JPS59152626A - 異物検出装置 - Google Patents

異物検出装置

Info

Publication number
JPS59152626A
JPS59152626A JP58026156A JP2615683A JPS59152626A JP S59152626 A JPS59152626 A JP S59152626A JP 58026156 A JP58026156 A JP 58026156A JP 2615683 A JP2615683 A JP 2615683A JP S59152626 A JPS59152626 A JP S59152626A
Authority
JP
Japan
Prior art keywords
slit
light
substrate
scattered light
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58026156A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0334577B2 (enrdf_load_stackoverflow
Inventor
Masataka Shiba
正孝 芝
Mitsuyoshi Koizumi
小泉　光義
Yukio Uto
幸雄 宇都
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58026156A priority Critical patent/JPS59152626A/ja
Priority to US06/548,516 priority patent/US4669875A/en
Publication of JPS59152626A publication Critical patent/JPS59152626A/ja
Priority to US07/360,971 priority patent/USRE33991E/en
Publication of JPH0334577B2 publication Critical patent/JPH0334577B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/02—Investigating particle size or size distribution
    • G01N15/0205—Investigating particle size or size distribution by optical means
    • G01N2015/0238—Single particle scatter
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N2021/4792—Polarisation of scatter light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/10—Scanning
    • G01N2201/105—Purely optical scan
    • G01N2201/1053—System of scan mirrors for composite motion of beam

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP58026156A 1982-11-04 1983-02-21 異物検出装置 Granted JPS59152626A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP58026156A JPS59152626A (ja) 1983-02-21 1983-02-21 異物検出装置
US06/548,516 US4669875A (en) 1982-11-04 1983-11-03 Foreign particle detecting method and apparatus
US07/360,971 USRE33991E (en) 1982-11-04 1989-06-02 Foreign particle detecting method and apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58026156A JPS59152626A (ja) 1983-02-21 1983-02-21 異物検出装置

Publications (2)

Publication Number Publication Date
JPS59152626A true JPS59152626A (ja) 1984-08-31
JPH0334577B2 JPH0334577B2 (enrdf_load_stackoverflow) 1991-05-23

Family

ID=12185676

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58026156A Granted JPS59152626A (ja) 1982-11-04 1983-02-21 異物検出装置

Country Status (1)

Country Link
JP (1) JPS59152626A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6429745A (en) * 1987-07-24 1989-01-31 Horiba Ltd Inspection device for existence of foreign matter
JPH01129144A (ja) * 1987-11-14 1989-05-22 Horiba Ltd 異物有無検査装置
JPH02194352A (ja) * 1989-01-24 1990-07-31 Fuji Electric Co Ltd 透明基板表面検査装置
EP1612607A3 (en) * 2004-06-30 2006-06-07 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52146682A (en) * 1976-05-27 1977-12-06 Ferranti Ltd Surface inspecting apparatus
JPS5671173A (en) * 1979-11-14 1981-06-13 Hitachi Ltd Pattern detection method of printed circuit substrate
JPS5780546A (en) * 1980-11-07 1982-05-20 Nippon Kogaku Kk <Nikon> Detecting device for foreign substance

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52146682A (en) * 1976-05-27 1977-12-06 Ferranti Ltd Surface inspecting apparatus
JPS5671173A (en) * 1979-11-14 1981-06-13 Hitachi Ltd Pattern detection method of printed circuit substrate
JPS5780546A (en) * 1980-11-07 1982-05-20 Nippon Kogaku Kk <Nikon> Detecting device for foreign substance

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6429745A (en) * 1987-07-24 1989-01-31 Horiba Ltd Inspection device for existence of foreign matter
JPH01129144A (ja) * 1987-11-14 1989-05-22 Horiba Ltd 異物有無検査装置
JPH02194352A (ja) * 1989-01-24 1990-07-31 Fuji Electric Co Ltd 透明基板表面検査装置
EP1612607A3 (en) * 2004-06-30 2006-06-07 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7158208B2 (en) 2004-06-30 2007-01-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7684009B2 (en) 2004-06-30 2010-03-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
JPH0334577B2 (enrdf_load_stackoverflow) 1991-05-23

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