解消するものであって、基板材料として特別な
生産管理を必要とする触媒入り接着剤付き積層板を使用
することなく、また、めっき時間が長くかかる化学銅め
っき法のみによる導体パターンの形成を改めて、通常の
プリント配線基板の作製において使用されている基板材
料を用いて、その表面に、フォトソルダレジスト(基板
の最外層の表面に塗布し写真法によりパターニングする
ソルダレジスト)を塗布して、フォトリソグラフィ技術
により、めっきレジストパターンを形成し、化学銅めっ
きと電気銅めっきとの併用により、物理特性に優れた堅
牢で微細な導体パターンを短時間に生産性良く形成する
ことにより、高密度、高性能で信頼性の高いプリント配
線基板を短い納期で容易に作製することができるプリン
ト配線基板の製造方法を提供することにある。
SUMMARY OF THE INVENTION It is an object of the present invention to selectively apply a chemical (electroless) copper plating only to a required wiring portion of a conventional substrate material and to print by an additive method of forming a conductor wiring pattern. It solves the problem of the method of manufacturing a wiring board, and does not use a laminated board with an adhesive containing a catalyst that requires special production control as a board material, and also requires a long plating time for chemical copper. The formation of the conductor pattern only by plating method is renewed, and using the board material used in the manufacture of a normal printed wiring board, a photo solder resist (applied to the surface of the outermost layer of the board and patterned by photo method) Solder resist), apply a photolithography technique to form a plating resist pattern, and then perform chemical copper plating and electrolytic copper plating Combined use of these enables the formation of robust and fine conductor patterns with excellent physical properties in a short time with good productivity, making it possible to easily produce high-density, high-performance, highly reliable printed wiring boards in a short delivery time. It is an object of the present invention to provide a method of manufacturing a printed wiring board which can be manufactured.

【0004】[0004]

【課題を解決するための手段】上記本発明の目的を達成
するために、本発明は特許請求の範囲に記載のような構
成とするものである。すなわち、本発明は請求項1に記
載のように、配線と部品搭載の両機能を持つプリント配
線基板を製造する方法であって、所定の基板上にフォト
ソルダレジストを塗布して、フォトリソグラフィ技術に
より配線レジストパターンを形成する工程と、化学銅め
っきと電気銅めっきを併用して、従来のアディティブ法
の化学銅めっきのみに比べて使用寿命が2倍以上の物理
特性に優れた堅牢な銅めっき層を形成する工程、および
基板上の不要な部分の銅めっき層を除去する工程を、少
なくとも1回以上繰り返して行うことにより配線パター
ンを形成する工程と、基板上に配線および部品搭載用の
ソルダレジストパターンを形成する工程を少なくとも含
む高密度プリント配線基板の製造方法とするものであ
る。また、本発明は請求項2に記載のように、請求項1
において、化学銅めっきと電気銅めっきを併用する最初
の電気銅めっき層の厚さを、必要とする銅めっき層の厚
さの1/2以下とする工程を含む高密度プリント配線基
板の製造方法とするものである。本発明の高密度プリン
ト配線基板の製造方法は、請求項1に記載のように、フ
ォトソルダレジストを用いて、フォトリソグラフィ技術
により微細配線レジストパターンを形成する工程と、化
学銅めっきと電気銅めっきを併用して物理特性に優れた
堅牢な銅めっき層を形成し、次いで基板上の不要な部分
の銅めっき層を除去する工程を少なくとも1回以上繰り
返すことにより微細配線パターンを形成するので、回路
幅30μm程度の微細配線回路を容易に高精度に形成す
ることが可能となり、かつ化学銅めっきと電気(電解)
銅めっきを併用するため物理特性の良好な微細配線パタ
ーンを作製することができるので、微細配線回路の断線
不良の発生を抑止することが可能となり、信頼性の高い
高密度プリント配線基板が得られる効果がある。さら
に、電気銅めっきの併用により銅めっき工程の時間が短
縮されるので生産性の向上効果がある。また、本発明は
請求項2に記載のように、化学銅めっきと電気銅めっき
を併用する最初の電気銅めっき層の厚さを、必要とする
銅めっき層の厚さの1/2以下に調整し、さらにその上
に銅めっき層を繰り返し積層する構成となるので、緻密
で物理特性に優れた堅牢な銅配線パターンが得られ、信
頼性の高い高密度プリント配線基板を実現できる効果が
ある。
Means for Solving the Problems In order to achieve the object of the present invention, the present invention is configured as described in the claims. That is, the present invention provides a method for manufacturing a printed wiring board having both functions of wiring and component mounting, wherein a photo solder resist is applied on a predetermined board, and a photolithography technique is used. Robust copper plating with excellent physical properties, with a service life more than twice as long as the conventional additive copper chemical plating only, using a process of forming a wiring resist pattern with chemical copper plating and electrolytic copper plating Forming a wiring pattern by repeating the step of forming a layer and the step of removing an unnecessary portion of the copper plating layer on the substrate at least once or more; and forming a wiring and a solder for mounting components on the substrate. A method of manufacturing a high-density printed wiring board including at least a step of forming a resist pattern. Further, the present invention provides the first aspect as described in the second aspect.
A method for manufacturing a high-density printed wiring board, comprising the step of reducing the thickness of an initial copper plating layer, in which chemical copper plating and copper electroplating are used together, to 以下 or less of the required copper plating layer thickness It is assumed that. The method for manufacturing a high-density printed wiring board according to the present invention includes, as described in claim 1, a step of forming a fine wiring resist pattern by a photolithography technique using a photo solder resist; To form a fine wiring pattern by repeating a process of forming a robust copper plating layer having excellent physical properties and then removing unnecessary portions of the copper plating layer at least once on the substrate at least once or more. A fine wiring circuit with a width of about 30 μm can be easily formed with high precision, and chemical copper plating and electric (electrolysis)
Since copper plating is used in combination, a fine wiring pattern having good physical characteristics can be produced, so that occurrence of disconnection failure of a fine wiring circuit can be suppressed, and a highly reliable high-density printed wiring board can be obtained. effective. Furthermore, the combined use of electrolytic copper plating shortens the time of the copper plating step, and thus has the effect of improving productivity. Further, as set forth in claim 2, the present invention reduces the thickness of the first electrolytic copper plating layer using both chemical copper plating and electrolytic copper plating to 1 / or less of the thickness of the required copper plating layer. Adjustment, and further, a copper plating layer is repeatedly laminated thereon, so that a dense copper wiring pattern with excellent physical properties can be obtained, which has the effect of realizing a highly reliable high-density printed wiring board. .

