JPS5891407A - シリコン回折格子の製造方法 - Google Patents
シリコン回折格子の製造方法Info
- Publication number
- JPS5891407A JPS5891407A JP18907681A JP18907681A JPS5891407A JP S5891407 A JPS5891407 A JP S5891407A JP 18907681 A JP18907681 A JP 18907681A JP 18907681 A JP18907681 A JP 18907681A JP S5891407 A JPS5891407 A JP S5891407A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- diffraction grating
- silicon
- mask
- single crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 41
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 41
- 239000010703 silicon Substances 0.000 title claims abstract description 41
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 22
- 238000005530 etching Methods 0.000 claims abstract description 97
- 239000013078 crystal Substances 0.000 claims abstract description 29
- 239000000758 substrate Substances 0.000 claims abstract description 9
- 238000000034 method Methods 0.000 claims description 15
- 230000003287 optical effect Effects 0.000 claims description 11
- 230000001419 dependent effect Effects 0.000 claims description 2
- 239000006185 dispersion Substances 0.000 abstract description 7
- 238000007796 conventional method Methods 0.000 description 11
- 230000007547 defect Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 235000014676 Phragmites communis Nutrition 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18907681A JPS5891407A (ja) | 1981-11-27 | 1981-11-27 | シリコン回折格子の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18907681A JPS5891407A (ja) | 1981-11-27 | 1981-11-27 | シリコン回折格子の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5891407A true JPS5891407A (ja) | 1983-05-31 |
JPS6314322B2 JPS6314322B2 (enrdf_load_stackoverflow) | 1988-03-30 |
Family
ID=16234899
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18907681A Granted JPS5891407A (ja) | 1981-11-27 | 1981-11-27 | シリコン回折格子の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5891407A (enrdf_load_stackoverflow) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6180822A (ja) * | 1984-09-27 | 1986-04-24 | Nec Corp | ブレ−ズド回折格子の作成方法 |
JPH0749403A (ja) * | 1993-04-12 | 1995-02-21 | Hughes Aircraft Co | マイクロ光学素子の製造方法 |
US6517734B1 (en) * | 2000-07-13 | 2003-02-11 | Network Photonics, Inc. | Grating fabrication process using combined crystalline-dependent and crystalline-independent etching |
JP2003075622A (ja) * | 2001-09-05 | 2003-03-12 | Toshiba Corp | 回折格子、回折格子の加工方法及び光学要素 |
-
1981
- 1981-11-27 JP JP18907681A patent/JPS5891407A/ja active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6180822A (ja) * | 1984-09-27 | 1986-04-24 | Nec Corp | ブレ−ズド回折格子の作成方法 |
JPH0749403A (ja) * | 1993-04-12 | 1995-02-21 | Hughes Aircraft Co | マイクロ光学素子の製造方法 |
US6517734B1 (en) * | 2000-07-13 | 2003-02-11 | Network Photonics, Inc. | Grating fabrication process using combined crystalline-dependent and crystalline-independent etching |
JP2003075622A (ja) * | 2001-09-05 | 2003-03-12 | Toshiba Corp | 回折格子、回折格子の加工方法及び光学要素 |
Also Published As
Publication number | Publication date |
---|---|
JPS6314322B2 (enrdf_load_stackoverflow) | 1988-03-30 |
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