JPS59170753A - Electron ray diffracting device - Google Patents

Electron ray diffracting device

Info

Publication number
JPS59170753A
JPS59170753A JP58045062A JP4506283A JPS59170753A JP S59170753 A JPS59170753 A JP S59170753A JP 58045062 A JP58045062 A JP 58045062A JP 4506283 A JP4506283 A JP 4506283A JP S59170753 A JPS59170753 A JP S59170753A
Authority
JP
Japan
Prior art keywords
lens
change
excitation
objective lens
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58045062A
Other languages
Japanese (ja)
Other versions
JPH04336B2 (en
Inventor
Takeshi Tomita
健 富田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP58045062A priority Critical patent/JPS59170753A/en
Publication of JPS59170753A publication Critical patent/JPS59170753A/en
Publication of JPH04336B2 publication Critical patent/JPH04336B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/295Electron or ion diffraction tubes

Abstract

PURPOSE:To prevent movement of a visual field and change in the visual field radius of a diffraction pattern when a convergent angle is changed by changing the excitation intensities of the 1st and 2nd convergent lenses and auxiliary lens cooperatively with the change in the excitation intensity of an objective lens. CONSTITUTION:An operator changes the front magnetic field lens 4a of an objective lens by adjusting an adjuster 12 so as to make the diffraction spot of the diffraction pattern on a fluorescent plate as large as possible within the range when the spots do not overlap each other while observing said spots. Control signals are supplied from converters 13, 14 to excitation power sources 9, 10 by which the excitation intensities of the 1st and 2nd convergent lenses 2, 3 are so excited that the image of an electron tun 1 is formed successively at the same magnification on a sample 5. The position and magnification of a rear magnetic field lens 4b change as well as a change in the output from the adjuster 12 but an auxiliary lens 15 crosses over the diffracted electron rays around a cylindrical part 6 in succession by a converter 17 and an excitation power source 16 and therefore the visual field radius of the diffraction pattern image is maintained max.

Description

【発明の詳細な説明】 1 +%″A−tの利用分野] 本発明は電子線回折パターンを観察(−るIこめの電子
線間IIN装置に関する。
DETAILED DESCRIPTION OF THE INVENTION Field of Use of 1+%''A-t] The present invention relates to an electron beam IIN apparatus for observing electron beam diffraction patterns.

[従来技術] 第1図は、電子線回折パターンを観察するlこめの従来
の電子線回折装置を説明するためのものて゛、図中、1
は電子銃、2.3は各々第1.第2の収束レンズである
。4a 、4bは対物レンズ4の前方及び後方磁界レン
ズであり、これらのレンズ4a、4bの間に試料5が配
置されて(Xる。6(ま試料5を透過した電子線のうち
光軸Cから大きく外れた電子線をカットするための筒状
部であり、この筒状部6の中心に制限視野観察をする際
には制限視野絞り(図示せず)が挿入される。この筒状
部6の後段には中間レンズ及び投影レンズからなるレン
ズ系7が配置されており、更にレンズ系7の一後段には
螢光板8が配置されている。
[Prior Art] Figure 1 is for explaining a conventional electron diffraction apparatus for observing electron diffraction patterns.
is the electron gun, and 2.3 is the first. This is the second converging lens. 4a and 4b are front and rear magnetic field lenses of the objective lens 4, and a sample 5 is placed between these lenses 4a and 4b. This is a cylindrical part for cutting off electron beams that deviate greatly from the cylindrical part 6. When performing selected area observation in the center of this cylindrical part 6, a selected area diaphragm (not shown) is inserted.This cylindrical part A lens system 7 consisting of an intermediate lens and a projection lens is arranged at the rear stage of the lens system 6, and a fluorescent plate 8 is arranged at the rear stage of the lens system 7.