【0005】[0005]

【発明の実施の形態】図1(a)〜(e)および図2
(f)〜(i)に、本発明の高密度プリント配線基板の
作製過程の一例を示す。本発明の高密度プリント配線基
板の製造方法は、従来のアディティブ法で用いられるめ
っきレジストに代えて、フォトソルダレジスト(プリン
ト配線基板の最外層表面に塗布し写真法によりパターニ
ングするソルダレジスト)を用いて、微細導体配線パタ
ーンを形成し、次に、通常のプリント基板の製造工程に
おいて用いられている化学銅めっきと電気銅めっきを併
用して、従来のアディティブ法の化学銅めっきのみに比
べて使用寿命が2倍以上の物理的特性に優れた堅牢な導
体配線パターンを比較的短時間に形成する工程と、不要
な部分の銅めっきを機械的に研磨除去(一般には、プリ
ント配線基板の銅めっきの研磨に使用されているバフロ
ールによる研磨機を用いる)する工程と、上記化学銅め
っきと電気銅めっきを併用する工程と、上記不要な部分
の銅めっきを機械的に研磨除去する工程を、少なくとも
1回以上繰り返して行う工程と、基板表面に配線および
部品搭載用のソルダレジストパターンを形成する工程を
含む高密度で微細な配線を有するプリント配線基板を作
製する方法である。ここで、図1(a)〜(e)および
図2(f)〜(i)を用いて、本発明の高密度配線の製
造方法の一例を説明する。図1(a)に、基板(銅張り
積層板)1として用いたガラスエポキシ材よりなる積層
板の表裏に銅箔2を張った積層板の構成を示す。図1
(b)は、スルーホール形成のための孔3の孔開け加工
を行い、銅箔2を薬液によりエッチングして除去した状
態を示す。図1(c)は、基板1の両面に、フォトソル
ダレジスト4を塗布した状態を示す。図1(d)は、フ
ォトソルダレジスト4に対し、フォトマスクを用いて、
感光・現像処理を行い、微細配線用のめっきレジストパ
ターン(ソルダレジストパターン)5を形成して、該め
っきレジストパターン5を乾燥キュアした状態を示す。
図1(e)は、通常のプリント配線基板の製造で行う
化学銅めっきにより極薄い化学銅めっき層を形成した後
に、電気銅めっきを行う。なお、この時点での電気銅
めっき層の厚さは、必要とする銅めっき厚さの1/2以
下とする。図2(f)は、めっきレジストパターン5上
に析出した不要な銅めっき層を機械的に研磨し除去した
状態を示す。図2(g)は、再び上記図1(e)に示す
銅めっきを繰り返して行う工程を示す。図2(h)は、
再び上記図2(f)の研磨を繰り返して行う工程を示
す。上記した図1(e)、図2(f)、図2(g)、図
2(h)の工程を繰り返して、所望する任意の厚さの銅
めっき層を有する微細配線を形成する工程を行った後、
図2(i)に示すように、基板表面にフォトソルダレジ
ストを塗布して、基板表面に配線および部品搭載用のソ
ルダレジストパターン9を形成することにより信頼性の
高い高密度プリント配線基板が得られる。
1 (a) to 1 (e) and FIG.
(F) to (i) show an example of a manufacturing process of the high-density printed wiring board of the present invention. The method for manufacturing a high-density printed wiring board of the present invention uses a photo solder resist (a solder resist that is applied to the outermost layer surface of a printed wiring board and patterned by a photographic method) instead of the plating resist used in the conventional additive method. Then, a fine conductor wiring pattern is formed, and then the combined use of the chemical copper plating and the electrolytic copper plating used in the normal printed circuit board manufacturing process is used, compared with the conventional additive method only of the chemical copper plating. A process of forming a robust conductor wiring pattern with excellent physical characteristics with a service life more than twice as long, in a relatively short time, and mechanically polishing and removing unnecessary portions of copper plating (generally, copper plating of printed wiring boards) Using a polishing machine with a buff roll used for polishing), a step of using both the chemical copper plating and the electrolytic copper plating, and High-density and fine wiring including a step of repeating the step of mechanically polishing and removing unnecessary portions of copper plating at least once or more, and a step of forming a wiring and a solder resist pattern for component mounting on the substrate surface This is a method for producing a printed wiring board having the following. Here, an example of a method for manufacturing a high-density wiring of the present invention will be described with reference to FIGS. 1 (a) to 1 (e) and 2 (f) to 2 (i). FIG. 1A shows a configuration of a laminated board in which a copper foil 2 is stretched on both sides of a laminated board made of a glass epoxy material used as a substrate (copper-clad laminated board) 1. FIG.
