JPS59122904A - イオンビ−ム膜厚測定装置 - Google Patents

イオンビ−ム膜厚測定装置

Info

Publication number
JPS59122904A
JPS59122904A JP57234194A JP23419482A JPS59122904A JP S59122904 A JPS59122904 A JP S59122904A JP 57234194 A JP57234194 A JP 57234194A JP 23419482 A JP23419482 A JP 23419482A JP S59122904 A JPS59122904 A JP S59122904A
Authority
JP
Japan
Prior art keywords
sample
layer
ion beam
amplifier
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57234194A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0230644B2 (enExample
Inventor
Yuji Sakai
堺 悠治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
NTT Inc
Original Assignee
Jeol Ltd
Nihon Denshi KK
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, Nippon Telegraph and Telephone Corp filed Critical Jeol Ltd
Priority to JP57234194A priority Critical patent/JPS59122904A/ja
Publication of JPS59122904A publication Critical patent/JPS59122904A/ja
Publication of JPH0230644B2 publication Critical patent/JPH0230644B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
    • G01B15/025Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness by measuring absorption

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP57234194A 1982-12-28 1982-12-28 イオンビ−ム膜厚測定装置 Granted JPS59122904A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57234194A JPS59122904A (ja) 1982-12-28 1982-12-28 イオンビ−ム膜厚測定装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57234194A JPS59122904A (ja) 1982-12-28 1982-12-28 イオンビ−ム膜厚測定装置

Publications (2)

Publication Number Publication Date
JPS59122904A true JPS59122904A (ja) 1984-07-16
JPH0230644B2 JPH0230644B2 (enExample) 1990-07-09

Family

ID=16967149

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57234194A Granted JPS59122904A (ja) 1982-12-28 1982-12-28 イオンビ−ム膜厚測定装置

Country Status (1)

Country Link
JP (1) JPS59122904A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006258771A (ja) * 2005-03-18 2006-09-28 Fujitsu Ltd 膜厚測定方法及び膜厚測定装置
JP2007171193A (ja) * 2005-12-21 2007-07-05 Carl Zeiss Nts Gmbh 距離を測定するための方法および装置

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0366248U (enExample) * 1989-10-26 1991-06-27
JPH0390150U (enExample) * 1989-12-27 1991-09-13

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5063990A (enExample) * 1973-10-08 1975-05-30
JPS5636024A (en) * 1979-08-31 1981-04-09 Fujitsu Ltd Measuring device for high-frequency modulated ray

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5063990A (enExample) * 1973-10-08 1975-05-30
JPS5636024A (en) * 1979-08-31 1981-04-09 Fujitsu Ltd Measuring device for high-frequency modulated ray

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006258771A (ja) * 2005-03-18 2006-09-28 Fujitsu Ltd 膜厚測定方法及び膜厚測定装置
JP2007171193A (ja) * 2005-12-21 2007-07-05 Carl Zeiss Nts Gmbh 距離を測定するための方法および装置

Also Published As

Publication number Publication date
JPH0230644B2 (enExample) 1990-07-09

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