さく、このような装置を用いて、第19、第2の収束レ
ンズ2,3及び前方磁界レンズ4aに・より、電子鏡1
の陶を試$315上に結1免さけるよ−)にして入射せ
しめ、その結果試料5にJ5いで回折された電F線を後
方磁界レンズ41〕によっCΔの位置に結像させ、更に
前記中間レンズの物面位置をこのAの位置に一致せしめ
、最終的に投影1ノンスによってAの位置にで゛きた回
折像を螢光板8」−に投影りれば、第2図に示1ような
電子線回折パターンが得られる。このJ、うな回折パタ
ーンをM¥する場合に、同図にJ3い(19口等で承り
回折スポットの中の模様を観察したい場合がある。この
ような場合に模様を容易に観察するため、スポラ1−ど
スポラ(へとが重なり合わない範囲で、スポラ1〜をて
さるだけ大きく螢光板8に投影りることが望まれる。ス
ポラ1〜の大ぎさを変−化さぜるi= tま、図中2α
で示された収束角を変化さければ良い。この際、スポラ
1−とスポラ1への間隔はi、t s’++のけ煩と、
どの結晶面に基づく回折像であるかによ−)で)Φ々異
なるため、この収束角2αの調整は)Φ絵;的に調整で
きることが必要でdうる。従っC1従来前記収束角2α
の調整は試料5の光軸方向のイ1装置、即ちlFi’−
4票4ずらづ−ことによって行なっていた。イの7jめ
、試11の7座標は」−−セントリックゴニオメータに
おりる標準7位置からずれてしまう。ところC、ユーセ
ントリックゴニオメータは試料が標準の7位置に有る場
合のみ、試料の傾斜角を変化さ1!−(も、観察視野を
同一に保持できるだ(プでdうるため、上述したように
試料が標準2位置からずれてしまうと、試料を傾斜した
際に観察視野が逃OCしまう。
Using such a device, the electronic mirror 1 is
As a result, the electric F rays diffracted by J5 are imaged at the position CΔ by the rear magnetic field lens 41, and further If the object surface position of the intermediate lens is made to coincide with the position A, and the diffraction image that finally appears at the position A by one projection is projected onto the fluorescent plate 8'', the image shown in FIG. An electron diffraction pattern like this is obtained. When making this J, Una diffraction pattern, you may want to observe the pattern inside the diffraction spot by using J3 in the same figure.In order to easily observe the pattern in such cases, Spora 1 - Spora (It is desirable to project Spora 1 ~ as large as possible onto the fluorescent plate 8 within a range where the ends do not overlap. Change the size of Spora 1 ~ i= t, 2α in the figure
All you have to do is change the convergence angle shown by . At this time, the distance between Spora 1- and Spora 1 is i, t s'++, and
Since the diffraction image differs depending on which crystal plane the diffraction image is based on, it is necessary to be able to adjust the convergence angle 2α according to the picture. Therefore, C1 conventionally said convergence angle 2α
The adjustment is performed using the A1 device in the optical axis direction of the sample 5, that is, lFi'-
It was done by 4 votes and 4 shifts. 7j of A, the 7th coordinate of test 11 is shifted from the standard 7th position that falls on the centric goniometer. However, the eucentric goniometer changes the tilt angle of the sample only when the sample is in the standard 7 position! - (Also, the observation field of view can be kept the same.) If the sample deviates from the two standard positions as described above, the observation field of view will miss when the sample is tilted.

更に、試料5の7位置を移動させると、対物レンズの後
方磁界レンズ4bのレンズ作用も異なる1、−め、回折
電子線が前記筒状部6の中心にりIコスA−バーしなく
なり、そのため蛍光板8上に投影される回折像の視野半
径rが小さくなり、注目しくいるスポラ1〜がカットさ
れでしまうことがある。
Furthermore, when the sample 5 is moved from one position to another, the lens action of the rear magnetic field lens 4b of the objective lens changes. Therefore, the visual field radius r of the diffraction image projected onto the fluorescent screen 8 becomes small, and the spora 1 to 1, which are attracting attention, may not be cut out.

