JPS5891446A - 軟ｘ線リソグラフイ−用フイルムの製造法 - Google Patents

軟ｘ線リソグラフイ−用フイルムの製造法

Info

Publication number
JPS5891446A
JPS5891446A JP56189521A JP18952181A JPS5891446A JP S5891446 A JPS5891446 A JP S5891446A JP 56189521 A JP56189521 A JP 56189521A JP 18952181 A JP18952181 A JP 18952181A JP S5891446 A JPS5891446 A JP S5891446A
Authority
JP
Japan
Prior art keywords
film
polyimide
soft
glass substrate
ultraviolet rays
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56189521A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6325931B2 (cs
Inventor
Yukio Iimura
飯村　幸夫
Tomihiro Nakada
中田　富紘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP56189521A priority Critical patent/JPS5891446A/ja
Publication of JPS5891446A publication Critical patent/JPS5891446A/ja
Publication of JPS6325931B2 publication Critical patent/JPS6325931B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Moulding By Coating Moulds (AREA)
JP56189521A 1981-11-26 1981-11-26 軟ｘ線リソグラフイ−用フイルムの製造法 Granted JPS5891446A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56189521A JPS5891446A (ja) 1981-11-26 1981-11-26 軟ｘ線リソグラフイ−用フイルムの製造法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56189521A JPS5891446A (ja) 1981-11-26 1981-11-26 軟ｘ線リソグラフイ−用フイルムの製造法

Publications (2)

Publication Number Publication Date
JPS5891446A true JPS5891446A (ja) 1983-05-31
JPS6325931B2 JPS6325931B2 (cs) 1988-05-27

Family

ID=16242673

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56189521A Granted JPS5891446A (ja) 1981-11-26 1981-11-26 軟ｘ線リソグラフイ−用フイルムの製造法

Country Status (1)

Country Link
JP (1) JPS5891446A (cs)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230044351A (ko) 2020-07-29 2023-04-04 도요보 가부시키가이샤 플렉시블 전자 디바이스의 제조 방법

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230044351A (ko) 2020-07-29 2023-04-04 도요보 가부시키가이샤 플렉시블 전자 디바이스의 제조 방법

Also Published As

Publication number Publication date
JPS6325931B2 (cs) 1988-05-27

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