JPS5889380A - Thermal head - Google Patents
Thermal headInfo
- Publication number
- JPS5889380A JPS5889380A JP18755081A JP18755081A JPS5889380A JP S5889380 A JPS5889380 A JP S5889380A JP 18755081 A JP18755081 A JP 18755081A JP 18755081 A JP18755081 A JP 18755081A JP S5889380 A JPS5889380 A JP S5889380A
- Authority
- JP
- Japan
- Prior art keywords
- film
- insulating base
- conductor
- heating resistor
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/315—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
- B41J2/32—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
- B41J2/345—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads characterised by the arrangement of resistors or conductors
Landscapes
- Electronic Switches (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は感熱プリンター用の印字ヘッド、特に発熱ドツ
トが数個板1〜列に並んだ構造のサーマルヘッドに関す
る。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a print head for a thermal printer, and particularly to a thermal head having a structure in which several heat-generating dots are arranged in a row on one plate.
従来の印字ヘッドには、平板形と円柱形がある。Conventional printheads include flat and cylindrical printheads.
平板形は第1図に示すような構造のものである。The flat plate type has a structure as shown in FIG.
この平板形のサーマルヘッドは、絶縁基板1の上に突起
をつくり、表面にN i Crなどの発熱抵抗体膜2を
真空蒸着で形成し、その上にAuなどの導体膜3を形成
し、フォトリゾグラフィにてパターン形成した後、上に
耐磨耗膜4として酸化タンタルなどをスパッタにて形成
する。使用時は導体膜3の両端に電圧印加し、発熱体ド
ツト部2aを発熱させて耐磨耗膜4の上を滑る感熱紙6
を発色させるものである。しかしこの構造は充分な紙へ
の押しつけ圧力を得るために、製造時にサーマルヘッド
の発熱ドツト部分だけ基板を盛り上げる必要があり、そ
れだけ工程が複雑となって製造価格を引き上げている。This flat thermal head has a protrusion formed on an insulating substrate 1, a heating resistor film 2 such as NiCr formed on the surface by vacuum evaporation, and a conductor film 3 such as Au formed on the surface. After forming a pattern by photolithography, a wear-resistant film 4 such as tantalum oxide is formed thereon by sputtering. When in use, a voltage is applied to both ends of the conductor film 3 to cause the heating element dots 2a to generate heat, and the thermal paper 6 slides on the abrasion resistant film 4.
It produces color. However, with this structure, in order to obtain sufficient pressing pressure against the paper, it is necessary to bulge the substrate only at the heating dots of the thermal head during manufacturing, which complicates the process and increases the manufacturing cost.
円柱形は第2図に示すようなもので、膜の構造は平板形
と同様である。すなわち、円柱形の絶縁基体6の上に発
熱抵抗体膜7、その上に導体膜8、さらにその上に耐磨
耗膜−9を形成している。7aは発熱体ドツト部である
。この円柱形のサーマルヘッドにおいては円周曲面を利
用しているだめ、そのままで紙6との接触が確実に行わ
れ、ドツト部分だけを盛り上げる必要はないので、平板
形よシ有利である。しかし発熱体のパターンを形成す3
べ一7′
る時に、曲面上に対してフォトリゾグラフィを行わなけ
ればならないため、技術的にむずかしく、1だ工数もか
かるという難点がある。The cylindrical shape is as shown in FIG. 2, and the structure of the membrane is the same as that of the flat plate shape. That is, a heat generating resistor film 7 is formed on a cylindrical insulating base 6, a conductor film 8 is formed thereon, and an abrasion resistant film 9 is further formed thereon. 7a is a heating element dot portion. Since this cylindrical thermal head utilizes a circumferentially curved surface, contact with the paper 6 is ensured as it is, and there is no need to raise only the dot portions, so it is advantageous over the flat plate type. However, forming the pattern of the heating element3
Since photolithography must be performed on a curved surface when preparing a sample, it is technically difficult and requires a lot of man-hours.