1発明の目的] 71\発明は、このような従来の欠点を解決し、前記収
束角2αを変化させた際にも視野が全く移動はヂ、且つ
回折パターンの視野半径rの人きさも変化づることのな
い電子線回折装置を提供することを目的としている。
1 Purpose of the Invention] 71\The invention solves such conventional drawbacks, and the field of view does not shift at all even when the convergence angle 2α is changed, and the sharpness of the field of view radius r of the diffraction pattern also changes. The purpose of this invention is to provide an electron beam diffraction device that does not leak.

[発明の構成] 本発明は電子鏡と、該電子鏡」、りの電子線を収束づる
Iζめの第1.第2の収束レンズど、対物レンズと、軸
から大きく外れた電子線をカッ1へりる筒状部と、中間
及び投影レンズと、該投影し・ンズの後段に配置された
螢光板とを備えた装置1“7(ごおいて、対物レンズの
励磁強度の変化にかかわらり^1(斜面上に電子線が同
一径の結像スポット(照r:・1εひれるように前記第
1.第2の収4!レンズの励Ii! ’i・11度を対
物レンズの励磁強度の変化に連311じi: ’55化
させるための手段ど、対物レンズと中間レンズどの間に
配置された補助レンズと、対物レンズの+il+磁強瓜
の変化にかかわらず8刻、補助レンズを経た電r線を1
;j゛に前記筒状部の中心(、:りに1スA−パーさせ
るため前記対物レンズの励磁強度の変化に連φυしC該
補助しノンスの励磁強度を変化させるための手段とを具
備覆ることを特徴とし−Cいる。
[Structure of the Invention] The present invention provides an electronic mirror and a first lens for converging an electron beam. The second converging lens includes an objective lens, a cylindrical part that captures the electron beam that is largely off-axis, an intermediate lens and a projection lens, and a phosphor plate disposed after the projection lens. The device 1"7 (in this case, regardless of the change in the excitation intensity of the objective lens) 2 convergence 4! Lens excitation Ii! 'i 11 degrees due to change in excitation intensity of objective lens Regardless of the changes in +il + magnetic strength of the lens and objective lens, the electric r-ray that has passed through the auxiliary lens is
;j゛, means for changing the excitation intensity of the nonce in conjunction with the change in the excitation intensity of the objective lens in order to make the center of the cylindrical part It is characterized by covering -C.

[実施例] 以上、図面に基づき本発明の実施例を詳述づる。[Example] The embodiments of the present invention will now be described in detail based on the drawings.