(B) shows a state in which a hole 3 for forming a through hole is formed, and the copper foil 2 is removed by etching with a chemical solution. FIG. 1C shows a state where the photo solder resist 4 is applied to both surfaces of the substrate 1. FIG. 1 (d) shows that a photomask is used for the photo solder resist 4.
A state is shown in which a plating resist pattern (solder resist pattern) 5 for fine wiring is formed by performing exposure and development processes, and the plating resist pattern 5 is dried and cured.
FIG. 1E shows a case where an extremely thin chemical copper plating layer is formed by chemical copper plating performed in the manufacture of a normal printed wiring board, and then electrolytic copper plating is performed. In addition, the thickness of the electrolytic copper plating layer at this point is set to be equal to or less than の of the required copper plating thickness. FIG. 2F shows a state where an unnecessary copper plating layer deposited on the plating resist pattern 5 is mechanically polished and removed. FIG. 2G shows a step of repeatedly performing the copper plating shown in FIG. 1E again. FIG. 2 (h)
The step of repeatedly performing the polishing in FIG. 2F again is shown. 1 (e), 2 (f), 2 (g), and 2 (h) are repeated to form a fine wiring having a copper plating layer having a desired thickness. After going,
As shown in FIG. 2 (i), a highly reliable high-density printed wiring board is obtained by applying a solder resist on the surface of the substrate and forming a solder resist pattern 9 for wiring and component mounting on the surface of the substrate. Can be

【0006】[0006]

【発明の効果】本発明の高密度プリント配線基板の製造
方法は、以下に示す効果がある。 (1)微細配線回路が容易に高精度に形成することがで
きる。 (2)電気(電解)銅めっきを併用するため物理特性に
優れた微細配線回路が形成できるので、信頼性の高い高
密度プリント配線基板が得られる。 (3)銅めっき工程の時間が短縮され、生産性が向上す
る。 (4)微細配線回路の断線不良の発生が少なくなり、信
頼性が向上する。 (5)また、配線回路の電気的特性(インピーダンス
等)の制御が容易となる。
The method for manufacturing a high-density printed wiring board according to the present invention has the following effects. (1) A fine wiring circuit can be easily formed with high precision. (2) Since a fine wiring circuit having excellent physical characteristics can be formed by using electric (electrolytic) copper plating together, a highly reliable high-density printed wiring board can be obtained. (3) The time of the copper plating process is shortened, and the productivity is improved. (4) The occurrence of disconnection failure of the fine wiring circuit is reduced, and the reliability is improved. (5) In addition, it is easy to control the electrical characteristics (such as impedance) of the wiring circuit.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施の形態で例示したプリント配線基
板の製造過程を示す工程図。
FIG. 1 is a process chart showing a manufacturing process of a printed wiring board exemplified in an embodiment of the present invention.

