JPS59124129A - 電子ビ−ム露光方法 - Google Patents

電子ビ−ム露光方法

Info

Publication number
JPS59124129A
JPS59124129A JP57231638A JP23163882A JPS59124129A JP S59124129 A JPS59124129 A JP S59124129A JP 57231638 A JP57231638 A JP 57231638A JP 23163882 A JP23163882 A JP 23163882A JP S59124129 A JPS59124129 A JP S59124129A
Authority
JP
Japan
Prior art keywords
exposure
mark
pattern
electron beam
marks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57231638A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0544172B2 (enrdf_load_stackoverflow
Inventor
Nobuyuki Yasutake
安武　信幸
Koichi Kobayashi
孝一 小林
Shuzo Oshio
大塩　修三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP57231638A priority Critical patent/JPS59124129A/ja
Publication of JPS59124129A publication Critical patent/JPS59124129A/ja
Publication of JPH0544172B2 publication Critical patent/JPH0544172B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP57231638A 1982-12-29 1982-12-29 電子ビ−ム露光方法 Granted JPS59124129A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57231638A JPS59124129A (ja) 1982-12-29 1982-12-29 電子ビ−ム露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57231638A JPS59124129A (ja) 1982-12-29 1982-12-29 電子ビ−ム露光方法

Publications (2)

Publication Number Publication Date
JPS59124129A true JPS59124129A (ja) 1984-07-18
JPH0544172B2 JPH0544172B2 (enrdf_load_stackoverflow) 1993-07-05

Family

ID=16926635

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57231638A Granted JPS59124129A (ja) 1982-12-29 1982-12-29 電子ビ−ム露光方法

Country Status (1)

Country Link
JP (1) JPS59124129A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6245838B2 (ja) 2013-04-30 2017-12-13 キヤノン株式会社 リソグラフィ装置、リソグラフィ方法、および物品の製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59105647A (ja) * 1982-12-09 1984-06-19 Mitsubishi Electric Corp 電子ビーム露光方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59105647A (ja) * 1982-12-09 1984-06-19 Mitsubishi Electric Corp 電子ビーム露光方法

Also Published As

Publication number Publication date
JPH0544172B2 (enrdf_load_stackoverflow) 1993-07-05

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