JPS59184442A - 電子線機器のゴニオメ−タステ−ジ - Google Patents

電子線機器のゴニオメ−タステ−ジ

Info

Publication number
JPS59184442A
JPS59184442A JP58057913A JP5791383A JPS59184442A JP S59184442 A JPS59184442 A JP S59184442A JP 58057913 A JP58057913 A JP 58057913A JP 5791383 A JP5791383 A JP 5791383A JP S59184442 A JPS59184442 A JP S59184442A
Authority
JP
Japan
Prior art keywords
sample
slanting
movement
mobile
rotation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58057913A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6352425B2 (enrdf_load_stackoverflow
Inventor
Shigeru Suzuki
繁 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
INTERNATL PRECISION Inc
Original Assignee
INTERNATL PRECISION Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by INTERNATL PRECISION Inc filed Critical INTERNATL PRECISION Inc
Priority to JP58057913A priority Critical patent/JPS59184442A/ja
Publication of JPS59184442A publication Critical patent/JPS59184442A/ja
Publication of JPS6352425B2 publication Critical patent/JPS6352425B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP58057913A 1983-04-04 1983-04-04 電子線機器のゴニオメ−タステ−ジ Granted JPS59184442A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58057913A JPS59184442A (ja) 1983-04-04 1983-04-04 電子線機器のゴニオメ−タステ−ジ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58057913A JPS59184442A (ja) 1983-04-04 1983-04-04 電子線機器のゴニオメ−タステ−ジ

Publications (2)

Publication Number Publication Date
JPS59184442A true JPS59184442A (ja) 1984-10-19
JPS6352425B2 JPS6352425B2 (enrdf_load_stackoverflow) 1988-10-19

Family

ID=13069228

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58057913A Granted JPS59184442A (ja) 1983-04-04 1983-04-04 電子線機器のゴニオメ−タステ−ジ

Country Status (1)

Country Link
JP (1) JPS59184442A (enrdf_load_stackoverflow)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03129653A (ja) * 1989-10-13 1991-06-03 Hitachi Ltd 電子顕微鏡
JP2009266564A (ja) * 2008-04-24 2009-11-12 Jeol Ltd 荷電粒子ビーム装置の試料装置
WO2011093316A1 (ja) * 2010-01-28 2011-08-04 株式会社日立ハイテクノロジーズ イオンミリング装置，試料加工方法，加工装置、および試料駆動機構
CN103210467A (zh) * 2010-11-22 2013-07-17 株式会社日立高新技术 离子铣削装置以及离子铣削加工方法
JP2018206596A (ja) * 2017-06-02 2018-12-27 国立研究開発法人物質・材料研究機構 試料冷却装置
CN112820615A (zh) * 2019-11-15 2021-05-18 Fei 公司 电子显微镜台
US11538652B2 (en) 2019-11-15 2022-12-27 Fei Company Systems and methods of hysteresis compensation
US11562877B2 (en) 2019-11-15 2023-01-24 Fei Company Systems and methods of clamp compensation

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03129653A (ja) * 1989-10-13 1991-06-03 Hitachi Ltd 電子顕微鏡
JP2009266564A (ja) * 2008-04-24 2009-11-12 Jeol Ltd 荷電粒子ビーム装置の試料装置
WO2011093316A1 (ja) * 2010-01-28 2011-08-04 株式会社日立ハイテクノロジーズ イオンミリング装置，試料加工方法，加工装置、および試料駆動機構
JP2011154920A (ja) * 2010-01-28 2011-08-11 Hitachi High-Technologies Corp イオンミリング装置，試料加工方法，加工装置、および試料駆動機構
CN102714125A (zh) * 2010-01-28 2012-10-03 株式会社日立高新技术 离子铣削装置、试料加工方法、加工装置及试料驱动机构
CN103210467A (zh) * 2010-11-22 2013-07-17 株式会社日立高新技术 离子铣削装置以及离子铣削加工方法
JP2018206596A (ja) * 2017-06-02 2018-12-27 国立研究開発法人物質・材料研究機構 試料冷却装置
CN112820615A (zh) * 2019-11-15 2021-05-18 Fei 公司 电子显微镜台
US11244805B2 (en) 2019-11-15 2022-02-08 Fei Company Electron microscope stage
EP3823003A3 (en) * 2019-11-15 2022-09-14 FEI Company Electron microscope stage
US11538652B2 (en) 2019-11-15 2022-12-27 Fei Company Systems and methods of hysteresis compensation
US11562877B2 (en) 2019-11-15 2023-01-24 Fei Company Systems and methods of clamp compensation
US12057286B2 (en) 2019-11-15 2024-08-06 Fei Company Systems and methods of clamp compensation

Also Published As

Publication number Publication date
JPS6352425B2 (enrdf_load_stackoverflow) 1988-10-19

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