JPS59194480A - Manufacture of solar battery - Google Patents

Abstract

PURPOSE:To facilitate positioning work by positioning a magnetic material as a mask material, disposing a magnet at the opposite mask material side to improve the bondability between a substrate and the mask material, and then forming an amorphous film. CONSTITUTION:A back plate 22 in which a plurality of magnets 21 are buried at the predetermined positions is placed on the back surface 27 of a transparent substrate 24 in which the substrate 24 attached with a transparent electrode 23 of the prescribed pattern and a mask 25 of magnetic material punched in the prescribed pattern are superposed, and the mask 25 is closely contacted with the substrate 24 via the magnets 21. Then, the mask 25, the substrate 24 and the back plate 22 thus poitioned merely are set by a holder 26 formed of a magnetic material to simply secure them to the holder in the positioned state.

Description

DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method for manufacturing an amorphous solar cell.

With the exception of some special applications, the fields of application of solar cells can be broadly divided into two: consumer use and power use. Among these, in the consumer field, recent display elements and LS
As the power consumption of I and other devices continues to decrease, and more and more Nariko devices are being introduced that are powered entirely by solar cells, with indoor light such as fluorescent lamps being the only light source, expectations for inexpensive, high-performance solar cells are increasing. There is.

Furthermore, in the field of electric power, large-scale solar power generation systems are under construction and operation, and expectations are high for inexpensive, high-performance solar cells.

Conventional Structure and Problems Conventionally, in the manufacturing process of amorphous solar cells, as shown in FIG. 2. Overlap the mask 3 with holes made in the
Place the holder 6 together with a suitable back plate 4 to be placed on top, fix the whole thing with the fixing pins 6, and attach the plasma C,
It is installed in a reactor such as a VD device, the atmosphere is kept in a vacuum, the entire appropriate amount of raw material gas such as 81% is passed through, the temperature of the substrate 1 is maintained at 200 to 30 degrees Celsius, and the holder 5 and the other electrode 7 are connected to each other. During this time, plasma was generated to deposit an amorphous film 9 on the main surface 8 of the substrate 1 only in the holes of the mask 3, as shown in FIG.

After that, the back electrode 10 is formed by vapor deposition or the like as shown in FIG.
By superimposing a f, series connection between each element was also performed. However, as shown in FIG. 5, bleeding 11 of the amorphous film and interference fringes 12 were likely to occur. Of these, the oozing 11 of the amorphous film is caused by the hook-shaped portion 1 of the back electrode 1o of the hook-shaped portion 2a at the tip of the transparent electrode 2, as described above.
If it occurs in a portion overlapping with 0a, the resistance of the oozing portion 11 of the amorphous film is very large, making series connection impossible and resulting in poor characteristics. Furthermore, even when oozing 11 occurs in other areas, abnormality in film quality at the oozing area may result in poor quality or poor appearance.

Here, the oozing 11 of the amorphous film and the interference fringes 12 mentioned above are shown.
The reason for this is that when the material of the mask 3 is stainless steel or the like, if the thickness is less than about 0.5 mm, it will bend severely when heated to about 200 to 300 degrees Celsius.
Due to this stiffness, the adhesion between the main surface 8 of the substrate 1 and the mask 3 is poor, and oozing 11 of the amorphous film is likely to occur. Further, when the thickness of the mask 3 is O,sm+n or more, the plasma in the vicinity is disturbed due to the step between the main surface 8 of the substrate 1 and the mask 3, and the interference fringes 12 of the amorphous film are This tends to occur, and when it occurs, it is easily noticeable in appearance. Therefore, in order to reduce both oozing and interference fringes as much as possible, the mask 3 having a thickness of about 0.5 mm is usually used. Since interference fringes on the film surface due to the effect of thickness on plasma discharge cannot be eliminated, poor characteristics and poor appearance always exist.

Furthermore, in the conventional method, in order to prevent misalignment when aligning the substrate 1 and the mask 3, the substrate 1 and the mask 3 are inserted into the holder 5 and then fixed with fixing pins 6, but this method has poor workability and However, there is a drawback that misalignment is likely to occur during alignment work.

