JPS59157635A - 平版印刷版材 - Google Patents
平版印刷版材Info
- Publication number
- JPS59157635A JPS59157635A JP3098783A JP3098783A JPS59157635A JP S59157635 A JPS59157635 A JP S59157635A JP 3098783 A JP3098783 A JP 3098783A JP 3098783 A JP3098783 A JP 3098783A JP S59157635 A JPS59157635 A JP S59157635A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- resin
- polymer
- polyester
- plate material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0384—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the main chain of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polyesters Or Polycarbonates (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3098783A JPS59157635A (ja) | 1983-02-28 | 1983-02-28 | 平版印刷版材 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3098783A JPS59157635A (ja) | 1983-02-28 | 1983-02-28 | 平版印刷版材 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59157635A true JPS59157635A (ja) | 1984-09-07 |
JPH035740B2 JPH035740B2 (enrdf_load_stackoverflow) | 1991-01-28 |
Family
ID=12318968
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3098783A Granted JPS59157635A (ja) | 1983-02-28 | 1983-02-28 | 平版印刷版材 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59157635A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59159156A (ja) * | 1983-03-01 | 1984-09-08 | Teijin Ltd | 平版印刷版材 |
-
1983
- 1983-02-28 JP JP3098783A patent/JPS59157635A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59159156A (ja) * | 1983-03-01 | 1984-09-08 | Teijin Ltd | 平版印刷版材 |
Also Published As
Publication number | Publication date |
---|---|
JPH035740B2 (enrdf_load_stackoverflow) | 1991-01-28 |
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