JPS59188135A - 半導体基板の吸着方法 - Google Patents

半導体基板の吸着方法

Info

Publication number
JPS59188135A
JPS59188135A JP6089983A JP6089983A JPS59188135A JP S59188135 A JPS59188135 A JP S59188135A JP 6089983 A JP6089983 A JP 6089983A JP 6089983 A JP6089983 A JP 6089983A JP S59188135 A JPS59188135 A JP S59188135A
Authority
JP
Japan
Prior art keywords
substrate
plates
semiconductor substrate
voltage
attracting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6089983A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0531300B2 (enExample
Inventor
Toshimasa Kisa
木佐　俊正
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP6089983A priority Critical patent/JPS59188135A/ja
Publication of JPS59188135A publication Critical patent/JPS59188135A/ja
Publication of JPH0531300B2 publication Critical patent/JPH0531300B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H01L21/6833—Details of electrostatic chucks

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
JP6089983A 1983-04-08 1983-04-08 半導体基板の吸着方法 Granted JPS59188135A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6089983A JPS59188135A (ja) 1983-04-08 1983-04-08 半導体基板の吸着方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6089983A JPS59188135A (ja) 1983-04-08 1983-04-08 半導体基板の吸着方法

Publications (2)

Publication Number Publication Date
JPS59188135A true JPS59188135A (ja) 1984-10-25
JPH0531300B2 JPH0531300B2 (enExample) 1993-05-12

Family

ID=13155661

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6089983A Granted JPS59188135A (ja) 1983-04-08 1983-04-08 半導体基板の吸着方法

Country Status (1)

Country Link
JP (1) JPS59188135A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150044814A (ko) 2013-10-17 2015-04-27 가부시끼가이샤 신꼬 몰드 도전성 실리콘 고무제 전극 패턴의 제작 방법과 올 실리콘 고무제 정전 척 및 그 제조 방법

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55122352U (enExample) * 1979-02-21 1980-08-30

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55122352U (enExample) * 1979-02-21 1980-08-30

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150044814A (ko) 2013-10-17 2015-04-27 가부시끼가이샤 신꼬 몰드 도전성 실리콘 고무제 전극 패턴의 제작 방법과 올 실리콘 고무제 정전 척 및 그 제조 방법

Also Published As

Publication number Publication date
JPH0531300B2 (enExample) 1993-05-12

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