JPS5896872A - 真空蒸着部 - Google Patents
真空蒸着部Info
- Publication number
- JPS5896872A JPS5896872A JP19448881A JP19448881A JPS5896872A JP S5896872 A JPS5896872 A JP S5896872A JP 19448881 A JP19448881 A JP 19448881A JP 19448881 A JP19448881 A JP 19448881A JP S5896872 A JPS5896872 A JP S5896872A
- Authority
- JP
- Japan
- Prior art keywords
- zinc
- furnace
- heater
- evaporation
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001771 vacuum deposition Methods 0.000 title abstract description 4
- 238000010438 heat treatment Methods 0.000 claims abstract description 19
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 14
- 238000007738 vacuum evaporation Methods 0.000 claims description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 abstract description 36
- 239000011701 zinc Substances 0.000 abstract description 36
- 229910052725 zinc Inorganic materials 0.000 abstract description 36
- 238000001704 evaporation Methods 0.000 abstract description 12
- 230000008020 evaporation Effects 0.000 abstract description 12
- 238000007740 vapor deposition Methods 0.000 abstract description 11
- 229910000831 Steel Inorganic materials 0.000 abstract description 10
- 239000010959 steel Substances 0.000 abstract description 10
- 239000007788 liquid Substances 0.000 abstract description 9
- 230000007423 decrease Effects 0.000 abstract description 4
- 230000008859 change Effects 0.000 abstract description 3
- 239000002344 surface layer Substances 0.000 abstract description 3
- 230000015572 biosynthetic process Effects 0.000 abstract description 2
- 230000004043 responsiveness Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 description 9
- 238000010521 absorption reaction Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 238000000151 deposition Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 230000004044 response Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000008188 pellet Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- OKTJSMMVPCPJKN-IGMARMGPSA-N Carbon-12 Chemical compound [12C] OKTJSMMVPCPJKN-IGMARMGPSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005246 galvanizing Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19448881A JPS5896872A (ja) | 1981-12-04 | 1981-12-04 | 真空蒸着部 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19448881A JPS5896872A (ja) | 1981-12-04 | 1981-12-04 | 真空蒸着部 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5896872A true JPS5896872A (ja) | 1983-06-09 |
JPH0144784B2 JPH0144784B2 (enrdf_load_stackoverflow) | 1989-09-29 |
Family
ID=16325359
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19448881A Granted JPS5896872A (ja) | 1981-12-04 | 1981-12-04 | 真空蒸着部 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5896872A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2017001910A1 (en) * | 2015-06-29 | 2017-01-05 | Flisom Ag | Evaporation crucible with floater |
CN109518136A (zh) * | 2019-01-24 | 2019-03-26 | 成都京东方光电科技有限公司 | 蒸镀结构、蒸镀系统及蒸镀结构的使用方法 |
CN113846294A (zh) * | 2020-06-26 | 2021-12-28 | 三星显示有限公司 | 显示装置的制造装置 |
-
1981
- 1981-12-04 JP JP19448881A patent/JPS5896872A/ja active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2017001910A1 (en) * | 2015-06-29 | 2017-01-05 | Flisom Ag | Evaporation crucible with floater |
CN109518136A (zh) * | 2019-01-24 | 2019-03-26 | 成都京东方光电科技有限公司 | 蒸镀结构、蒸镀系统及蒸镀结构的使用方法 |
WO2020151495A1 (zh) * | 2019-01-24 | 2020-07-30 | 京东方科技集团股份有限公司 | 蒸镀结构、蒸镀装置、蒸镀系统及蒸镀结构的使用方法 |
CN113846294A (zh) * | 2020-06-26 | 2021-12-28 | 三星显示有限公司 | 显示装置的制造装置 |
Also Published As
Publication number | Publication date |
---|---|
JPH0144784B2 (enrdf_load_stackoverflow) | 1989-09-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CA1081558A (en) | Method for dip-coating ceramic with molten silicon | |
US4856457A (en) | Cluster source for nonvolatile species, having independent temperature control | |
BRPI0918113B1 (pt) | Instalação de depósito a vácuo de um revestimento de liga metálica sobre um substrato e método para depositar um revestimento de liga metálica sobre um substrato | |
JPS5896872A (ja) | 真空蒸着部 | |
US4649857A (en) | Thin-film forming device | |
JPS5896871A (ja) | 真空蒸着装置の溶融金属蒸発炉 | |
US4537651A (en) | Method for removing semiconductor layers from salt substrates | |
JPH06502450A (ja) | 超伝導膜の現場成長法 | |
US3740043A (en) | Apparatus for vaporizing molten metal | |
KR0160067B1 (ko) | 진공증착강판제조용 저항가열 증발원 | |
KR0116791Y1 (ko) | 저항가열식 진공증착용 증발기 | |
JPH03211263A (ja) | 溶融めっき鋼板の製造装置 | |
JPS5884971A (ja) | 真空メツキ装置 | |
JPS5816066A (ja) | 真空メツキ装置 | |
JPS6157905B2 (enrdf_load_stackoverflow) | ||
JPH01275750A (ja) | 金属薄膜の製造装置 | |
JPH0230754A (ja) | 蒸着方法 | |
JPH0571152B2 (enrdf_load_stackoverflow) | ||
JPH0313566A (ja) | 薄膜製造方法 | |
JPS5887269A (ja) | 蒸発源装置 | |
JP3446420B2 (ja) | 連続溶融めっき方法 | |
JPS5974277A (ja) | 真空蒸着装置 | |
JPH01294851A (ja) | スナウト内ドロスの発生防止方法 | |
JPS579870A (en) | Formation of vapor-deposited film consisting of two or more elements | |
KR100489301B1 (ko) | 진공증착을 이용한 금속 필름 제조방법 |