JPS589416A - Production of container for quartz oscillator - Google Patents

Production of container for quartz oscillator

Info

Publication number
JPS589416A
JPS589416A JP10799881A JP10799881A JPS589416A JP S589416 A JPS589416 A JP S589416A JP 10799881 A JP10799881 A JP 10799881A JP 10799881 A JP10799881 A JP 10799881A JP S589416 A JPS589416 A JP S589416A
Authority
JP
Japan
Prior art keywords
glass
crystal
tin oxide
etching
case
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10799881A
Other languages
Japanese (ja)
Other versions
JPH0129086B2 (en
Inventor
Eiji Togawa
戸川 栄司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP10799881A priority Critical patent/JPS589416A/en
Publication of JPS589416A publication Critical patent/JPS589416A/en
Publication of JPH0129086B2 publication Critical patent/JPH0129086B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02Details
    • H03H9/05Holders; Supports
    • H03H9/10Mounting in enclosures
    • H03H9/1007Mounting in enclosures for bulk acoustic wave [BAW] devices
    • H03H9/1014Mounting in enclosures for bulk acoustic wave [BAW] devices the enclosure being defined by a frame built on a substrate and a cap, the frame having no mechanical contact with the BAW device
    • H03H9/1021Mounting in enclosures for bulk acoustic wave [BAW] devices the enclosure being defined by a frame built on a substrate and a cap, the frame having no mechanical contact with the BAW device the BAW device being of the cantilever type

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)

Abstract

PURPOSE:To realize a large-quantity and simultaneously vacuum sealing process, by using the glass for a case material. CONSTITUTION:The tin oxide of about 100Angstrom -1mu is formed on at least a single side of the glass by a CVD process. Then the unnecessary area of the tin oxide film 10 is removed by a photoetching process, etc. The remaining film 10 is used as a mask to etch the glass, and a recessed part is formed to the glass. The unnecessary area of the film 10 is removed again by a photoetching process, etc., and an electrode is formed so as to leave the film 10 only at the areas shown by the oblique lines. In such way, the cost of the materials is reduced and the large- quantity and simultaneous process is possible.

Description

【発明の詳細な説明】 本発明は、薄型水晶振動子用のガラスケースの製造方法
に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing a glass case for a thin crystal resonator.

従来、水晶振動子は第1図に示すように水晶音叉1をプ
ラグ2と呼ばれるハーメチックシールのリード端子3に
ろう付し、真空中で金属ケース4を圧入して製造されて
いる。大半の水晶振動子はこのように製造されているが
、一部では薄型化の要求から第2図、第3図に示すよう
な水晶振動子がある。第2図αは、第2図すに示すよう
な枠付きの水晶音叉5を箱形にエツチングした水晶製の
上ケース6と下ケース7にはさんでろう材を用いて封止
した水晶振動子である。第3図は、絞り加工したセラミ
ックケース8に水晶音叉1をマウントシ、ガラス板9と
セラミックケース8をろう材で封止した水晶振動子であ
る。  ゛ 第1図に示す水晶振動子はプラグ、ケースが高く、円筒
形であるため薄展化には水晶音叉の巾という限界があっ
た。これを改善するために、第2図、第3図に示す水晶
振動子が考案されたが、前者はケース材料に高価な水晶
を用いているため、薄型化には成功したがきわめて高価
なものである。後者はセラミックの真空に対する信頼性
の低さとセラミック成形の困難さ、および水晶音叉の固
定(以下マウントという)の困難さからやはり実用的に
は円筒形の水晶振動子に劣るという欠点を有していた。
Conventionally, a crystal resonator is manufactured by brazing a crystal tuning fork 1 to a lead terminal 3 of a hermetic seal called a plug 2, and press-fitting a metal case 4 in a vacuum, as shown in FIG. Although most crystal resonators are manufactured in this manner, some crystal resonators are manufactured as shown in FIGS. 2 and 3 due to the demand for thinner crystal resonators. Figure 2 α shows a crystal vibration in which a crystal tuning fork 5 with a frame as shown in Figure 2 is sandwiched between an upper case 6 and a lower case 7 made of crystal etched into a box shape and sealed using a brazing material. It is a child. FIG. 3 shows a crystal resonator in which a crystal tuning fork 1 is mounted on a drawn ceramic case 8, and the glass plate 9 and the ceramic case 8 are sealed with a brazing material. ``The crystal resonator shown in Figure 1 has a tall plug and case, and is cylindrical, so there is a limit to how thin it can be made, which is the width of a crystal tuning fork. In order to improve this, the crystal resonators shown in Figures 2 and 3 were devised, but the former uses expensive crystal for the case material, so although it was successful in making it thinner, it was extremely expensive. It is. The latter has the disadvantage that it is inferior to a cylindrical crystal resonator in practical terms due to the low reliability of ceramics in vacuum, the difficulty of ceramic molding, and the difficulty of fixing (hereinafter referred to as mounting) the crystal tuning fork. Ta.

