JPS59185772A - 高融点金属化合物における蒸発ガスの流量制御装置 - Google Patents
高融点金属化合物における蒸発ガスの流量制御装置Info
- Publication number
- JPS59185772A JPS59185772A JP5972583A JP5972583A JPS59185772A JP S59185772 A JPS59185772 A JP S59185772A JP 5972583 A JP5972583 A JP 5972583A JP 5972583 A JP5972583 A JP 5972583A JP S59185772 A JPS59185772 A JP S59185772A
- Authority
- JP
- Japan
- Prior art keywords
- carrier gas
- gas
- flow rate
- tank
- pipe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000002844 melting Methods 0.000 title claims abstract description 13
- 238000001704 evaporation Methods 0.000 title claims abstract description 12
- 230000008018 melting Effects 0.000 title claims abstract description 12
- 229910000765 intermetallic Inorganic materials 0.000 title 1
- 239000007789 gas Substances 0.000 claims abstract description 49
- 239000012159 carrier gas Substances 0.000 claims abstract description 38
- 150000002736 metal compounds Chemical class 0.000 claims description 11
- 230000008020 evaporation Effects 0.000 claims description 7
- 238000005259 measurement Methods 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 2
- 239000008246 gaseous mixture Substances 0.000 abstract 3
- 238000000034 method Methods 0.000 description 4
- 238000010574 gas phase reaction Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229940126214 compound 3 Drugs 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000001947 vapour-phase growth Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- GICWIDZXWJGTCI-UHFFFAOYSA-I molybdenum pentachloride Chemical compound Cl[Mo](Cl)(Cl)(Cl)Cl GICWIDZXWJGTCI-UHFFFAOYSA-I 0.000 description 1
- KPGXUAIFQMJJFB-UHFFFAOYSA-H tungsten hexachloride Chemical compound Cl[W](Cl)(Cl)(Cl)(Cl)Cl KPGXUAIFQMJJFB-UHFFFAOYSA-H 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5972583A JPS59185772A (ja) | 1983-04-05 | 1983-04-05 | 高融点金属化合物における蒸発ガスの流量制御装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5972583A JPS59185772A (ja) | 1983-04-05 | 1983-04-05 | 高融点金属化合物における蒸発ガスの流量制御装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59185772A true JPS59185772A (ja) | 1984-10-22 |
| JPH0362790B2 JPH0362790B2 (enrdf_load_stackoverflow) | 1991-09-27 |
Family
ID=13121460
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5972583A Granted JPS59185772A (ja) | 1983-04-05 | 1983-04-05 | 高融点金属化合物における蒸発ガスの流量制御装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59185772A (enrdf_load_stackoverflow) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60102251U (ja) * | 1983-12-14 | 1985-07-12 | 日本電気株式会社 | 気相成長装置 |
| JPS6191301U (enrdf_load_stackoverflow) * | 1984-11-17 | 1986-06-13 | ||
| EP0382987A1 (en) * | 1989-02-13 | 1990-08-22 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Gas supplying apparatus |
| US6802419B2 (en) | 2002-10-11 | 2004-10-12 | Bert Co Industries, Inc. | Package form and method of making a package |
| US6899223B2 (en) | 2002-05-09 | 2005-05-31 | Bert-Co Industries, Inc. | Form for a package and method of making same |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS513737U (enrdf_load_stackoverflow) * | 1974-06-24 | 1976-01-12 |
-
1983
- 1983-04-05 JP JP5972583A patent/JPS59185772A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS513737U (enrdf_load_stackoverflow) * | 1974-06-24 | 1976-01-12 |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60102251U (ja) * | 1983-12-14 | 1985-07-12 | 日本電気株式会社 | 気相成長装置 |
| JPS6191301U (enrdf_load_stackoverflow) * | 1984-11-17 | 1986-06-13 | ||
| EP0382987A1 (en) * | 1989-02-13 | 1990-08-22 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Gas supplying apparatus |
| US6899223B2 (en) | 2002-05-09 | 2005-05-31 | Bert-Co Industries, Inc. | Form for a package and method of making same |
| US6802419B2 (en) | 2002-10-11 | 2004-10-12 | Bert Co Industries, Inc. | Package form and method of making a package |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0362790B2 (enrdf_load_stackoverflow) | 1991-09-27 |
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