JPS5912638B2 - Direct synthesis method for intermetallic compounds containing volatile components - Google Patents
Direct synthesis method for intermetallic compounds containing volatile componentsInfo
- Publication number
- JPS5912638B2 JPS5912638B2 JP49010240A JP1024074A JPS5912638B2 JP S5912638 B2 JPS5912638 B2 JP S5912638B2 JP 49010240 A JP49010240 A JP 49010240A JP 1024074 A JP1024074 A JP 1024074A JP S5912638 B2 JPS5912638 B2 JP S5912638B2
- Authority
- JP
- Japan
- Prior art keywords
- volatile components
- crucible
- inner lid
- intermetallic compounds
- coating material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Inorganic Compounds Of Heavy Metals (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Description
【発明の詳細な説明】
この発明はその一成分に揮発性成分を含む、例えばm−
v族、II−Vl族、Vl−Vl族等の金属間化合物の
直接合成方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention is directed to the use of a compound containing a volatile component as one of its components, for example, m-
The present invention relates to a method for directly synthesizing intermetallic compounds such as V group, II-Vl group, Vl-Vl group, etc.
これらの金属間化合物は、通常、天然には産しないので
、工業的に価値のある単結晶を得るためには、まず、こ
れらの化合物を合成することが必要である。These intermetallic compounds usually do not occur naturally, so in order to obtain industrially valuable single crystals, it is first necessary to synthesize these compounds.
従来、これらの化合物のうち、近年脚光をあびていると
くにGaAs 、GaPは融点が高く、その−成分たる
AsやPが温度の上昇と共に指数函数的に増大する蒸気
圧を示すので、これを直接に合成することは不可能視さ
れていたが、この発明者等は特公昭52−33041号
(特願昭44−12538号)において、揮発性成分を
過剰に配合し、反応系の雰囲気を該揮発性成分の蒸気圧
よりも高い高圧の不活性ガス雰囲気とし、かつ、その加
熱反応時間を短時間とした場合には、上記化合物を封管
を用いないで直接に合成することができることを明らか
にした。Conventionally, among these compounds, GaAs and GaP, which have been in the spotlight in recent years, have high melting points, and their constituents, As and P, exhibit vapor pressures that increase exponentially with increasing temperature. Although it was thought that it would be impossible to synthesize the volatile components, in Japanese Patent Publication No. 52-33041 (Japanese Patent Application No. 12538-1982), the inventors blended an excessive amount of volatile components and changed the atmosphere of the reaction system to remove the volatile components. It was revealed that the above compounds can be directly synthesized without using a sealed tube if the atmosphere is a high-pressure inert gas atmosphere higher than the vapor pressure of the chemical component and the heating reaction time is short. did.
その後、この発明より遅れること約−午後に特開昭47
−556号に開示されたように、上記発明にさらにB2
O3等の液体被覆材を加えて、上記化合物を直接に合成
する方法の発明が提案された。After that, it was about to be delayed from this invention - in the afternoon JP-A-47
As disclosed in No.-556, B2 is further added to the above invention.
A method of directly synthesizing the above compound by adding a liquid coating material such as O3 was proposed.
しかし、この後者の方法を用いても、なお、合成時に液
体被覆材内部を揮発性成分が気泡となって蒸発してしま
うのを阻止できないことから、本願発明がなされたもの
である。However, even if this latter method is used, it is still not possible to prevent volatile components from forming bubbles and evaporating inside the liquid coating material during synthesis, which is why the present invention was made.
而して本願発明の目的は、揮発性成分の反応系外の蒸発
を従来技術のものよりもさらに防止することのできる、
上記した金属間化合物の直接合成方法を提供せんとする
にある。Therefore, the object of the present invention is to further prevent the evaporation of volatile components outside the reaction system than those of the prior art.
It is an object of the present invention to provide a method for directly synthesizing the above-mentioned intermetallic compounds.
