JPS59143322A - 電子線描画装置 - Google Patents

電子線描画装置

Info

Publication number
JPS59143322A
JPS59143322A JP58016638A JP1663883A JPS59143322A JP S59143322 A JPS59143322 A JP S59143322A JP 58016638 A JP58016638 A JP 58016638A JP 1663883 A JP1663883 A JP 1663883A JP S59143322 A JPS59143322 A JP S59143322A
Authority
JP
Japan
Prior art keywords
electron
drawn
electron beam
lenses
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58016638A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0226371B2 (enrdf_load_stackoverflow
Inventor
Toshinori Goto
後藤　俊徳
Teruo Someya
染谷　輝夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Jeol Ltd
Nihon Denshi KK
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, Nippon Telegraph and Telephone Corp filed Critical Jeol Ltd
Priority to JP58016638A priority Critical patent/JPS59143322A/ja
Publication of JPS59143322A publication Critical patent/JPS59143322A/ja
Publication of JPH0226371B2 publication Critical patent/JPH0226371B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP58016638A 1983-02-03 1983-02-03 電子線描画装置 Granted JPS59143322A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58016638A JPS59143322A (ja) 1983-02-03 1983-02-03 電子線描画装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58016638A JPS59143322A (ja) 1983-02-03 1983-02-03 電子線描画装置

Publications (2)

Publication Number Publication Date
JPS59143322A true JPS59143322A (ja) 1984-08-16
JPH0226371B2 JPH0226371B2 (enrdf_load_stackoverflow) 1990-06-08

Family

ID=11921898

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58016638A Granted JPS59143322A (ja) 1983-02-03 1983-02-03 電子線描画装置

Country Status (1)

Country Link
JP (1) JPS59143322A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01143217A (ja) * 1987-11-27 1989-06-05 Jeol Ltd 電子ビーム描画装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01143217A (ja) * 1987-11-27 1989-06-05 Jeol Ltd 電子ビーム描画装置

Also Published As

Publication number Publication date
JPH0226371B2 (enrdf_load_stackoverflow) 1990-06-08

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