【図2】本発明の実施の形態で例示したプリント配線基
板の製造過程を示す工程図。
FIG. 2 is a process chart showing a manufacturing process of the printed wiring board exemplified in the embodiment of the present invention.

【図3】従来のプリント配線基板の製造過程を示す工程
図。
FIG. 3 is a process diagram showing a process for manufacturing a conventional printed wiring board.

【符号の説明】[Explanation of symbols]

1…基板(銅張り積層板) 2…銅箔 3…孔 4…フォトソルダレジスト 5…めっきレジストパターン(ソルダレジストパター
ン) 6…化学銅めっきと電気銅めっきの積層体 7…化学銅めっきと電気銅めっきの積層体 8…スルーホール 9…ソルダレジストパターン 11…基板(触媒入り接着剤付き積層板) 12…接着剤 13…孔 14…めっきレジストパターン 15…化学銅めっき層 16…スルーホール 17…ソルダレジストパターン
DESCRIPTION OF SYMBOLS 1 ... Substrate (copper laminated board) 2 ... Copper foil 3 ... Hole 4 ... Photo solder resist 5 ... Plating resist pattern (solder resist pattern) 6 ... Laminated body of chemical copper plating and electrolytic copper plating 7 ... Chemical copper plating and electricity Copper plating laminate 8 ... Through hole 9 ... Solder resist pattern 11 ... Substrate (laminate plate with adhesive containing catalyst) 12 ... Adhesive 13 ... Hole 14 ... Plating resist pattern 15 ... Chemical copper plating layer 16 ... Through hole 17 ... Solder resist pattern

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】配線と部品搭載の両機能を持つプリント配
線基板を製造する方法であって、 所定の基板上にフォトソルダレジストを塗布して、フォ
トリソグラフィ技術により配線レジストパターンを形成
する工程と、 化学銅めっきと電気銅めっきを併用して、従来のアディ
ティブ法の化学銅めっきのみに比べて使用寿命が2倍以
上の物理特性に優れた堅牢な銅めっき層を形成する工
程、および基板上の不要な部分の銅めっき層を除去する
工程を、少なくとも1回以上繰り返して行うことにより
配線パターンを形成する工程と、 基板上に配線および部品搭載用のソルダレジストパター
ンを形成する工程を少なくとも含むことを特徴とする高
密度プリント配線基板の製造方法。
1. A method for manufacturing a printed wiring board having both functions of wiring and component mounting, comprising: applying a photo solder resist on a predetermined substrate, and forming a wiring resist pattern by a photolithography technique. A process of using a chemical copper plating and an electrolytic copper plating together to form a robust copper plating layer having excellent physical properties with a service life more than twice that of the conventional additive copper plating, and Forming a wiring pattern by repeating the step of removing the unnecessary portion of the copper plating layer at least once or more, and a step of forming a solder resist pattern for wiring and component mounting on the substrate A method for manufacturing a high-density printed wiring board, comprising:
【請求項2】請求項1において、化学銅めっきと電気銅
めっきを併用する最初の電気銅めっき層の厚さは、必要
とする銅めっき層の厚さの1/2以下とすることを特徴
とする高密度プリント配線基板の製造方法。
2. The method according to claim 1, wherein the thickness of the first electrolytic copper plating layer in which the chemical copper plating and the electrolytic copper plating are used together is not more than 1 / of the required thickness of the copper plating layer. Method for manufacturing a high-density printed wiring board.
JP13978497A 1997-05-29 1997-05-29 Manufacture of high-density printed wiring board Pending JPH10335786A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13978497A JPH10335786A (en) 1997-05-29 1997-05-29 Manufacture of high-density printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13978497A JPH10335786A (en) 1997-05-29 1997-05-29 Manufacture of high-density printed wiring board

Publications (1)

Publication Number Publication Date
JPH10335786A true JPH10335786A (en) 1998-12-18

Family

ID=15253354

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13978497A Pending JPH10335786A (en) 1997-05-29 1997-05-29 Manufacture of high-density printed wiring board

Country Status (1)

Country Link
JP (1) JPH10335786A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100403761B1 (en) * 2001-11-26 2003-10-30 세일전자 주식회사 Fabrication method of high reliability printed circuit board
JP2015141998A (en) * 2014-01-28 2015-08-03 ファナック株式会社 Printed circuit board including structure for preventing disconnection of wiring pattern due to corrosion

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100403761B1 (en) * 2001-11-26 2003-10-30 세일전자 주식회사 Fabrication method of high reliability printed circuit board
JP2015141998A (en) * 2014-01-28 2015-08-03 ファナック株式会社 Printed circuit board including structure for preventing disconnection of wiring pattern due to corrosion

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