本発明は、上記のような欠点を改善し、安価で薄い水晶
振動子の製造方法を提供するものである第2図、第3@
の水晶振動子がコストダウンという目的を達成できなか
った理由を検討した結果状のような結論を得た。
The present invention improves the above-mentioned drawbacks and provides a method for manufacturing an inexpensive and thin crystal resonator.
As a result of examining the reason why the crystal resonator of 2005 was unable to achieve the goal of reducing costs, we came to the following conclusion.

第2図の水晶振動子について ■ケースに高価な水晶を用いた。枠付き水晶音叉を用い
る場合には熱膨張率をケースと音叉を合わせる必要があ
る。
About the crystal oscillator shown in Figure 2 ■ An expensive crystal was used for the case. When using a framed crystal tuning fork, it is necessary to match the thermal expansion coefficients of the case and tuning fork.

■ケースをクロム、金の蒸着膜をマスクにしてエツチン
グした。水晶は高濃度のフッ化水木溶液でエツチングす
るため、エツチングマスクはクロム、金を用いるしかな
い。
■The case was etched using chrome and gold vapor deposition film as a mask. Since crystals are etched with a highly concentrated fluoride solution, the etching mask must be made of chromium or gold.

■枠付き水晶を用いた。水晶片から水晶音叉をとり出す
時、枠も同時に加工するため音叉の取れ数が少なく高価
になる。
■Using framed crystal. When removing a crystal tuning fork from a piece of crystal, the frame is also processed at the same time, which makes the number of tuning forks that can be removed small and expensive.

■ケースにエツチング異方性のある水晶を用いた。水晶
はX、Y、Z軸方向でエツチング速度が異なるが、ケー
スの厚み方向2方向は特にエツチングされやすく、結晶
に欠陥があればケースの表裏はエツチングで貫通して真
空を保持できない。
■Crystal with etching anisotropy is used for the case. Although the etching speed of crystal is different in the X, Y, and Z axis directions, the two thickness directions of the case are particularly susceptible to etching, and if there is a defect in the crystal, the front and back of the case will be etched through, making it impossible to maintain a vacuum.

第3図の水晶振動子について ■セラミックの気密信頼性が低い。 セラミックは微粒
子の焼結体であるためある程度以上の厚みがないと気密
を保つことができない。
Regarding the crystal oscillator shown in Figure 3: - Ceramic has low airtight reliability. Since ceramic is a sintered body of fine particles, airtightness cannot be maintained unless it is thicker than a certain level.

■マウント部がセラミックケースの内部にあるためマウ
ント作業が困難である。
■Mounting work is difficult because the mount part is inside the ceramic case.

■セラミックの平担度が悪い。 セラミックは印刷、絞
り加工後焼成するため、完成品の平担度が悪い。 この
ため、多くのセラミックケースをシート状で一度に封止
することができないので単品加工になる。
■Poor ceramic flatness. Since ceramics are fired after printing and drawing, the finished product has poor flatness. For this reason, it is not possible to seal many ceramic cases in sheet form at once, so each product must be processed individually.

以上に述べた欠点を改善するために、本発明者は次のよ
うな構成で水晶振動子を製造した。
In order to improve the above-mentioned drawbacks, the present inventor manufactured a crystal resonator with the following configuration.

(1)ケースはガラスを用いる。(1) Use glass for the case.

(2)ケースは酸化スズをマスクとしてエツチングする
(2) The case is etched using tin oxide as a mask.

(8)ケースは平担なガラスから多数個同時に製造する
(8) Multiple cases are manufactured simultaneously from flat glass.

(4)ケースは箱形で第3図のセラ建ツクケース8のよ
うな2重段差としない。
(4) The case is box-shaped and does not have double steps like the cellar-built case 8 in Figure 3.