また前記従来のサーマルヘッドの製造時には、導体パタ
ーンのエツチング時72発熱体のエツチング時、リード
線の取p付は時と3回の微細位置合わせを行わねばなら
ず(平板形では更にドツト部分盛り上げ時の位置合わせ
が加わる)“、多くの工数を要していた。Furthermore, when manufacturing the conventional thermal head, fine alignment must be performed three times during etching of the conductor pattern, etching of the heating element, and three times when attaching the lead wires (in the case of a flat plate type, the dots are further raised). (Adding time alignment), it took a lot of man-hours.
さらに従来、発熱体の抵抗値は、一般にドツト寸法を個
々のサーマルヘッドに対して変ることができないため、
薄膜形成時に一義的に決定されてしまい、薄膜形成時の
抵抗値のばらつきが製造時の全体の歩留りに大きく悪影
響を及ぼしていた。Furthermore, conventionally, the resistance value of the heating element generally cannot be changed for each thermal head because the dot size cannot be changed for each thermal head.
It is uniquely determined at the time of thin film formation, and variations in resistance value during thin film formation have a large negative effect on the overall yield during manufacturing.
本発明は以上の点に鑑み、円柱形の利点を利用しつつ製
造上の難点を解決したサーマルヘッドを提供することを
目的とする。In view of the above points, it is an object of the present invention to provide a thermal head that utilizes the advantages of the cylindrical shape while solving the manufacturing difficulties.
この目的を達成するために本発明は、発熱抵抗体膜およ
び導体膜の形成された絶縁基体の軸の回りを旋回し発熱
抵抗体膜および導体膜を複数の領域に分離するだめの螺
線状の溝を形成したものである。To achieve this object, the present invention provides a spiral structure that rotates around the axis of an insulating substrate on which a heating resistor film and a conductor film are formed, and separates the heating resistor film and the conductor film into a plurality of regions. This groove has been formed.
以下本発明の一実施例について第3図、第4図を用いそ
の構成と製造方法について説明する。図において1oは
直径3論のアルミナよりなる絶縁基体である。この絶縁
基体100周面上にNiCx合金を蒸着して発熱抵抗体
膜を形成し、この発熱抵抗体膜11上にAuを導電材料
として蒸着させて導体膜12を形成する。このようにし
て絶縁基体10上に発熱抵抗体膜11.導体膜12を形
成したのち、ディスクブレードのカッター刃またはレー
ザー光にて絶縁基体10の一部まで削シ取る深さに溝切
りを行い、螺旋状の溝13を形成する。The structure and manufacturing method of one embodiment of the present invention will be described below with reference to FIGS. 3 and 4. In the figure, 1o is an insulating substrate made of alumina and having a diameter of 3 mm. A NiCx alloy is deposited on the circumferential surface of the insulating substrate 100 to form a heating resistor film, and Au is deposited as a conductive material on the heating resistor film 11 to form a conductor film 12. In this way, the heating resistor film 11 is formed on the insulating substrate 10. After the conductive film 12 is formed, a groove is cut to a depth such that a portion of the insulating substrate 10 is scraped using a cutter blade of a disk blade or a laser beam, thereby forming a spiral groove 13.
この溝切りはブレードを固定しておいて絶縁基体1oを
回転させながら軸方向に送る方法にて簡単に行うことが
できる。送シのピッチは発熱体のドツトピッチ0.36
■となっている。This groove cutting can be easily performed by keeping the blade fixed and feeding the insulating base 1o in the axial direction while rotating it. The pitch of the feeder is the dot pitch of the heating element 0.36
■It is.
次に第4図に示すように発熱体ドツト部11aを作成す
るために、絶縁基体10の軸と平行な方向にドツト幅0
.3簡に導体膜12をエツチングに511・−7′
より除去する。また発熱体ドツト部11aの裏側の絶縁
基体10を発熱抵抗体膜11および導体膜12とともに
すり落とす。Next, as shown in FIG. 4, in order to create the heating element dot portion 11a, dots with a width of 0 are made in a direction parallel to the axis of the insulating base 10.
.. 3. The conductive film 12 is removed by etching 511.-7'. Further, the insulating base 10 on the back side of the heating element dot portion 11a is rubbed off together with the heating resistor film 11 and the conductor film 12.
