JPS59122904A - イオンビ−ム膜厚測定装置 - Google Patents
イオンビ−ム膜厚測定装置Info
- Publication number
- JPS59122904A JPS59122904A JP57234194A JP23419482A JPS59122904A JP S59122904 A JPS59122904 A JP S59122904A JP 57234194 A JP57234194 A JP 57234194A JP 23419482 A JP23419482 A JP 23419482A JP S59122904 A JPS59122904 A JP S59122904A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- layer
- ion beam
- amplifier
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
- G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
- G01B15/025—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness by measuring absorption
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57234194A JPS59122904A (ja) | 1982-12-28 | 1982-12-28 | イオンビ−ム膜厚測定装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57234194A JPS59122904A (ja) | 1982-12-28 | 1982-12-28 | イオンビ−ム膜厚測定装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59122904A true JPS59122904A (ja) | 1984-07-16 |
| JPH0230644B2 JPH0230644B2 (enExample) | 1990-07-09 |
Family
ID=16967149
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57234194A Granted JPS59122904A (ja) | 1982-12-28 | 1982-12-28 | イオンビ−ム膜厚測定装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59122904A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006258771A (ja) * | 2005-03-18 | 2006-09-28 | Fujitsu Ltd | 膜厚測定方法及び膜厚測定装置 |
| JP2007171193A (ja) * | 2005-12-21 | 2007-07-05 | Carl Zeiss Nts Gmbh | 距離を測定するための方法および装置 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0366248U (enExample) * | 1989-10-26 | 1991-06-27 | ||
| JPH0390150U (enExample) * | 1989-12-27 | 1991-09-13 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5063990A (enExample) * | 1973-10-08 | 1975-05-30 | ||
| JPS5636024A (en) * | 1979-08-31 | 1981-04-09 | Fujitsu Ltd | Measuring device for high-frequency modulated ray |
-
1982
- 1982-12-28 JP JP57234194A patent/JPS59122904A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5063990A (enExample) * | 1973-10-08 | 1975-05-30 | ||
| JPS5636024A (en) * | 1979-08-31 | 1981-04-09 | Fujitsu Ltd | Measuring device for high-frequency modulated ray |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006258771A (ja) * | 2005-03-18 | 2006-09-28 | Fujitsu Ltd | 膜厚測定方法及び膜厚測定装置 |
| JP2007171193A (ja) * | 2005-12-21 | 2007-07-05 | Carl Zeiss Nts Gmbh | 距離を測定するための方法および装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0230644B2 (enExample) | 1990-07-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Devynck et al. | Localized measurements of turbulence in the TORE SUPRA tokamak | |
| JPS59122904A (ja) | イオンビ−ム膜厚測定装置 | |
| JPS639807A (ja) | 膜厚測定方法およびその装置 | |
| US4134014A (en) | Spectroscopy | |
| US4094608A (en) | Spectrometer of the electro-opto-acoustic type with capacitor-type detection | |
| WO1996026454A1 (en) | Electron beam stop analyzer | |
| Struyf et al. | The Fourier‐transform laser microprobe mass spectrometer with external ion source as a tool for inorganic micro‐analysis | |
| US5336886A (en) | Apparatus for measuring a diffraction pattern of electron beams having only elastic scattering electrons | |
| JPH0531724B2 (enExample) | ||
| Hurwitz et al. | Detector array for measurement of high‐frequency fluctuations in visible and near‐UV emission from tokamaks | |
| JP2921597B2 (ja) | 全反射スペクトル測定装置 | |
| JPS6082835A (ja) | 自動光熱分光測定装置 | |
| JP2587883B2 (ja) | 特性x線の角度分解スペクトラム測定方法 | |
| Wagner et al. | Single-beam thermowave analysis of semiconductors | |
| JPH03221853A (ja) | X線光電子分析装置 | |
| JPS6381251A (ja) | 表面構造解析法 | |
| SU1117505A1 (ru) | Способ рентгеноспектрального анализа (его варианты) | |
| SU1140586A1 (ru) | Способ определени пробега фрагментов рел тивистских дер | |
| SU1141855A1 (ru) | Способ контрол эрозионного разрушени | |
| SU1022089A1 (ru) | Способ запоминани и воспроизведени скрытого рентгеновского изображени и устройство дл его осуществлени | |
| SU1602291A1 (ru) | Способ определени дозы имплантированных ионов на поверхности полупроводника | |
| JPH0124619Y2 (enExample) | ||
| SU815485A1 (ru) | Способ определени толщиныпОКРыТи | |
| JP2895860B2 (ja) | 質量分析方法 | |
| Kaur et al. | Upgradation of CMS Detector at the LHC with GEM Detector |