(5)ガラスのエツチングマスクとして用いた酸化スズ
膜を、水晶音叉の電極を外部に引き出すリード線にする
(5) The tin oxide film used as the glass etching mask is used as a lead wire to lead the electrode of the crystal tuning fork to the outside.

次に、実施例に従って本発明の詳細な説明する実施例 厚み[L3mの50叫角のD263ガラス(商品名ニジ
ヨツト社、成分:いづれも重量比にて、f910.68
%、Na107%s 人1103 4 %、に、106
%、Ba0a8%、B、0.9%、ZnO4%)を十分
洗浄、乾燥した後、OVD法で酸化スズ(SnO,)1
0を厚さ1000X形成した。この上にフォトレジスト
11を塗布し、露光。
Next, the present invention will be described in detail according to examples.Example Thickness [L3m, 50 cryo angle D263 glass (trade name: Nijiyoto Co., Ltd., components: all by weight ratio, f910.68
%, Na107%s people 1103 4%, 106
%, Ba0a8%, B,0.9%, ZnO4%) were sufficiently washed and dried, and then tin oxide (SnO,)1
0 was formed to a thickness of 1000×. A photoresist 11 is applied on top of this and exposed.

現像をして第4図のようなパターンを形成した。It was developed to form a pattern as shown in FIG.

斜線部がレジストの残った部分で、第4図(α)は上ケ
ース、(h)は下ケースのパターンである。次に、クエ
ン酸200 f/l 、塩酸50 t/を溶液に金属ク
ロムを109/を溶解した溶液を60℃に加熱し、この
液に上記のガラスを10秒間浸漬して第4図の斜線部以
外の酸化スズを除去した。次に、このガラスを49%H
Fs液800Q/l、グリセリン500o /Zのエツ
チング液で、60℃で50分間エツチングした。エツチ
ング後のガラスの断面を第5図に示す。ガラスのエツチ
ング深さは110μであった。なお、酸化スズ10は片
面にのみ形成したので、他の面は均一にエツチングされ
て、ガラスの厚みはエツチングされていない場所で19
0μであった。エツチング後、酸化スズの表面およびエ
ツチングされたガラスの面を観察してみたところ、酸化
スズはほとんどエツチングされておらず、一方ガラスの
エツチング面は非常になめらかでエツチング深さも均一
であった。これから、酸化スズとアルカリ亜鉛ホウケイ
酸とのエツチング速度の比は1000倍以上である。よ
りエツチングされやすいソーダガラスでは5000倍以
上であることが他の実験から確認された。酸化スズの厚
みは、ガラスのエツチングマスクとしては1ooi以上
1μ以下であり、望ましくは300〜3oooXである
。酸化スズの厚みが1oo′j−より少ないとピンホー
ルが多くてエツチングマスクとしては使用できず、また
ガラス材質によってはエツチング速度の選択比を十分に
とることができない。一方厚みが1μを越えると酸化ス
ズに微細な亀裂が生じやすく、また酸化スズのパターニ
ングの際のサイドエッチ量が大きく使用することが困難
になる。厚みが300〜30ooXの間では酸化スズは
ピンホール、亀裂がほとんどなく、緻密である。
The shaded area is the remaining part of the resist, and FIG. 4(α) is the pattern for the upper case, and FIG. 4(h) is the pattern for the lower case. Next, a solution containing 200 f/l of citric acid, 50 t/l of hydrochloric acid, and 109/ml of metallic chromium was heated to 60°C, and the above glass was immersed in this solution for 10 seconds to form the diagonal lines in Figure 4. The remaining tin oxide was removed. Next, this glass was 49%H
Etching was performed at 60° C. for 50 minutes with an etching solution containing 800 Q/l of Fs solution and 500°/Z of glycerin. A cross section of the glass after etching is shown in FIG. The etching depth of the glass was 110μ. Note that since the tin oxide 10 was formed only on one side, the other surfaces were uniformly etched, and the thickness of the glass was 19 mm at the unetched area.
It was 0μ. After etching, the surface of the tin oxide and the surface of the etched glass were observed, and it was found that the tin oxide was hardly etched, while the etched surface of the glass was very smooth and the etching depth was uniform. It can be seen that the ratio of etching rates between tin oxide and alkali zinc borosilicate is more than 1000 times. Other experiments have confirmed that soda glass, which is more easily etched, is 5000 times more effective. The thickness of tin oxide as a glass etching mask is 100 to 1 μm, preferably 300 to 300×. If the thickness of tin oxide is less than 1 oo'j-, there will be too many pinholes and it cannot be used as an etching mask, and depending on the glass material, it may not be possible to obtain a sufficient etching rate selectivity. On the other hand, if the thickness exceeds 1 μm, fine cracks are likely to occur in tin oxide, and the amount of side etching during patterning of tin oxide is large, making it difficult to use. When the thickness is between 300 and 3000X, tin oxide is dense with almost no pinholes or cracks.

