JPS59116661A - プリント基板図面の座標読取方法 - Google Patents

プリント基板図面の座標読取方法

Info

Publication number
JPS59116661A
JPS59116661A JP57231506A JP23150682A JPS59116661A JP S59116661 A JPS59116661 A JP S59116661A JP 57231506 A JP57231506 A JP 57231506A JP 23150682 A JP23150682 A JP 23150682A JP S59116661 A JPS59116661 A JP S59116661A
Authority
JP
Japan
Prior art keywords
brake
axis
switch
rail
coordinate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57231506A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0230053B2 (OSRAM
Inventor
Takeshi Matsuzaki
松崎　武
Makoto Takasaki
高崎　真
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mutoh Industries Ltd
Original Assignee
Mutoh Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mutoh Industries Ltd filed Critical Mutoh Industries Ltd
Priority to JP57231506A priority Critical patent/JPS59116661A/ja
Publication of JPS59116661A publication Critical patent/JPS59116661A/ja
Publication of JPH0230053B2 publication Critical patent/JPH0230053B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP57231506A 1982-12-23 1982-12-23 プリント基板図面の座標読取方法 Granted JPS59116661A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57231506A JPS59116661A (ja) 1982-12-23 1982-12-23 プリント基板図面の座標読取方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57231506A JPS59116661A (ja) 1982-12-23 1982-12-23 プリント基板図面の座標読取方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP58029980A Division JPS59116888A (ja) 1983-02-24 1983-02-24 座標読取装置

Publications (2)

Publication Number Publication Date
JPS59116661A true JPS59116661A (ja) 1984-07-05
JPH0230053B2 JPH0230053B2 (OSRAM) 1990-07-04

Family

ID=16924556

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57231506A Granted JPS59116661A (ja) 1982-12-23 1982-12-23 プリント基板図面の座標読取方法

Country Status (1)

Country Link
JP (1) JPS59116661A (OSRAM)

Also Published As

Publication number Publication date
JPH0230053B2 (OSRAM) 1990-07-04

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