JPS59157635A - 平版印刷版材 - Google Patents

平版印刷版材

Info

Publication number
JPS59157635A
JPS59157635A JP3098783A JP3098783A JPS59157635A JP S59157635 A JPS59157635 A JP S59157635A JP 3098783 A JP3098783 A JP 3098783A JP 3098783 A JP3098783 A JP 3098783A JP S59157635 A JPS59157635 A JP S59157635A
Authority
JP
Japan
Prior art keywords
acid
resin
polymer
polyester
plate material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3098783A
Other languages
English (en)
Japanese (ja)
Other versions
JPH035740B2 (enExample
Inventor
Kaoru Iwata
薫 岩田
Hiroshi Matsuzawa
松沢　博志
Kiyomi Naka
中　喜代己
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Priority to JP3098783A priority Critical patent/JPS59157635A/ja
Publication of JPS59157635A publication Critical patent/JPS59157635A/ja
Publication of JPH035740B2 publication Critical patent/JPH035740B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0384—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the main chain of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polyesters Or Polycarbonates (AREA)
JP3098783A 1983-02-28 1983-02-28 平版印刷版材 Granted JPS59157635A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3098783A JPS59157635A (ja) 1983-02-28 1983-02-28 平版印刷版材

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3098783A JPS59157635A (ja) 1983-02-28 1983-02-28 平版印刷版材

Publications (2)

Publication Number Publication Date
JPS59157635A true JPS59157635A (ja) 1984-09-07
JPH035740B2 JPH035740B2 (enExample) 1991-01-28

Family

ID=12318968

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3098783A Granted JPS59157635A (ja) 1983-02-28 1983-02-28 平版印刷版材

Country Status (1)

Country Link
JP (1) JPS59157635A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59159156A (ja) * 1983-03-01 1984-09-08 Teijin Ltd 平版印刷版材

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59159156A (ja) * 1983-03-01 1984-09-08 Teijin Ltd 平版印刷版材

Also Published As

Publication number Publication date
JPH035740B2 (enExample) 1991-01-28

Similar Documents

Publication Publication Date Title
US4537855A (en) Photopolymerizable photosensitive composition
JP3365434B2 (ja) 光重合性組成物及び感光材料
CA1046190A (en) Photographic element capable of using an aqueous alcoholic developer and radiation-sensitive composition and copolymer therefor
JPS61169835A (ja) 光可溶化組成物
JPS6127735B2 (enExample)
EP0071236B1 (en) Photosensitive lithographic plate
US20030166750A1 (en) Method for the production of anhydride modified polyvinyl acetals useful for photosensitive compositions
JPS6231844A (ja) 平版用版材
US3615630A (en) Light-sensitive coating and recording material containing photopolymerizable compounds
US5045432A (en) Radiation-sensitive composition containing both a poly(N-acylalkyleneimine) and an unsaturated polyester and use thereof in lithographic printing plates
JPH0767868B2 (ja) 感光性平版印刷版
US5043250A (en) Radiation-sensitive composition containing a poly (N-acyl-alkyleneimine) and use thereof in lithographic printing plates
JP2536528B2 (ja) 光重合開始剤およびこれを用いた光重合性組成物
JPS6120939A (ja) 平版印刷版用感光性組成物
JPS59157635A (ja) 平版印刷版材
US5053315A (en) Radiation-sensitive composition containing an unsaturated polyester and use thereof in lithographic printing plates
US5061600A (en) Radiation-sensitive composition containing both a vinyl pyrrolidone polymer and an unsaturated polyester and use thereof in lithographic printing plates
JPS59159156A (ja) 平版印刷版材
JPS59155417A (ja) 可視光感光性樹脂の感度増強法及び感度増強された可視光感光性樹脂組成物
JPH04194857A (ja) 新規な光開始剤系及びこれを用いた光重合性組成物
JPH035574B2 (enExample)
JPS58173740A (ja) 感光性組成物
JP3424368B2 (ja) 光重合性組成物
JP3978695B2 (ja) 感光性組成物
JP3552437B2 (ja) 光重合性組成物