OBJECTS OF THE INVENTION Therefore, the entire object of the present invention is to provide a method for manufacturing an amorphous solar cell, which overcomes all the drawbacks of the conventional methods described above.

Structure of the Invention In order to achieve the above object, the present invention uses magnetic #- as the material of the mask used to selectively form an amorphous film, and the mask is attracted and brought into close contact with the substrate surface by a magnet. It is characterized by this.

Description of examples Examples of the present invention will be described in detail below.

As shown in FIG. 6, a plurality of magnets 21 are placed at predetermined positions in advance.
A transparent electrode 23 of a predetermined pattern is attached to the back plate 22 embedded with
Place the transparent substrate 24 with the above-mentioned mask 24 on the back surface 27 of the substrate 24, which is made by overlapping a mask 25 made of a magnetic material (SUS430. It is brought into close contact with the substrate 24 using a magnet 21. What is important here is that the total thickness of the mask 25 must be 0.3 mm or less in order to completely eliminate the interference fringes of the amorphous film as described above. However, the board 24 is 200
The mask 25 is heated to a temperature of ~300'C.
If the thickness of the mask 25 is less than 0.5 m, the strength of the mask 25 alone will cause thermal expansion.
As shown in Figure 2, the magnet cannot absorb thermal expansion and warps, and furthermore, if the key temperature is less than 30°C, the magnet will lose its magnetic force. Therefore, it is important to improve the adhesion between the mask 25 and the substrate 24 by using the magnet 21 having a high Curie temperature. Therefore, the Curie temperature of the magnet used here is 30° C. or higher, and the mask 25 was experimentally connected to the substrate 2.
4, a residual magnetic flux density of 3000 Gauss or more is required.

Next, the mask 25 and substrate 2 that have been aligned in this way are
4 and the back plate 22 in a holder 26 made of a magnetic material, they can be easily fixed to the holder in an aligned state.

Effects of the Invention According to the present invention, a solar cell with high shape accuracy can be manufactured very easily and at low cost without the oozing of the amorphous film or the generation of interference fringes. Further, in the manufacturing process, there is no need for complicated fixing work after alignment, and the aligned substrate and mask can be easily fixed to the holder using all the magnets.

[Brief explanation of the drawing]

Figure 1 is a diagram showing the complete alignment of the transparent substrate and mask in the conventional solar cell manufacturing method, Figure 2 is a diagram showing the aligned substrate and mask holder set in a reactor, and Figure 3 is a diagram showing the alignment of the transparent substrate and mask in the conventional solar cell manufacturing method. Figure 4 shows the amorphous film deposited in the hole of the mask, Figure 4 shows the back electrode formed on the amorphous film in Figure 3, and Figure 5 shows the oozing and interference of the amorphous film. FIG. 6 is a diagram showing the back plate in which a magnet is embedded in an embodiment of the present invention. FIG. 7 is a diagram showing the back plate in which a magnet is embedded in the embodiment of the present invention. FIG. It is a diagram. 1124...Transparent substrate, 2.23...Transparent electrode, 3.25...Mask, 4,22...Placement plate, 5
, 26...Holder, 21...Magnet. Name of agent: Patent attorney Toshio Nakao and 1 other person No. 1
Figure 2 Figure 3

Claims (3)

[Claims] (1) A method for manufacturing an amorphous solar cell, in which only the necessary parts of the substrate excluding terminals, series-parallel connections, etc. A magnetic material is positioned as a mask material for forming an amorphous film, and a magnet is placed on the side of the substrate opposite to the mask material in order to improve the adhesion between the substrate and the mask material, and then the amorphous film is formed. A method for manufacturing a solar cell characterized by forming a solar cell. (2) The method for manufacturing a solar cell according to claim 1, wherein the thickness of the mask material is 0.3a or less. (3) The method for manufacturing a solar cell according to claim 1, wherein the Curie temperature of the magnet is 300° C. or higher, and the residual magnetic density is 3000 Gauss or higher.