ガラスをエツチングした後、第4図(h)に示す下ケー
スをフォトエツチング法を用いてパターニングし、第6
図(α)に示すように斜線部にのみ酸化スズ膜が残るよ
うに電極を形成する。次に下ケース用ガラスの凸部に低
融点ガラスフリット12を第6図Cb’)のように印刷
したのち、400℃で20分間焼成した。低融点ガラス
ペーストはI、A200A(商品名:吉川化工製)を用
いた。これは軟化点が385℃である。次に、低融点ガ
ラスを付着した下ケースに市販の前処理液および無電解
ニッケルメッキ液によって酸化スズ10上にのみ選択的
に、かつ密着よくニッケルメッキ13を施した。増感剤
はシップレイ44(商品名)、促進剤はシップレイ19
(商品名)、無電解ニッケルメッキ液はシューマー86
510(商品名:日本カニゼン製)を用いた。水晶音叉
のマウント性、外部端子のハンダ付性を良くするために
ニッケルの上に無電解金メッキ液アトメックス(商品名
8日本エンゲルハルト製)で金メッキ14を施した。下
ケースの断面を第7図に示す。次に、第8図に示すよう
に、マウント部にろう材をメッキした水晶音叉1をろう
付したのち、酸化スズを剥離した上ケース15を真空中
で図のように重ね、475℃で30分間加熱して低融点
ガラスフリットを溶融して封止した。
After etching the glass, the lower case shown in FIG. 4(h) is patterned using a photo-etching method, and
As shown in Figure (α), the electrode is formed so that the tin oxide film remains only in the shaded area. Next, a low melting point glass frit 12 was printed on the convex portion of the lower case glass as shown in FIG. 6Cb'), and then baked at 400° C. for 20 minutes. As the low melting point glass paste, I, A200A (trade name: manufactured by Yoshikawa Kako) was used. It has a softening point of 385°C. Next, nickel plating 13 was selectively and closely adhered to the tin oxide 10 only on the tin oxide 10 using a commercially available pretreatment solution and an electroless nickel plating solution on the lower case to which the low melting point glass was attached. The sensitizer is Shipley 44 (trade name) and the accelerator is Shipley 19.
(Product name), electroless nickel plating solution is Schumer 86
510 (trade name: manufactured by Nippon Kanigen) was used. In order to improve the mountability of the crystal tuning fork and the solderability of external terminals, gold plating 14 was applied on the nickel using an electroless gold plating solution Atomex (product name 8 manufactured by Nippon Engelhardt). A cross section of the lower case is shown in FIG. Next, as shown in Fig. 8, after brazing the crystal tuning fork 1 plated with brazing material to the mount part, the upper case 15 from which the tin oxide has been peeled off is stacked in a vacuum as shown in the figure, and heated to 475°C for 30 minutes. The low melting point glass frit was melted and sealed by heating for a minute.

このようにして製造した水晶振動子の厚みは1llL6
闘であった。
The thickness of the crystal resonator manufactured in this way is 1llL6
It was a struggle.

次に、本発明によって得られる効果を述べる。Next, the effects obtained by the present invention will be described.

(1)材料が安価である。(1) Materials are inexpensive.

ガラスを用いるだけでなく、ガラス材質もほとんど選ば
ないため、安価なガラスを使用できる(2)大量同時加
工ができる。
Not only glass is used, but the glass material is hardly selected, so inexpensive glass can be used.(2) Large-scale simultaneous processing is possible.

水晶をケースとして用いるには水晶原石の大きさによっ
て加工数が限定される上に、必ずコストを大巾に上げる
研摩工程が必要である。また、セラミックは平担度が悪
いため、大きなシートで大量同時加工は不可能である。
When using crystal as a case, the number of processes is limited depending on the size of the raw crystal, and it also requires a polishing process that increases the cost considerably. Furthermore, since ceramic has poor flatness, it is impossible to process large sheets simultaneously in large quantities.