次に発熱体ドツト部11aの上にTa2o6の耐磨耗膜
をスパッタリングで形成する。さらに発熱体ドツト部1
1aの両端の導電部12aの各々の端に電圧印加用のリ
ード線を接続する。以上のようにして本実施例のサーマ
ルヘッドは製造される0本実施例のサーマルヘッドにお
いては、微細位置合わせはリード線の取付けの際の1回
だけで良い。すなわち導体パターンのエツチング(発熱
体ドツト部11&の形成)は円周上のどの位置でも良い
から位置合わせをする必要がなく、またドツトピッチに
ついては溝切シ時に軸方向送りの速度を制御することに
より、簡単に精度の良いピッチ寸法を実現することがで
きる。Next, a wear-resistant film of Ta2O6 is formed on the heating element dot portion 11a by sputtering. Furthermore, heating element dot part 1
Lead wires for voltage application are connected to each end of the conductive portion 12a at both ends of 1a. The thermal head of this embodiment is manufactured as described above. In the thermal head of this embodiment, fine positioning only needs to be performed once when attaching the lead wires. In other words, the etching of the conductor pattern (formation of the heating element dots 11 & , it is possible to easily achieve accurate pitch dimensions.
また発熱抵抗体膜11の形成後に個々の素体の表面抵抗
値を測定し、ランク分けした後に各々のランクに応じて
導体膜12のエツチング幅を変えることにより、簡単に
最終抵抗値を一定値に調整 −
することができ、製造歩留りを大きく向上させることが
できる。In addition, by measuring the surface resistance value of each element after forming the heating resistor film 11, and after classifying the elements into ranks, the etching width of the conductor film 12 is changed according to each rank, so that the final resistance value can be easily maintained at a constant value. - The manufacturing yield can be greatly improved.
また溝切り時に絶縁基体10の一部まで削り取るので、
ドツト間の熱的な分離も良く、印字のにじみが改良され
る。Also, since part of the insulating base 10 is removed when cutting the groove,
Thermal separation between dots is also good, and printing smearing is improved.
なお、各部材の材質などについては゛、実施例に挙げた
ものでなくても良く、例えば絶縁基体1゜については、
アルミナの他に7オルステライトなどの酸化物、シリカ
などの各種ガラスなど種々用いることができ、抵抗発熱
体膜11としてはNiCrの他Ta、TaN、Wなど多
数ある。導体膜12についても同様である。また、絶縁
基体1゜は外周が溝切り時に円柱形をしていれば良いの
で、例えば抵抗発熱体膜11の形成時に便利なように、
中に穴がおいていても効果には影響はない。さらに抵抗
発熱体膜11および導体膜12については、絶縁基体円
周全面について形成されていなくても良く、導体膜12
のエツチングを施す位置に抵抗発熱体膜11があれば充
分である。この場合、第4図で示したように発熱体ドツ
ト部11aの裏側7ベーン
の絶縁基体10をすり落とす必要はないので絶縁基体1
0は円柱形のままとなる。Note that the materials of each member may not be those listed in the examples; for example, for the insulating base 1,
In addition to alumina, various other materials such as oxides such as 7-orsterite and various types of glasses such as silica can be used, and as the resistance heating element film 11, there are many other materials such as Ta, TaN, and W in addition to NiCr. The same applies to the conductor film 12. In addition, since the outer periphery of the insulating substrate 1° only needs to have a cylindrical shape when grooves are cut, it is convenient when forming the resistance heating element film 11, for example.
Even if there is a hole inside, the effect will not be affected. Furthermore, the resistance heating element film 11 and the conductor film 12 do not need to be formed over the entire circumference of the insulating base;
It is sufficient if the resistive heating element film 11 is located at the location where the etching is performed. In this case, as shown in FIG.
0 remains cylindrical.
溝切り方法については、第6図に示すように螺旋状に切
る方法が機械的動きから考えても最も簡単に切削でき、
また速度も速く切削できる方法であり、効果的である。As for the groove cutting method, the spiral cutting method shown in Figure 6 is the easiest cutting method considering the mechanical movement.
It is also an effective method for cutting at a high speed.
これに反して第6図に示すように溝13′を例えば円柱
軸に直角方向に切ることを繰り返すなどの方法にするこ
とは、生産機器の機構が複雑となったり、製造に時間が
かかったりするため効果が半減する。On the other hand, if the groove 13' is repeatedly cut in a direction perpendicular to the cylinder axis as shown in FIG. Therefore, the effect is halved.