以下にこの発明を図面に基づいて詳細に説明すると、第
1図において、1は抵抗加熱体又は高周波加熱コイル等
から成る発熱体、2は図示していない装置によって上下
に移動するルツボ支持台、3はルツボ、3aはその上蓋
、3bはこの上蓋3aとルツボ3との間に生ずる間隙、
4は例えばGaAs 、GaP等の目的化合物の組成融
液、5は例えばB2O3等の液体被覆材であり、この液
体被覆材5と組成融液4との間には中蓋6が浮遊せられ
ている。The present invention will be explained in detail below based on the drawings. In FIG. 1, 1 is a heating element consisting of a resistance heating element or a high-frequency heating coil, etc.; 2 is a crucible support that is moved up and down by a device not shown; 3 is a crucible, 3a is its upper cover, 3b is a gap created between the upper cover 3a and the crucible 3,
4 is a composition melt of a target compound such as GaAs or GaP, 5 is a liquid coating material such as B2O3, and an inner lid 6 is suspended between the liquid coating material 5 and the composition melt 4. There is.
実施例によれば、高純度ガリウムと高純度砒素、及びル
ツボ3の内径よりわずかに小さ目の外径を有する石英製
の中蓋6と、ルツボ3に適合する固体円盤状のB2O3
を収用させたルツボ3を支持台2に載置した後、図示し
てない炉体内部を真空排気し、約100気圧のアルゴン
不活性ガスを導入した。According to the embodiment, high-purity gallium and high-purity arsenic, an inner lid 6 made of quartz having an outer diameter slightly smaller than the inner diameter of the crucible 3, and a solid disc-shaped B2O3 that fits the crucible 3 are used.
After the crucible 3 containing the crucible was placed on the support stand 2, the inside of the furnace (not shown) was evacuated and argon inert gas of about 100 atmospheres was introduced.
するとルツボ3内部も間隙3bを通して真空排気及び加
圧され、該ルツボ3内外圧は均等となった。Then, the inside of the crucible 3 was also evacuated and pressurized through the gap 3b, and the internal and external pressures of the crucible 3 became equal.
しかる後、ルツボ3を発熱体1内部へ移動させ、収用物
の加熱を開始させた。Thereafter, the crucible 3 was moved inside the heating element 1 and heating of the expropriated material was started.
すると、ガリウムの融点は29.8°C2B2O3の融
点は約450℃、砒素の融点は812℃であることから
、温度の上昇と共にルツボ内の収納物は、ガリウム、B
2O3、砒素の順で融解すると共に、それぞれの比重が
、砒素5.73・砒化ガリウム5.3・石英2.6・B
2031.8であることから融解内容物は砒素単体、ガ
リウム単体、中蓋6、B2O33の順に分離積層され、
砒素とガリウムの反応系は完全にシールされるに至り、
続いてルツボ3内部は約1300℃に昇温せしめられた
。Then, the melting point of gallium is 29.8°C, the melting point of 2B2O3 is about 450°C, and the melting point of arsenic is 812°C, so as the temperature rises, the contents in the crucible will change to gallium, B2O3, and arsenic.
2O3 and arsenic are melted in this order, and the specific gravity of each is arsenic 5.73, gallium arsenide 5.3, quartz 2.6, and B.
2031.8, the melted contents were separated and stacked in the order of arsenic alone, gallium alone, inner lid 6, and B2O33.
The reaction system between arsenic and gallium was completely sealed,
Subsequently, the temperature inside crucible 3 was raised to about 1300°C.
そして、加熱開始時より20分を経過した後、発熱体1
の電源を切り、ルツボ3を降下させてそのまま冷却させ
た。Then, after 20 minutes have passed from the start of heating, heating element 1
The power was turned off, and the crucible 3 was lowered and allowed to cool.
このようにして得られた・インゴットは検鏡の結果化学
量論的組成のものか、あるいはこれよりも過剰の砒素を
含有する多結晶体であることが認められた。The ingot thus obtained was found to be polycrystalline with a stoichiometric composition or an excess of arsenic as a result of microscopic examination.
第2図乃至第3図は他の実施例を示し、ルツボ3内に浮
遊された中蓋7は同心状に穴7aが設けられている。FIGS. 2 and 3 show another embodiment, in which an inner lid 7 suspended within the crucible 3 is provided with concentric holes 7a.