それに対して、本発明ではガラスをケース材料に用いる
ので、無研摩で平担度が良く、かつ大きなシートを容易
に、安価に得ることができる。
On the other hand, in the present invention, since glass is used as the case material, it is possible to easily obtain a large sheet with good flatness without polishing and at low cost.

(8)ガラスエツチングマスクが安価である。(8) Glass etching masks are inexpensive.

ガラスを精度良くエツチングする場合、一般的にはクロ
ム、金の蒸着膜を用いる。耐フツ酸性金属としては金を
用いるのであるが、金のみではガラスへの密着性を得ら
れないために下地としてクロムを用いている。2層金属
を用いるために増える工数と、高価な金を用いること、
ぞ−して何よりも真空中で皮膜をつけることが高価にす
る原因となっている。本発明では、酸化スズ1層でエツ
チングマスクとして用いることができる。また、酸化ス
ズはOVD法によって連続7 的にきわめて容易に形成
することができるため、ガラスエツチングマスク形成を
安価にすることができる。
When etching glass with high precision, vapor-deposited films of chromium and gold are generally used. Gold is used as the hydrofluoric acid-resistant metal, but since gold alone does not provide good adhesion to glass, chromium is used as the base. Increased man-hours due to the use of two-layer metal and the use of expensive gold;
Above all, applying the film in a vacuum is the cause of the high cost. In the present invention, a single layer of tin oxide can be used as an etching mask. Further, since tin oxide can be formed continuously and very easily by the OVD method, the glass etching mask can be formed at low cost.

(4)気密信頼性が高い。(4) High airtight reliability.

水晶はケース製造時のエツチングの際、格子欠陥による
貫通穴が生じやすくて歩留が低い。
When crystal is etched during case manufacturing, through-holes are likely to occur due to lattice defects, resulting in a low yield.

また、セラミックは本質的に気密の信頼性が低い。本発
明ではガラスを素材としているため気密性は極めて高い
Additionally, ceramics inherently have poor airtight reliability. In the present invention, since glass is used as the material, airtightness is extremely high.

(5)ガラスエツチングマスクを電極にも使用できる。(5) Glass etching masks can also be used for electrodes.

本発明でガラスエツチングのマスクとして使用した酸化
スズは導電性を有するため、水晶音叉から取り出す電気
信号を容器外部へ導く電極として使用することができる
。酸化スズはガラスを封止する低融点ガラスフリットが
その上にあっても性能を変えることがないが、同様な透
明電極材料酸化インジウム(工n*os)は低融点ガラ
スフリットとともに加熱すると導電性を失う。本発明に
よればエツチングマスクとして使用した酸化スズを再び
電極材料として用いることができるので工程が短いとい
うコストダウン効果がある。
Since the tin oxide used as a mask for glass etching in the present invention has electrical conductivity, it can be used as an electrode to guide the electrical signal extracted from the crystal tuning fork to the outside of the container. Tin oxide does not change its performance even if a low-melting glass frit that seals the glass is placed on top of it, but a similar transparent electrode material, indium oxide (N*OS), becomes conductive when heated with a low-melting glass frit. Lose. According to the present invention, tin oxide used as an etching mask can be used again as an electrode material, resulting in a cost reduction effect in which the process is shortened.