イ(斤明の一突f他例を示す第3図にJ5いて、第1!
ン1と同 の)l′+1成要素に対しては同一の番号が
(=JされC1いる。同図にd5いて、9,10は各々
第1゜第2の収束レンズの電源で゛ある。11は対物レ
ンズ4の励)、競)U源である。この励’f、1に電源
11.J、りの励14電流は調整器12により、調整ひ
きるように<+ニー)’7−い0゜又、励磁用111M
9.10の励磁電流は各′Z調整器12まりの制御信号
を変換器13.1/l ’(介1fI4 シた信号に基
づいて制御される。これら変換Pg13.14は、調整
器12の出力信号を変化ン\は・、−ΩことにJ、り対
物レンズの励liu強石を変化さけた際に、この変化に
もかかわらず電子鏡〈あイ)いはそのクロスオーバー)
の像が試料5上に同一のスポラ1〜径を有して結像され
るように前記第1、第2の収束レンズ2,3の励磁強度
を連動して変化させるためのもので、これら変換器13
3゜1/Iにより調整器12よりの制御信号は第1.第
2の収束レンズ2,3を必要なだけ励磁するだめの制御
信号に変換される。これら変換器13,14は各々メモ
リーとその読み出し機構とからなっ(いる。これ1う各
変換器内のメしり一の記jQ内容は、調整器12の出力
信シー)を杯々変化さt!Iこ際に前方磁界レンズ4a
がその位動をどのように鼓化させるか(ぞの☆化E−δ
)、マ、その際の倍率はどのように変化するか(その変
化量ΔN・1)を予め調べ、この変化に合わせ−C第1
及び第2の収束レンズ2.3をどれだけ励磁することが
必要かを理論的あるいは実験的に求め、この必要な励磁
強19を与える制御信号値を調整器12の各(1〔1に
対応した番地に記憶したものである。更に、対物レンズ
4とN状部6の間には補助レンズ15が1ケ11えられ
(いる。この補助レンズ15の励磁電源1(5の励磁管
流も前記調整器12よりの信号を変換器]7C′変1φ
した侶舅に基づいて制御され、る。変換器17もメモリ
ーどイのt売み出しく幾構とよりなり、このメしり一に
も調整器12の出力信号を変化さけて対物レンズ4の励
磁強度を変化さけた際(こ、この変化(こよらずに帛に
回折電子線を前記筒状部6の中心てり[]1スA−バー
さけるの(こ必g2な電源16の制御13号伯が記憶さ
れている。尚、1くは収束し・ンズ絞りて゛ある。
I (J5 in Figure 3, which shows another example), is the first one!
The same number (=J and C1) is given to the l'+1 component (same as lens 1). In the same figure, 9 and 10 are the power supplies of the 1st and 2nd converging lenses, respectively. .11 is the excitation) and competition) U source of the objective lens 4. This excitation'f, 1 to power supply 11. The excitation 14 current of J and RI is adjusted by the regulator 12 so that
The excitation current of 9.10 is controlled based on the signal which converts the control signal of each 'Z regulator 12 into the converter 13.1/l' (1fI4). When changing the output signal, especially when avoiding changing the excitation power of the objective lens, the electronic mirror (or its crossover)
This is for changing the excitation intensities of the first and second converging lenses 2 and 3 in conjunction so that an image of the same spora 1 to diameter is formed on the sample 5. converter 13
3°1/I, the control signal from the regulator 12 is the first. This is converted into a control signal for exciting the second converging lenses 2 and 3 as necessary. These converters 13 and 14 each consist of a memory and a readout mechanism. ! I At this point, the front magnetic field lens 4a
How does that position become a drum? (zono☆ka E-δ
), Ma, check in advance how the magnification changes at that time (the amount of change ΔN・1), and adjust the -C first according to this change.
The degree to which it is necessary to excite the second converging lens 2.3 is determined theoretically or experimentally, and the control signal value that provides this necessary excitation strength 19 is set for each of the adjusters 12 (1 [corresponding to 1). Furthermore, an auxiliary lens 15 is provided between the objective lens 4 and the N-shaped portion 6. The signal from the regulator 12 is converted to a converter] 7C' change 1φ
It is controlled based on the husband and father in law. The converter 17 also has a number of memory blocks, and when the excitation intensity of the objective lens 4 is changed without changing the output signal of the adjuster 12 (this Changes (do not rely on the diffracted electron beam at the center of the cylindrical part 6 [ ] 1 space A-bar (it is necessary to control the power supply 16 at g2) are stored in No. 13. First, it converges and narrows down the lens.

このような構成において、調整器12の出力信号を変化
させると、この変化に伴なつ゛C対物レレンズ前方磁界
レンズ4− aが変化でるが、調整器12の出力信号を
変換りる変換器13.14よりのnil iJl (i
<弓がこの変化に連動し−C変化して各々励磁電源9,
10に供給されるため、N! 1 +第2の収束レンズ
2,3の励磁強度は電子銃(あるいはそのクロスオーバ
ー)の像が引き続き同一倍率で試:i”l 5上に結像
されるように励磁される。従って、この変化に伴なって
該レンズ4aの物点位置が第3図(こ示寸ように移動す
るため、収束角2αを変化さけることができる。そこで
、操作者は蛍光板8上の回折パターンの回折スポラl〜
を観察しながら、そのスポラ]〜が重ならない範囲でで
きるだけ大きくなるように調整器12の出力を調整づる
In such a configuration, when the output signal of the adjuster 12 is changed, the C objective lens front magnetic field lens 4-a changes due to this change, but the converter 13 that converts the output signal of the adjuster 12 changes. nil iJl (i
<The bow is linked to this change and -C changes, respectively excitation power source 9,
Since it is supplied to 10, N! 1 + The excitation intensity of the second converging lenses 2, 3 is such that the image of the electron gun (or its crossover) is subsequently imaged on the sample i"l 5 at the same magnification. Therefore, this As the object point position of the lens 4a moves as shown in FIG. 3 due to the change, the convergence angle 2α can be avoided. l~
While observing the above, adjust the output of the adjuster 12 so that the spoiler]~ becomes as large as possible without overlapping.