このように実施した場合には、化合物の合成に引き続い
て単結晶の引上げを行いこの間揮発性成分の蒸発を可及
的に防止できるという利点がある。When carried out in this manner, there is an advantage that the synthesis of the compound is followed by the pulling of the single crystal, and during this process the evaporation of volatile components can be prevented as much as possible.
実施例によると、内径70ynmの石英ルツボ3内へ総
計9509の高純度砒素とガリウム、及び709のB2
O3と、外径70ynwよりわずかに小さ目で30朋の
穴7aを穿設した石英製の中蓋7を装入して、第1図で
示した実施例と同様の圧力と加熱条件の下で加熱した。According to the example, a total of 9509 pieces of high-purity arsenic and gallium and 709 pieces of B2 were placed in the quartz crucible 3 with an inner diameter of 70 yn.
O3 and an inner lid 7 made of quartz with a hole 7a of 30 mm slightly smaller than the outer diameter of 70 ynw were charged and heated under the same pressure and heating conditions as in the embodiment shown in FIG. Heated.
すると、先に説明した理由と同じ理由によって反応系は
完全にシールされた。The reaction system was then completely sealed for the same reason as explained earlier.
そして、加熱開始時より25分程度経過した後、単結晶
引上棒8の先端に取りつけた種結晶9を、B2O3の液
体被覆材5を通して、穴7a内を貫通させて垂下させ、
GaAs組成融液内に浸漬させた後、ルツボ3を6 r
、p、m程度、種結晶9を12r、p、m程度で各逆方
向に回転させながら、1211LrIL/時の割合で引
上げた。After about 25 minutes have elapsed from the start of heating, the seed crystal 9 attached to the tip of the single crystal pulling rod 8 is passed through the B2O3 liquid coating material 5, penetrated through the hole 7a, and allowed to hang down.
After being immersed in the GaAs composition melt, the crucible 3 was heated to 6 r
, p, m, and the seed crystal 9 was pulled at a rate of 1211 LrIL/hour while rotating the seed crystal 9 in the opposite directions at approximately 12r, p, and m.
すると、中蓋7は液面が低下する毎に低下し、更に反応
系外へ蒸発しようとする揮発性成分は、この中蓋7によ
ってほとんど阻止されるので、蒸発防止効果はきわめて
顕蓄であった。Then, the inner lid 7 lowers each time the liquid level drops, and most of the volatile components that try to evaporate out of the reaction system are blocked by the inner lid 7, so the evaporation prevention effect is extremely significant. Ta.
即ち、この中蓋7を用いない場合には、上述したのと同
一の条件の下で2gの砒素の蒸発損失があったが、これ
を用いることによりその半分以下に押えることができた
。That is, when this inner lid 7 was not used, there was a evaporation loss of 2 g of arsenic under the same conditions as described above, but by using this, it was possible to suppress the loss to less than half.
また、中蓋7を用いない場合にはB2O3を100g必
要としたがこれを用いた時には709でも充分にその目
的を達成できることが解った。Moreover, when the inner lid 7 was not used, 100 g of B2O3 was required, but when this was used, it was found that even 709 could sufficiently achieve the purpose.
そして、得られた単結晶の外径は穴7aの内径に相当す
る30間であった。The outer diameter of the obtained single crystal was 30 mm, which corresponds to the inner diameter of the hole 7a.
尚、上記した実施例ではGaAsを直接に合成する場合
のみを述べたが、この発明が砒素ガリウム以外のGaP
等の揮発性成分を含む金属間化合物を製造する場合に応
用できることは明らかである。In the above embodiments, only the case where GaAs is directly synthesized was described, but this invention is applicable to GaAs other than gallium arsenide.
It is clear that this method can be applied to the production of intermetallic compounds containing volatile components such as.
また、中蓋に使用する材質は他にも黒鉛、アルミナ、B
eO、B4C3等のものが目的とする金属化合物の種類
により適宜に選択されるべきである。In addition, other materials used for the inner lid include graphite, alumina, and B.
eO, B4C3, etc. should be appropriately selected depending on the type of the intended metal compound.
