JPS59190399A - 浸漬処理物への空気導入装置 - Google Patents

浸漬処理物への空気導入装置

Info

Publication number
JPS59190399A
JPS59190399A JP4193683A JP4193683A JPS59190399A JP S59190399 A JPS59190399 A JP S59190399A JP 4193683 A JP4193683 A JP 4193683A JP 4193683 A JP4193683 A JP 4193683A JP S59190399 A JPS59190399 A JP S59190399A
Authority
JP
Japan
Prior art keywords
air
float
panel
air introduction
treated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4193683A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0346557B2 (https=
Inventor
Takatsugu Teramoto
寺本　隆次
Eiji Matsushima
松島　英治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mazda Motor Corp
Original Assignee
Mazda Motor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mazda Motor Corp filed Critical Mazda Motor Corp
Priority to JP4193683A priority Critical patent/JPS59190399A/ja
Publication of JPS59190399A publication Critical patent/JPS59190399A/ja
Publication of JPH0346557B2 publication Critical patent/JPH0346557B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Coating Apparatus (AREA)
JP4193683A 1983-03-14 1983-03-14 浸漬処理物への空気導入装置 Granted JPS59190399A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4193683A JPS59190399A (ja) 1983-03-14 1983-03-14 浸漬処理物への空気導入装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4193683A JPS59190399A (ja) 1983-03-14 1983-03-14 浸漬処理物への空気導入装置

Publications (2)

Publication Number Publication Date
JPS59190399A true JPS59190399A (ja) 1984-10-29
JPH0346557B2 JPH0346557B2 (https=) 1991-07-16

Family

ID=12622105

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4193683A Granted JPS59190399A (ja) 1983-03-14 1983-03-14 浸漬処理物への空気導入装置

Country Status (1)

Country Link
JP (1) JPS59190399A (https=)

Also Published As

Publication number Publication date
JPH0346557B2 (https=) 1991-07-16

Similar Documents

Publication Publication Date Title
US5569330A (en) Method and device for chemically treating substrates
US5361789A (en) Washing/drying method and apparatus
US6109278A (en) Liquid treatment method and apparatus
CN103187339B (zh) 基板处理装置以及基板处理方法
US20200027758A1 (en) Substrate processing apparatus
KR920013640A (ko) 유입 및 유출 평형이 이루어지는 재순환 화학조
JPS59190399A (ja) 浸漬処理物への空気導入装置
JP2001044106A (ja) ウエット装置
JP2006100717A (ja) 基板処理方法およびその装置
JPH07245290A (ja) ウエハエッチング方法
JPS59190393A (ja) 浸漬処理物への空気導入装置
JPH0437131A (ja) 半導体ウエハの純水水洗槽及び水洗方法
US20020139401A1 (en) Wet process station with water spray of wafer reverse side
JPS59190395A (ja) 浸漬処理物への空気導入装置
JPH0443639A (ja) 半導体装置の製造方法
JPH0345950Y2 (https=)
JP3447881B2 (ja) 半導体ウェハの乾燥方法
JPH04144132A (ja) 基板乾燥方法
JPH11314025A (ja) 膜の洗浄方法
JPS6248547B2 (https=)
JPH0594978A (ja) 半導体基板浸漬処理槽
JPS62190729A (ja) 水洗装置
JPH0860375A (ja) めっき方法及びめっき装置
JPH0444323A (ja) 基板の水切り乾燥装置
JPH02304925A (ja) 半導体ウェハ乾燥装置