又、この調整器12の出力信号の変化に伴なって1(方
1lii 胃レンズ4bの位動及び46率も変化4るが
、調整器12の出力信号を変換した変換器17よりの制
御13号が励磁電源1Gに供給されるため一補助しンス
15〕は引され°Cさ回析電了ワ;;を−1)a記中ノ
し\Cクロスオーバーさせるように1′[用ηる。11
゛Lつ(、収束角2αの具91整に伴なって回1h電了
線のカッ1〜41が増えることはない。
In addition, as the output signal of the regulator 12 changes, the position and ratio of the gastric lens 4b also change. Since the signal is supplied to the excitation power supply 1G, the auxiliary current 15] is pulled out and the diffraction electricity is reduced to -1) a. Ru. 11
With the adjustment of the convergence angle 2α, the number of cuts 1 to 41 of the 1h power line does not increase.

[効果J ト述1.たJ、う(ご、本発明(二d3い((、L、試
4:lの7位置を変化させることなく前記収Φμ」を連
続的(こ変化させることかC′さると共に、収束角を闘
1ヒ8せた際にも試料にに電子線のクロスオーバー(へ
゛4結@−4る際の倍率を一定に保つことか【、きるた
め、今まで観察していた視野を全く同−川こ保t−,f
Q;から、回折スポラ1への径を連続的(ご調4’l”
 1iることが(さる。更に又、収束角の調整を行なつ
Cし、回折パターン像の視野径1゛も最大に保つ(つど
が(さる。
[Effect J To description 1. It is possible to continuously change the convergence Φμ without changing the 7 position of l. It is important to keep the magnification constant when applying the electron beam to the sample (to avoid the cross-over of the electron beam to the sample). - Kawakobo t-, f
Continuously change the diameter from Q to diffraction spora 1 (adjust 4'l")
Furthermore, the convergence angle is adjusted to keep the field of view diameter of the diffraction pattern image at its maximum.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の装置を説明1するためのl’、xl C
八うり、第2図は蛍光板1に投影される回fliバクー
ン0)回折スポラ1〜と視野の径を説明(」るl、−(
ν′)のし1、第3図は本発明σルー実施例を示(また
めの図(ある。 1:電r銃、2.3:収束レンズ、71ン1 :前方(
り■1ノンス゛、41):j糸7′5磁界レンズ、5:
試お1、G:筒状部、7:レンズ系、8:蛍光板、5〕
、10、 11 、16 : I+Jl田電源、12:
調整器、ゴζ3゜1/1.17:変換器、15:補助L
レンズC:光軸、)〈衿り。 特許出願人 11本電子株式会ン」 代t〈者 伊藤 −人
Figure 1 shows l', xl C for explaining a conventional device.
Figure 2 shows the diffraction spora 1~ projected on the fluorescent screen 1 and the diameter of the field of view.
Figures 1 and 3 show an embodiment of the present invention.
ri■1 non-switch, 41): j thread 7'5 magnetic field lens, 5:
Trial 1, G: Cylindrical part, 7: Lens system, 8: Fluorescent screen, 5]
, 10, 11, 16: I+Jl field power supply, 12:
Adjuster, Go ζ3゜1/1.17: Converter, 15: Auxiliary L
Lens C: optical axis, )〈collar. Patent Applicant: 11 Electronics Co., Ltd. Representative: Ito - Person

Claims (1)