以上のように本発明のサーマルヘッドは構成したので、
微細位置合わせが1回だけで良く、容易にかつ安価に製
造することができ、また導体膜のエツチング幅を変える
ことにより簡単に最終抵抗値を一定値に調整することが
でき製造歩留りを大きく向上することができるものでち
り、その工業的価値は高い。Since the thermal head of the present invention is configured as described above,
Only one fine alignment is required, making it easy and inexpensive to manufacture.Also, by changing the etching width of the conductor film, the final resistance value can be easily adjusted to a constant value, greatly improving manufacturing yield. It can be used as dust, and its industrial value is high.
第1図および第2図は従来のサーマルヘッドの断面図、
第3図および第4図は本発明における一実施例のサーマ
ルヘッドの製造過程における斜視図、第6図および第6
図は溝切り方法の説明図である。
1o・・・・・・絶縁基体、11・・・・・・抵抗発熱
体膜、11a・・・・・・発熱体ドツト部、12・・・
・・・導体膜、12a・・・・・・導電部、13・・・
・・・溝。
代理人の氏名 弁理士 中 尾 敏 男 ほか1名第1
図
第3図
第4図
O
第5図
f、1
第6V4
f3’Figures 1 and 2 are cross-sectional views of a conventional thermal head;
3 and 4 are perspective views of the manufacturing process of a thermal head according to an embodiment of the present invention, and FIGS.
The figure is an explanatory diagram of the groove cutting method. 1o...Insulating base, 11...Resistive heating element film, 11a...Heating element dot portion, 12...
... Conductor film, 12a... Conductive part, 13...
···groove. Name of agent: Patent attorney Toshio Nakao and 1 other person 1st
Figure 3 Figure 4 O Figure 5 f, 1 6V4 f3'
Claims (1)
抗体膜と、この発熱抵抗体膜上に形成した導体膜と、こ
の導体膜を前記絶縁基体の軸と平行な方向に除去し前記
発熱抵抗体膜を露出させて形成上だ発熱部とを備え、前
記絶縁基体の軸の回りを旋回し、前記発熱抵抗体膜およ
び導体膜を複数の領域に分離するための螺線状の溝を形
成してなるす〜マルヘッド。A heating resistor film formed on the surface of a cylindrical or approximately cylindrical insulating substrate, a conductor film formed on the heating resistor film, and the conductor film being removed in a direction parallel to the axis of the insulating substrate to remove the heating element. The resistor film is exposed and the heat generating portion is formed on the surface, and a spiral groove is formed to rotate around the axis of the insulating base and to separate the heat generating resistor film and the conductor film into a plurality of regions. It will form ~ Maru Head.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18755081A JPS5889380A (en) | 1981-11-20 | 1981-11-20 | Thermal head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18755081A JPS5889380A (en) | 1981-11-20 | 1981-11-20 | Thermal head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5889380A true JPS5889380A (en) | 1983-05-27 |
Family
ID=16208036
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18755081A Pending JPS5889380A (en) | 1981-11-20 | 1981-11-20 | Thermal head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5889380A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0222836U (en) * | 1988-07-30 | 1990-02-15 | ||
EP0399376A2 (en) * | 1989-05-24 | 1990-11-28 | Onoda Cement Company, Ltd. | Heat fixing roll for copying machine, method of producing the same and electronic copying machine provided with the same |
US7361869B2 (en) * | 2001-12-19 | 2008-04-22 | Watlow Electric Manufacturing Company | Method for the production of an electrically conductive resistive layer and heating and/or cooling device |
-
1981
- 1981-11-20 JP JP18755081A patent/JPS5889380A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0222836U (en) * | 1988-07-30 | 1990-02-15 | ||
EP0399376A2 (en) * | 1989-05-24 | 1990-11-28 | Onoda Cement Company, Ltd. | Heat fixing roll for copying machine, method of producing the same and electronic copying machine provided with the same |
US7361869B2 (en) * | 2001-12-19 | 2008-04-22 | Watlow Electric Manufacturing Company | Method for the production of an electrically conductive resistive layer and heating and/or cooling device |
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