JPS59146177A - 光照射加熱方法 - Google Patents

光照射加熱方法

Info

Publication number
JPS59146177A
JPS59146177A JP1886983A JP1886983A JPS59146177A JP S59146177 A JPS59146177 A JP S59146177A JP 1886983 A JP1886983 A JP 1886983A JP 1886983 A JP1886983 A JP 1886983A JP S59146177 A JPS59146177 A JP S59146177A
Authority
JP
Japan
Prior art keywords
heated
light source
heat transfer
light
heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1886983A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0150837B2 (OSRAM
Inventor
荒井　徹治
芳樹 三村
佐藤　征史郎
佐藤　亮三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Sagami Ltd
Ushio Denki KK
Original Assignee
Tokyo Electron Sagami Ltd
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Sagami Ltd, Ushio Denki KK filed Critical Tokyo Electron Sagami Ltd
Priority to JP1886983A priority Critical patent/JPS59146177A/ja
Publication of JPS59146177A publication Critical patent/JPS59146177A/ja
Publication of JPH0150837B2 publication Critical patent/JPH0150837B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Control Of Resistance Heating (AREA)
  • Resistance Heating (AREA)
  • Vertical, Hearth, Or Arc Furnaces (AREA)
  • Furnace Details (AREA)
JP1886983A 1983-02-09 1983-02-09 光照射加熱方法 Granted JPS59146177A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1886983A JPS59146177A (ja) 1983-02-09 1983-02-09 光照射加熱方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1886983A JPS59146177A (ja) 1983-02-09 1983-02-09 光照射加熱方法

Publications (2)

Publication Number Publication Date
JPS59146177A true JPS59146177A (ja) 1984-08-21
JPH0150837B2 JPH0150837B2 (OSRAM) 1989-10-31

Family

ID=11983542

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1886983A Granted JPS59146177A (ja) 1983-02-09 1983-02-09 光照射加熱方法

Country Status (1)

Country Link
JP (1) JPS59146177A (OSRAM)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5390033A (en) * 1977-01-19 1978-08-08 Hitachi Ltd Heat treatment equipment

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5390033A (en) * 1977-01-19 1978-08-08 Hitachi Ltd Heat treatment equipment

Also Published As

Publication number Publication date
JPH0150837B2 (OSRAM) 1989-10-31

Similar Documents

Publication Publication Date Title
US4047496A (en) Epitaxial radiation heated reactor
US3623712A (en) Epitaxial radiation heated reactor and process
GB2181458A (en) Apparatus and method for an axially symmetric chemical vapor deposition reactor
JP3659863B2 (ja) 熱処理装置
KR910007109B1 (ko) 화학증기증착 반응기용 반사장치
US20200022223A1 (en) Circular lamp arrays
JPS6293378A (ja) 軸対称的なエピタキシヤル成長装置中で基板を加熱するための方法及び装置
JPS58158914A (ja) 半導体製造装置
JPH10241844A (ja) 加熱装置と加熱する方法
CN105679666B (zh) 用于半导体处理腔室的吸收反射体
TW200921754A (en) Filament lamp and light irradiation type heat treatment device
JPS59146177A (ja) 光照射加熱方法
US4419332A (en) Epitaxial reactor
US20040067052A1 (en) Localized heating of substrates using optics
JPH0778830A (ja) 半導体製造装置
JPS5936927A (ja) 半導体気相成長装置
KR100970013B1 (ko) 열처리 장치
JP2003059853A (ja) ランプヒータおよび熱処理装置
JPS60189927A (ja) 気相反応容器
JPH04713A (ja) 基板の加熱装置
JP2008117892A (ja) 半導体製造装置および半導体装置の製造方法
JPH0210866B2 (OSRAM)
KR920004964B1 (ko) 광화학증착장치용 적외선 가열장치
JPH04325686A (ja) Ｃｖｄ装置の加熱ヒータ
JPS59145482A (ja) 照射加熱炉