JPS5896883A - ル−プ状線材の表面処理方法 - Google Patents

ル−プ状線材の表面処理方法

Info

Publication number
JPS5896883A
JPS5896883A JP19445481A JP19445481A JPS5896883A JP S5896883 A JPS5896883 A JP S5896883A JP 19445481 A JP19445481 A JP 19445481A JP 19445481 A JP19445481 A JP 19445481A JP S5896883 A JPS5896883 A JP S5896883A
Authority
JP
Japan
Prior art keywords
wire rod
pickling
wire
conveyor
loop
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19445481A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0116914B2 (enrdf_load_stackoverflow
Inventor
Ikuo Fujii
郁雄 藤井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Welding and Engineering Co Ltd
Original Assignee
Nippon Steel Welding and Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Welding and Engineering Co Ltd filed Critical Nippon Steel Welding and Engineering Co Ltd
Priority to JP19445481A priority Critical patent/JPS5896883A/ja
Publication of JPS5896883A publication Critical patent/JPS5896883A/ja
Publication of JPH0116914B2 publication Critical patent/JPH0116914B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G3/00—Apparatus for cleaning or pickling metallic material
    • C23G3/02—Apparatus for cleaning or pickling metallic material for cleaning wires, strips, filaments continuously

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
JP19445481A 1981-12-04 1981-12-04 ル−プ状線材の表面処理方法 Granted JPS5896883A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19445481A JPS5896883A (ja) 1981-12-04 1981-12-04 ル−プ状線材の表面処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19445481A JPS5896883A (ja) 1981-12-04 1981-12-04 ル−プ状線材の表面処理方法

Publications (2)

Publication Number Publication Date
JPS5896883A true JPS5896883A (ja) 1983-06-09
JPH0116914B2 JPH0116914B2 (enrdf_load_stackoverflow) 1989-03-28

Family

ID=16324831

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19445481A Granted JPS5896883A (ja) 1981-12-04 1981-12-04 ル−プ状線材の表面処理方法

Country Status (1)

Country Link
JP (1) JPS5896883A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6210996B1 (en) 1995-01-13 2001-04-03 Semiconductor Energy Laboratory Co., Ltd. Laser illumination system
JP2005175451A (ja) * 2003-11-20 2005-06-30 Semiconductor Energy Lab Co Ltd レーザ照射装置並びに半導体装置の作製方法
US7714251B2 (en) 2005-11-23 2010-05-11 Semiconductor Energy Laboratory Co., Ltd Laser irradiation apparatus
JP5873606B1 (ja) * 2014-09-10 2016-03-01 中川特殊鋼株式会社 線材の洗浄方法およびその装置

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6210996B1 (en) 1995-01-13 2001-04-03 Semiconductor Energy Laboratory Co., Ltd. Laser illumination system
US6468842B2 (en) 1995-01-13 2002-10-22 Semiconductor Energy Laboratory Co., Ltd. Laser illumination system
US6706570B2 (en) 1995-01-13 2004-03-16 Semiconductor Energy Laboratory Co., Ltd., Laser illumination system
US6784030B2 (en) 1995-01-13 2004-08-31 Semiconductor Energy Laboratory Co., Ltd. Laser illumination system
US7528079B2 (en) 1995-01-13 2009-05-05 Semiconductor Energy Laboratory Co., Ltd. Method of changing an energy attenuation factor of a linear light in order to crystallize a semiconductor film
JP2005175451A (ja) * 2003-11-20 2005-06-30 Semiconductor Energy Lab Co Ltd レーザ照射装置並びに半導体装置の作製方法
US7714251B2 (en) 2005-11-23 2010-05-11 Semiconductor Energy Laboratory Co., Ltd Laser irradiation apparatus
JP5873606B1 (ja) * 2014-09-10 2016-03-01 中川特殊鋼株式会社 線材の洗浄方法およびその装置

Also Published As

Publication number Publication date
JPH0116914B2 (enrdf_load_stackoverflow) 1989-03-28

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