JPS59190399A - 浸漬処理物への空気導入装置 - Google Patents
浸漬処理物への空気導入装置Info
- Publication number
- JPS59190399A JPS59190399A JP4193683A JP4193683A JPS59190399A JP S59190399 A JPS59190399 A JP S59190399A JP 4193683 A JP4193683 A JP 4193683A JP 4193683 A JP4193683 A JP 4193683A JP S59190399 A JPS59190399 A JP S59190399A
- Authority
- JP
- Japan
- Prior art keywords
- air
- float
- panel
- air introduction
- treated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title claims abstract description 30
- 239000007788 liquid Substances 0.000 claims abstract description 28
- 230000007423 decrease Effects 0.000 claims abstract description 4
- 230000000994 depressogenic effect Effects 0.000 abstract 1
- 230000010355 oscillation Effects 0.000 abstract 1
- 238000004070 electrodeposition Methods 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 1
Landscapes
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Coating Apparatus (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4193683A JPS59190399A (ja) | 1983-03-14 | 1983-03-14 | 浸漬処理物への空気導入装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4193683A JPS59190399A (ja) | 1983-03-14 | 1983-03-14 | 浸漬処理物への空気導入装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59190399A true JPS59190399A (ja) | 1984-10-29 |
| JPH0346557B2 JPH0346557B2 (enrdf_load_stackoverflow) | 1991-07-16 |
Family
ID=12622105
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4193683A Granted JPS59190399A (ja) | 1983-03-14 | 1983-03-14 | 浸漬処理物への空気導入装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59190399A (enrdf_load_stackoverflow) |
-
1983
- 1983-03-14 JP JP4193683A patent/JPS59190399A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0346557B2 (enrdf_load_stackoverflow) | 1991-07-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5361789A (en) | Washing/drying method and apparatus | |
| KR100364161B1 (ko) | 화학적기판처리방법및그장치 | |
| US11024520B2 (en) | Substrate processing apparatus | |
| US20110048468A1 (en) | Liquid processing apparatus and liquid processing method | |
| KR920013640A (ko) | 유입 및 유출 평형이 이루어지는 재순환 화학조 | |
| JPS59190399A (ja) | 浸漬処理物への空気導入装置 | |
| JP2006100717A (ja) | 基板処理方法およびその装置 | |
| JPH07245290A (ja) | ウエハエッチング方法 | |
| JPS59190394A (ja) | 浸漬処理物への空気導入装置 | |
| JPS59190398A (ja) | 浸漬処理物への空気導入装置 | |
| JPH0437131A (ja) | 半導体ウエハの純水水洗槽及び水洗方法 | |
| US20020139401A1 (en) | Wet process station with water spray of wafer reverse side | |
| JPH0443639A (ja) | 半導体装置の製造方法 | |
| JPS59190395A (ja) | 浸漬処理物への空気導入装置 | |
| JPH0345950Y2 (enrdf_load_stackoverflow) | ||
| JPH04144132A (ja) | 基板乾燥方法 | |
| JPH11314025A (ja) | 膜の洗浄方法 | |
| JPS6248547B2 (enrdf_load_stackoverflow) | ||
| JPH0594978A (ja) | 半導体基板浸漬処理槽 | |
| JPH071763B2 (ja) | 基体収容装置及び基体乾燥方法 | |
| JPS62190729A (ja) | 水洗装置 | |
| TW472287B (en) | Drying method for substrate and the device thereof | |
| JPS61125136A (ja) | 処理槽 | |
| JPH02304925A (ja) | 半導体ウェハ乾燥装置 | |
| JPH0860375A (ja) | めっき方法及びめっき装置 |