以上に述べたように、本発明による水晶振動子用容器の
製造方法は、安価な材料でしかも大量同時真空封止処理
が可能となるため、従来の円筒形水晶振動子の製造方法
に優る極めて実用的な発明である。
As described above, the method for manufacturing a container for a crystal resonator according to the present invention is extremely superior to the conventional method for manufacturing a cylindrical crystal resonator, since it uses inexpensive materials and enables simultaneous vacuum sealing in large quantities. This is a practical invention.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の円筒形水晶振動子、第2図は水晶をケー
ス材料とする薄型水晶振動子の斜視図(′ α)と水晶
片の平面図Ch)、第3図はセラミックとガラスをケー
ス材料とする薄型水晶振動子を示す。第4図は本発明に
よる上ケースのパターン図(α)と下ケースのパターン
図(b)、第5図はガラスエツチング後の断面、第6図
は電極の配線@(α)、および低融点ガラスフリット印
刷後の平面図Ch)、第7図は酸化スズ上に無電解ニッ
ケルおよび金を施した後の断面図、第8図は水晶音叉マ
ウントおよび上ケース真空封止後の図をそれぞれ示す。 以上 出願人 株式会社識訪精工舎 代理人 弁理士 最上  務 矛ぢ図 (α)                (bツヤ乙 
図 +i7  図 千8 図
Fig. 1 shows a conventional cylindrical crystal resonator, Fig. 2 shows a perspective view (' α) and a plan view of a crystal piece of a thin crystal resonator whose case material is crystal (Ch), and Fig. 3 shows a ceramic and glass crystal resonator. The thin crystal resonator used as the case material is shown. Figure 4 is the upper case pattern diagram (α) and lower case pattern diagram (b) according to the present invention, Figure 5 is the cross section after glass etching, and Figure 6 is the electrode wiring @ (α) and the low melting point. Figure 7 is a cross-sectional view after applying electroless nickel and gold on tin oxide, and Figure 8 is a diagram after the crystal tuning fork mount and upper case are vacuum sealed. . Applicant: Shikiwa Seikosha Co., Ltd. Agent, Patent Attorney: Mogami
Figure + i7 Figure 1,000 Figure 8

Claims (1)

【特許請求の範囲】[Claims] 水晶音叉を一方の面に凹部を有する2枚のガラスによっ
て真空封入する水晶振動子の製造方法において、該ガラ
スの少なくとも片面に100X以上1μ以下の酸化スズ
(S n Ox )を形成したのち、フォトエツチング
法等を用いて酸化スズ皮膜の不要部を除去後、残った酸
化スズ皮膜をマスクとしてガラスをエツチングしてガラ
スに水晶音叉を収納する四部を形成し、再びフォトエツ
チング法等を用いて酸化スズの不要部を除去し、残った
酸化スズ皮膜を水晶音叉の外部への導通電極とすること
を特徴とする水晶振動子用容器の製造方法
In a method for manufacturing a crystal resonator in which a crystal tuning fork is vacuum-sealed between two pieces of glass having a concave portion on one surface, tin oxide (S n Ox ) of 100X or more and 1μ or less is formed on at least one side of the glass, and then a photo After removing unnecessary parts of the tin oxide film using an etching method, etc., etching the glass using the remaining tin oxide film as a mask to form four parts that house the crystal tuning fork in the glass, and then oxidizing again using a photo etching method etc. A method for manufacturing a container for a crystal resonator, characterized by removing unnecessary portions of tin and using the remaining tin oxide film as a conductive electrode to the outside of the crystal tuning fork.
JP10799881A 1981-07-09 1981-07-09 Production of container for quartz oscillator Granted JPS589416A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10799881A JPS589416A (en) 1981-07-09 1981-07-09 Production of container for quartz oscillator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10799881A JPS589416A (en) 1981-07-09 1981-07-09 Production of container for quartz oscillator

Publications (2)

Publication Number Publication Date
JPS589416A true JPS589416A (en) 1983-01-19
JPH0129086B2 JPH0129086B2 (en) 1989-06-07

Family

ID=14473385

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10799881A Granted JPS589416A (en) 1981-07-09 1981-07-09 Production of container for quartz oscillator

Country Status (1)

Country Link
JP (1) JPS589416A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04211275A (en) * 1989-12-20 1992-08-03 Dx Imaging Inc Electrostatic liquid developing solution and manufacture thereof
JP5162675B2 (en) * 2008-11-28 2013-03-13 セイコーインスツル株式会社 Piezoelectric vibrator manufacturing method, piezoelectric vibrator, oscillator, electronic device, and radio timepiece

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04211275A (en) * 1989-12-20 1992-08-03 Dx Imaging Inc Electrostatic liquid developing solution and manufacture thereof
JP5162675B2 (en) * 2008-11-28 2013-03-13 セイコーインスツル株式会社 Piezoelectric vibrator manufacturing method, piezoelectric vibrator, oscillator, electronic device, and radio timepiece
US8638180B2 (en) 2008-11-28 2014-01-28 Sii Crystal Technology Inc. Piezoelectric vibrator manufacturing method, piezoelectric vibrator, oscillator, electronic device, and radio-controlled timepiece

Also Published As

Publication number Publication date
JPH0129086B2 (en) 1989-06-07

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