以上詳細に説明したようにこの発明は、中蓋によって揮
発性成分の蒸発がより防止されるので、揮発性成分を過
剰に配合しなくとも良く、さらに、比較的に高価である
B2O3等の液体被覆材を節約できる他、中蓋に単結晶
引上げ用の穴を設けたものを使用した場合には、目的金
属間化合物の合成にひき続いて直ちに単結晶の引上げを
行うことができるという作用効果を奏し得る。As explained in detail above, in this invention, since the inner lid further prevents the evaporation of volatile components, there is no need to mix excessive volatile components, and furthermore, it is possible to prevent the volatile components from evaporating by using the inner lid. In addition to saving on coating material, if you use a lid with a hole for pulling a single crystal, you can pull the single crystal immediately after synthesizing the target intermetallic compound. can be played.
第1図はこの発明を説明するための装置の一部断面略図
、第2図ないし第3図は他の実施例を示す一部断面略図
である。
1・・・・・・発熱体、2・・・・・・ルツボ支持台、
3・・・・・・ルツボ、4・・・・・・組成融液、5・
・・・・・液体被覆材、6゜7・・・・・・中蓋、7a
・・・・・・穴。FIG. 1 is a schematic partial cross-sectional view of an apparatus for explaining the present invention, and FIGS. 2 and 3 are schematic partial cross-sectional views showing other embodiments. 1... Heating element, 2... Crucible support,
3... Crucible, 4... Composition melt, 5...
...Liquid coating material, 6゜7...Inner lid, 7a
······hole.
Claims (1)
プセル法にて合成するに当り、反応させるべき元素成分
と被覆材を収納させたルツボ内へ中蓋をかぶせ、前記元
素成分をその反応の起る温度以上に加熱させ、この加熱
の過程で反応系を反応成分の蒸気圧よりも高いガス圧に
加圧維持すると共に、この加熱反応の過程を通じて、液
体被覆材と前記化合物結晶体の組成融液との間に前記中
蓋を浮遊せしめる過程を含むことを特徴とする、揮発性
成分を含む金属間化合物の直接合成方法。1 Composition of an intermetallic compound containing volatile components When synthesizing a melt by the liquid capsule method, an inner lid is placed in a crucible containing an elemental component to be reacted and a coating material, and the elemental component is reacted with the elemental component. During this heating process, the reaction system is kept under pressure at a gas pressure higher than the vapor pressure of the reaction components, and through this heating reaction process, the liquid coating material and the compound crystals are heated. 1. A method for directly synthesizing an intermetallic compound containing a volatile component, the method comprising a step of suspending the inner lid between the composition and the melt.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP49010240A JPS5912638B2 (en) | 1974-01-25 | 1974-01-25 | Direct synthesis method for intermetallic compounds containing volatile components |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP49010240A JPS5912638B2 (en) | 1974-01-25 | 1974-01-25 | Direct synthesis method for intermetallic compounds containing volatile components |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS50145373A JPS50145373A (en) | 1975-11-21 |
JPS5912638B2 true JPS5912638B2 (en) | 1984-03-24 |
Family
ID=11744765
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP49010240A Expired JPS5912638B2 (en) | 1974-01-25 | 1974-01-25 | Direct synthesis method for intermetallic compounds containing volatile components |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5912638B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019008663A1 (en) * | 2017-07-04 | 2019-01-10 | 住友電気工業株式会社 | Gallium arsenide crystalline body and gallium arsenide crystal substrate |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49107986A (en) * | 1973-02-19 | 1974-10-14 |
-
1974
- 1974-01-25 JP JP49010240A patent/JPS5912638B2/en not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49107986A (en) * | 1973-02-19 | 1974-10-14 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019008663A1 (en) * | 2017-07-04 | 2019-01-10 | 住友電気工業株式会社 | Gallium arsenide crystalline body and gallium arsenide crystal substrate |
US10822722B2 (en) | 2017-07-04 | 2020-11-03 | Sumitomo Electric Industries, Ltd. | Gallium arsenide crystal body and gallium arsenide crystal substrate |
Also Published As
Publication number | Publication date |
---|---|
JPS50145373A (en) | 1975-11-21 |
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