【特許請求の範囲】[Claims] 電子銃と、該電子銃よりの電子線を収束づ−るための第
1.第2の収束レンズど、対物レンズと、軸から大ぎく
外れ1.:電子線をjJツ]〜する筒状部と、中間及び
投影レンズと、該投影レンズの後段に配置されたも1光
板どを備えた装置にJりい−(、り・1物レンズの励磁
強度の変化にかかわらず試料面上に電子線が同一径の結
像スポットで照射されるように前記第1.第2の収束レ
ンズの励磁強度を対物レンズの励磁強度の変化に連動し
て変1ヒさせるため゛  の手段と、対物レンズと中間
レンズとの間に配置された補助レンズと、対物レンズの
励磁強良の変化にかかわらず該補助レンズを経た電子線
を常に前記筒状部の中心にクロスオーバーさせるため前
記対物レンズの綻J磁強度の変化に連動して該補助レン
ズの励磁強痘を変化させるための手段とを具tfi Y
lることを特徴とする電子線回折装置。
An electron gun and a first device for converging the electron beam from the electron gun. The second converging lens is very far off-axis from the objective lens.1. : A device equipped with a cylindrical part for transmitting an electron beam, an intermediate and projection lens, and a light plate placed after the projection lens. The excitation intensity of the first and second converging lenses is linked to the change in the excitation intensity of the objective lens so that the electron beam is irradiated with an imaging spot of the same diameter on the sample surface regardless of the change in the excitation intensity. an auxiliary lens disposed between the objective lens and the intermediate lens; and a means for causing the electron beam to pass through the auxiliary lens to always be directed to the cylindrical portion regardless of changes in the excitation strength of the objective lens. means for changing the excitation strength of the auxiliary lens in conjunction with the change in the magnetic strength of the objective lens in order to cross over to the center of the auxiliary lens.
An electron beam diffraction apparatus characterized by:
JP58045062A 1983-03-17 1983-03-17 Electron ray diffracting device Granted JPS59170753A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58045062A JPS59170753A (en) 1983-03-17 1983-03-17 Electron ray diffracting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58045062A JPS59170753A (en) 1983-03-17 1983-03-17 Electron ray diffracting device

Publications (2)

Publication Number Publication Date
JPS59170753A true JPS59170753A (en) 1984-09-27
JPH04336B2 JPH04336B2 (en) 1992-01-07

Family

ID=12708864

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58045062A Granted JPS59170753A (en) 1983-03-17 1983-03-17 Electron ray diffracting device

Country Status (1)

Country Link
JP (1) JPS59170753A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110692018B (en) 2017-05-31 2023-11-03 富士胶片株式会社 Photosensitive resin composition, polymer precursor, cured film, laminate, method for producing cured film, and semiconductor device

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51124371A (en) * 1975-04-23 1976-10-29 Jeol Ltd Scanning type electron microscope and similar equipment provided with means for controlling opening angle of electron beam for irradiating s amples
JPS51138064U (en) * 1975-04-28 1976-11-08
JPS55128243A (en) * 1979-03-28 1980-10-03 Hitachi Ltd Electron microscope
JPS57212755A (en) * 1981-06-25 1982-12-27 Internatl Precision Inc Transmission-type electron microscope
JPS5825055A (en) * 1981-07-16 1983-02-15 Jeol Ltd Electron microscope

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51124371A (en) * 1975-04-23 1976-10-29 Jeol Ltd Scanning type electron microscope and similar equipment provided with means for controlling opening angle of electron beam for irradiating s amples
JPS51138064U (en) * 1975-04-28 1976-11-08
JPS55128243A (en) * 1979-03-28 1980-10-03 Hitachi Ltd Electron microscope
JPS57212755A (en) * 1981-06-25 1982-12-27 Internatl Precision Inc Transmission-type electron microscope
JPS5825055A (en) * 1981-07-16 1983-02-15 Jeol Ltd Electron microscope

Also Published As

Publication number Publication date
JPH04336B2 (en) 1992-01-07

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