JPS59154800A - プラズマ発生用高周波発振器 - Google Patents

プラズマ発生用高周波発振器

Info

Publication number
JPS59154800A
JPS59154800A JP58028196A JP2819683A JPS59154800A JP S59154800 A JPS59154800 A JP S59154800A JP 58028196 A JP58028196 A JP 58028196A JP 2819683 A JP2819683 A JP 2819683A JP S59154800 A JPS59154800 A JP S59154800A
Authority
JP
Japan
Prior art keywords
voltage
circuit
output
oscillator
high frequency
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58028196A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0534800B2 (https=
Inventor
植原　晃
植原　▲たかし▼
斉藤　幸
石田　俊之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Denshi Kagaku KK
Original Assignee
Tokyo Denshi Kagaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Denshi Kagaku KK filed Critical Tokyo Denshi Kagaku KK
Priority to JP58028196A priority Critical patent/JPS59154800A/ja
Priority to US06/580,853 priority patent/US4577165A/en
Publication of JPS59154800A publication Critical patent/JPS59154800A/ja
Publication of JPH0534800B2 publication Critical patent/JPH0534800B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
JP58028196A 1983-02-22 1983-02-22 プラズマ発生用高周波発振器 Granted JPS59154800A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP58028196A JPS59154800A (ja) 1983-02-22 1983-02-22 プラズマ発生用高周波発振器
US06/580,853 US4577165A (en) 1983-02-22 1984-02-16 High-frequency oscillator with power amplifier and automatic power control

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58028196A JPS59154800A (ja) 1983-02-22 1983-02-22 プラズマ発生用高周波発振器

Publications (2)

Publication Number Publication Date
JPS59154800A true JPS59154800A (ja) 1984-09-03
JPH0534800B2 JPH0534800B2 (https=) 1993-05-24

Family

ID=12241915

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58028196A Granted JPS59154800A (ja) 1983-02-22 1983-02-22 プラズマ発生用高周波発振器

Country Status (1)

Country Link
JP (1) JPS59154800A (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0235722A (ja) * 1988-07-26 1990-02-06 Matsushita Electric Ind Co Ltd 反応性イオンエッチング装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5798678A (en) * 1980-12-11 1982-06-18 Toshiba Corp Method and device for dry etching
JPS5864030A (ja) * 1981-10-13 1983-04-16 Nec Kyushu Ltd プラズマエツチング装置
JPS58163435A (ja) * 1982-03-25 1983-09-28 Semiconductor Energy Lab Co Ltd プラズマ反応用装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5798678A (en) * 1980-12-11 1982-06-18 Toshiba Corp Method and device for dry etching
JPS5864030A (ja) * 1981-10-13 1983-04-16 Nec Kyushu Ltd プラズマエツチング装置
JPS58163435A (ja) * 1982-03-25 1983-09-28 Semiconductor Energy Lab Co Ltd プラズマ反応用装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0235722A (ja) * 1988-07-26 1990-02-06 Matsushita Electric Ind Co Ltd 反応性イオンエッチング装置

Also Published As

Publication number Publication date
JPH0534800B2 (https=) 1993-05-24

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